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Advanced optical damage studies using x-ray laser interferometric microscopy

We present early results of an application of X-ray laser, aimed at understanding the effects involved in formation of laser-induced damage in optical materials exposed to sub-ns laser pulses. For the purpose of the experiment, a novel interferometric microscopy technique was designed and tested. The interferometric beamline employed a double Lloyd's mirror interferometer, used in conjunction with an imaging mirror to provide magnification of ~8 along a plane inclined with respect to the propagation direction of the X-ray beam. The objects investigated were thin plane beamsplitters made of fused silica (SiO2), irradiated by damaging laser light at 438 nm and in situ probed by the developed technique of interferometric microscopy. The soft X-ray beam was emitted by neon-like zinc laser, delivering up to 10 mJ at 21.2 nm. In conjunction with an array of in-situ optical diagnostics, one of the questions addressed was whether the damage of the rear surface of the beamsplitter occurs approximately during of much after the laser pulse. Another issue examined by the X-ray interferometric microscopy technique was whether the surface perturbation seen shortly after the impact of the damaging pulse is associated or not with the pattern of permanent surface modifications.