(IO)  Patent No.:  US 8,900,791 B2  Dec. 2, 2014  (45)  Date of Patent:  c12)  United States Patent  Tsuchimura et al.  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION AND METHOD OF FORMING  PATTERN WITH THE COMPOSITION  (75)  Inventors:  Tomotaka Tsuchimura,  Haibara-gun  (JP);  Koji Shirakawa,  Haibara-gun (JP);  Toru Tsuchihashi,  Haibara-gun (JP);  Hideaki Tsubaki,  Haibara-gun (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( * )  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by 489 days.  (21)  Appl. No.:  13/071,153  (22)  Filed:  Mar. 24, 2011  ( 63)  Continuation of application No. PCT /JP2009/067292,  filed on Sep. 28, 2009.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC .............  C07C 309/42  (2013.01);  C07C 309125  (2013.01);  C07C 309/29  (2013.01);  C07C  309/35  (2013.01);  C07C 309/38  (2013.01);  C07C 309/39  (2013.01);  C07C 309/44  (2013.01);  C07C 309/59  (2013.01);  C07C  323166  (2013.01);  C07C 381112  (2013.01);  C07C 2101/02  (2013.01);  C07C 2101/04  (2013.01);  C07C 2101/08  (2013.01);  C07C  2101/14  (2013.01);  C07C 2101/18  (2013.01);  C07C 2102/28  (2013.01);  C07C 2102/42  (2013.01);  C07C 2102/44  (2013.01);  C07C  2103/24  (2013.01);  C07C 2103/28  (2013.01);  C07C 2103/74  (2013.01);  C07D 209182  (2013.01);  C07D 339/08  (2013.01);  G03F  710045  (2013.01);  G03F 710382  (2013.01);  G03F 710392  (2013.01);  G03F 710397  (2013.01);  YJ0S 430/122  (2013.01)  USPC .........  430/270.1;  430/325; 430/326; 430/921  (58)  Field of Classification Search  USPC .............. 430/270.1, 325,326,913,914,921;  549/16, 17, 26, 43; 544/145; 546/197;  548/526; 568/21, 23, 22, 25  See application file for complete search history.  21 Claims, No Drawings  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  Sep.26,2008  Feb.23,2009  (JP) ................................. 2008-249192  (JP) ................................. 2009-039905  G03F 71004  G03F 71028  C07C 309125  C07C 309/28  C07C 309/42  C07C 309/29  C07C 309/35  C07C 309/38  C07C 309/39  C07C 309/44  C07C 309/59  C07C 323166  C07C 381112  C07D209/82  C07D339/08  G03F 71038  G03F 71039  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  9/1994 Shen et al.  5,347,063 A  5,679,496 A  *  6,200,729 Bl  6,265,135 Bl  6,548,221 B2  10/1997 Ohsawa et al. ............ 430/270.1  3/2001 Aoai et al.  7/2001 Kodama et al.  4/2003 Uetani et al.  EP  EP  0 869 393 Al  10/1998  1 480 078 Al  11/2004  US 2011/0171577 Al  Jul. 14, 2011  US008900791B2  (Continued)  (Continued)  Yamaguchi et al., JP20090535 l 8A (English Translation), 2011.  *  (Continued)  Primary Examiner  - Anca Eoff  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  wherein:  (I)  An actinic ray-sensitive or radiation-sensitive resin composi› tion includes any of the compounds of general formula  (I)  below;  Ar represents an aromatic ring that may have a substituent  other than the -(A-B) groups;  n is an integer of 1 or greater;  A represents any one, or a combination of two or more  members selected from a single bond, an alkylene  group,  ---0-, -S-, ----C(=O)-, -S(=O)-,  -S(=O)$_{2}$- and  ---OS(=O)$_{2}$-, provided  that  ----C(=O)O- is excluded;  B represents a group containing a hydrocarbon group hav› ing 4 or more carbon atoms wherein either a tertiary or a  quaternary carbon atom is contained,  whenn is 2 or greater, the two or more -(A-B) groups may  be identical to or different from each other; and  M+ represents an organic onium ion. 