US 2016/0342090 Al  2  Nov.  24, 2016  (I)  having no substituent (unsubstituted alkyl group) but also an  alkyl group having a substituent (substituted alkyl group).  [0030]  Incidentally, the term "actinic rays" or "radiation"  as used herein refers to, for example, a bright line spectrum  of mercury lamp, far ultraviolet rays represented by excimer  laser, extreme ultraviolet rays (EUV light), X-rays, an elec› tron beam, or the like. As used herein, the term "light" means  actinic rays or radiation. Furthermore, unless otherwise  indicated, the term "exposure" as used herein includes not  only exposure to a mercury lamp, far ultraviolet rays rep› resented by excimer laser light, X-rays, EUV light, or the  like but also lithography with particle beams such as an  electron beam and an ion beam.  [0031]  The actinic ray-sensitive or radiation-sensitive  resin composition of the present invention (hereinafter,  simply referred to as "composition" or "composition of the  present invention".) is an actinic ray-sensitive or radiation› sensitive resin composition including (A) a polymer com› pound having a structure in which a hydrogen atom of a  phenolic hydroxyl group is substituted by a group repre› sented by General Formula  (I) described below, and (B) a  compound capable of generating an acid upon irradiation  with actinic rays or radiation.  [0032]  The composition of the present invention is pref› erably for electron beam or extreme ultraviolet exposure.  [0033]  The composition of the present invention may be a  negative chemically amplified resist composition or may be  a positive chemically amplified resist composition.  [0034]  A pattern simultaneously providing high resolution  (for example, high resolving power, excellent pattern profile,  and low line edge roughness (LER)), and good  dry  etching  resistance can be formed by forming a resist film using the  composition of the present invention containing a specific  polymer compound (A). Although the reason is not clear, it  is estimated as follows.  [0035]  First, a phenolic hydroxyl group of the polymer  compound (A) has been protected by a group represented by  General Formula  (I), but this group contains an alicyclic  group having a relatively high glass transition point (Tg).  Therefore, it is considered that a Tg of the polymer com› pound (A) itself, or a Tg of a resist film formed from a  composition containing the polymer compound (A) also  becomes higher, and as a result, dry etching resistance is  improved.  [0036]  Moreover, it is considered that high resolving  power, excellent pattern profile, small LER, and the like are  achieved because the diffusion of an acid generated from a  later-described compound (B) (acid generator) is inhibited  as a Tg becomes higher.  [0037]  Hereinafter, the actinic ray-sensitive or radiation› sensitive resin composition of the present invention will be  described in detail.  [0038]  [1] (A) Polymer Compound  [0039]  The actinic ray-sensitive or radiation-sensitive  resin composition of the present invention contains (A) a  polymer compound having a structure in which a hydrogen  atom of a phenolic hydroxyl group is substituted by a group  represented by the following General Formula  (I) (herein› after, also referred to as "polymer compound (A)").  [0040]  The present invention uses, as a main component,  a polymer compound which contains phenolic hydroxyl  groups and in which a portion of the phenolic hydroxyl  groups is substituted by a group represented by the follow› ing General Formula  (I).  [0050]  The alicyclic group represented by A$_{1 }$ is preferably  a bridged cycloalkyl group, because the effect of the present  invention (in particular, dry etching resistance) is superior.  [0049]  Further, a part of carbon atoms in the monocyclic  or bridged cycloalkyl group may be substituted, for  example, by a heteroatom such as an oxygen atom or a sulfur  atom.  [0048]  Further, other examples of the alicyclic group  include a cyclohexenyl group, a cyclohexadienyl group, a  cyclopentenyl group, a cyclopentadienyl group, a bicy› clooctenyl group, and a bicyclotridecenyl group.  [0047]  The bridged cycloalkyl group is, for example, a  group containing a structure such as a bicyclo structure, a  tricyclo structure, or a tetracyclo structure, and specific  examples thereof include a bicyclobutyl group, a bicyclo› hexyl group, a bicycloheptyl group, a bicyclooctyl group, a  bicyclononyl group, a bicyclodecanyl group, a bicycloun› decanyl group, a bicyclododecanyl group, an adamantyl  group, a decalin group, an isobornyl group, a norbornyl  group, a cedrol group, a camphanyl group, an a-pine! group,  a tricyclodecanyl group, a tetracyclododecyl group, and  androstanyl group. Among these, preferred are an adamantyl  group, a decalin group, a norbornyl group, a cedrol group, a  bicyclohexyl group, a bicycloheptyl group, a bicyclooctyl  group, a bicyclodecanyl group, a bicyclododecanyl group,  and a tricyclodecanyl group. More preferred is an adamantyl  group from the viewpoint of  dry  etching resistance.  [0046]  Examples of the monocyclic cycloalkyl group  include a cyclopropyl group, a cyclobutyl group, a cyclo› heptyl group, a cyclohexyl group, a cyclopentyl group, a  cyclooctyl group, a cyclononyl group, a cyclodenyl group, a  cycloundenyl group, and a cyclododecanyl group. The  monocyclic cycloalkyl group is preferably a cyclohexyl  group or a cyclopentyl group.  [0045]  Examples of such an alicyclic group include a  monocyclic cycloalkyl group and a bridged cycloalkyl  group.  [0044]  In General Formula (I), A$_{1 }$ represents an alicyclic  group having 3 to 12 carbon atoms which may have a  heteroatom and which may have a double bond.  [0043]  The group represented by General Formula (I) will  now be described.  [0042]  The site which is substituted by a group repre› sented by General Formula (I) is a part having a function of  controlling the developability of a polymer compound con› taining a repeating unit having a phenolic hydroxyl group.  The structure in which a hydrogen atom of a phenolic  hydroxyl group is substituted by a group represented by  General Formula (I) is decomposed by the action of an acid  to generate a phenolic hydroxyl group.  [0041]  In General Formula (I), A$_{1 }$ represents an alicyclic  group having 3 to 12 carbon atoms which may have a  heteroatom. R$_{1 }$ and R$_{2 }$ each independently represent a  hydrocarbon group. R$_{1 }$ and R$_{2 }$ may be bonded to each other  to form a ring. * indicates a binding site to an oxygen atom  of the phenolic hydroxyl group. 