B represents a group containing a cycloaliphatic group  having  4  or more carbon atoms wherein either a tertiary  or a quaternary carbon atom is contained,  the two or more -(A-B) groups may be identical to or  different from each other; and  Ar represents an aromatic ring that may have a substituent  other than the -(A-B) groups;  n is an integer of 2 to 5;  A represents a single bond;  M+ represents an organic onium ion, and  wherein a substituent other than -(A-B) groups which aro› matic ring Ar in general formula  (I) may have is selected  from a group consisting of:  wherein:  Ar represents a benzene ring that may have a substituent  other than the -(A-B) groups and two a-positions of the  benzene ring are substituted with the -(A-B) groups;  A represents any one, or a combination of two or more  members selected from a single bond, an alkylene  group, ---0-, -S-, ----C(=O)-, -S(=O)-,  -S(=0)$_{2}$ - and  -OS(=0)$_{2}$-, provided  that  ----C(=O)O-is excluded;  B represents a group containing a noncyclic hydrocarbon  group having 5 or more carbon atoms or a cycloaliphatic  group having  4  or more carbon atoms wherein either a  tertiary or a quaternary carbon atom is contained,  the two or more -(A-B) groups may be identical to or  different from each other; and  M+ represents an organic onium ion.  n is an integer of 2 to 5;  wherein:  8.  An actinic ray-sensitive or radiation-sensitive resin com- position comprising any of the compounds of general formula  (I) below, a resin soluble in an alkali developer and an acid  crosslinking agent capable of crosslinking with the resin  soluble in an alkali developer by the action of an acid;  7.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  1,  wherein in general formula  (I), A represents a single bond.  6.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  1,  wherein in general formula  (I), the three -(A-B) groups are the same.  5.  The method of forming a pattern according to claim  4,  wherein the exposure is carried out by use of X-rays, electron  beams or EUV.  4.  A method of forming a pattern, comprising the steps of  forming the actinic-ray- or radiation-sensitive resin compo› sition according to claim  1  into a film, exposing the film and  developing the exposed film.  12.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  8,  wherein in general formula  (I), n=3.  13.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  12,  wherein in general for› mula  (I), the three -(A-B) groups are substituted at two a-po› sitions and one p-position of the benzene ring.  14.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  12,  wherein in general for- mula (I), the three -(A-B) groups are the same.  15.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  8,  wherein in general formula  (I), A represents a single bond.  16.  A compound of general formula (I) below;  alkoxy group, an aryloxy group, an alkylthioxy group, an  arylthioxy group, an alkoxycarbonyl group, a phenoxycarbo- nyl group, and acetoxy group, a liner or branched alkyl group,  an alkenyl group, an alkynyl group, an aryl group, an acyl  group, a hydroxyl group, a carboxyl group and a sulfonate  group.  17.  A compound of general formula (I) according to claim  16,  wherein two a-positions of the benzene ring are substi› tuted with the -(A-B) groups.  18.  A compound of general formula (I) according to claim  16,  wherein, n=3.  19.  A compound of general formula (I) according to claim  16,  wherein the three -(A-B) groups are substituted at two  a-positions and one p-position of the benzene ring.  20.  A compound of general formula (I) according to claim  16,  wherein the three -(A-B) groups are the same.  21.  A compound of general formula (I) according to claim  16,  wherein the aromatic ring represented by Ar has no sub› stituent other than the -(A-B) groups.  *  *  *  *  *  9.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  8,  wherein in the general  formula  (I), B represents a cycloaliphatic group having  4  or  more carbon atoms.  10.  A method of forming a pattern, comprising the steps of  forming the actinic-ray- or radiation-sensitive resin compo› sition according to claim  8  into a film, exposing the film and  developing the exposed film.  11.  The method of forming a pattern according to claim  10,  wherein the exposure is carried out by use of X-rays, electron  beams or EUV.  (I)  ~(A-B), M’  170  US 8,900,791 B2  169  (I)  ~  (A-B)n 