US 2019/0196326 Al  37  Jun.27,2019  Basic Compound  Compound Having Structure Represented by  Formula (A) to (E))  [0301]  In Formulae (A) and (E),  [0302]  R 200 , R 201 , and R $^{202 }$may be identical to or different  from each other, and represent hydrogen atoms, alkyl groups  (preferably having 1 to 20 carbon atoms), cycloalkyl groups  (preferably, having 3 to 20 carbon atoms), or aryl groups  (having 6 to 20 carbon atoms). Here, R$^{201 }$and R$^{202 }$may be  bonded to each other, so as to form a ring.  (E)  (D)  (C)  (B)  (A)  [0300]  Examples of the basic compound include com› pounds having structures represented by Formulae (A) to  (E).  [0293]  A dispersion degree (molecular weight distribu› tion) which is a ratio (Mw/Mn) of a weight-average molecu› lar weight (Mw) and a number-average molecular weight  (Mn) in the resin (A) is generally 1.0 to 3.0, preferably 1.0  to 2.6, more preferably 1.0 to 2.0, and even more preferably  [0292]  The weight-average molecular weight (Mw) of the  resin (A) is preferably 1,000 to 200,000 and more preferably  2,000 to 20,000. In a case where the weight-average molecu› lar weight is caused to be 1,000 to 200,000, it is possible to  prevent deterioration of heat resistance and dry etching  resistance and it is possible to prevent deterioration of  developability and deterioration of lam formability due to  increase in viscosity.  [0291]  In a case where the composition according to the  embodiment of the present invention is for ArF exposure, in  view of transparency to ArF light, it is preferable that the  resin (A) used in the composition according to the embodi› ment of the present invention has substantially no aromatic  group. Specifically, during the entire repeating unit of the  resin (A), the content of the repeating unit having an  aromatic group is preferably 5 mo! % or less, more prefer› ably 3 mo!  %  or less, and ideally 0 mo!  %  with respect to the  all repeating units, that is, it is more preferable to not have  a repeating unit having an aromatic group. The resin (A)  preferably has a monocyclic or polycyclic alicyclic hydro› carbon structure.  [0290]  With respect to the resin (A) used in the compo› sition according to the embodiment of the present invention,  the content molar ratio of each of the repeating structural  units is appropriately set.  [0289]  In addition, in a case of an addition polymerizable  unsaturated compound copolymerizable with the monomer  corresponding to the above various repeating structural  units, the compound may be copolymerized.  [0288]  Examples of the monomer include a compound  having  one addition polymerizable unsaturated bond  selected from acrylic acid esters, methacrylic acid esters,  acrylamides, methacrylamides, ally!  compounds, vinyl  ethers, and vinyl esters.  [0299]  Hereinafter, the basic compound that can be pref› erably used in the actinic ray-sensitive or radiation-sensitive  resin composition according to the embodiment of the  present invention is described.  [0298]  In a case where the actinic ray-sensitive or radia› tion-sensitive resin composition contains a basic compound,  the content of the basic compound is generally 0.001 to 10  mass  %  and preferably 0.01 to 5 mass  %  with respect to the  solid content of the composition.  [0297]  The basic compound is not particularly limited, and  well-known basic compounds can be used.  [0296]  The actinic ray-sensitive or radiation-sensitive  resin composition according to the embodiment of the  present invention may contain a basic compound.  [0287]  The resin (A) used in the composition according to  the embodiment of the present invention may include vari› ous repeating units in addition to the repeating unit.  Examples of the repeating units include repeating units  corresponding to the following monomers, but the repeating  units are not limited thereto.  [0286]  For example, the resin (A) may include repeating  units disclosed in paragraphs <0045> to <0065> of JP2009- 258586A.  [0285]  The resin (A) may further have a repeating unit  having an alicyclic hydrocarbon structure which does not  have a polar group (for example, alkali-soluble group, a  hydroxyl group, and a cyano group) and not exhibiting acid  decomposability. Examples of the repeating unit include  repeating units disclosed in paragraphs <0114> to <0123> of  JP2014-106299A.  [0295]  The resin (preferably the resin (A)) may be used  singly, and two or more kinds thereof may be used in  combination. In a case where two or more resins (preferably  the resin (A)) are used in combination, it is preferable that  the total content is in the above range.  [0294]  A content ratio of the resin (preferably the resin  (A)) in the total composition is preferably in the range of30  to 99 mass % and more preferably in the range of 50 to 95  mass % with respect to the total solid content.  in the range of 1.1 to 2.0. As the molecular weight distri› bution is smaller, a resolution and a resist shape are excel› lent, a sidewall of a resist pattern is smooth, and roughness  properties are excellent.  [0284]  The resin (A) may have a repeating unit having an  alkali-soluble group. Examples of the alkali-soluble group  include a carboxy group, a sulfonamide group, a sulfonylim› ide group, a bissulfonylimide group, and aliphatic alcohol  (for example, hexafluoroisopropanol group) of which the  a-position is substituted with an electron withdrawing  group. Examples of the repeating unit having an alkali› soluble group include repeating units disclosed in para› graphs <0085> and <0086> of JP2014-098921A.  R201  I  R2oo_N-R202  I I  -N-C=N- I  I  =C-N=C- I I  =C-N- R204  R2os  I  I  I  R203_C-N-C-R206  I  I 