{'fraction_non_alphanumeric': 0.029175050301810865, 'fraction_numerical': 0.04024144869215292, 'mean_word_length': 4.9226190476190474, 'pattern_counts': {'":': 0, '<': 0, '<?xml version=': 0, '>': 0, 'https://': 0, 'lorem ipsum': 0, 'www.': 0, 'xml': 0}, 'pii_count': 0, 'substrings_counts': 0, 'word_list_counts': {'cursed_substrings.json': 0, 'profanity_word_list.json': 0, 'sexual_word_list.json': 0, 'zh_pornsignals.json': 0}}
Characteristics of Large Area Inductively Coupled Plasma Using a Multiple Linear Antennas with U-Type Parallel Connection for Flat Panel Display Processing

In this study, the characteristics of large area internal linear inductively coupled plasma (ICP) sources of 1,020×920 mm2 (substrate area is 880×660 mm2) were investigated using a multiple linear antennas with U-type parallel connection. Using the multiple linear antennas with U-type parallel connection, a high plasma density of 2×1011 cm-3 and a high power transfer efficiency of about 88% could be obtained at 5 kW of RF power and with 20 mTorr Ar. A low plasma potential of less than 26 V and a low electron temperature of 2.6–3.2 eV could be also obtained. The measured plasma uniformity on the substrate size of fourth generation (880×660 mm2) was about 4%, therefore, it is believed that the multiple linear antennas with U-type parallel connection can be successfully applicable to the large area flat panel display processing.