US 10,054,853 B2  172  171  TABLE 4  TABLE 4-continued  Examples 3-1 to 3-8 & Comparative Examples 1-1  to 1-7  3) Preparation of Resist Composition  Resist compositions in solution form were prepared by  dissolving a base resin (Polymers P-1 to P-15), optionally a  sulfonium salt other than the sulfonium salts of Examples  1-1 to 1-7 (PAG-A to PAG-C), quencher (Q-1), and alkali- soluble surfactant (SF-1) in an organic solvent containing  0.01 wt % of surfactant A, and filtering through a Teflonfi  filter with a pore size of 0.2 µm. Tables 5 and 6 show the  formulation of the resulting resist compositions.  The solvent, quencher (Q-1 ), sulfonium salt other than the  above-synthesized sulfonium salts (PAG-A to PAG-C),  alkali-soluble surfactant (SF-1) and surfactant A used herein  are identified below.  H  0  0  ;~cc,  SO3- Q  usu  C-1  H  0  0  <  0  o)<;  -O3S  Q  usu  C-2  H  0  0  ;>(;  SO3- Q  usu  C-3  C-4 50  c+-I---J  J  Fo  0  \  ✓ ,:::-0  F  s~o  F  F  F  F  SO3- C-5  Q  H  0  0  b  usu  F  \  -7’0  ;ff~o  F  F  F  S-N- 0 ,:::;-11  \  O  ✓ ,:::S-CF3  0 9’11  0  C-6  Q  H  0  0  0 3  usu  s  o,:::;- \ $_{N-}$ O~/  -7’S  0  \  CF 3 