TABLE 4-continued  142  US 8,962,233 B2  141  ArF:  ositive  Acid  Acid  generator  generator  Basic  Solvent  (Al)  (A2)  Resin (B)  compound  Surfactant  [0.4g]  [0.4g]  (9.6 g)  (0.02 g)  (0.1 mass%)  Ex. 6A  Al-35  RA-3  C-3  W-1  Ex. 7A  Al-54  RA-1  C-1  W-1  Ex. SA  Al-69  RA-2  C-1  W-2  Ex. 9A  Al-70  z  RA-2  C-1  W-3  Ex. l0A  Al-79  RA-2  C-1  W-3  Ex. llA  Al-83  RA-4  C-1  W-3  Ex.12A  Al-96  RA-3  C-2  W-4  Ex.13A  Al-1  RA-4  C-3  W-4  Ex.14A  Al-69  RA-3  C-2  W-4  Ex.15A  Al-96  RA-4  C-3  W-4  Comp. !A  Comparative  RA-2  C-1  W-1  compound 1  Comp. 2A  Comparative  RA-2  C-1  W-1  compound 2  Comp. 3A  Comparative  RA-2  C-1  W-1  compound 3  Comp. 4A  Comparative  RA-2  C-1  W-1  compound 4  Comp.  SA  Comparative  RA-2  C-1  W-1  compound 5  [mass  ratio]  Al/Bl  [6/4]  A2/B2  [6/4]  Al/Bl  [6/4]  A3/Bl  [6/4]  A3/Bl  [6/4]  A3/Bl  [6/4]  A4/Bl  [6/4]  A4/Bl  [6/4]  A4/Bl  [6/4]  A4/Bl  [6/4]  Al/Bl  [6/4]  Al/Bl  [6/4]  Al/Bl  [6/4]  Al/Bl  [6/4]  Al/Bl  [6/4]  Sensitivity  (mJ/cm 2 )  29.0  29.0  26.0  27.0  27.0  28.0  27.0  27.0  26.0  27.0  30.0  33.0  30.0  31.0  33.0  Configuration  Outgassing  LER of  performance  Resolution  y  (nm) pattern  (%)  5.4  6.3  Rectangle  4.5  5.2  6.5  Rectangle  5.5  7.3  4.2 Rectangle  5.5  6.6  4.3  Rectangle  3.0  6.5  4.8 Rectangle  3.0  6.0  6.2  Rectangle  5.0  6.8  4.4 Rectangle  5.5  6.8  4.2 Rectangle  5.5  6.4  4.3  Rectangle  5.5  6.6  4.7 Rectangle  5.5  4.2  7.4 Taper  6.8  5.1  7.2 Taper  6.2  4.8  6.9  Taper  6.4  4.8  6.7  Taper  6.4  4.6  6.5  Rectangle  6.4  The employed components are as follows.  [ Acid Generator]  The acid generators (Al) according to the present inven› tion are those mentioned hereinbefore by way of example.  The acid generator (A2) used in combination therewith is  compound Z shown below.  (Z)  F  F  O+H+F  0-~  F  II  F  F  0  F  F  Comparative compound 2  Comparative compound 1 