Mar. 26, 2015  111  US 2015/0086912 Al  -continued  [0457]  In the case where the acid generator (B) takes the  form of being included in a part of a polymer, the acid gen› erator (B) may be included in a part of the resin (P) and  constitute the resin (P), or may be included in a resin different  from the resin (P).  [0458]  In the invention, the acid generator (B) preferably  takes the form of a low molecular compound.  [0459]  The preferred form of the acid generator (B) is an  onium compound. As such a form of the acid generator (B),  for example, a sulfonium salt, an iodonium salt, and a phos› phonium salt are exemplified.  [0460]  As preferred other form of the acid generator (B), a  compound capable of generating a sulfonic acid, an imidic  acid, or a methide acid upon irradiation with an actinic ray or  radiation can be exemplified. As the acid generator (B) in that  form, for example, a sulfonium salt, an iodonium salt, a  phosphonium salt, an oxime sulfonate, an imidosulfonate and  the like can be exemplified.  [0461]  The acid generator (B) is preferably a compound  capable of generating an acid upon irradiation with an elec› tron beam or an extreme ultraviolet ray.  [0462]  The actinic ray-sensitive or radiation-sensitive resin  composition according to the invention may contain or may  not contain the acid generator (B), but when contains the acid  generator (B), the content is preferably 0.1 % by mass to 30%  by mass, more preferably 0.5% by mass to 20% by mass, and  still more preferably 1.0% by mass to 10% by mass, based on  all the solid content in the composition.  [0463]  The acid generator (B) can be used by one kind  alone, or two or more kinds may be used in combination.  [0464]  The specific examples of the acid generators (B) are  shown below.  [0452]  As the hydrophobic resins (HR), in addition to the  above, those described in JP-A-2011-248019, JP-A-2010- 175859 and JP-A-2012-032544 can also be preferably used.  [0453]  It is especially preferred to use the hydrophobic  resin (HR) having an acid-decomposable group.  [3] (B) Compound Capable of Generating an Acid Upon  Irradiation with an Actinic Ray or Radiation  [0454]  The actinic ray-sensitive or radiation-sensitive resin  composition according to the invention may contain (B) a  compound capable of generating an acid upon irradiation  with an actinic ray or radiation (hereinafter abbreviated to  "acid generator (B)").  [0455]  The acid generator (B) may take the form of a low  molecular compound, or may take the form of being included  in a part of a polymer. Also, the form as a low molecular  compound and the form of being included in a part of a  polymer may be used in combination.  [0456]  When the acid generator (B) takes the form of a low  molecular compound, the molecular weight is preferably  3,000 or less, more preferably 2,000 or less, and still more  preferably 1,000 or less.  (zl)  (z3)  (z2)  c,c,s~- (z4)  (  ots, O;S  (z6)  (zS)  (  as, o,s-~=f  CF3  (z5)  (z7) 