US 20200050105Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama et al.  c10)  Pub. No.: US 2020/0050105 Al  (43)  Pub. Date:  Feb. 13, 2020  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu-shi (JP);  Masaki Ohashi,  Joetsu-shi (JP);  Takayuki Fujiwara,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/530,438  (22)  Filed:  Aug. 2, 2019  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..........  G03F 710045  (2013.01);  G03F 710392  (2013.01);  G03F 710382  (2013.01);  C07D  295/088  (2013.01);  C07C 217106  (2013.01);  C07D 235112  (2013.01);  G03F 7/162  (2013.01);  C07D 207108  (2013.01);  C07D  211146  (2013.01);  C07D 453102  (2013.01);  C07D 209152  (2013.01);  C07D 451102  (2013.01);  C07D 211122  (2013.01)  C07D 295/088  C07C 217106  C07D 235112  C07D 211122  C07D 207108  C07D 211146  C07D 453102  C07D 209152  C07D 451102  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  G03F 71004  G03F 71039  G03F 71038  (2006.01)  (2006.01)  (2006.01)  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Publication Classification  Aug. 9, 2018  (JP) ................................. 2018-150050  A  resist composition comprising a base polymer and a  quencher in the form of an amine compound having an  iodized aromatic ring bonded to the nitrogen atom via a  divalent hydrocarbon group offers a high sensitivity and  minimal LWR or improved  CDU, independent of whether it  is of positive or negative tone. 