US 10,754,248 B2  6  5  In addition, the component (B) is preferably a polymer  including a repeating unit represented by the following  general formula ( 6) and a repeating unit represented by the  following general formula  (7),  -continued  (6c)  wherein,  RA  represents any of a hydrogen atom, a fluorine  atom, a methyl group, or a trifluoromethyl group;  zA  rep› resents any of a single bond, a phenylene group, a naphth› ylene group, or a (main chain) ----C(=0)---0-Z’-; Z’  represents a linear, a branched, or a cyclic alkylene group 30  having 1 to 10 carbon atoms optionally containing any of a  hydroxy group, an ether bond, an ester bond, or a lactone  ring, a phenylene group, or a naphthylene group;  XA  repre› sents an acid labile group; and  yA  represents a hydrogen  atom, or a polar group having one or more structures 35  selected from a hydroxy group, a cyano group, a carbonyl  group, a carboxyl group, an ether bond, an ester bond, a  sulfonic ester bond, a carbonate bond, a lactone ring, a  sultone ring, and a carboxylic acid anhydride.  Such the resist composition including a component  (B)  provides high dissolution contrast, excellent lithography  performance such as LWR, few defects and excellently  rectangle patterns.  Also,  XA  in the general formula (6) is preferably repre› sented by any of the following general formula (6a), (6b ), or  (6c),  wherein, each ofR 10O , R 2OO , and R $^{3OO }$independently repre› sents a linear, a branched, or a cyclic monovalent hydrocar› bon group having 1 to 20 carbon atoms optionally contain› ing a heteroatom, and two or more of R 10O , R 2OO , and R 3OO  may be bonded to form a ring together with a sulfur atom in  the formula; and  xa- represents an anion represented by any  of the following general formula (SA), (8B), (SC) or (SD),  In addition, the component (D) is preferably represented  by the following general formula (8) or the following  general formula (9),  Such the resist composition including a component (B) is  more excellent in dissolution contrast and pattern’s rectangle  property.  zA  in the general formula (6) preferably represents a  single bond.  Such the resist composition including a component  (B)  provides extremely high dissolution contrast, excellent  lithography performance such as LWR, few defects and  excellently rectangle patterns.  wherein, R  66  represents a linear, a branched, or a cyclic  monovalent hydrocarbon group having 1 to 10 carbon atoms  optionally containing a heteroatom;  "q"  represents 1 or 2;  and "*" represents a bond with an ester site in the general  formula (6).  (6a)  R66  (6b)  (SA)  (SB)  (8)  RIOO  I  xa- +S-R200  I  R300  (SC)  (6)  H  ’j==o  $^{0 }$\ $_{yA }$ (7) 