US 2020/0050105 Al  99  Feb. 13, 2020  [0166]  At the end of development, the resist film is rinsed.  As the rinsing liquid, a solvent which is miscible with the  developer and does not dissolve the resist film is preferred.  Suitable solvents include alcohols of 3 to 10 carbon atoms,  ether compounds of 8 to 12 carbon atoms, alkanes, alkenes,  and alkynes of 6 to 12 carbon atoms, and aromatic solvents.  [0167]  Specifically, suitable alcohols of 3 to 10 carbon  atoms include n-propyl alcohol, isopropyl alcohol, I-butyl  alcohol, 2-butyl alcohol, isobutyl alcohol, t-butyl alcohol,  1-pentanol, 2-pentanol, 3-pentanol, t-pentyl alcohol, neo› pentyl alcohol, 2-methyl-1-butanol, 3-methyl-1-butanol,  3-methyl-3-pentanol, cyclopentanol, 1-hexanol, 2-hexanol,  3-hexanol, 2,3-dimethyl-2-butanol, 3,3-dimethyl-1-butanol,  3,3-dimethyl-2-butanol, 2-ethyl-1-butanol, 2-methyl-1-pen› tanol, 2-methyl-2-pentanol, 2-methyl-3-pentanol, 3-methyl- 1-pentanol,  3-methyl-2-pentanol,  3-methyl-3-pentanol,  4-methyl-1-pentanol, 4-methyl-2-pentanol, 4-methyl-3-pen› tanol, cyclohexanol, and 1-octanol. Suitable ether com› pounds of 8 to 12 carbon atoms include di-n-butyl ether,  diisobutyl ether, di-s-butyl ether, di-n-pentyl ether, diisopen› tyl ether, di-s-pentyl ether, di-t-pentyl ether, and di-n-hexyl  ether. Suitable alkanes of 6 to 12 carbon atoms include  hexane, heptane, octane, nonane, decane, undecane, dode› cane, methylcyclopentane, dimethylcyclopentane, cyclo› hexane, methylcyclohexane, dimethylcyclohexane, cyclo› heptane, cyclooctane, and cyclononane. Suitable alkenes of  6 to 12 carbon atoms include hexene, heptene, octene,  cyclohexene,  methylcyclohexene,  dimethylcyclohexene,  cycloheptene, and cyclooctene. Suitable alkynes of 6 to 12  carbon atoms include hexyne, heptyne, and octyne. Suitable  aromatic solvents include toluene, xylene, ethylbenzene,  isopropylbenzene, t-butylbenzene and mesitylene. The sol› vents may be used alone or in admixture.  [0168]  Rinsing is effective for minimizing the risks of  resist pattern collapse and defect formation. However, rins› ing is not essential. If rinsing is omitted, the amount of  solvent used may be reduced.  [0169]  A hole or trench pattern after development may be  shrunk by the thermal flow, RELACSfi or DSA process. A  hole pattern is shrunk by coating a shrink agent thereto, and  baking such that the shrink agent may undergo crosslinking  at the resist surface as a result of the acid catalyst diffusing  from the resist layer during bake, and the shrink agent may  attach to the sidewall of the hole pattern. The bake is  preferably at a temperature of 70 to 180°  C., more preferably  80 to 170°  C., for a time of 10 to 300 seconds. The extra  shrink agent is stripped and the hole pattern is shrunk.  [0170]  Examples of the invention are given below by way  of illustration and not by way of limitation. The abbreviation  "pbw" is parts by weight. Analytic instruments are as shown  below.  [0171]  IR: NICOLET 6700 by Thermo Fisher Scientific  Inc.  [0172]  $^{1}$H-NMR: ECA-500 by JEOL Ltd.  EXAMPLES  Synthesis Example 1  [0173]  Synthesis of quenchers  (1) Synthesis of 2,3,5-triiodobenzoyl chloride  [0174]  A mixture of 50.0 g of 2,3,5-triiodobenzoic acid,  0.4 g of dimethylformamide, and 350 g of chloroform was  heated at 60°  C., after which 23.8 g ofthionyl chloride was  added dropwise. Stirring was continued at 60°  C. for 23  hours, after which with heating stopped, the reaction solu› tion was allowed to resume room temperature. The reaction  solution was concentrated under reduced pressure, during  which a solid matter precipitated out. To the solid precipi› tate, 500 g of hexane was added and stirred. The solid matter  was filtered and washed with hexane, obtaining 51.6 g of the  desired compound, 2,3,5-triiodobenzoyl chloride. The solid  was ready for use in the subsequent step as a purity 100%  product without vacuum drying.  (2) Synthesis of Quencher 1  [0175]  [0176]  In 20 g of methylene chloride, 4.4 g of 2,3,5- triiodobenzoyl chloride synthesized in (1) was dissolved. To  this solution, 2.4 g of N-(2-hydroxyethyl)piperidine was  added dropwise. After the solution was stirred at room  temperature overnight, 20 g of deionized water was added to  quench the reaction. The organic layer was taken out and  washed 6 times with 20 g of deionized water, once with 20  g of 1 wt % hydrochloric acid solution, 3 times with 20 g of  deionized water, once with 20 g of 1 wt % ammonia water,  and 5 times with 20 g of deionized water. The organic layer  was concentrated under reduced pressure. Hexane, 30 g, was  added to the concentrate and stirred, during which a solid  matter precipitated out. The solid precipitate was collected  by filtration, washed twice with hexane, and dried in vacuum  at 50°  C., obtaining the target compound, Quencher 1, as  solids. Amount 3.6 g, two-step yield 69%. Quencher 1 was  analyzed by IR and $^{1 }$H-NMR spectroscopy, with the data  shown below.  )=(_  HO~o  vcoc,  N  CH2Cl2  I  I  I  y-<_rO  I  Quencher 1  y-coc,  I 