{'fraction_non_alphanumeric': 0.025252525252525252, 'fraction_numerical': 0.015993265993265993, 'mean_word_length': 5.128865979381444, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook

This paper will provide experimental results of Phase-Shift Mask (PSM) Polarimetry, a previously introduced resistbased polarization monitoring technique that employs a specialized chromeless phase-shifting test reticle. The patterns derived from high-NA proximity effects have proven to be 2 to 3 times more sensitive to polarization than a previously reported generation of patterns. Example results in this paper show that for a numerical aperture (NA) of 0.93, this technique is likely capable of measuring the intensity in the preferred polarization state (IPS) to within about 3%. Data from a follow-on reticle for NAs up to 1.35 is expected soon and promises to measure IPS to within about 1.5%. This is expected to suffice for monitoring polarization at the 22nm node for water-based immersion tools over time or from tool to tool. This technique is extendable and likely offers even greater sensitivity for high-index immersion lithography, should NAs greater than 1.35 become available. Advantages and disadvantages of this technique will be addressed.