ring in formula (Zl ), when -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at  the para-position relative to sulfonium cs+), Ll is not an  oxygen atom (---0-).  138  US 9,069,246 B2  137  2.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  wherein the compound  represented by formula (Zl) is a compound represented by  the following formula (Z2):  The reason why in Examples 1 G and 2G, the sensitivity and  LER were excellent and the variation of sensitivity after aging  was small is considered to be the same as the reason described  above in Example E.  According to the present invention, an actinic ray-sensitive  or radiation-sensitive resin composition excellent in sensitiv- ity, resolution, roughness performance and aging stability and  less likely to cause outgassing, a pattern forming method and  a resist film using the composition, and an electronic device  manufacturing method and an electronic device using the  composition, method or film, can be provided.  8.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  whereinA$_{1 }$ in formula (Zl) is -SO$_{3}$-.  7.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  wherein with respect to the benzene ring in formula (Zl) to  which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at  the meta- or ortho-position relative to s+.  wherein with respect to the benzene ring in formula (Zl) to  which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at  the para-position relative to s+ and L$_{1 }$ is -S-, -OS  (=0) 2 -, -S(=O) 2 O-, -OC(=O)- or -C(=O)  0-.  wherein with respect to the benzene ring in formula (Z2) to  which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at  the meta- or ortho-position relative to s+.  wherein with respect to the benzene ring in formula (Z2) to  which -L$_{1 }$-R$_{1 }$-A$_{1 }$ is bonded, -L$_{1 }$-R$_{1 }$-A$_{1 }$ is substituted at  the para-position relative to s+ and L$_{1 }$ is -S-, -OS  (=0) 2 -, -S(=O) 2 O-, -OC(=O)- or -C(=O)  0-.  provided that with respect to the benzene ring in formula  (Z2) to which -L$_{1}$-R$_{1}$-A$_{1 }$ is bonded, when -L$_{1 }$-R$_{1 }$-A$_{1 }$ is  substituted at the para-position relative to s+, L$_{1 }$ is not  ---0-.  the plurality ofR$_{4 }$ when n$_{1 }$ is  2  or more, the plurality of Rs  when n 2  is 2 or more, or the plurality of R$_{6 }$when n$_{3 }$ is 2  or more, may be the same or different and may combine  with each other to form a ring, R$_{4 }$ and Rs, Rs and R$_{6}$ ,  or  R$_{4 }$ and R$_{6 }$ may combine with each other to form a ring,  and in this case, each of R$_{4}$ ,  Rs and R$_{6 }$ may be a single  bond;  each of Rs and R$_{6 }$ independently represents a monovalent  substituent, and each of n 2  and n$_{3 }$ independently repre› sents an integer of 0 to 5; and  L$_{1}$ ,  R$_{1}$,A$_{1}$ ,  R$_{4}$ andn$_{1 }$have the same meanings as L$_{1}$ ,  R$_{1}$,A$_{1}$ ,  R$_{4 }$ and n$_{1 }$ in formula (Zl );  each ofR 2  and R$_{3 }$independently represents an alkyl group,  an alkenyl group, a cycloalkyl group, an aryl group or a  heterocyclic group;  R$_{4 }$ represents a monovalent substituent, n$_{1 }$ represents an  integer of0 to 4, and when n$_{1 }$is  2  or more, each R$_{4 }$ may  be the same as or different from every other R$_{4}$ ;  and  R 2  and R$_{3}$ ,  R 2  and R$_{4}$ ,  R$_{3 }$ and R$_{4}$ ,  R 2  and the benzene ring  in formula (Zl), R$_{3 }$ and the benzene ring, or R$_{4 }$ and R$_{4 }$ when n$_{1 }$ is  2  or more, may combine with each other to  form a ring, provided that with respect to the benzene  5.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  2,  6.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  wherein A$_{1 }$ in formula (Z2) is -SO$_{3 }$ - .  4.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  2,  3.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  2,  in formula (Zl),  1.  An actinic ray-sensitive or radiation-sensitive resin com› position containing a compound capable of generating an  acid upon irradiation with an actinic ray or radiation, repre› sented by the following formula (Zl):  The invention claimed is:  This application is based on Japanese Patent Application  (PatentApplicationNo. 2012-032099) filed on Feb. 16, 2012,  the contents of which are incorporated herein by way of  reference.  While the invention has been described in detail and with  reference to specific embodiments thereof, it will be apparent  to one skilled in the art that various changes and modifications  can be made therein without departing from the spirit and  scope of the invention.  in formula (Z2),  INDUSTRIAL APPLICABILITY  (Z2)  (Zl) 