US 9,034,557 B2  56  55  25.  A process for patterning relief structures on a substrate,  comprising:  (b) coating on the substrate a photosensitive composition  of claim  24;  ( c) baking the photosensitive composition to provide a  photosensitive film on the substrate;  ( e) developing the photosensitive film making a portion of  the underlying substrate visible; and  one or more resin binders that include one or more acid  sensitive protecting groups and that are substantially  free of phenolic groups protected by acetal or ketal  groups and wherein the binder becomes alkali-soluble  by the action of an acid to remove the acid sensitive  protecting groups;  one or more photo acid generators, that, upon exposure to  a source of high energy, decompose and generate a pho› toacid strong enough to remove the one or more acid  sensitive groups;  one or more ionic non-photosensitive additives of an imi› nium salt; and  one or more solvents, wherein the iminium salt is selected  from the group consisting of a salt of structure I$_{0 }$ 25  (B+ A$_{0 }$ -),  wherein B+is  26.  A photoresist composition, comprising:  form a 5-7 member ring, R 3  and R 4  may form a 5-7  member ring if connected together, A- is selected from  the group consisting of an organic sulfonic acid anion  (R$^{11}$SO$_{3 }$ -), a sulfamic acid anion [R $^{12}$N(R$^{53}$)SO$_{3 }$ -], a  carboxylic acid anion (R $^{14}$CO$_{2 }$ -), an alkyl sulfate anion  (R$^{15}$SO$_{4}$ -), a bis sulfonyl imide anion [(R$^{16}$SO$_{2}$ ) $_{2}$N-],  and a tris sulfonyl methide anion [(R$^{16}$SO$_{2}$ ) $_{3}$C-]; where  R 11 ,  R 12 , R 13 , R 14  and R 15  are each independently  selected from the group consisting of a C$_{1 }$-C$_{24 }$carbon  chain, a partially or fully halogen substituted carbon  chain, unsubstituted or substituted  CcC$_{20 }$ aromatic car› bon group, and combinations thereof, optionally con› taining S or N or any organic functional group that may  interrupt the skeletal chain;  _,,-Y......._  _,,R 3  R 1  X  2  I  4  R’-. _,,,w~  _..R  z  W  0  I  A  Rs  R $^{16 }$is independently selected from the group consisting of  highly fluorinated orperfluorinated alkyl and fluorinated  aryl groups and may be cyclic, when a combination of  any two R $^{16 }$groups are linked to form a bridge, further,  the R $^{16 }$alkyl chains contain from 1-20 carbon atoms and  may be straight, branched, or cyclic, such that divalent  oxygen, trivalent nitrogen or hexavalent sulf~ may  interrupt the skeletal chain, and further when R  con› tains a cyclic structure, such structure has 5 or 6 ring  members, optionally, 1 or 2 of which are N, S or  0  atoms,  and a salt of the structure:  wherein  Ra  and  Rb,  are substituted or unsubstituted alkyl  groups that optionally include one or more carbonyl  groups, one or more S atoms, one or more O atoms, or  one or more NRe groups within the chain; wherein Re  and  Rd  are independently selected from the group con› sisting of hydrogen and an alkyl group, and, if an alkyl  group, can optionally include one or more S atoms, o~e  or more O atoms, or one or more NRe groups; wherem  Ra  and  Rb,  or  Ra  and Re, or Re and  Rd,  or  Rb  and  Rd  optionally form a 5-7 membered ring, and wherein Re is  selected from the group consisting of hydrogen and an  alkyl group; andA$_{0}$ - is selected from the group consist› ing of a sulfamic acid anion, an alkyl sulfate anion, a bis  sulfonylimide anion, and a tris sulfonyl methide anion,  a salt of the structure:  wherein W is a carbon atom, X is selected from the group  consisting of a R $^{26}$C group and a nitrogen atom, Y is selected  from the group consisting of a (R 27 ) $_{2}$C, a carbonyl group, an  S atom and an O atom, Z is selected from the group consisting  of a (R 28 J  C grou;,, a R$^{29}$N group, an S atom and an O atom,  R $^{61 }$to R  1"  and R  $^{9 }$are each independently selected from the  group consisting of a hydrogen atom, a phenyl group, and a  C$_{1 }$-C$_{3 }$ carbon chain optionally substituted with a phenyl  group or a 5 to 7 member ring, R $^{21 }$and R $^{22 }$may be connected  together to form a 5-7 member ring, R$^{23 }$and R$^{24 }$may form a  5-7 member ring if connected together, p and s are each  independently  O  or 1, and q and tare each independently 1,  R $^{28 }$is selected from the group consisting of a hydrogen atom  and a C$_{1 }$-C$_{3 }$carbon chain optionally substituted with a phenyl  group or a 5 to 7 member ring; and A- is selected from the  group consisting of an organic sulfonic acid anion (R $^{11 }$SO$_{3 }$-),  a sulfamic acid anion [R $^{12}$N(R $^{13}$)SO$_{3 }$ -i,  a carboxylic acid  anion (R $^{14}$CO$_{2 }$ -), an alkyl sulfate anion (R  $^{15}$SO$_{4 }$ -), a bis  sulfonyl imide anion [(R$^{16}$SO$_{2}$ ) $_{2}$N-], and a tris sulfonyl  methide anion [(R$^{16}$SO$_{2}$ ) $_{3}$C-].  27.  A process for patterning relief structures on a substrate,  comprising:  wherein Wis a carbon atom, Xis a selected from the group  consisting of a R  $^{6}$C group, a nitrogen atom, and oxygen  atom and a sulfur atom, Y is selected from the group  consisting of a (R  7 ) $_{2}$C, a carbonyl group, an S atom and  an O atom Z is selected from the group consisting of a  ’  1  9  (R  8 ) $_{2}$C group, a R$^{9}$N, an S atom and an O atom, R to R  are each independently selected from the group consist› ing of a hydrogen atom, C$_{1 }$-C$_{3 }$ carbon chain and a 5 to 7  member ring, R$^{1 }$and R 2  may be connected together to  (b) coating on the substrate a photosensitive composition  of claim  26;  ( c) baking the photosensitive composition to provide a  photosensitive film on the substrate;  ( e) developing the photosensitive film making a portion of  the underlying substrate visible; and  *  *  *  *  *  (a) providing a substrate;  ( d) exposing the photosensitive film to imaging radiation;  (f)  rinsing the substrate.  (a) providing a substrate;  ( d) exposing the photosensitive film to imaging radiation;  (f)  rinsing the substrate. 