1111111111111111 IIIIII IIIII 111111111111111 11111 1111111111 111111111111111 IIIIII IIII 11111111  US 20140030643Al  Provided is an actinic-ray- or radiation-sensitive resin com› position including a resin (P) containing an acid-decompos› able repeating unit (A), which resin when acted on by an acid,  increases its solubility in an alkali developer, a compound (Q)  that when exposed to actinic rays or radiation, generates an  acid, and a compound (R) expressed by general formula  (1)  or  (2)  below.  c19)  United States  c12)  Patent Application Publication  TAKAHASHI et al.  c10)  Pub. No.: US 2014/0030643 Al  (43)  Pub. Date:  Jan. 30, 2014  (54)  ACTINIC-RAY-OR RADIATION-SENSITIVE  RESIN COMPOSITION, ACTINIC-RAY- OR  RADIATION-SENSITIVE RESIN FILM  THEREFROM AND METHOD OF FORMING  PATTERN USING THE COMPOSITION  Publication Classification  Related U.S. Application Data  (30)  Foreign Application Priority Data  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Toshiya TAKAHASHI,  Shizuoka (JP);  Hiroo TAKIZAWA,  Shizuoka (JP);  Hideaki TSUBAKI,  Shizuoka (JP);  Shuji HIRANO,  Shizuoka (JP);  Tomotaka TSUCHIMURA,  Shizuoka  (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  (21)  Appl. No.:  14/039,435  (22)  Filed:  Sep.27,2013  ( 63)  Continuation of application No. PCT /JP2012/059300,  filed on  Mar. 29, 2012.  (51)  Int. Cl.  G03F  71004  (2006.01)  (52)  U.S. Cl.  CPC ....................................  G03F  710045  (2013.01)  USPC ...........................  430/18;  430/270.1; 430/296  (57)  ABSTRACT  Mar. 30, 2011  (JP) ................................. 2011-076093  (1)  (2) 