(45)  Date of Patent:  Aug. 27, 2019  (IO)  Patent No.:  US 10,394,127 B2  Nihashi et al.  c12)  United States Patent  (54)  PATTERN FORMING METHOD AND  METHOD FOR MANUFACTURING  ELECTRONIC DEVICE  US010394127B2  (72)  Inventors:  Wataru Nihashi,  Shizuoka (JP);  Hideaki Tsubaki,  Shizuoka (JP);  Toru  Tsuchihashi,  Shizuoka (JP);  Tomotaka  Tsuchimura,  Shizuoka (JP)  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  15/718,659  Sep. 28, 2017  (22)  Filed:  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..............  G03F  71325  (2013.01);  G03F  71038  (2013.01);  G03F  710382  (2013.01);  G03F  710392  (2013.01);  G03F  7116  (2013.01);  G03F  7120  (2013.01);  G03F  712004  (2013.01)  ( 58)  Field of Classification Search  CPC ......... G03F 7/325; G03F 7/0382; G03F 7/038  See application file for complete search history.  U.S. PATENT DOCUMENTS  (56)  References Cited  G03F  7120  G03F  7132  G03F  71038  G03F  7116  G03F  71039  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  Mar. 31, 2015  (JP) ................................. 2015-074229  US 2018/0017872 Al  Jan. 18, 2018  (63)  Continuation  of  application  No.  PCT/JP2016/059522, filed on Mar. 24, 2016.  Park et al ,"Polymers with Acid-amplifying Side Chainsas Positive› type Photoresists", Journal of Photopolymer Science and Technol› ogy, vol. 17, No. 3 , 2004,pp. 427-432. (Year: 2004).*  English Translation of JP 2015-096932 A generated machine trans› lation from AIPN Japan Patent Office National Center for Industrial  Property Information and Training, generated Oct. 19, 2018, 62  pages. (Year: 2018). *  Communication dated Feb. 20, 2018, from the Japanese Patent  Office in counterpart Application No. 2017-509886.  International Search Report, issued by International Searching  Authority in corresponding International Application No. PCT/  JP2016/059522, dated Jun. 21, 2016, (PCT/ISA/210).  Written Opinion, issued by International Searching Authority in  corresponding International Application No. PCT/JP2016/059522,  dated Jun. 21, 2016, (PCT/ISA/237).  * cited by examiner  Primary Examiner  - Cynthia Hamilton  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  Provide are a pattern forming method including a step (1) of  forming a film using an actinic ray-sensitive or radiation› sensitive resin composition including a resin having an  acid-decomposable repeating unit capable of decomposing  by the action of an acid to generate an acid having a pKa of  3.0 or less, a step (2) of exposing the film using actinic rays  or radiation, and a step (3) of carrying out development  using a developer including an organic solvent after the  exposure to form a negative tone pattern; and a method for  manufacturing an electronic device, including the pattern  forming method.  12 Claims, No Drawings  (57)  ABSTRACT  6,576,392 Bl *  9,772,558 B2 *  2003/0232277 Al  2005/0089800 Al*  6/2003 Sato ...................... G03F 7/0045  430/270.1  9/2017 Ayothi ...................... G03F 7 /40  12/2003 Sasaki et al.  4/2005 Lee  C07D 327/04  430/281.1  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  JP  JP  JP  JP  JP  JP  JP  JP  JP  2003-316007  A  2011-98953  A  2011-150211 A  2013-160947 A  2015-25879  A  2015-31851 A  2015-96932  A  2016-71206 A  2016-71207 A  11/2003  5/2011  8/2011  8/2013  2/2015  2/2015  5/2015  5/2016  5/2016  2012/0237875 Al  2014/0212813 Al  2014/0349224 Al  2015/0086925 Al *  9/2012 Asano et al.  7/2014 Asano et al.  11/2014 Takizawa et al.  3/2015 Ayothi ...................... G03F 7/40  430/285.1  2015/0192851 Al*  2016/0147147 Al  2016/0179003 Al  2017/0176862 Al*  7/2015 Yamashita ............ G03F 7/2002  430/296  5/2016 Hirano et al.  6/2016 Asano et al.  6/2017 Inoue ...................... G03F 7 /038 