US 2020/0050105 Al  107  Feb. 13, 2020  TABLE 2-continued  Acid  Polymer  generator  Quencher  Organic solvent PEB temp. Sensitivity CDU  (pbw)  (pbw)  (pbw)  (pbw)  (" C.)  (mJ/cm 2 )  (nm)  25  Polymer 2  Quencher 20  PGMEA (400)  100  29  1.8  (100)  (5.96)  CyH (2,000)  Blend Quencher 1  PGME (100)  (3.00)  26  Polymer 2  Quencher 21  PGMEA (400)  100  28  1.9  (100)  (4.33)  CyH (2,000)  Blend Quencher 2  PGME (100)  (3.00)  27  Polymer 2  PAG5  Quencher 22  PGMEA (400)  100  24  2.2  (100)  (5.0)  (6.53)  CyH (2,000)  PGME (100)  28  Polymer 2  PAG 6  Quencher 23  PGMEA(2000)  100  23  2.3  (100)  (5.0)  (10.00)  DAA (500)  29  Polymer 2  PAG 6  Quencher 24  PGMEA(2000)  100  27  2.3  (100)  (5.0)  (6.08)  DAA (500)  30  Polymer 2  PAG 6  Quencher 25  PGMEA(2000)  100  28  2.2  (100)  (5.0)  (6.23)  DAA (500)  31  Polymer 2  PAG 6  Quencher 26  PGMEA(2000)  100  28  2.3  (100)  (5.0)  (6.36)  DAA (500)  32  Polymer 2  PAG 6  Quencher 27  PGMEA(2000)  100  26  2.2  (100)  (5.0)  (6.57)  DAA (500)  33  Polymer 2  PAG 6  Quencher 28  PGMEA(2000)  100  26  2.3  (100)  (5.0)  (7.01)  DAA (500)  TABLE 3  Acid  Polymer  generator  Quencher  Organic solvent PEB temp. Sensitivity CDU  (pbw)  (pbw)  (pbw)  (pbw)  Comparative  Polymer 1  PAG2  Comparative  PGMEA (400)  Example  (100)  (30)  Quencher 1  CyH (2,000)  (1.20)  PGME (100)  2 Polymer 1  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 2  CyH (2,000)  (1.20)  PGME (100)  3 Polymer 1  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 3  CyH (2,000)  (3.20)  PGME (100)  4 Polymer 1  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 4  CyH (2,000)  (3.20)  PGME (100)  5 Polymer 1  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 5  CyH (2,000)  (3.20)  PGME (100)  6 Polymer 1  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 6  CyH (2,000)  (3.20)  PGME (100)  7 Polymer 4  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 7  CyH (2,000)  (3.65)  PGME (100)  8 Polymer 1  PAG2  Comparative  PGMEA (400)  (100)  (30)  Quencher 8  CyH (2,000)  (2.60)  PGME (100)  C.)  (mJ/cm 2 )  (nm)  100  100  100  100  100  100  120  100  28  3.5  28  3.2  30  2.9  28  2.8  38  3.0  30  3.0  30  4.9  26  3.2  [0203]  It  is demonstrated in Tables 1 to 3 that resist  compositions comprising an iodized aromatic ring-contain› ing amine compound form patterns having a high sensitivity  and a reduced value of CDU.  [0204]  Japanese Patent Application No. 2018-150050 is  incorporated herein by reference.  [0205]  Although some preferred embodiments have been  described, many modifications and variations may be made  thereto in light of the above teachings.  It  is therefore to be $^{("}$ understood that the invention may be practiced otherwise  than as specifically described without departing from the  scope of the appended claims.  1.  A resist composition comprising a base polymer and a  quencher, the quencher being an amine compound having an  iodine-substituted aromatic ring bonded to the nitrogen atom  via a C$_{1 }$-C$_{20 }$divalent hydrocarbon group which may contain  at least one moiety selected from ester bond and ether bond. 