US 20100266955Al  c19)  United States  c12)  Patent Application Publication  UTSUMI et al.  c10)  Pub. No.: US 2010/0266955 Al  (43)  Pub. Date:  Oct. 21, 2010  (54)  POSITIVE RESIST COMPOSITION AND  METHOD OF FORMING RESIST PATTERN  (75)  Inventors:  Yoshiyuki UTSUMI,  Kawasaki-shi  (JP);  Makiko IRIE,  Kawasaki-shi  (JP)  (73)  Assignee:  TOKYO OHKA KOGYO CO.,  LTD.,  Kawasaki-shi (JP)  (21)  Appl. No.:  12/758,650  (22)  Filed:  Apr. 12, 2010  (51)  Int. Cl.  G03F  71004  G03F  7120  (2006.01)  (2006.01)  (52)  U.S. Cl.  ......................................  430/285.1;  430/326  Apr. 15, 2009  (JP) ................................. 2009-099218  Correspondence Address:  KNOBBE MARTENS OLSON & BEAR LLP  2040 MAIN STREET, FOURTEENTH FLOOR  IRVINE, CA 92614 (US)  A positive resist composition including a base component (A)  which exhibits increased solubility in an alkali developing  solution under action of acid and an acid-generator compo› nent (B) which generates acid upon exposure, the component  (A) including a polymeric compound (Al) having a structural  unit (a0) represented by general formula (a0-1) (wherein R  represents a hydrogen atom, an alkyl group of 1 to 5 carbon  atoms or a halogenated alkyl group of 1 to 5 carbon atoms;  R  1  represents  an  acid dissociable, dissolution inhibiting group;  and  R  $^{2 }$represents a divalent hydrocarbon group), and the acid  generator (B) including an acid generator (Bl) having  an  anion moiety represented by general formula  (I)  (wherein X  represents a hydrocarbon group of3 to 30 carbon atoms; Q 1  represents a divalent linking group containing an oxygen  atom; and Y$^{1 }$represents an alkylene group of 1 to 4 carbon  atoms or a fluorinatedalkylene group ofl to 4 carbon atoms).  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Publication Classification  (a0-1)  (I) 