US009411230B2  (IO)  Patent No.:  US 9,411,230 B2  (45)  Date of Patent:  Aug. 9, 2016  c12)  United States Patent  Takizawa et al.  (54)  PATTERN FORMING METHOD, ELECTRON  BEAM-SENSITIVE OR EXTREME  ULTRAVIOLET-SENSITIVE COMPOSITION,  RESIST FILM, METHOD FOR  MANUFACTURING ELECTRONIC DEVICE  USING THE SAME, AND ELECTRONIC  DEVICE  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Hiroo Takizawa,  Shizuoka (JP);  Kaoru  Iwato,  Shizuoka (JP);  Hideaki Tsubaki,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 14 days.  (21)  Appl. No.:  14/227,344  (22)  Filed:  Mar. 27, 2014  (63)  Continuation of application No. PCT/JP2012/074315,  filed on Sep. 14, 2012.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  710388  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  71038  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  7111  (2013.01);  G03F  712041  (2013.01);  G03F  71325  (2013.01);  G03F  71405  (2013.01)  ( 58)  Field of Classification Search  CPC ... G03F 7/0045; G03F 7/0046; G03F 7/0388;  G03F 7/325; G03F 7/2041; G03F 7/038;  G03F 7/0392; G03F 7/11; G03F 7/405;  G03F 7/0397; G03F 7/2059; G03F 7/2004  USPC .......................... 430/9, 18,270.1, 288.1, 325  See application file for complete search history.  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (56)  References Cited  U.S. PATENT DOCUMENTS  (57)  ABSTRACT  25 Claims, No Drawings  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  US 2014/0212796 Al  Jul. 31, 2014  Sep.30,2011  (JP) ................................. 2011-218546  There is provided a pattern forming method comprising (1) a  step of forming a film by using an electron beam-sensitive or  extreme ultraviolet-sensitive resin composition, (2) a step of  exposing the film by using an electron beam or an extreme  ultraviolet ray, and (3) a step of developing the exposed film  by using an organic solvent-containing developer, wherein  the electron beam-sensitive or extreme ultraviolet-sensitive  resin composition contains (A) a resin containing (R) a  repeating unit having a structural moiety capable of decom› posing upon irradiation with an electron beam or an extreme  ultraviolet ray to generate an acid, and (B) a solvent.  Primary Examiner  - John A McPherson  (Continued)  Computer-generated translation of JP 2010-085499 (Apr. 2010).*  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  G03F  71038  G03F  7132  G03F  71004  G03F  71039  G03F  7111  G03F  7120  G03F  7140  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  CN  101473268 A  7/2009  JP  2002-148806  A  5/2002  JP  2008-268935  A  11/2008  JP  2010-85499  A  4/2010  JP  2010-85971 A  4/2010  JP  2010-217884 A  9/2010  JP  2010-256856  A  11/2010  JP  2011-123469 A  6/2011  JP  2011-170316 A  9/2011  JP  2011-221513 A  11/2011  JP  2011-248019 A  12/2011  JP  2012-32806  A  2/2012  JP  2012-32807  A  2/2012  TW  200804243  A  1/2008  TW  201202269 Al  1/2012  WO  2007/147782 A2  12/2007  WO  2007/147782 A3  12/2007  WO  WO 2011/025070 Al *  3/2011  WO  2011/104127 Al  9/2011  WO  2011/149035 Al  12/2011  WO  2012/114963 Al  8/2012  WO  2012/121278 Al  9/2012  WO  2013/047895 Al  4/2013  2010/0167178 Al  7/2010  2010/0248143 Al  9/2010  2011/0159433 Al  6/2011  2011/0177462 Al  7/2011  2011/0236826 Al  9/2011  2011/0236831 Al  9/2011  2011/0300485 Al  12/2011  2012/0009527 Al  1/2012  2012/0009529 Al  1/2012  2012/0077131 Al  3/2012  2013/0040096 Al  2/2013  2013/0337385 Al  12/2013  2014/0004467 Al  1/2014  Yamato et al.  Ito et al.  Takahashi et al.  Hatakeyama et al.  Hatakeyama et al.  Hasegawa et al.  Tsubaki et al.  Hatakeyama et al.  Hatakeyama  Enomoto et al.  Iwato et al.  Furukawa et al.  Hirano et al.  2002/0061462 Al  5/2002 Uenishi  2008/0241745 Al  10/2008 Shirakawa et al. 