(10)  Patent No.:  US 7,781,141 B2  (45)  Date of Patent:  Aug. 24, 2010  c12)  United States Patent  Gallagher et al.  (54)  COMPOSITIONS AND PROCESSES FOR  IMMERSION LITHOGRAPHY  (75)  Inventors:  Michael K. Gallagher,  Hopkinton, MA  (US);  Gerald B. Wayton,  Leicester, MA  (US);  Gregory P. Prokopowicz,  Lancaster, MA (US);  Stewart A.  Robertson,  Shrewsbury, MA (US)  (73)  Assignee:  Rohm and Haas Electronic Materials  LLC,  Marlborough, MA (US)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  11/173,932  (22)  Filed:  Jul. 1, 2005  (60)  Provisional application No. 60/585,119, filed on Jul. 2,  2004.  (51)  Int. Cl.  (52)  U.S. Cl.  .................  430/270.1;  430/330; 430/272.1;  430/273.1; 430/327; 430/322; 430/494  (58)  Field of Classification Search  .............. 430/272.1,  430/273.1, 327,330, 322, 494  See application file for complete search history.  FOREIGN PATENT DOCUMENTS  OTHER PUBLICATIONS  (57)  ABSTRACT  13 Claims, No Drawings  (56)  References Cited  U.S. PATENT DOCUMENTS  Related U.S. Application Data  (65)  Prior Publication Data  6,788,477 B2 *  9/2004 Lin ............................ 359/820  2004/0075895 Al  4/2004 Lin  2005/0123863 Al*  6/2005 Chang et al. ................ 430/322  2005/0175940 Al*  8/2005 Dierichs ..................... 430/322  2005/0202340 Al  9/2005 Houlihan et al.  2005/0202347 Al  9/2005 Houlihan et al.  2005/0202351 Al  9/2005 Houlihan et al.  2005/0238991 Al  10/2005 Jung  2005/0239296 Al  10/2005 Jung  2005/0250898 Al  11/2005 Maeda et al.  2005/0255414 Al*  11/2005 Inabe et al. ................. 430/327  2005/0266354 Al  12/2005 Li et al.  2005/0277069 Al*  12/2005 Endo et al. .................. 430/327  2006/0008732 Al  1/2006 Jung  2006/0024613 Al  2/2006 Otozawa et al.  2006/0029884 Al  2/2006 Hatakeyama et al.  2006/0093959 Al  5/2006 Huang et al.  2006/0111550 Al  5/2006 Hata et al.  2006/0141400 Al  6/2006 Hirayama et al.  2006/0154170 Al  7/2006 Endo et al.  G03F  7100  (2006.01)  G03F  7111  (2006.01)  G03F  7120  (2006.01)  G03F  7138  (2006.01)  US 2006/0105272Al  May 18, 2006  4,617,057 A  10/1986 Plueddemann  US007781141B2  EP  0239108  9/1987  Proceedings  of SPIE,  vol.  5754,  May 2004,  pp.  13-22  (XP002341982).  Proceedings  of SPIE,  vol.  5376,  May 2004,  pp.  63-70  (XP002341983).  * cited by examiner  Primary Examiner-Amanda  C. Walke  (74)  Attorney, Agent, or Firm-Peter  F. Corless; Darryl P.  Frickey; Edwards Angell Palmer & Dodge LLP  The present invention relates to barrier layer compositions  that are applied above a photoresist composition for immer› sion lithography processing. In a further aspect, new methods  are provided for immersion lithography processing. 