US 10,088,749  B2  20  19  xi is independently at each occurrence Ci-i$_{2 }$ alkyl, or  C$_{2}$_i 2  alkoxy carbonyl; and  z- is an anion comprising a sulfonate group, a sulfona› midate group, a sulfonimidate group, a methide group,  or a borate group.  6.  The photoacid-generating compound of claim  1,  having  the structure  11.  A photoresist composition comprising the polymer of  claim  8.  *  *  *  *  *  ( c) developing the exposed photoresist layer to provide a  photoresist relief image.  (b) pattern-wise exposing the photoresist layer to activat› ing radiation to form an exposed photoresist layer; and  (a) applying a layer of the photoresist composition of  claim  9  on a substrate to form a photoresist layer;  10.  A method of forming a photoresist relief image,  comprising:  9.  A photoresist composition comprising the photoacid› generating compound of any one of claims  1 to 6.  8.  A polymer comprising repeat units derived from the  photoacid-generating compound of claim  7.  7.  The photoacid-generating compound of claim  1,  wherein one of R i or R  2  or  z-,  or one occurrence of X, or  one occurrence ofY, is a polymerizable group, provided that  if one occurrence ofX is the polymerizable group, then n is  1, 2, or 3, and provided that if one occurrence of Y is the  polymerizable group, then mis 1, 2, or 3.  wherein  q is 0, 1, 2, or 3;  xi is independently at each occurrence an unsubstituted  or substituted  Ci-is alkyl; and  z- is an anion comprising a sulfonate group, a sulfona› midate group, a sulfonimidate group, a methide group,  or a borate group.  +  s  X  (X)n  z- Rs, R 6 , and R $^{7 }$are each independently an unsubstituted or  substituted Ci-i$_{4 }$ hydrocarbyl, wherein two of Rs, R 6 ,  and R $^{7 }$can be connected to form a cyclic structure; and  wherein the total number of carbon atoms in Rs, R 6 ,  and R 7  does not exceed 16; 