50  US 7,410,747 B2  49  Also, the organic antireflection film may be a commer› cially available organic antireflection film such as DTV-30  Series, DTV-40 Series (produced by Brewer Science, Inc.),  AR-2, AR-3 andAR-5 (produced by Shipley Co., Ltd.).  In the production or the like of a precision integrated circuit  device, the step of forming a pattern on a photosensitive film  is performed by coating the photosensitive composition of the  present invention on a substrate (for example, a silicon/silicon  dioxide-coated substrate, a glass substrate, an ITO substrate  or a quartz/chromium oxide-coated substrate), drying or bak› ing it to form a photosensitive film, irradiating the photosen› sitive film with actinic rays or radiation such as far ultraviolet  ray (e.g., KrF, ArF excimer laser), F$_{2 }$ excimer laser, electron  beam, EUV or X-ray, preferably heating it, and then subject- ing the photosensitive film to development, rinsing and dry› ing, whereby a good pattern can be formed.  The photosensitive composition of the present invention is  preferably exposed by electron beam or EUV.  The alkali developer which can be used in the development  is an aqueous solution ofan alkali (usually, 0.1 to 20 mass%)  such as inorganic alkalis ( e.g., sodium hydroxide, potassium  hydroxide, sodium carbonate, sodium silicate, sodium meta› silicate, aqueous ammonia), primary amines (e.g., ethy- !amine, n-propylamine), secondary amines (e.g., diethy› lamine,  di-n-butylamine),  tertiary  amines  (e.g.,  triethylamine, methyldiethylamine), alcohol amines (e.g.,  dimetylethanolamine, triethanolamine), quaternary ammo› nium salts ( e.g., tetramethylammonium hydroxide, tetraethy- !ammonium hydroxide, choline) and cyclic amines ( e.g., pyr› role, piperidine). In this aqueous solution of an alkali, an  alcohol such as isopropyl alcohol and a surfactant such as  nonionic surfactant may be added each in an appropriate  amount.  Among these developers, preferred are a quaternary  ammonium salt, more preferred are tetramethylammonium  hydroxide and choline.  The alkali concentration of the alkali developer is usually  from 0.1 to 20 mass%.  The pH of the alkali developer is usually from IO.Oto 15.0.  The present invention is described in greater detail below  by referring to Examples, but the present invention should not  be construed as being limited thereto.  In a reaction vessel, 111.14 g (0.5 mo!) of3-methoxy-4- (1-ethoxyethoxy)styrene and 94.59 g (0.5 mo!) ofN-(4-hy› droxyphenyl)maleimide were dissolved in 400 ml oftetrahy› drofuran. While stirring the resulting solution, a nitrogen gas  was passed into the system. Subsequently, 12.42 g (0.05 mo!)  of polymerization initiator V-65 (produced by Waka Pure  Chemical Industries, Ltd.) was added thereto and the reaction  solution was heated at 65°  C. After stirring under heat for 10  hours by adding V-65 in the same amount as above every one  hour, the reaction solution was allowed to cool to room tem› perature and then added dropwise in 5 L of hexane to precipi› tate a polymer. The solid obtained by filtration was dissolved  in 800 ml of tetrahydrofuran and the resulting solution was  again added dropwise in 5 L of hexane. After filtration, the  solid obtained was dried under reduced pressure to obtain  181.04 g of a 3-methoxy-4-(1-ethoxyethoxy)styrene/N-(4- hydroxyphenyl)maleimide copolymer.  In a reaction vessel, 180 g of the polymer obtained above,  800 ml of tetrahydrofuran, 100 ml of methanol, 10 ml of  distilled water and 1.0 g of p-toluenesulfonic acid were added  and stirred at room temperature for 5 hours. Subsequently, the  reaction solution was added dropwise in 3 L of distilled water,  and the solid obtained by filtration was dissolved in 600 ml of  tetrahydrofuran. The resulting solution was again added  dropwise in 3 L of distilled water and after filtration, the solid  obtained was dried under reduced pressure to obtain 120.5 g  of 3-methoxy-4-hydroxystyrene/N-( 4-hydroxypheny I )male› imide copolymer.  In a reaction vessel, 30 g of the polymer obtained above  was dissolved in 100 g of propylene glycol monomethyl ether  acetate (PGMEA) and the resulting solution was depressur› ized to 20 mmHg at 60°  C. to distill out about 20 g of the  solvent together with water remaining in the system. The  residue was cooled to 20°  C. and after adding 8.71 g of  2-phenoxyethyl vinyl ether and 1.0 g of p-toluenesulfonic  acid, stirred at room temperature for 1 hour. Subsequently,  1.16 g oftriethylamine was added to effect neutralization and  Synthesis Example 1  Synthesis of Polymer A-la  EXAMPLES  OMO  A  y  ~  oyo~ 0 ~  -continued 