9  O-s0  - b $^{204 }$ -continued  j:o  (CH2JiN  ¢  0  OH  0  I  F*O  SF O  F  F  F  F  O=S=O  I  0N  I  O=S=O  I  CF3  CN  0  OH  US 9,052,590 B2  203  The actinic-ray- or radiation-sensitive resin composition of  the present invention can further according to necessity con› tain a basic compound, a resin that when acted on by an acid,  is decomposed to thereby increase its rate of dissolution in an  alkali aqueous solution, any of conventional photoacid gen› erators, a surfactant, an acid-decomposable dissolution inhib› iting compound, a dye, a plasticizer, a photosensitizer, a com› pound capable of increasing the solubility in a developer, a  compound having a functional group as a proton acceptor and  the like.  <Basic Compound>  The actinic-ray- or radiation-sensitive resin composition of  the present invention preferably contains a basic compound.  The basic compound is preferably a nitrogenous organic basic  compound.  Useful basic compounds are not particularly limited. How› ever, for example, the compounds of categories (1) to ( 4)  below are preferably used.  (1) Compounds of General Formula (BS-1) Below  In general formula (BS-1 ), each of Rs independently rep› resents any of a hydrogen atom, an alkyl group (linear or  branched), a monovalent aliphatic hydrocarbon ring group  (monocyclic or polycyclic), a monovalent aromatic ring  group and a combination of an alkylene group and a monova› lent aromatic ring group, provided that in no event all the  three Rs are hydrogen atoms.  The numberof carbon atoms of the alkyl group represented  by R is not particularly limited. However, it is generally in the  range of 1 to 20, preferably 1 to 12.  The number of carbon atoms of the monovalent aliphatic  hydrocarbon ring group represented by R is not particularly  limited. However, it is generally in the range of 3 to 20,  preferably 5 to 15.  The number of carbon atoms of the monovalent aromatic  ring group represented by R is not particularly limited. How- (BS-1)  R  I  R-N-R 