-continued  138  US 9,221,742 B2  137  (d2)  c+-£  if  ;=a  0  ’\------’n  O==<L"  A~S~  F  (5)  (6)  (7)  (8)  (4)  17.  The resist composition of claim  13,  further comprising  surfactant which is insoluble in water and soluble in alkaline  developer.  16.  The resist composition of claim  13,  further comprising  a nitrogen-containing compound.  *  *  *  *  *  whereinRa 1 ,  R 61 , R 62 , Rel, Rc 2 ,  andRc3 are each indepen› dently fluorine or a straight C$_{1 }$-C$_{40 }$or branched or cyclic  C$_{3}$-C$_{40 }$monovalent hydrocarbon group which may be  substituted with or separated by a heteroatom, R$^{61 }$and  R 62 , or Rel and Rc 2  may bond together to form a ring  with -CF  $_{2}$-S0$_{2}$ - group to which they are attached,  Rd 1  is a straight C$_{1}$-C$_{40 }$ or branched or cyclic C$_{3}$ -C$_{40 }$ monovalent hydrocarbon group which may be substi› tuted with or separated by a heteroatom.  whereinR 2 , R 3 , andR $^{4 }$areas definedabove,x- is an anion  of any one of the general formulae ( 5) to (8):  wherein R 1 , R 2 , R 3 , and R 4  are as defined above, L’ is a  single bond or C$_{2}$-C$_{5 }$ alkylene group,  RY  is a straight  C$_{1 }$-C$_{20 }$or branched or cyclic C$_{3}$-C$_{20 }$monovalent hydro- carbon group which may be substituted with or sepa› rated by a heteroatom, A is hydrogen or trifluoromethyl,  L" is a single bond or a straight C$_{1 }$-C$_{20 }$or branched or  cyclic C$_{3}$-C$_{20 }$divalent hydrocarbon group which may be  substituted with or separated by a heteroatom, n is O or 1,  with the proviso that n is O when L" is a single bond.  15.  The resist composition of claim  13,  further comprising  a photoacid generator having the general formula ( 4 ): 