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Synthesis and characterization of boron carbide films by plasma-enhanced chemical vapor deposition

The plasma-enhanced chemical vapor deposition of boron carbide was investigated on quartz glass and alumina substrates from a gas mixture of BCl 3 , H 2 , and CH 4 in an inductively coupled plasma (ICP) medium produced by a radio frequency (RF) discharged onto the gases passing through a tubular reactor under atmospheric pressure. A thin solid boron carbide coating with a gray color was deposited on both substrates. The results of XRD revealed that the major solid phase formed in the coating material was β-rhombohedral B 4 C. The SEM analysis showed that the surface homogeneity increased with an increase in the exposure time, and different boron carbide structures were formed at different RF powers and exposure times.