US 8,614,033 B2  92  91  Composition  P18  P19  P20  P21  P22  (Exposure to Electron Beam: Positive Type)  High  Molecular  Photoacid  Compound  Generator  P3  z65  (0.6 g)  (0.12 g)  P3  z5  (0.6 g)  (0.12 g)  P3  z8  (0.6 g)  (0.12 g)  P3  z66  (0.6 g)  (0.12 g)  P12  z42  (0.6 g)  (0.12 g)  Basic  Compound  Bl  (0.002 g)  Bl  (0.002 g)  Bl/B6  (0.001 g/0.001 g)  Bl  (0.002 g)  Bl  (0.002 g)  Solvent  S2/Sl  (5.0 g/4.0 g)  S2/Sl  (5.0 g/4.0 g)  S2/Sl  (5.0 g/4.0 g)  S2/Sl  (5.0 g/4.0 g)  Sl  (9.0 g)  TABLE 4-continued  -continued  TABLES  Composition  Comparative  Composition Pl  Comparative  Composition P2  (Ex12osure to Electron Beam: Positive TYQe)  High Molecular  Photoacid  Basic  Compound  Generator  Compound  Solvent  Comparative  z2  B2  Sl  High Molecular  (0.12 g)  (0.002 g)  (9.0 g)  Compound (Pl)  (0.6 g)  Comparative  z2  B2  Sl  High Molecular  (0.12 g)  (0.002 g)  (9.0 g)  Compound (P2)  (0.6 g)  The abbreviations of each of the components used in the  above and the following Examples/Comparative Examples  are listed below.  (z58)  OH  #  ,,Jl ,o  r17  CC ~)()  g’  t  13  )tl1  I  291 A 3  s  #  271 A 3  (z48)  186A 3  (z45)  CF3  I  O=S=O 0  I  II  -c--S-CF3  I  II  O=S=O 0  I  CF3  189A 3  (z42)  0  ~-No  II  0  244A 3  (z37)  (Or  136A 3  (z8)  216A 3  (z5)  303  A 3  (z2)  113A 3  Photoacid Generator (Compound (B))] 