US010101653B2  c12)  United States Patent  Hatakeyama et al.  (IO)  Patent No.:  US 10,101,653 B2  Oct. 16, 2018  (45)  Date of Patent:  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu (JP);  Masaki  Ohashi,  Joetsu (JP)  (73)  Assignee:  SHIN-ETSU CHEMICAL CO., LTD.,  Tokyo (JP)  ( * )  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  15/666,731  (22)  Filed:  Aug. 2, 2017  (65)  Prior Publication Data  (30)  Foreign Application Priority Data  US 2018/0039173 Al  Feb. 8, 2018  Aug. 8, 2016  (JP) ................................. 2016-155516  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F 710045  (2013.01);  C07C 69/63  (2013.01);  C07C 303132  (2013.01);  C07C  309/04  (2013.01);  C07C 309/06  (2013.01);  C07C 309/17  (2013.01);  C07C 309/19  (2013.01);  C07C 309/23  (2013.01);  C07C  309124  (2013.01);  C08F 212102  (2013.01);  C08F 220118  (2013.01);  C08F 220122  (2013.01);  C08F  220124  (2013.01);  C08F  220128  (2013.01);  C08F  220138  (2013.01);  C08F  224100  (2013.01);  C08F  228102  (2013.01);  G03F  710046  (2013.01);  G03F  710048  (2013.01);  G03F  710382  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  71162  (2013.01);  G03F  71168  (2013.01);  G03F  712004  (2013.01);  G03F  712006  (2013.01);  G03F  712037  (2013.01);  G03F  712041  (2013.01);  G03F  71322  (2013.01);  G03F  71325  (2013.01);  G03F  7138  (2013.01);  C08F 2220/185  (2013.01);  C08F 2220/1866  (2013.01);  C08F  2220/281  (2013.01);  C08F 2220/282  (2013.01);  C08F 2220/283  (2013.01);  C08F  2220/303  (2013.01);  C08F 2220/382  (2013.01)  (58)  Field of Classification Search  CPC .... G03F 7/0045; G03F 7/0382; G03F 7/0397;  G03F 7/2006; G03F 7/2037; G03F 7/38;  G03F 7/40; C07C 303/32; C07C 309/04;  C07C 309/06; C07C 309/09; C07C  309/17; C07C 309/19; C07C 309/23;  C07C 309/24; C07C 69/63; C08F 212/02;  C08F 220/22; C08F 220/24; C08F  220/38; C08F 2220/282; C08F 2220/283;  C08F 2220/303; C08F 2220/382; C08F  224/00; C08F 228/02  USPC ..... 430/270.1, 905, 907, 910, 921; 526/243,  526/245, 247, 248, 249, 266, 280, 281,  526/282, 286, 287, 288, 291, 292.1,  526/292.5, 292.9, 293, 294; 560/147,  560/149, 226, 227, 228; 562/41, 42, 100,  562/109, 110, 111, 113  (56)  References Cited  U.S. PATENT DOCUMENTS  3,182,089 A  *  5/1965 Godfrey .................. C07B 39/00  568/323  2010/0331567 Al*  12/2010 Giovenzana ............ C07B 39/00  560/65  2012/0041224 Al*  2/2012 Citterio ................. C07C 227/16  560/47  2013/0072719 Al *  3/2013 Citterio ................. C07C 231/10  564/153  * cited by examiner  See application file for complete search history.  Primary Examiner  - John S Chu  (74)  Attorney, Agent, or Firm  - Westerman, Hattori,  Daniels & Adrian, LLP  (57)  ABSTRACT  A resist composition comprising a base polymer and a  sulfonium or iodonium salt of iodinated phenoxy or iodi› nated phenylalkoxy-containing fluorinated sulfonic acid  offers a high sensitivity and minimal LWR or improved  CDU independent of whether it is of positive or negative  tone.  13 Claims, No Drawings  G03F  71004  G03F  7138  C08F  212102  C08F  220122  C08F  220124  C08F  220138  C08F  224100  C08F  228102  C07C 303132  C07C 309/04  C07C 309/06  C07C 309/09  C07C 309/17  C07C 309/19  C07C 309/23  C07C 309124  C07C 69/63  G03F  71039  G03F  71038  G03F  7116  G03F  7120  G03F  7132  C08F 220128  C08F 220118  C08F 220/30  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01) 