109  US 9,989,847 B2  110  -continued  (++)  H  ’j=o  $^{0 }$\ $_{YL }$ (2)  (3)  wherein R  la  is hydrogen, fluorine, methyl ortrifluoromethyl,  za  is a single bond, phenylene, naphthylene or (backbone)› C(=0)-0-Z’-, Z’ is a straight C$_{1}$-C$_{10 }$ or branched or  cyclic C$_{3}$ -C$_{10 }$alkylene group which may contain a hydroxyl  radical, ether bond, ester bond or lactone ring, or phenylene  25  or naphthylene group, XA is an acid labile group, and YL is  hydrogen or a polar group having at least one structure  selected from the group consisting of hydroxyl, cyano,  carbonyl, carboxyl, ether bond, ester bond, sulfonate bond,  carbonate bond, lactone ring, sultone ring, and carboxylic 30  anhydride.  2.  The resist composition of claim  1  wherein the anion  moiety in formula  (1)  is selected from the following formu- lae (ql) to (q35):  o:f  H  (X>-cw  H  cc5  co  (qg)  (’13) 50 