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Hg-Sensitized Photochemical Vapor Deposition Application to Hydrogenated Amorphous Silicon Photoconversion Layer Overlaid on Charge Coupled Device

An Hg-sensitized photochemical vapor deposition method has been developed which has enabled a hydrogenated amorphous silicon photoconversion layer to be overlaid on a charge coupled device (CCD) imager, without a pixel separation structure. This chemical vapor deposition (CVD) method has been used to realize imaging devices with high sensitivity and high resolution for high-definition TV.