US 20160334706Al  c19)  United States  c12)  Patent Application Publication  Ohashi  c10)  Pub. No.: US 2016/0334706 Al  (43)  Pub. Date:  Nov. 17, 2016  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventor:  Masaki Ohashi,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  15/153,060  (22)  Filed:  May 12, 2016  (52)  U.S. Cl.  CPC ...............  G03F  71039  (2013.01);  G03F  71168  (2013.01);  G03F  712004  (2013.01);  G03F  712053  (2013.01);  G03F  7138  (2013.01);  G03F  71322  (2013.01);  G03F  712041  (2013.01)  (51)  Int. Cl.  Publication Classification  (57)  ABSTRACT  (30)  Foreign Application Priority Data  May 14, 2015  (JP) ................................. 2015-098783  A resist composition comprising (A) a base resin of specific  structure and (B) an ammonium salt is provided. When  processed by ArF,  EB  or  EUV  lithography, the resist com› position exhibits a high sensitivity and high resolution and  is improved in LER.  G03F  71039  (2006.01)  G03F  7132  (2006.01)  G03F  7138  (2006.01)  G03F  7116  (2006.01)  G03F  7120  (2006.01) 