US 9,904,167 B2  120  119  agents, and is preferably used as a combination of two or  more agents from the point of view of the pattern shape.  For example, in a case where another cross-linking agent,  for example, a compound or the like which has an  N-alkoxymethyl groups described above, is also used in  addition to the phenolic derivative described above, the ratio  of the phenolic derivative described above and the other  cross-linking agent is  100/0 to 20/80, preferably 90/10 to  40/60, and even more preferably 80/20 to 50/50 in a molar  ratio.  The acid cross-linkable compound (C) may be a resin  which has a repeating unit having an acid-cross-linkable  group (also referred to below as resin (C")). In a case where  the acid cross-linkable compound (C) is the resin (C")  described above, since the repeating unit in the resin (C")  described above has an acid-cross-linkable group, it is  possible to form a hard film with a higher cross-linking  reactivity in comparison with the active light sensitive or  radiation sensitive resin composition which contains a resin  which does not have a repeating unit having an acid-cross- linkable group. As a result, it is considered that the dry  etching resistance is improved. In addition, since the diffu› sion of the acid in the sections exposed to active light or  radiation is suppressed, it is considered that, as a result, in  a case of forming a fine pattern, the resolving power is  improved, the pattern shape is improved, and the line edge  roughness (LER) is further reduced. In addition, as in the  repeating unit represented by General Formula (1) below, in  a case where the reaction point of the resin and the reaction  point of the cross-linkable group are close, it is considered  that the sensitivity of the active light sensitive or radiation  sensitive resin composition is improved.  Examples of the resin  (C’) include a resin which has the  repeating unit represented by General Formula (1) below.  The repeating unit represented by General Formula (1) is a  structure including at least one methylol group which may  have a substituent group.  Here, the "methylol group" is a group represented by  General Formula (M) below and is preferably a hydroxym› ethyl group or an alkoxymethyl group in an aspect of the  present invention.  In General Formula (1),  R$_{2}$ , R$_{3}$ , and Z are the same as in General Formula (M)  described above.  R$_{1 }$ represents a hydrogen atom, a methyl group, or a  halogen atom.  L represents a divalent linking group or a single bond.  Y represents a substituent group other than a methylol  group.  m represents an integer of 0 to 4.  n represents an integer of 1 to 5.  m+n is 5 or less.  In a case where mis 2 or more, a plurality of Y’s may be  the same, or may be different from each other.  In a case where n is 2 or more, a plurality of R/s, R/s,  and Z’s may be the same, or may be different from each  other.  In addition, two or more of  Y,  R$_{2}$ ,  R$_{3}$ ,  and Z may bond  with each other to form a ring structure.  R1, R$_{2}$ ,  R$_{3}$ ,  L, and Y may each have a substituent group.  The content ratio of the repeating unit which has an  acid-cross-linkable group in the resin (C") is preferably 3  mass % to  40 mass % and more preferably 5 mass % to 30  mass %, with respect to all of the repeating units of the resin  (C").  The content of the resin (C") is preferably 5 mass% to 95  mass % and more preferably 10 mass % to 90 mass %, in the  total solid content of the negative type resist composition.  The resin (C") may include two or more types of repeating  unit having an acid-cross-linkable group, or two or more  types ofresin (C") may be used in combination. In addition,  it is also possible to use the compound (C) and the resin (C")  in combination.  Specific examples of the repeating unit which has an  acid-cross-linkable group included in the resin (C") include  the following structures.  (Q-1)  0  I  (Q-2)  OH  (1)  (M)  R$_{2 }$ and R$_{3 }$ represent a hydrogen atom, an alkyl group, or  a cycloalkyl group.  Z represents a hydrogen atom or a substituent group.  Description will be given below of General Formula (1 ). 