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Mo base superconducting materials prepared by multi-target reactive sputtering

With an aim of developing new types of superconducting materials, Mo-N films and Mo/Si multi-layered films were fabricated by reactive and two-target sputtering methods, respectively. The superconducting properties such as T c , H c2 and J c were examined. The crystal structure of Mo-N films changed from bcc to fcc with increasing N 2 gas flow rate during sputtering and a homogeneous fcc Mo 2 N superconductor was obtained. On the other hand, the superconducting characteristics of the Mo/Si multi-layered film with a layer spacing 32.3 A were confirmed to be similar to those of amorphous Mo-Si alloys except the occurrence of anisotropic vortex pinning.