US 20190204738Al  c19)  United States  c12)  Patent Application Publication  YAMANO et al.  c10)  Pub. No.: US 2019/0204738 Al  (43)  Pub. Date:  Jul. 4, 2019  (54)  RESIST COMPOSITION AND METHOD OF  FORMING RESIST PATTERN  (71)  Applicant:  TOKYO OHKA KOGYO CO., LTD.,  Kawasaki-shi  (JP)  (72)  Inventors:  Hitoshi YAMANO,  Kawasaki-shi (JP);  Takahiro KOJIMA,  Kawasaki-shi (JP);  Yoichi HORI,  Kawasaki-shi (JP);  Yasuhiro YOSHII,  Kawasaki-shi (JP);  Masahito YAHAGI,  Kawasaki-shi (JP)  (21)  Appl. No.:  16/222,758  (22)  Filed:  Dec. 17, 2018  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  710397  (2013.01);  C08F  12124  (2013.01);  C08F  220130  (2013.01);  C08F  220118  (2013.01);  C08F  212114  (2013.01)  A resist composition including a resin component whose  solubility in a developing solution is changed due to the  action of the acid, in which the resin component has a  constitutional unit derived from a compound represented by  Formula (a0-1) and a constitutional unit containing an acid  decomposable group whose polarity is increased due to the  action of the acid. In the formula,  W represents a polymer› izable group-containing group, Ya 0  represents a carbon  atom, Xa 0  represents a group that forms a monocyclic  aliphatic hydrocarbon group together with Ya 0 ,  some or all  hydrogen atoms in the monocyclic aliphatic hydrocarbon  group may be substituted with substituents, and Ra$^{00 }$rep› resents an aromatic hydrocarbon group which may have a  substituent.  Dec. 28, 2017  (JP) ................................. 2017-254665  G03F  71039  C08F  12124  C08F  212114  C08F  220118  C08F  220130  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  Publication Classification  (30)  Foreign Application Priority Data  (57)  ABSTRACT  (a0-1) 