TABLE 2-continued  166  US 9,217,919 B2  165  Evaluation results in EB exposure  Ex.24  P-20  99.95  Nil  Nil  Nil  Sl/S2  40/60  Ex. 25  P-21  99.95  Nil  Nil  Nil  Sl/S2  40/60  Ex.26  P-22  99.95  Nil  Nil  Nil  Sl/S2  40/60  Ex. 27  P-23  99.95  Nil  Nil  Nil  Sl/S2  40/60  C.Ex.1 Nil  P-14  91.95  PAG-1  8  Nil  Sl/S2  40/60  C.Ex.2 Nil  P-14  90.95  PAG-1  8  TPI  Sl/S2  40/60  C. Ex. 3 Nil  P-14  50  Nil  Nil  Sl/S2  40/60  P-16  49.95  C.Ex.4 Nil  P-17  99.95  Nil  Nil  Sl/S2  40/60  C. Ex. 5 Nil  P-18  99.95  Nil  Nil  Sl/S2  40/60  Total solids  Concen- concen- Sensitivity Resolution  Pattern  LER  Surfactant  tration  tration  (µC/cm 2 )  (nm)  profile  (nm)  Ex. 1  W-1  0.05  4.0  25.0  65  Rectangular  4.8  Ex.2  W-1  0.05  4.0  22.1  60  Rectangular  4.3  Ex. 3  W-2  0.05  4.0  24.5  60  Rectangular  4.2  Ex. 4  W-3  0.05  4.0  20.8  65  Rectangular  5.0  Ex. 5  W-1  0.05  4.0  19.5  60  Rectangular  4.0  Ex. 6  W-1  0.05  4.0  17.3  55  Rectangular  4.1  Ex. 7  W-1  0.05  4.0  20.1  60  Rectangular  4.6  Ex. 8  W-1  0.05  4.0  24.6  55  Rectangular  3.9  Ex.9  W-1  0.05  4.0  17.0  55  Rectangular  3.7  Ex. 10  W-1  0.05  4.0  18.2  65  Rectangular  4.7  Ex.  11  W-1  0.05  4.0  23.2  65  Rectangular  4.8  Ex. 12  W-2  0.05  4.0  24.7  70  Rectangular  5.0  Ex. 13  W-3  0.05  4.0  24.4  70  Rectangular  5.1  Ex. 14  W-1  0.05  4.0  24.9  70  Rectangular  5.6  Ex. 15  W-3  0.05  4.0  26.8  55  Rectangular  3.8  Ex. 16  W-1  0.05  4.0  26.4  55  Rectangular  3.8  Ex. 17  W-2  0.05  4.0  29.7  65  Rectangular  5.3  Ex. 18  W-3  0.05  4.0  25.9  55  Rectangular  3.9  Ex. 19  W-1  0.05  4.0  18.0  65  Rectangular  5.1  Ex.20  W-1  0.05  4.0  19.7  55  Rectangular  4.2  Ex.21  W-2  0.05  4.0  26.6  55  Rectangular  4.0  Ex.22  W-3  0.05  4.0  25.9  55  Rectangular  3.6  Ex. 23  W-2  0.05  4.0  23.1  65  Rectangular  5.3  Ex. 24  W-3  0.05  4.0  24.9  65  Rectangular  5.6  Ex. 25  W-1  0.05  4.0  25.0  70  Rectangular  5.8  Ex. 26  W-2  0.05  4.0  25.1  70  Rectangular  5.9  Ex. 27  W-2  0.05  4.0  22.7  65  Rectangular  5.2  C. Ex. 1  W-1  0.05  4.0  A  100-nm LIS pattern could not be formed.  C. Ex. 2  W-1  0.05  4.0  32.8  90  Taper  12.6  C. Ex. 3  W-1  0.05  4.0  27.6  85  Taper  10.2  C. Ex. 4  W-1  0.05  4.0  A  100-nm LIS pattern could not be formed.  C. Ex. 5  W-1  0.05  4.0  25.0  75  Taper  6.8  The concentration of each of the components expresses a concentration(% by mass) in the total solids concentration.  The resins P- 7  and P-9 in the "Other resin" column in Table  2 are a resin  of  the invention.  Structures  of  the raw materials (and other resins, conven› tional acid generator and basic compounds) used in the  Examples and Comparative Examples are shown below.  -continued  OH  P-14  Mw  ~  19000 (Mw/Mn  ~  1.14)  OH  P-15  Mw  ~  20000 (Mw/Mn  ~  1.15) 