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Surface analyses and depth profiles of oxide scales formed on alloy surface

The distributions of elements were analyzed at oxide scale surface and around the oxide scale/alloy interfaces. Glow discharge optical emission spectrometry (GDOES) depth profiles and secondary ion mass spectrometry (SIMS) imaging have been applied to analyze the oxide scales formed on FeCr alloys in CH4H2O (thickness from 100 nm to 4 µm, at 1073 K for 3 to 1050 h). The oxide scale is identified as the following phases from surface to inner oxide: MnFe oxide spinel, Cr2O3 oxide, SiO2, Al2O3 inner oxide and FeCr alloy. The concentration of Si was estimated from the quantitative analysis of Si with the GDOES depth analysis. The Si concentration increases with the oxidation duration and the highest concentration after 1050 h treatment is estimated to be 4.9 mass% from the quantitative analysis of Si. Copyright © 2006 John Wiley & Sons, Ltd.