US 10,175,578 B2  118  117  -continued  -continued  (z70)  (z71)  (z73)  (z74)  (z75)  (z76)  (z77)  (z78)  The photoacid generator can be used singly or in combi› nation of two or more kinds thereof. When the photoacid  generator is used in combination of two or more kinds  thereof, it is preferable to combine compounds that generate  two different kinds of organic acids having the total number  of atoms excluding hydrogen atoms of 2 or more.  The content of the photoacid generator is preferably  0.1  %  to 20% by mass, more preferably 0.5% to  10%  by mass, and  still more preferably  1  % to 7% by mass, with respect to the  total solid content of the actinic ray-sensitive or radiation› sensitive resin composition. By setting the content of the  photoacid generator to the range, the exposure latitude when  a resist pattern is formed is improved, or the crosslinking  reactivity of the crosslinking layer forming material is  improved.  (C) Solvent  The actinic ray-sensitive or radiation-sensitive resin com› position of the present invention may contain a solvent.  Examples of the solvent which can be used when the  respective components are dissolved to prepare an actinic  ray-sensitive  or radiation-sensitive  resin  composition  include organic solvents such as alkylene glycol monoalkyl  ether carboxylate, alkylene glycol monoalkyl ether, alkyl  lactate ester, alkyl alkoxypropionate, a cyclic lactone having  4  to  10  carbon atoms, a monoketone compound having  4  to  10  carbon atoms, which may have a ring, alkylene carbon› ate, alkyl alkoxyacetate, and alkyl pyruvate.  Preferred examples of the alkylene glycol monoalkyl  ether carboxylate include propylene glycol monomethyl  ether acetate, propylene glycol monoethyl ether acetate,  propylene glycol monopropyl ether acetate, propylene gly› col monobutyl ether acetate, propylene glycol monomethyl  ether propionate, propylene glycol monoethyl ether propi› onate, ethylene glycol monomethyl ether acetate, and eth› ylene glycol monoethyl ether acetate.  OBu  c¢  C2Fs  I  O=S=O 0  I  II  #  ec--S-C2F5  I  II  O=S=O 0  I  C2Fs  I  C2Fs  0=?.  I  O=S=O 0  I  II  ec--S-C2F5  I  II  O=S=O 0  I  C2Fs  0  0  0  0  0  0  0  -t-0-s  0  F  F  ~  0-s+  O;S  C ;  F  F  0  BuS02--0-s+  C4F9S03- F  F  F  I I I  CHO  F  F  F 