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Mutual source, mask and projector pupil optimization

This paper presents a combined source/mask/projector pupil optimization (SMPO) procedure, aiming at the maximization of the common process window of different line/space configurations. The parameters are given by a pixelated source representation, sizes of the main features and the SRAF configuration. The projector wavefront is varied through the coefficients of the Fringe/Zernike polynomials for spherical aberrations. A genetic algorithm is applied as the underlying optimization algorithm. A number of results are presented and discussed, demonstrating the feasibility and potentials of the approach.