US009323150B2  c12)  United States Patent  Hirano et al.  (IO)  Patent No.:  US 9,323,150 B2  Apr. 26, 2016  (45)  Date of Patent:  (54)  ACTINIC-RAY- OR RADIATION-SENSITIVE  RESIN COMPOSITION, ACTINIC-RAY- OR  RADIATION-SENSITIVE FILM THEREFROM  AND METHOD OF FORMING PATTERN  (71)  Applicant:  FUJIFILM Corporation,  Minato-Ku,  Tokyo (JP)  (72)  Inventors:  Shuji Hirano,  Shizuoka (JP);  Hiroo  Takizawa,  Shizuoka (JP);  Hideaki  Tsubaki,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( * )  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  14/229,210  (22)  Filed:  Mar. 28, 2014  (63)  Continuation of application No. PCT/JP2012/075867,  filed on Sep. 28, 2012.  (60)  Provisional application No. 61/548,032, filed on Oct.  17, 2011.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..............  G03F  710388  (2013.01);  C08F  12108  (2013.01);  C08F  212108  (2013.01);  C08F  220128  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  710758  (2013.01);  G03F  7111  (2013.01);  G03F  712041  (2013.01)  (58)  Field of Classification Search  CPC ..... G03F 7/004; G03F 7/0045; G03F 7/0046;  G03F 7/0388; G03F 7/0392; G03F 7/397;  G03F 7/11; G03F 7/2041; C08F 212/08;  C08F 12/08; C08F 236/10  22 Claims, No Drawings  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  Provided is an actinic-ray- or radiation-sensitive resin com› position including a resin (Aa) containing at least one repeat› ing unit (Aal) derived from monomers of general formula  (aal-1) below and at least one repeating unit (Aa2) derived  from monomers of general formula (aa2-1) below and com› prising a resin (Ab) that when acted on by an acid, changes its  alkali solubility.  Sep. 30, 2011  (JP) ................................. 2011-217048  US 2014/0227636 Al  Aug. 14, 2014  English Translation of IPRP issued in PCT/JP2012/075867 dated  Apr. 10, 2014.  (Continued)  Primary Examiner  - Amanda C Walke  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  (Continued)  (Continued)  USPC .............. 430/270.1, 913, 311, 322,325,329;  526/243, 242, 251  See application file for complete search history.  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (aal-1)  (aa2-1)  JP  JP  2008090261 A  *  4/2008  2009-093137 A  4/2009  5,314,931 A  *  5/1994 Yamada et al. ............... 522/127  8,039,199 B2  10/2011 Abe  8,313,886 B2  11/2012 Harada et  al.  8,642,244 B2  2/2014 Shiono et al.  8,822,561 B2 *  9/2014 Ito et  al . ........................ 522/112  2010/0152400 Al*  6/2010 Iizuka et al . .................. 526/268  2010/0233617 Al  9/2010 Wada  2010/0248144 Al*  9/2010 Iwai et al. .................. 430/285.1  2011/0091809 Al *  4/2011 Saegusa et al. ............ 430/270.1  G03F  71004  G03F  71038  C08F  212108  C08F  12108  C08F  220128  G03F  71039  G03F  71075  G03F  7111  G03F  7120  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01) 