{'fraction_non_alphanumeric': 0.02034428794992175, 'fraction_numerical': 0.018779342723004695, 'mean_word_length': 5.213592233009709, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Temperature Dependence of Porogen Desorption from Low-k Porous Silica Films Incorporated with Ethylene Groups

The temperature dependence of porogen desorption from low-k silica films incorporated with ethylene groups was investigated. Total-reflection X-ray measurement indicated that porogen desorption characteristics strongly depended on temperature and time. The time required for film annealing at 400°C was 3 h, while that required for film annealing at 375°C was 8 h. These results were confirmed by temperature desorbing spectra measurement. The film vacuum annealed at 375°C for 8 h did not show that the peaks came from porogen.