US009323153B2  c12)  United States Patent  Hirano et al.  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, AND, ACTINIC  RAY-SENSITIVE OR RADIATION-SENSITIVE  FILM AND PATTERN FORMING METHOD,  EACH USING THE SAME  (IO)  Patent No.:  US 9,323,153 B2  (45)  Date of Patent:  Apr. 26, 2016  U.S. PATENT DOCUMENTS  (56)  References Cited  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (57)  ABSTRACT  FOREIGN PATENT DOCUMENTS  OTHER PUBLICATIONS  17 Claims, No Drawings  (71)  Applicant:  FUJIFILM Corporation,  Minato-Ku,  Tokyo (JP)  (72)  Inventors:  Shuji Hirano,  Haibara-gun (JP);  Hiroo  Takizawa,  Haibara-gun (JP);  Hideaki  Tsubaki,  Haibara-gun (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by 0 days.  (21)  Appl. No.:  14/478,135  (22)  Filed:  Sep.5,2014  (63)  Continuation of application No. PCT/JP2013/059791,  filed on Mar. 25, 2013.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F 710397  (2013.01);  C07D 235112  (2013.01);  C07D 235/16  (2013.01);  C07D  235122  (2013.01);  C07D 235/26  (2013.01);  C07D 235/28  (2013.01);  G03F 710045  (2013.01);  G03F  710046  (2013.01);  G03F  71027  (2013.01);  G03F  71038  (2013.01);  G03F  710392  (2013.01);  G03F  7109  (2013.01);  G03F  7111  (2013.01);  G03F  712002  (2013.01);  G03F  712041  (2013.01);  G03F  7130  (2013.01);  G03F  71322  (2013.01);  G03F  71325  (2013.01)  (58)  Field of Classification Search  None  See application file for complete search history.  R$_{2 }$ represents a substituent, in the case where a plurality of  R/ s are present, they may be the same as or different  from each other and a plurality ofR/ s may be bonded to  each other to form a ring;  US 2015/0004533 Al  Jan. 1, 2015  Derwent English abstract for JP62-290702 ( 1987).  *  (Continued)  (Continued)  Primary Examiner  - Sin Lee  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  An actinic ray-sensitive or radiation-sensitive resin composi› tion in the present invention contains a nitrogen-containing  compound (N) which is represented by the following general  formula (Nl ):  [Chem.!]  wherein, in the general formula (Nl ),  X represents a group including a hetero atom;  L represents a single bond or an alkylene group;  R$_{3 }$ represents a hydrogen atom or a substituent; and  n represents an integer of0 to 4.  G03F  71039  G03F  71004  G03F  7120  G03F  7130  G03F  7109  C07D235/12  C07D 235/16  C07D235/22  C07D235/26  C07D235/28  G03F  7111  G03F  7132  G03F  71027  G03F 71038  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  Mar. 29, 2012  Feb.22,2013  (JP) ................................. 2012-077761  (JP) ................................. 2013-033638  JP  JP  JP  62-290702  2004-347738 A  2006-065071 A  *  12/1987  12/2004  3/2006  4,835,085 A  *  2005/0008968 Al*  2007 /0292802 Al  2008/0102407 Al  *  2011/0159670 Al  2013/0078426 Al*  5/1989 Bauer  C07D 235/20  430/165  1/2005 Watanabe et al. .......... 430/270.1  12/2007 Sato  5/2008 Ohsawa et al. ............ 430/286.1  6/2011 Wang et al. ................... 438/514  3/2013 Koshijima et al. ............ 428/156  (Nl) 