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Lifetime Measurements of CFx Radicals and H Atoms in Afterglow of CF4/H2 Plasmas

Decay time constants of CFx radical and H atom densities were measured in the afterglow of high-density CF4 plasmas following the addition of H2. The lifetimes of CFx and H for high H2 partial percentages (>25%) were several tens of times longer than those for low H2 partial percentages (<15%). The long lifetimes of both CFx and H observed for high H2 percentages suggest that the rate coefficient for the gas-phase reaction CFx + H →CFx-1 + HF is much smaller than the values reported in literature.