c12)  United States Patent  Oh  et al.  (IO)  Patent No.:  US 8,283,102 B2  Oct. 9, 2012  (45)  Date of Patent:  (54)  PHOTOACID GENERATOR, COPOLYMER,  CHEMICALLY AMPLIFIED RESIST  COMPOSITION, AND METHOD OF  FORMING PATTERN USING THE  CHEMICALLY AMPLIFIED RESIST  COMPOSITION  (75)  Inventors:  Jung Hoon Oh,  Cheonan-si (KR);  Sang  Jin Kim,  Asan-si (KR);  Jin Ho Kim,  Asan-si (KR);  Dae Hyeon Shin,  Seoul  (KR)  (73)  Assignee:  Korea Kumho Petrochemical Co.,  Ltd.,  Seoul (KR)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by 128 days.  (21)  Appl. No.:  12/416,988  (22)  Filed:  Apr. 2, 2009  (51)  Int. Cl.  (52)  U.S. Cl.  .....................  430/270.1;  430/326; 430/330;  430/905; 430/910; 430/921; 526/282; 526/286;  560/221  (58)  Field of Classification Search  ............... 430/270.1,  430/326, 330,910,921; 526/282, 286; 560/221  See application file for complete search history.  (56)  References Cited  U.S. PATENT DOCUMENTS  (57)  ABSTRACT  14 Claims, 28 Drawing Sheets  (65)  Prior Publication Data  (30)  Foreign Application Priority Data  G03F  71004  G03F 7130  C0SF 10100  C07C 691773  (2006.01)  (2006.01)  (2006.01)  (2006.01)  5,057,146 A *  5,130,392 A *  6,586,152 Bl*  7,618,765 B2 *  2006/0147836 Al *  2009/0186296 Al *  2009/0186297 Al *  2009/0186298 Al *  2009/0233223 Al*  10/1991 Anthony et al ............... 504/255  7/1992 Schwalm et al. ............. 526/288  7/2003 Urano et al ................... 430/170  11/2009 Nishi et al .................. 430/270.1  7/2006 Hatakeyama et al. ..... 430/270.1  7/2009 Ohsawa et al. ............ 430/270.1  7/2009 Ohsawa et al. ............ 430/270.1  7/2009 Ohsawa et al. ............ 430/270.1  9/2009 Tachibana et al. ......... 430/270.1  US008283102B2  * cited by examiner  Primary Examiner  - John Chu  (74)  Attorney, Agent, or Firm  - Ladas & Parry LLP  Disclosed are a photoacid generator, a copolymer, a chemi› cally amplified resist composition, and a method of forming a  pattern using the chemically amplified resist composition.  The photoacid is connected with a main chain of the copoly› mer, whereby the photoacid is equally dispersed within a  resist layer, and characteristics of line edge roughness of a  resist pattern is improved.  Dec. 4, 2008  (KR) ........................ 10-2008-0122403  US 2010/0143843 Al  Jun. 10, 2010 