181  US 9,904,167 B2  182  From the results shown in Table 11, it is understood that  the Examples lG to 14G which used the active light sensi› tive or radiation sensitive resin composition of the present  invention are excellent in sensitivity, resolving power, pat› tern shape, and LER in comparison with Comparative  Examples lG to 4G which did not use the compound (A).  Examples 1 G, 2G, 4G; 6G and 8G which used the compound  where X$_{1 }$ or X$_{2 }$ was a group represented by -S- in  General Formula (I) or (II) are particularly excellent in the  LER performance, while Examples 3G, 5G, 7Q, 9G to 14G  which used the compound where X$_{1 }$ or X$_{2 }$ was a group  represented by -NH- and -NR 1 - in General Formula  (I) or (II) are particularly excellent in the resolving power.  wherein, in General Formula (I), Y$_{1 }$ is a monovalent  hydrocarbon group which has an alicyclic hydrocarbon  structure having 5 or more carbon atoms.  2.  The active light sensitive or radiation sensitive resin  composition according to claim  1,  3.  The active light sensitive or radiation sensitive resin  composition according to claim  1,  wherein, in General Formula (I), X$_{1 }$ is a group which is  represented by -NH- or -NR 1 -.  wherein, in General Formula (I), X$_{1 }$ is a group which is  represented by -S-.  4.  The active light sensitive or radiation sensitive resin  composition according to claim  1,  wherein the resin (B) has a phenolic hydroxyl group.  5.  The active light sensitive or radiation sensitive resin  composition according to claim  4,  wherein the resin (B) is a resin which has a repeating unit  represented by General Formula (1) below:  INDUSTRIAL APPLICABILITY  According to the present invention, it is possible to  provide a compound and an active light sensitive or radia› tion sensitive resin composition which are able to form  ultrafine (for example, a line width of 50 nm or less) patterns  in a state in which high resolution (for example, high  resolving power), excellent pattern shape, and low line edge  roughness (LER) are satisfied at the same time.  In addition, according to the present invention, it is  possible to provide a resist film using the active light  sensitive or radiation sensitive resin composition described  above, a resist-coated mask blank, a photomask, a pattern  forming method, a method for manufacturing an electronic  device, and an electronic device.  Detailed description was given of the present invention  with reference to specific embodiments; however, it will be  obvious to a person skilled in the art that it is possible to  make various changes and modifications without departing  from the spirit and scope of the present invention.  This application is based on Japanese Patent Application  (JP 2013-145015) filed on Jul. 10, 2013 and Japanese Patent  Application (JP 2014-026904) filed on Feb. 14, 2014, the  contents of which are incorporated herein by reference.  What is claimed is:  1.  An active light sensitive or radiation sensitive resin  composition comprising:  a compound (A) represented by General Formula  (I)  below,  in the formula,  Y$_{1 }$ represents a monovalent organic group;  M$_{1 }$ +  represents an organic onium ion;  nl represents an integer of 1 or more; and  R  1  and Y $_{1 }$ may bond with each other to form a ring;  (B) a resin, and  a solvent,  in General Formula (1),  R$_{11 }$ represents a hydrogen atom, a methyl group, or a  halogen atom;  B$_{1 }$ represents a single bond or a divalent linking group;  Ar represents an aromatic ring; and  ml represents an integer of 1 or more.  6.  The active light sensitive or radiation sensitive resin  composition according to claim  4,  wherein the resin (B) is a resin which has a repeating unit  represented by General Formula (A) below:  R$_{0}$ $^{i, R}$02, and R$_{03 }$each independently represent a hydro› gen atom, an alkyl group, a cycloalkyl group, a halogen  atom, a cyano group, or an alkoxycarbonyl group;  R$_{03 }$ and Ar$_{1 }$ may bond with each other to form a 5- or  6-membered ring with a main chain of the repeating  unit represented by General Formula (A);  n Y’s each independently represent a hydrogen atom or a  group which is released due to an action of an acid;  at least one Y represents a group which is released due to  an action of an acid; and n represents an integer of 1 to  4.  in General Formula (A),  Ar $_{1 }$represents an aromatic ring group;  7.  The active light sensitive or radiation sensitive resin  composition according to claim  1,  further comprising:  an acid cross-linkable compound  (C).  0  Y(/~x~so?  0 M$_{1 }$ 0  II  y{""~’x~so?  0 M$_{2 }$ 0  (I)  (II)  (A)  Roi  Ro2  I  I  *--f-C-Ct-*  I  I  Ro3  Ar1  \o-Y)n  R11  ~ $_{B1 }$ I  Ar  I  (OH)m1  (1)  X$_{1 }$ represents a group which is represented by -S-,  -NH-, or -NR 1 -; R 1  represents a monovalent  organic group; 