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STRUCTURAL-PHASE TRANSFORMATIONS IN MAGNETRON DEPOSITED FILMS OF Ti-Zr-Ni SYSTEMS DURING ANNEALING IN VACUUM

Structural and phase changes in thin films obtained by magnetron sputtering of a target with the composition Ti41Zr38.3Ni20.7 (at.%) were studied under isothermal vacuum annealing in the temperature range from 400 to 800 C. The boundaries of the thermal stability of the phases have been determined. Coatings consisting of a single icosahedral quasicrystalline phase, as well as films consisting of the 2/1 crystal-approximant phase were obtained. The features of the phase transformation of a quasicrystal into an approximant crystal were investigated, and the activation energy of this transformation was determined at a level of 94 kJ/mol. The dependence of the degree of phase transformation on the temperature and duration of annealing has been established.