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Dark-Field Imaging based on Post-Processing of Electron Backscatter Diffraction Patterns in a Scanning Electron Microscope

Dark-field (DF) imaging can be performed by selecting a specific diffracted beam in the selected area diffraction pattern in conventional transmission electron microscope (CTEM) or in the convergent beam electron diffraction pattern in scanning transmission electron microscopy (STEM) mode [1]. The resultant micrograph provides high intensity of the objects in the probed volume that diffract in this particular direction. In contrast, dark-field micrographs can be obtained in STEM mode by capturing the signal from a specific range of scattering angles, with the most representative example being the high-angle annular dark-field imaging (HAADF) [2]. This leads to a contrast mostly based on atomic number differences between the different objects analysed [3].