United States Patent  [191  Heinzelmann et al.  [11]  Patent Number:  4,618,481  [45]  Date of Patent:  Oct. 21, 1986  [54]  ABSORBENT COMPOSITION CONTAINING  A SEVERELY HINDERED AMINO  COMPOUND AND AN AMINE SALT AND  PROCESS FOR THE ABSORPTION OF H2S  USING THE SAME  [75]  Inventors:  Fred J. Heinzelmann, Fanwood,  N.J.; Noah S. Rothblatt, New York,  N.Y.; James P. Glass, Jr.; Geoffrey  R.  Say, both of Baton Rouge, La.;  George R. Chludzinski, South  Orange, N.J.; Guido Sartori; W. S.  Winston Ho, both of Annandale, N.J.  [73]  Assignee:  Exxon Research and Engineering Co.,  Florham Park, N.J.  [21]  Appl. No.: 771,515  [22]  Filed:  Aug. 30, 1985  [51]  Int. Cl. 4  .......................  corn  17/16;  C0lB 31/20;  C09K 3/00  [52]  U.S. CI . ....................................  423/228;  423/226;  423/229; 423/220; 252/189; 252/190;  252/188.28; 564/503; 564/505; 564/508; 55/68  [58]  Field of Search  ............... 423/226, 228, 220, 229,  423/223; 55/73, 68; 252/189, 190, 188.28;  564/508, 505, 503  [56]  References Cited  U.S. PATENT DOCUMENTS  FOREIGN PATENT DOCUMENTS  [57]  ABSTRACT  28 Claims, 4 Drawing Figures  2,722,500 11/1955 Rippie et al. .......................... 196/23  3,139,324  6/1964 Housset ..................................... 23/2  3,848,057 I 1/1974 Leder et al. ......................... 423/223  4,080,423  3/1978 Smith et al. ......................... 423/210  4,153,674  5/1979 Verloop et al. ................. 423/573 R  4,405,583  9/1983 Stogryn et al. ..................... 423/228  4,405,585  9/1983 Sartori et al. ....................... 423/228  4,471,138  9/1984 Stogryn ............................... 564/508  4,525,294  5/1985 Sartori et al. ....................... 423/226  4,556,546 12/1985 Burgoyne, Jr. et al. ............ 423/228  0134948  6/1984 United Kingdom .  Primary Examiner-John  Doll  Assistant Examiner-Robert  L.  Stoll  Attorney, Agent, or  Firm-Marthe  L.  Gibbons  An alkaline absorbent composition comprising a se› verely hindered amino compound and an amine salt is  provided. A process for the removal of H2S from fluid  mixtures using this absorbent composition to produce a  very low level of H2S in the treated fluid is also pro› vided. The process is also suited for the selective re› moval of H2S from fluid mixtures comprising H2S and  CO2.  22  16  18  12  20  10  14  26  52  40  34  36  38  30  42  ABSORPTION-REGENERATION UNIT FOR SELECTIVE  ~  REMOVAL 