Oct. 21, 2010  46  US 2010/0266955 Al  [Chemical Formula 51]  (b0-1)  (b0-2)  (bl-1)  represents an integer of 0 to 3; f represents an integer of 1 to  20; and R 7 ’  represents a substituent,  [0367]  As the substituent for R 7 ’,  the same groups as those  which the aforementioned aliphatic hydrocarbon group or  aromatic hydrocarbon group for  Rx  may have as a substituent  can be used.  [  03 68]  If  there are two or more of the R  7 ’  group, as indicated  bythevaluerl, then the two or more of the R 7 ’  groups maybe  the same or different from each other.  [0369]  tis preferably 1 or 2.  [0370]  v0 is preferably Oto 2, more preferably 0 or 1, and  still more preferably 0.  [0371]  It is preferable that each of q 1 and q2 independently  represent 1 to 5, and more preferably 1 to 3.  [0372]  rl is preferably an integer of Oto 2, and more pref› erably 0 or 1.  [0373]  f is preferably 1 to 15, and more preferably 1 to 10.  [Chemical Formula 50]  (bl-3-1)  In the formula, A+ is the same as defined above; t represents an  integer of 1 to 3; q3 represents an integer of 1 to 12; r2  represents an integer of0 to 3; and R 7 ’  represents a substitu› ent.  [0374]  The substituent for R 7 ’  is the same as defined above.  [0375]  If  there are two or more of the R 7 ’  group, as indicated  bythevaluer2, then the two or more of the R 7 ’  groups maybe  the same or different from each other.  [0376]  tis preferably 1 or 2.  [0377]  q3 is preferably 1 to 5, and more preferably 1 to 3.  [0378]  r2 is preferably an integer of Oto 2, and more pref› erably 0 or 1.  [0379]  As the component (Bl), one type of acid generator  may be used alone, or two or more types may be used in  combination.  [0380]  In the resist composition of the present invention,  the amount of the component (Bl) within the component (B)  is preferably 50% by weight or more, more preferably 60% by  weight or more, still more preferably 7 5% by weight or more,  and most preferably 100% by weight. When the amount of the  component (B 1) is at least as large as the lower limit of the  above-mentioned range, the effects of the present invention  can be improved.  [0381]  The component (Bl) can be produced by a conven› tional method.  [0382]  As the component (Bl), for example, a compound  represented by the aforementioned general formula (bl-1)  and a compound represented by the aforementioned general  formula (bl-2) can be produced as follows.  [0383]  [Production Method of Compound Represented by  General Formula (bl-1)]  [0384]  A compound represented by general formula (bl-1)  above can be produced by a method including reacting a  compound (b0-1) represented by general formula (b0-1)  shown below with a compound (b0-2) represented by general  formula (b0-2) shown below.  [Chemical Formula 52]  (b0-1-11)  (b0-1-12)  (b0-1-13)  [0385]  In general formulas (b0-1) and (b0-2), X, Q 2 , m0, Y 1  and A+ are respectively the same as defined for X, Q 2 , m0, Y 1  and gin general formula (bl-1).  [0386]  M+ represents an alkali metal ion. Examples of  alkali metal ions include a sodium ion, a lithium ion and a  potassium ion, and a sodium ion or a lithium ion is preferable.  [0387]  z- represents a non-nucleophilic  [0388]  Examples of non-nucleophilic ions include a halo› gen ion such as a bromine ion or a chlorine ion; an ion capable  of forming an acid exhibiting a lower acidity than the com› pound (b0-1); BF  4 -, AsF  6  -, SbF  6  -, PF  6 - and ClO$_{4}$ -.  [0389]  Examples of ions for which are capable of forming  an acid exhibiting a lower acidity than the compound (b0-1)  include sulfonic acid ions such as a p-toluenesulfonate ion, a  methanesulfonate ion and a benzenesulfonate ion.  [0390]  As the compound (b0-1) and the compound (b0-2),  commercially available compounds may be used, or the com› pounds may be synthesized by a conventional method.  [0391]  The method of producing the compound (b0-1) is  not particularly limited. For example, a compound repre› sented by general formula (b0-1-11) shown below can be  dissolved in a solvent such a tetrahydrofuran or water, and the  resulting solution can be subjected to a reaction in an aqueous  solution of an alkali metal hydroxide such as sodium hydrox› ide or lithium, hydroxide, thereby obtaining a compound  represented by general formula (b0-1-12) shown below.  Then, the compound represented by general formula (b0-1- 12) can be subjected to a dehydration/condensation reaction  with an alcohol represented by general formula (b0-1-13)  shown below in an organic solvent such as benzene or dichlo› roethane in the presence of an acidic catalyst, thereby obtain› ing a compound represented by general formula (b0-1) above  in which m0 is 1 (i.e., a compound represented by general  formula (b0-1-1) shown below). 