6  US 8,574,814 B2  5  hydroxyl group and at least one group in which a hydrogen  atom of a phenolic hydroxyl group is substituted with a group  (hereinbelow, also referred to as an "acid labile group") rep› resented by the following General Formula (1). The "acid  labile group" refers to a group eliminated when a chemical  bond is broken by the action of an acid. In addition, the  "phenolic hydroxyl group" refers to a hydroxyl group directly  binding to an aromatic ring.  [Chem. 6]  S represents a structural moiety that generates an acid on a  side chain by being degraded by actinic ray irradiation or  radiation irradiation.  (10) The composition according to any one of (1) to (9),  which is exposed with at least one of an electron beam,  X-rays, and EUV light.  (11) An actinic ray-sensitive or radiation-sensitive film  formed using the composition according to any one of (1) to  (10).  (12) Mask blanks on which the actinic ray-sensitive or  radiation-sensitive film according to (11) is formed.  (13) A mask for producing semiconductors that is obtained  by exposing and developing the mask blanks according to  (12).  (14) A pattern forming method including exposing the film  according to (11 ), and developing the exposed film.  (15) A pattern forming method including exposing the  mask blanks according to (12), and developing the exposed  mask blanks.  (16) The method according to (14) or (15), wherein the  exposing is performed using at least one of an electron beam,  X-rays, and EUV light.  According to the present invention, an actinic ray-sensitive  or radiation-sensitive resin composition that can form inde› pendent line patterns with high resolution and excellent 30  shapes and shows excellent resist performances including  roughness characteristics, and an actinic ray-sensitive or  radiation-sensitive film and a pattern forming method using  the composition can be provided.  Hereinbelow, embodiments of the present invention will be  described in detail.  Regarding the description for a group ( atomic group) in the  present specification, if a group is not described in regard to  whether the group is substituted or unsubstituted, this group  includes not only those not having a substituent but also those  having a substituent. For example, an "alkyl group" includes  not only an alky 1 group ( unsubstituted alky 1 group) not having  a substituent but also an alkyl group (substituted alkyl group)  having a substituent.  In the present invention, the term "actinic rays" or "radia› tion" refers to, for example, a bright line spectrum of a mer› cury lamp, far-ultraviolet rays represented by an excimer  laser, extreme ultraviolet rays (EUV light), X-rays, or an  electron beam. In addition, the "light" in the present invention  refers to the actinic rays or the radiation. The term "exposure"  in this specification includes not only the exposure performed  using a mercury lamp, far-ultraviolet rays represented by an  excimer laser, X-rays, EUV light, and the like, but also draw› ing performed using particle beams such as an electron beam  and an ion beam, unless otherwise specified.  The actinic ray-sensitive or radiation-sensitive resin com- position according to the present invention is, for example, a  positive composition, and typically is a positive resist com› position. The constitution of this composition will be  described below.  [1] Compound (P)  The composition according to the present invention con› tains a compound (P) that contains at least one phenolic  The aryl group may contain a hetero atom; alternatively,  the aryl group may also contain a structure (for example, a  biphenyl group or a terphenyl group) in which a plurality of  The cycloalkyl group may be monocyclic or polycyclic.  The cycloalkyl group preferably has 3 to 10 carbon atoms.  Examples of the cycloalkyl group include a cyclopropyl  group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl  group, a cycloheptyl group, a cyclooctyl group, a 1-adaman› tyl group, a 2-adamantyl group, a 1-norbornyl group, and a  2-norbornyl group. Among these, a cyclopentyl group and a  cyclohexyl group are preferable.  In an embodiment, the alkyl group preferably has 20 or less  carbon atoms, and more preferably has 8 or less carbon atoms.  Examples of the alkyl group include a methyl group, an ethyl  group, a propyl group, an isopropyl group, an n-butyl group,  a sec-butyl group, at-butyl group, a hexyl group, a 2-ethyl› hexyl group, an octyl group, and a dodecyl group. Among  these, a methyl group, an ethyl group, a propyl group, an  isopropyl group, and at-butyl group are particularly prefer› able.  As described above, each of R 11  and R$^{12 }$independently  represents a hydrogen atom, an alkyl group, a cycloalkyl  group, an aryl group, or an aralkyl group.  The General Formula (1) will be described in more detail.  DESCRIPTION OF THE PREFERRED  EMBODIMENTS  (1)  H  RI!  In the formula,  R $^{41 }$represents a hydrogen atom or a methyl group;  Ar$^{41 }$represents an arylene group;  L $^{41 }$represents a single bond or a divalent linking group;  and  In General Formula (1),  each of R $^{11 }$and R $^{12 }$independently represents a hydrogen  atom, an alkyl group, a cycloalkyl group, an aryl group, or an  aralkyl group;  n $_{1 }$represents  O  or 1;  X$^{11 }$represents an oxygen atom or a sulfur atom whenn$_{1 }$is  0, and represents a nitrogen atom when n$_{1 }$ is 1;  M 11  m represents a single bond, an alkylene group, a  cycloalkylene group, -S-, ---0-, -CO-, -CS-,  -SO$_{2}$-,  -N(R$_{0}$)-, or a combination of two or more kinds  of the same, herein, R$_{0 }$represents a hydrogen atom or an alkyl  group;  each of M$^{12 }$and M$^{13 }$independently represents a single  bond or a divalent linking group;  Q 11  represents an alkyl group, an aralkyl group, a  cycloalkyl group, or an aryl group when M$^{11 }$is a group other  than a single bond, and represents an alkyl group, an aralkyl  group, or a cycloalkyl group when M$^{11 }$is a single bond;  Q$^{12 }$represents an organic group;  Q$^{13 }$represents an organic group or a hydrogen atom; and  at least two ofR 11 , R 12 , Q 12 , and Q $^{13 }$may form a ring by  binding to each other. 