Jul.  17,  2014  8  US 2014/0199617 Al  combination is generally 20/80 to 99/1 as mass ratio, prefer› ably 50/50 to 97/3, more preferably 60/40 to 95/5, and most  preferably 60/40 to 90/10.  [0150]  In formula (S2), each ofR" and R"" independently  represents a hydrogen atom, an alkyl group, a cycloalkyl  group, an alkoxy group, an alkoxycarbonyl group, a carboxyl  group, a hydroxyl group, a cyano group or a halogen atom,  and R" and R"" may be bonded to each other to form a ring.  [0151]  Each of R" and R"" preferably represents a hydro› gen atom or an alkyl group. The carbon atom number of the  alkyl group, alkoxy group and alkoxycarbonyl group repre› sented by R" and R"" is preferably in the range of 1 to 15, and  the carbon atom number of the cycloalkyl group is preferably  in the range of3 to 15.  [0152]  R"’ represents an alkylene group or a cycloalkylene  group. R"’ preferably represents an alkylene group. The car› bon atom number of the alkylene group represented by R"’ is  preferably in the range of 1 to 10. The carbon atom number of  the cycloalkylene group represented by R"’ is preferably in  the range of3 to 10.  [0153]  The alkyl group, cycloalkyl group, alkoxy group  and alkoxycarbonyl group represented by each ofR" and R"",  the alkylene group and cycloalkylene group represented by  R"’, and the ring formed by bonding of R" and R"" to each  other may be substituted with a hydroxyl group, a group  containing a carbonyl group ( e.g., an acyl group, an aldehyde  group, an alkoxycarbonyl group or the like), or a cyano group.  [0154]  The alkylene group represented by R"’ in formula  (S2) may have an ether bond in the alkylene chain.  [0155]  The examples of the solvents represented by for› mula (S2) include, for example, propylene glycol monom› ethyl ether acetate, ethylene glycol monoethyl ether acetate,  ethylene glycol monopropyl ether acetate, ethylene glycol  monobutyl ether acetate, ethylene glycol monophenyl ether  acetate, diethylene glycol monomethyl ether acetate, diethyl› ene glycol monopropyl ether acetate, diethylene glycol  monophenyl ether acetate, diethylene glycol mono butyl ether  acetate, di ethylene glycol monoethyl ether acetate, propylene  glycol monoethyl ether acetate, propylene glycol monopro› pyl ether acetate, methyl-3-methoxy propionate, ethyl-3- methoxy propionate, ethyl-3-ethoxy propionate, propyl-3- methoxy  propionate,  ethyl  methoxyacetate,  ethyl  ethoxyacetate,  2-methoxybutyl  acetate,  3-methoxybutyl  acetate, 4-methoxybutyl acetate, 3-methyl-3-methoxybutyl  acetate,  3-ethyl-3-methoxybutyl  acetate,  2-ethoxybutyl  acetate,  4-ethoxybutyl acetate,  4-propoxybutyl acetate,  2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-meth› oxypentyl acetate, 2-methyl-3-methoxypentyl acetate, 3-me› thy 1-3-methoxypenty 1 acetate, 3-methy 1-4-methoxypenty 1  acetate, 4-methyl-4-methoxypentyl acetate, etc., and propy› lene glycol monomethyl ether acetate is preferred.  [0156]  Of the above, each ofR" and R"" preferably repre› sents an unsubstituted alkyl group. R"’ preferably represents  an unsubstituted alkylene group. Each of R" and R"" more  preferably represents either a methyl group or an ethyl group.  Still more preferably, each ofR" and R"" represents a methyl  group.  [0157]  The solvent represented by formula (S2) may be  used in combination with one or more other organic solvents.  The solvents for use in combination in this case are not  especially restricted so long as they can be blended with the  solvent represented by formula (S2) without separation. The  solvents represented by formula (S2) may be blended with  each other. The solvent represented by formula (S2) may be  used as mixture with the solvent selected from other ester  solvents, ketone solvents, alcohol solvents, amide solvents,  ether solvents and hydrocarbon solvents. One or more sol› vents may be used in combination, but for obtaining stable  performance, the solvent to be used in combination is prefer› ably one kind. When one kind of a solvent is used in combi› nation as mixture, the blending ratio of the solvent repre› sented by formula (S2) and the solvent to be used in  combination is generally 20/80 to 99/1 as mass ratio, prefer› ably 50/50 to 97/3, more preferably 60/40 to 95/5, and most  preferably 60/40 to 90/10.  [0158]  As organic solvents for use as the developer, ether  solvents can also be preferably exemplified.  [0159]  As ether solvents that can be used, the above-de› scribed ether solvents are exemplified. Of the above ether  solvents, ether solvents having one or more aromatic rings are  preferred, more preferably a solvent represented by the fol› lowing formula (S3), and most preferably anisole.  [0160]  In formula (S3), Rs represents an alkyl group. The  alkyl group preferably has 1 to 4 carbon atoms, and is more  preferably a methyl group or an ethyl group, and most pref› erably a methyl group.  [0161]  In the invention, the water content of the developer  is generally 10% by mass or less, preferably 5% by mass or  less, more preferably 1 % by mass or less, and it is most  preferred not to substantially contain water.  [0162]  Surfactant  [0163]  To the developer containing an organic solvent may  be added an appropriate amount of a surfactant according to  necessity.  [0164]  As the surfactant, the same surfactants as those for  use in the later-described electron beam-sensitive or extreme  ultraviolet radiation-sensitive resin composition can be used.  [0165]  The amount of the surfactant to be used is generally  0.001 % by mass to 5% by mass of the entire amount of the  developer, preferably 0.005% by mass to 2% by mass, and  more preferably 0.01 % by mass to 0.5% by mass.  [0166]  Developing Method  [0167]  As a developing method, for example, a method of  dipping a substrate in a tank filled with a developer for a  prescribed time (a dipping method), a developing method by  swelling a developer by surface tension to slightly above the  surface of a substrate and standing still for a prescribed time  ( a puddling method), a method of spraying a developer on the  surface of a substrate (a spraying method), and a method of  continuously ejecting a developer by scanning a developer  ejection nozzle at a constant speed on a substrate revolving at  a constant speed (a dynamic dispensing method) can be  applied.  [0168]  After a development step, a step of stopping devel› opment while replacing the developer with other solvent may  be performed.  [0169]  The developing time is not especially restricted so  long as it is sufficient for the resin in an unexposed part to be  R’’-----(_;(=0)---0-R’’’-O-R’’’’  (S2)  (S3) 