US009069246B2  c12)  United States Patent  Takizawa et al.  (IO)  Patent No.:  US 9,069,246 B2  (45)  Date of Patent:  Jun.30,2015  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, PATTERN FORMING  METHOD AND RESIST FILM USING THE  COMPOSITION, AND ELECTRONIC DEVICE  MANUFACTURING METHOD AND  ELECTRONIC DEVICE USING THESE  (71)  Applicant:  FUJIFILM CORPORATION,  Tokyo  (JP)  (72)  Inventors:  Hiroo Takizawa,  Shizuoka (JP);  Tomotaka Tsuchimura,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  14/458,660  (22)  Filed:  Aug. 13, 2014  (65)  Prior Publication Data  US 2014/0349221 Al  Nov. 27, 2014  Related U.S. Application Data  ( 63)  Continuation of application No. PCT /JP2013/05067 5,  filed on Jan. 16, 2013.  (30)  Foreign Application Priority Data  Feb. 16,2012  (JP) ................................. 2012-032099  (51)  Int. Cl.  G03F  71004  G03F  71027  G03F  71038  G03F  71039  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (52)  U.S. Cl.  CPC ................  G03F  71027  (2013.01);  G03F  71004  (2013.01);  G03F  71038  (2013.01);  G03F  71039  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  710382  (2013.01);  G03F  710397  (2013.01)  ( 58)  Field of Classification Search  CPC ....... G03F 7/004; G03F 7/038; G03F 7/0382;  G03F 7/039; G03F 7/0392  USPC ....................................... 430/270.1, 325, 326  See application file for complete search history.  and a resist film formed using the actinic ray-sensitive or  radiation-sensitive resin composition, a pattern forming  method comprising a step of forming a film by using the  actinic ray-sensitive or radiation-sensitive resin composition,  a step of exposing the film, and a step of developing the  exposed film, a method for manufacturing an electronic  device, comprising the pattern forming method, and an elec› tronic device manufactured by the method for manufacturing  an electronic device.  14 Claims, No Drawings  (Zl)  (57)  ABSTRACT  An actinic ray-sensitive or radiation-sensitive resin composi› tion containing a compound capable of generating an acid  upon irradiation with an actinic ray or radiation, represented  by the formula (Zl), and the formula (Zl) is defined as herein,  International Search Report dated Feb. 19, 2013 issued in Interna› tional Application No. PCT/JP2013/050675 (PCT/ISA/210).  Written Opinion dated Feb. 19, 2013 issued in International Appli› cation No. PCT/JP2013/050675 (PCT/ISA/237).  Conununication from the Japanese Patent Office dated Sep. 9, 2014,  in a counterpart Japanese application No. 2012-032099.  * cited by examiner  Primary Examiner  - John A McPherson  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  (56)  References Cited  U.S. PATENT DOCUMENTS  2005/0053861 Al*  2007/0141512 Al  2011/0008735 Al  2011/0318542 Al  3/2005 Yoneda et al. ............. 430/270.1  6/2007 Wada et al.  1/2011 Ohsawa et al.  12/2011 Mori et al.  FOREIGN PATENT DOCUMENTS  JP  JP  JP  2007-199692 A  2010-150367 A  2011-16746 A  8/2007  7/2010  1/2011  OTHER PUBLICATIONS 