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X-ray spectroscopy of laser-produced plasmas using a von Hamos spectrograph

The design and characteristics of a von Hamos spectrograph are considered. Efficiency of the von Hamos mica crystal spectrograph is absolutely calibrated using laser-produced plasmas as an x-ray source and a p-i-n diode as a detector. The value of integrated reflectivity of the mica crystal is also determined in the same spectral bands and diffraction orders: 5.5 - 11 angstrom (first order), 2.6 - 5.0 angstrom (second order), 1.84 - 3.22 angstrom (third order), 1.84 - 2.65 angstrom (fourth order), 1.84 - 1.92 angstrom (fifth order). The von Hamos spectrograph is used for x-ray spectroscopy and radiometry of laser-produced plasmas. The spectrograph possesses several advantages of interest: high spectral resolution ((lambda) /(delta) (lambda) up to 3000), a direct registration of one or two dimensional source images (spatial resolution up to 10 micrometers) and a high detecting efficiency over a wide spectral range. Focused intensities could be 102 - 103 times higher than those of flat crystal spectrographs. This type of spectrograph is ideal for the recording of the wide-range x-ray spectra of low intensity sources such as the femtosecond laser-produced plasma, micropinch, electron beam ion trap (EBIT), and others.