Pattern Profile  Sensitivity  Resolution  (rating on a scale  LWR  (µC/cm 2 )  (µm)  of3 grades)  (nm)  Example 9  15.0  0.050  rectangular  2.5  Example 10  15.0  0.050  rectangular  2.0  Example 11  21.0  0.050  rectangular  3.0  Example 12  35.0  0.100  rectangular  4.0  Example 13  40.0  0.100  rectangular  4.0  Example 14  25.0  0.100  rectangular  5.5  Example 15  15.5  0.038  rectangular  2.0  Example 16  18.0  0.038  rectangular  2.5  Example 17  18.0  0.038  rectangular  2.0  Example 18  17.5  0.038  rectangular  2.0  Example 19  18.0  0.038  rectangular  2.0  Example 20  19.5  0.038  rectangular  2.0  Example 21  18.0  0.038  rectangular  2.0  Comparative  18.0  0.080  round top  7.0  Example 1  Comparative  100  0.050  rectangular  5.0  Example 2  Comparative  Example 3  Bridge  Collapse  Margin  Margin  (%)  (%)  40  40  40  35  40  15  25  15  25  15  25  15  40  45  45  40  40  45  55  45  45  45  45  45  40  40  35  30  50  15  TABLE 2-continued  80  US 8,637,222  B2  79  In the Table, abbreviations indicate specific examples  above or the followings.  OH  (P-2)  (X-1)  0  (X-3)  0  (X-2)  (P-1)  l"nk"  <Cross 1  mg Agent>  <Organic Basic Compound>  D-1: Tetra-(n-butyl)ammonium hydroxide  D-2: 1,8-Diazabicyclo[5.4.0]-7-undecene  D-3: 2,4,5-Triphenylimidazole  D-4: Tridodecylamine  <Other Components>  F-1: Benzoic acid  F-2: 2-Naphthoic acid  <Resist Solvent, Developer, Rinsing Solution>  S-1: Propylene glycol monomethyl ether acetate (PGMEA)  S-2: Propylene glycol monomethyl ether (PGME)  S-3: Cyclohexanone  S-4: Butyl acetate  S-5: Dodecane  S-6: Tetrahydrofuran  S-7: 1-Hexanol  S-8: Methyl amyl ketone  S-9: Ethyl lactate  S-10: Decane  S-11: Isopropyl alcohol  <Surfactant>  W-1: PF6320 (produced by OMNOVA)  <Resin>  PMMA: Polymethyl methacrylate  W-2: Megaface Fl 76 (produced by Dainippon Ink  & Chemi› cals, Inc.)  -continued 