{'fraction_non_alphanumeric': 0.019808306709265176, 'fraction_numerical': 0.0012779552715654952, 'mean_word_length': 5.525, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Nanometer Scale Coating Using Atomic Layer Deposition Technique To Enhance Performance of Bio-Medical Devices

Nanofabrication is the meeting ground of engineering, biology, physics, medicine and chemistry. Most of these disciplines converge at the nanoscale, towards the same building blocks, principles, tools of investigation and fabrication. By the same token, micro- and nano-fabrication techniques are applicable in a wide range of non-traditional research areas and advance manufacturing, in particular, applications in the biomedical areas have been growing rapidly. In this work, a semiconductor microfabrication technique such as atomic layer deposition (ALD) has been applied to bio-medical stent devices as the preferred nano-scale coating method that demonstrated an enhanced in the device performance that is directly related to conformal and uniform atomic level coating. In this work, bio-medical stent devices are coated with sub-30 nm thickness of Aluminum Oxide using a plasma-enhanced ALD method. This work also describes the characterization of layer thickness using various techniques such as Ellipsometry, Scanning electron microscopy and Focused ion beam scanning electron microscopy and the results demonstrate the conformality and uniformity of the coating layer. The work also demonstrates the impact of the ALD coating on the successful adherence and coatings of other subsequent organic layer coatings on the stent device that ultimately improves the performance of the ALD coated stent devices in terms of its anti-clotting properties.