US  2019/0041751  Al  15  Feb. 7,2019  from H, C$_{1}$ _ $_{4}$-alkyl, C$_{1}$ _ $_{4}$-haloalkyl, halogen, and CN; each of  R$^{17 }$and R$^{18 }$is independently chosen from OR$^{19 }$and N(R 20 )  2 ;  R 19  is chosen from H, C$_{1}$ _ $_{20}$-alkyl, C$_{5}$ _ $_{30}$-aryl, C$_{6}$ _ 20 - aralkyl and a monovalent organic residue having a lactone  moiety; and each R 20  is independently chosen from H,  C$_{1}$ _ $_{20}$-alkyl, and C$_{6}$ _ $_{20}$-aryl; wherein Zand R $^{14 }$may be taken  together to form a 5 to 7-membered unsaturated ring.  11.  The composition of claim  10  wherein at least one third  monomer has the formula (5)  15.  The compos1t10n of claim  1  wherein at least one  condensable silicon monomer has the formula (9)  16.  The composition of claim  15  wherein p=0 or  1.  17.  A composition comprising: (a) one or more solvents;  and (b) one or more condensed polymers having an organic  polymer chain having pendently-bound moieties having an  acidic proton and a pKa in water from -5 to 13 and having  pendently-bound siloxane moieties.  wherein ADG is an acid decomposable group; and R 21  is  chosen from H, C$_{1}$ _ $_{4}$-alkyl, C$_{1}$ _ $_{4}$-haloalkyl, halogen, and CN.  12.  The composition of claim  1  wherein the organic  polymer further comprises as polymerized units one or more  unsaturated monomers having a chromophore moiety.  13.  The composition of claim  12  wherein the chro› mophore moiety is pendent from the organic polymer back› bone.  * * * * *  20.  A method comprising (a) coating a substrate with the  composition of claim  17  to form a coating layer; (b) curing  the coating layer to form a polymeric underlayer; ( c) dis› posing a layer of a photoresist on the polymeric underlay er;  (d) pattern-wise exposing the photoresist layer to form a  latent image; ( e) developing the latent image to form a  patterned photoresist layer having a relief image therein; (f)  transferring the relief image to the substrate; and (g) remov› ing the polymeric underlayer by wet stripping.  14.  The composition of claim  13  wherein the chro› mophore moiety is selected from the group consisting of  from fury!, pyryl, thiophenyl, pyridyl, phenyl, naphthyl,  acenaphthyl, fluorenyl, carbazolyl, anthracenyl, phenan› thryl, pyrenyl, coronenyl, tetracenyl, pentacenyl, tetraphe› nyl, benzotetracenyl, triphenylenyl, perylenyl, benzyl, phen› ethyl, tolyl, xylyl, styrenyl, vinylnaphthyl, vinylanthracenyl,  dibenzothiophenyl, thioxanthonyl, indolyl, and acridinyl.  19.  The method of claim  18  wherein the polymeric  underlay er is removed by wet stripping at room temperature.  18.  A method comprising (a) coating a substrate with the  composition of claim  1  to form a coating layer; (b) curing  the coating layer to form a polymeric underlayer; ( c) dis› posing a layer of a photoresist on the polymeric underlay er;  (d) pattern-wise exposing the photoresist layer to form a  latent image; ( e) developing the latent image to form a  patterned photoresist layer having a relief image therein; (f)  transferring the relief image to the substrate; and (g) remov› ing the polymeric underlayer by wet stripping.  ADG  (5)  Si(R$^{50}$)p(X)$_{4}$_P  (9)  wherein each R 50  is independently chosen from a C$_{1}$ _ 30  hydrocarbyl moiety and a substituted C$_{1}$_ 30  hydrocarbyl  moiety; and each X is independently chosen from halogen,  cl-10 alkoxy, -OH, -O----C(O)-R 50 , -(O-Si(R 51 )2)  P$_{2}$-X 1 , and -(Si(R 51 ) $_{2}$)P$_{3}$ -X 1 ; X 1  is independently cho› sen from halogen, C$_{1}$ _ $_{10 }$alkoxy, -OH, -O----C(O)-R 50 ;  each R 51  is independently chosen from R$^{50 }$and X; p is an  integer from Oto 3; p2 is an integer from 1 to 10; and p3 is  an integer from 1 to 10. 