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X-Ray Photoelectron Spectroscopic Studies on Pyrolysis of Plasma-Polymerized Fluorocarbon Films on Si

Temperature-programmed X-ray photoelectron spectroscopy was used to study pyrolysis of fluorocarbon thin films polymerized on Si substrates in magnetomicrowave plasma with C4F8 gas. Variations of fluorocarbon moieties were obtained at the temperature range between 20 and 700° C. The films, consisting of CF3, CF2, CF and C-CFx bonds, were found to be stable up to approximately 200° C and to be pyrolyzed via the dissociation of the terminal bonds above this temperature.