{'fraction_non_alphanumeric': 0.01718213058419244, 'fraction_numerical': 0.005154639175257732, 'mean_word_length': 5.7011494252873565, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Nanostructures of ZnO Prepared by Direct-Current Magnetron Sputtering Technique

We present a technique for growing wurtzite zinc oxide (ZnO) nanostructures on glass substrates using a direct-current magnetron sputtering method without catalysts. The ZnO nanostructures grown on directly glass substrates exhibit remarkably strong visible emission intensity, which is nearly 100 times stronger than that of the ZnO thin films, and narrow peak distribution. This technique opens the simplicity of creating ZnO and doped ZnO nanostructures which can cover large-area glass substrates.