US 20150086912Al  c19)  United States  c12)  Patent Application Publication  KAWABATA et al.  c10)  Pub. No.: US 2015/0086912 Al  (43)  Pub. Date:  Mar. 26, 2015  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, RESIST FILM AND  PATTERN FORMING METHOD USING THE  SAME, MANUFACTURING METHOD OF  SEMICONDUCTOR DEVICE, AND  SEMICONDUCTOR DEVICE  (71)  Applicant:  FUJIFILM CORPORATION,  Tokyo  (JP)  (72)  Inventors:  Takeshi KAWABATA,  Haibara-gun  (JP);  Hideaki TSUBAKI,  Haibara-gun  (JP);  Hiroo TAKIZAWA,  Haibara-gun  (JP);  Natsumi YOKOKAWA,  Haibara-gun (JP)  (73)  Assignee:  FUJIFILM CORPORATION,  Tokyo  (JP)  (21)  Appl. No.:  14/554,344  (22)  Filed:  Nov. 26, 2014  ( 63)  Continuation of application No. PCT /JP2013/065770,  filed on May 31, 2013.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ........  G03F 710388  (2013.01);  C08F 216/1416  (2013.01);  C08F 216110  (2013.01);  C08F  220130  (2013.01);  C08F 216114  (2013.01);  C08F 2220/301  (2013.01)  USPC  430/18;  430/325; 430/319; 526/243;  526/256; 526/270; 526/287  G03F 71038  C08F 216110  C08F 220130  C08F 216114  (2006.01)  (2006.01)  (2006.01)  (2006.01)  May 31, 2012  Apr. 30, 2013  (JP) ................................. 2012-124854  (JP) ................................. 2013-096041  There is provided an actinic ray-sensitive or radiation-sensi› tive resin composition comprising (P) a resin having a repeat› ing unit (A) represented by the specific formula  (I)  capable of  generating an acid on the side chain of the resin upon irradia› tion with an actinic ray or radiation, and a resist film formed  with the actinic ray-sensitive or radiation-sensitive resin com› position, and a pattern forming method comprising: exposing  the resist film, and developing the exposed resist film, and a  method for manufacturing a semiconductor device, contain› ing the pattern forming method, and a semiconductor device  manufactured by the manufacturing method of the semicon› ductor device.  (57)  ABSTRACT  Related U.S. Application Data  (30)  Foreign Application Priority Data  Publication Classification 