Feb.4,2021  126  US 2021/0033969 Al  Acid  Polymer  generator  Quencher  Organic solvent PEB temp. Sensitivity CDU  (pbw)  (pbw)  (pbw)  (pbw)  (" c.)  (mJ/cm 2 )  (nm)  18  Polymer 2  Quencher 18  PGMEA (2,500) 80  22  2.8  (100)  (4.72)  DAA (500)  19  Plonero) 2  Quencher 19  PGMEA (2,500) 80  21  2.8  (100)  (3.24)  DAA (500)  20  Polymer 2  Quencher 20  PGMEA (2,500) 80  22  2.8  (100)  (3.93)  DAA (500)  21  Polymer 2  Quencher 21  PGMEA (2,500) 80  26  2.1  (100)  (7.30)  DAA (500)  22  Polymer 2  Quencher 22  PGMEA (2,500) 80  27  2.2  (100)  (7.78)  DAA (500)  23  Polymer 2  Quencher 21  PGMEA (2,500) 80  20  2.6  (100)  (7.30)  DAA (500)  24  Polymer 2  Quencher 22  PGMEA (2,500) 80  18  2.4  (100)  (7.78)  DAA (500)  25  Polymer 2  Quencher 23  PGMEA (2,500) 80  24  2.6  (100)  (7.29)  DAA (500)  26  Polymer 2  Quencher 24  PGMEA (2,500) 80  24  2.7  (100)  (8.85)  DAA (500)  27  Polymer 2  Quencher 25  PGMEA (2,500) 80  22  2.6  (100)  (9.54)  DAA (500)  28  Polymer 2  Quencher 26  PGMEA (2,500) 80  23  2.6  (100)  (8.60)  DAA (500)  29  Polymer2  Quencher 27  PGMEA (2,500) 80  24  2.5  (100)  (6.57)  DAA (500)  30  Polymer 2  Quencher 28  PGMEA (2,500) 80  25  2.4  (100)  (6.43)  DAA (500)  31  Polymer 2  Quencher 29  PGMEA (2,500) 80  26  2.3  (100)  (6.69)  DAA (500)  32  Polymer 2  Quencher 1  PGMEA (2,500) 90  27  2.8  (100)  (4.27)  DAA (500)  33  Polymer 3  Comparative Quencher 1 PGMEA (2,500) 90  27  2.8  (100)  (2.50)  DAA (500)  2-iodoisobutyric acid  (2.14)  34  Polymer 4 PAG4  Quencher 1  PGMEA (3,000) 120  28  3.2  (100)  (12)  (4.27)  Acid  Polymer  generator  Quencher  Organic solvent PEB temp. Sensitivity CDU  (pbw)  (pbw)  (pbw)  (pbw)  (" c.)  (mJ/cm 2 )  (nm)  Comparative  Polymer 2  Comparative Quencher 1 PGMEA (2,500) 80  28  3.7  Example  (100)  (2.50)  DAA (500)  2 Polymer 2  Comparative Quencher 2 PGMEA (2,500) 80  28  3.6  (100)  (4.42)  DAA (500)  3 Polymer 2  Comparative Quencher 3 PGMEA (2,500) 80  30  3.6  (100)  (3.63)  DAA (500)  2-iodoisobutyric acid  (2.14)  4 Polymer 2  Comparative Quencher 4 PGMEA (2,500) 80  28  3.6  (100)  (3.23)  DAA (500)  5 Polymer 3  Comparative Quencher 1 PGMEA (2,500) 90  30  3.5  (100)  (2.50)  DAA (500)  6 Polymer 4 PAG4  Comparative Quencher 1 PGMEA (3,000) 120  30  4.9  (100)  (12)  (2.50)  TABLE 3  TABLE 2-continued  thereto in light of the above teachings.  It  is therefore to be  understood that the invention may be practiced otherwise  than as specifically described without departing from the  scope of the appended claims.  1.  A chemically amplified resist composition comprising  a quencher and an acid generator, the quencher comprising  an ammonium salt of a carboxylic acid having an iodine or  bromine-substituted hydrocarbyl group which does not con› tain an iodine or bromine-substituted aromatic ring.  [0171]  It  is demonstrated in Tables 1 to 3 that resist  compositions comprising an ammonium salt of a carboxylic  acid having an iodized or brominated hydrocarbyl group  ( exclusive of an iodized or brominated aromatic ring) form  patterns having a high sensitivity, satisfactory resolution,  and reduced values of CDU.  [0172]  Japanese Patent Application No. 2019-142875 is  incorporated herein by reference.  [0173]  Although some preferred embodiments have been  described, many modifications and variations may be made 