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Vapor-deposition polymerization and insulating characteristics of silsesquioxane thin films

Thin films of silsesquioxane, an organic-inorganic hybrid molecule, were prepared by electron-assisted vapor deposition polymerization of its acryl monomer. It was observed that the polymerization reaction was enhanced, and the surface smoothness was improved with increasing electron current for the vapor deposition. The deposited films had dielectric breakdown strength higher than 2x108V/m. Moreover, thermal stability of the insulating characteristics was improved by the electron-assisted deposition. Both dielectric constant and refractive index of the film had a tendency to decrease as the polymerization proceeds.