May 12, 2005  10  US 2005/0100814 Al  tional group and within the scope of the invention are  presented below:  [0095]  As  is well known to those skilled in the polymer  art, an ethylenically unsaturated compound undergoes free  radical polymerization to afford a polymer having a repeat  unit that is derived from the ethylenically unsaturated com› pound. Specifically, ethylenically unsaturated compound  having structure:  [0096]  are described above with regard to copolymer (al).  [0097]  The fluoropolymer having at least one fluoroalco› hol group (c) is selected from the group consisting of:  [0099]  wherein Rf and Rf’ are as described above;  -ZCH$_{2}$C(R,:)(R,,’)OH  -C(Rf)(Ri)OH  ---C(R,:)(R,,’)OR 44  -C(R,,)(R,,’)OH  [0101]  wherein Rf and Rf’ are as described above;  [0111]  (  c6) a polymer comprising:  [0110]  wherein Rf and R/ are as describe above; R$^{44 }$is a  hydrogen atom or an acid- or base-labile protecting group;  v is the number of repeat units in the polymer; w is 0-4; at  least one of the repeat units has a structure whereby at least  one of  R 40 ,  R 41 ,  R 42 ,  and  R 43  contains the structure  C(Rf)(R/)OR 44 , for example,  R 40 ,  R $^{41 }$and  R $^{42 }$are a hydro› gen atom and R$^{43 }$is CH$_{2}$ OCH$_{2}$C(CF$_{3}$ ) $_{2}$OCH$_{2}$ CO$_{2}$C(CH$_{3}$ ) 3  wherein CH$_{2}$CO$_{2}$ C(CH$_{3}$ ) $_{3 }$is an acid or base labile protecting  group or R 43  is OCH$_{2}$ C(CF$_{3}$ ) $_{2}$OCH$_{2}$ CO$_{2}$C(CH$_{3}$ ) 3  wherein  OCH CO$_{2}$ C(CH$_{3}$ ) $_{3 }$is an acid or base labile protecting group;  and  2  [0109]  wherein each of  R 40 ,  R 41 ,  R 42 ,  and  R $^{43 }$indepen› dently is hydrogen atom, a halogen atom, a hydrocarbon  group containing from 1 to 10 carbon atoms, a hydrocarbon  group substituted with at least one 0,  S, N, P  or halogen and  having 1 to 12 carbons atoms, for example, an alkoxy group,  a carboxylic acid group, a carboxylic ester group or a  functional group containing the structure:  [0107]  wherein Rf and R/ are as described above; and Z is  an element selected from Group VA, and other Group VIA  of the Periodic Table of the Elements (CAS Version).  Typically X is a sulfur, oxygen, nitrogen or phosphorus  atom;  ---C(R,:)(Ri)OH  [0105]  wherein Rf and  R/  are as described above.  [0103]  (i) a repeat unit derived from at least one  ethylenically unsaturated compound containing at  least three fluorine atoms covalently attached to  two ethylenically unsaturated carbon atoms; and  [0104]  (ii) a repeat unit derived from an ethyl- enically unsaturated compound comprised of a  fluoroalcohol functional group having the struc› ture:  [0106]  (c4) a fluorine-containing copolymer com› prising a repeat unit derived from at least one eth› ylenically unsaturated compound containing a fluo› roalcohol functional group having the structure:  [0108]  (  cS) a fluorine-containing polymer compris› ing the structure:  [0098]  (cl) a fluorine-containing polymer compris› ing a repeat unit derived from at least one ethyleni› cally unsaturated compound containing a fluoroal› cohol functional group having the structure:  [0100]  (c2) a fluorine-containing copolymer com› prising a repeat unit derived from at least one eth› ylenically unsaturated compound characterized in  that at least one ethylenically unsaturated compound  is cyclic or polycyclic, at least one ethylenically  unsaturated compound contains at least one fluorine  atom covalently attached to an ethylenically unsat› urated carbon atom, and at least one ethylenically  unsaturated compound is comprised of a fluoroalco› hol functional group having the structure:  [0102]  (c3) a fluorine-containing copolymer com› prising:  [0112]  (i) a repeat unit derived from at least one  ethylenically unsaturated compound containing a  \  c=c  I  \  S  T  CD-cn,qa,,i,on  CD-cn,ocn,qa,,non  oo-cn£C(ce,i,on  00-cnpcn,qa,,i,on  CH2=CHOCH2CH20CH2C(CF3)20H  CH2=CHO(CH2)40CH2C(CF3)20H 