US 20180373148Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama et al.  c10)  Pub. No.: US 2018/0373148 Al  (43)  Pub. Date:  Dec. 27, 2018  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu-shi (JP);  Koji  Hasegawa,  Joetsu-shi (JP);  Masahiro  Fukushima,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/005,988  (22)  Filed:  Jun. 12, 2018  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..............  G03F  71038  (2013.01);  G03F  71162  (2013.01);  G03F  71168  (2013.01);  G03F  7138  (2013.01);  G03F  71322  (2013.01);  G03F  712004  (2013.01);  C08F 2220/302  (2013.01);  C08F  220116  (2013.01);  G03F  71039  (2013.01);  C08F  220130  (2013.01);  C08F  212114  (2013.01);  C08F 2800/10  (2013.01);  G03F  712006  (2013.01)  G03F  7138  G03F  7132  G03F  7120  C08F  220116  G03F  71039  C08F  220130  C08F  212114  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  G03F  71038  G03F  7116  (2006.01)  (2006.01)  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Publication Classification  Jun. 21, 2017  (JP) ................................. 2017-121532  A resist composition comprising a polymer comprising  recurring units having an optionally substituted brominated  phenol has advantages including high sensitivity, high reso› lution and reduced acid diffusion and forms a pattern of good  profile with improved CDU. 