1111111111111111 IIIIII IIIII 1111111111 11111 111111111111111 IIIII lllll 111111111111111 11111111  US 20200272048Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama et al.  c10)  Pub. No.: US 2020/0272048 Al  (43)  Pub. Date:  Aug. 27, 2020  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu-shi (JP);  Masaki Ohashi,  Joetsu-shi (JP);  Takayuki Fujiwara,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/787,743  (22)  Filed:  Feb. 11, 2020  (30)  Foreign Application Priority Data  (57)  ABSTRACT  Publication Classification  Feb. 27, 2019  (JP) ................................. 2019-033684  A resist composition comprising a base polymer and a  quencher in the form of a salt of a cyclic ammonium cation  with a carboxylate, sulfonamide, halogenated phenoxide or  halide anion offers a high sensitivity and minimal LWR or  improved CDU, independent of whether it is of positive or  negative tone.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  710045  (2013.01);  G03F 7/162  (2013.01);  G03F  710382  (2013.01);  G03F  710392  (2013.01)  G03F  71004  G03F  71039  G03F  71038  (2006.01)  (2006.01)  (2006.01) 