{'fraction_non_alphanumeric': 0.011904761904761904, 'fraction_numerical': 0.002976190476190476, 'mean_word_length': 5.594771241830065, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
THERMAL BOUNDARY RESISTANCE MEASUREMENTS USING A TRANSIENT THERMOREFLECTANCE TECHNIQUE

A transient thermoreflectance technique, using a 200-fs laser pulse, is demonstrated as a nondestructive method for measuring the thermal boundary resistance between a thin metallic film and dielectric substrate. Experimental results are presented for Au deposited on silicon and silicon dioxide substrates taken at room temperature and compared to a thermal model. The relevant thermal properties of the metal film and the substrate are known, leaving the thermal boundary resistance as the only free parameter in the least-squares fitting routine. It is shown that the sensitivity of this technique is related directly to the thermal diffusivity of the substrate. A comparison between the diffuse mismatch model, the phonon radiation limit, and the experimental results indicates that the phonon dispersion relations of the materials can be utilized to give a qualitative prediction of the thermal boundary resistance.