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UV and VUV photolysis vs. UV/H2O2 and VUV/H2O2 treatment for removal of clofibric acid from aqueous solution

Clofibric acid (CA), a metabolite of lipid regulators, was investigated in ultra‐pure water and sewage treatment plant (STP) effluent at 10 °C under UV, vacuum UV (VUV), UV/H2O2 and VUV/H2O2 processes. The influences of NO3 −, HCO3 − and humic acid (HA) on CA photolysis in all processes were examined. The results showed that all the experimental data well fitted the pseudo‐first‐order kinetic model, and the apparent rate constant (kap ) and half‐life time (t1/2 ) were calculated accordingly. Direct photolysis of CA through UV irradiation was the main process, compared with the indirect oxidation of CA due to the slight generation of hydroxyl radicals dissociated from water molecules under UV irradiation below 200 nm monochromatic wavelength emission. In contrast, indirect oxidation was the main CA degradation mechanism in UV/H2O2 and VUV/H2O2, and VUV/H2O2 was the most effective process for CA degradation. The addition of 20 mg L−1 HA could significantly inhibit CA degradation, whereas, except for UV irradiation, the inhibitive effects of NO3 − and HCO3 − (1.0 × 10−3 and 0.1 mol L−1, respectively) on CA degradation were observed in all processes, and their adverse effects were more significant in UV/H2O2 and VUV/H2O2 processes, particularly at the high NO3 − and HCO3 − concentrations. The degradation rate decreased 1.8–4.9‐fold when these processes were applied to a real STP effluent owing to the presence of complex constituents. Of the four processes, VUV/H2O2 was the most effective, and the CA removal efficiency reached over 99% after 40 min in contrast to 80 min in both the UV/H2O2 and VUV processes and 240 min in the UV process.