(45)  Date of Patent:  Dec. 25, 2018  Hatakeyama et al.  c12)  United States Patent  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (IO)  Patent No.:  US 10,162,262 B2  USO 10162262B2  (71)  Applicant:  SHIN-ETSU CHEMICAL CO., LTD.,  Tokyo (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu (JP);  Masaki  Ohashi,  Joetsu (JP)  (73)  Assignee:  SHIN-ETSU CHEMICAL CO., LTD.,  Tokyo (JP)  ( * )  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  15/292,772  (22)  Filed:  Oct. 13, 2016  (65)  Prior Publication Data  US 2017 /0115565 Al  Apr. 27, 2017  Oct. 23, 2015  (JP) ................................. 2015-208575  (30)  Foreign Application Priority Data  (51)  Int. Cl.  G03F 71004  G03F 7130  C08F 220122  C08F 220124  C08F 220134  C08F  220138  C08F  224100  C08F  228102  G03F  71039  C08F  220128  C08F  220130  G03F  7120  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (52)  U.S. Cl.  CPC ..........  G03F  710397  (2013.01);  C08F  220122  (2013.01);  C08F  220124  (2013.01);  C08F  220128  (2013.01);  C08F  220130  (2013.01);  C08F  220134  (2013.01);  C08F  220138  (2013.01);  C08F  224100  (2013.01);  C08F  228102  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  712004  (2013.01);  G03F 712006  (2013.01);  C08F  2220/283  (2013.01);  C08F 2220/301  (2013.01);  C08F 2220/303  (2013.01);  C08F  2220/382  (2013.01);  C08F 2800/20  (2013.01)  12 Claims, No Drawings  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  (58)  Field of Classification Search  CPC .... G03F 7/0397; G03F 7/0045; G03F 7/2004;  G03F 7/2006; C08F 220/22; C08F  220/24; C08F 220/34; C08F 220/38;  C08F 2220/283; C08F 2220/303; C08F  2220/382; C08F 224/00; C08F 228/02  USPC ..... 430/270.1, 910, 921, 326, 942; 526/243,  526/245, 266,281,282,287  See application file for complete search history.  8,048,610 B2  *  11/2011 Ohsawa ................ C08F 220/18  430/270.1  8,105,748 B2  *  1/2012 Ohashi .................. C07C 309/12  9,360,753 B2  6/2016 Hatakeyama  2012/0202153 Al  8/2012 Hatakeyama  430/270.1  JP  JP  JP  JP  JP  01-175733 A  2006-178317 A  2010-152136 A  2012-181511 A  5601286 B2  7 /1989  7/2006  7/2010  9/2012  2/2013  Hinsberg et al., Extendibility of Chemically Amplified Resists:  Another Brick Wall?, SPIE vol. 5039 p. 1 (2003).  Kishikawa et al., Assessment of trade-off between resist resolution  and sensitivity for optimization of hyper-NA immersion lithogra› phy, SPIE vol. 6520 p. 65203L-l (2007).  Office Action dated Aug. 28, 2018, counterpart to Japanese Appli› cation No. 2015-208575, with English translation (7 pages).  Primary Examiner  - John S Chu  (74)  Attorney, Agent, or Firm  - Westerman, Hattori,  Daniels & Adrian, LLP  * cited by examiner  A resist composition comprising a base resin comprising  recurring units having an acid labile group and recurring  units containing a rubidium or cesium salt of a-fluorinated  sulfonic acid exhibits a high sensitivity and forms a pattern  of satisfactory profile with minimal LWR after exposure and  development. 