(Q-G)  (Q-F)  (Q-E)  (Q-D)  (Q-C)  (Q-B)  120  US 9,221,742 B2  119  TABLE4  C-1  C-2  Examples 1-1 to 1-20 and Comparative Examples  1-1 to 1-7  A resist solution was prepared by selecting a carboxylic  acid sulfonium salt (Q-1 to Q-7, prepared in the above Syn- thesis Examples), polymer, PAG, and alkali-soluble surfac- tant SF-1 in accordance with the formulation shown in Table  5, dissolving the components in a solvent, and filtering  through a Teflonfi filter having a pore size of 0.2 µm. The  solvent contained 0.01 wt% of surfactant A. A comparative  resist solution was prepared by the same procedure aside from  using an amine compound oronium salt (Q-A to Q-G) instead  of the carboxylic acid sulfonium salt. The formulation of  comparative resist solution is also shown in Table 5.  The solvent, PAG, alkali-soluble surfactant SF-1, surfac- tant A, and comparative quenchers (Q-A to Q-G) in Table 5  are identified below.  Surfactant SF-1: poly(2,2,3,3,4,4,4-heptafluoro-l-isobutyl- l-butyl  methacrylate/9-(2,2,2-trifluoro-l-trifluoroethy- loxycarbonyl)-4-oxatricyclo-[ 4.2. l .0 $^{3}$-7Jnonan-5-on-2-yl  methacrylate) of the structural formula shown below  PAG-Y: triphenylsulfonium 2-(adamantane-l-carbonyloxy)- 3,3,3-trifluoro-2-trifluoromethy lpropane-1-sulfonate  PAG-X: triphenylsulfonium 2-(adamantane-l-carbonyloxy)- 1, 1,3,3,3-pentafluoropropane-l-sulfonate  GBL: y-butyrolactone  PGMEA: propylene glycol monomethyl ether acetate 