[Chemical formula 52]  solvent, an ester-based solvent, an alcohol-based solvent, an  amide-based solvent, and an ether-based solvent is used. Of  these, at least one kind selected from a hydrocarbon-based  solvent, a ketone-based solvent, an ester-based solvent, an  alcohol-based solvent, and an amide-based solvent is prefer- able; at least one kind selected from an alcohol-based solvent  and an ester-based solvent is more preferable; and an alcohol› based solvent is especially preferable.  The alcohol-based solvent which is used in the rinse solu- tion is preferably a monohydric alcohol having 6 to 8 carbon  atoms, and the monohydric alcohol may be linear, branched,  or cyclic. Specifically, examples thereof include 1-hexanol,  1-heptanol, 1-octanol, 2-hexanol, 2-heptanol, 2-octanol,  3-hexanol, 3-heptanol, 3-octanol, 4-octanol, and benzyl alco- ho!. Of these, 1-hexanol, 2-heptanol, or 2-hexanol is prefer› able, and 1-hexanol or 2-hexanol is more preferable.  These organic solvents may be used alone, or as a mixture  of two or more kinds thereof. In addition, such an organic  solvent may be mixed with an organic solvent other than the  foregoing organic solvents or water and used. However, tak› ing into consideration the development properties, an amount  of water blended in the rinse solution is preferably not more  than 30 mass%, more preferably not more than 10 mass%,  still more preferably not more than 5 mass %, and especially  preferably not more than 3 mass % relative to the whole  amount of the rinse solution.  The rinse solution can be blended with a known additive, if  desired. Examples of the additive include a surfactant.  Examples of the surfactant include the same surfactants as  those described above. Above all, a nonionic surfactant is  preferable, and a fluorine-based surfactant or a silicon-based  surfactant is more preferable.  In the case ofblending the surfactant, the blending amount  thereofis usually 0.001 mass% to 5 mass%, preferably 0.005  mass% to 2 mass%, and more preferably 0.01 mass% to 0.5  mass% relative to the whole amount of the rinse solution.  The rinse treatment (washing treatment) using a rinse solu- tion can be carried out through a known rinse method.  Examples of the method include a method of continuously  dispensing a rinse solution onto a support rotating at a fixed  rate (rotary coating method); a method of immersing a sup- port in a rinse solution for a certain period of time ( dip  method); and a method of spraying a rinse solution onto the  surface of a support (spray method).  The invention is hereunder described in more detail by  reference to the following Examples, but it should not be  construed that the invention is limited to these Examples.  In Examples, a compound represented by a chemical for› mula (1) is designated as "compound (1)", and the same  applies for compounds represented by other chemical formu› lae.  Example of Manufacturing of High-molecular Weight Com- pound  In Examples, to obtain a high-molecular weight compound  used as a base material component, compounds as monomers  represented by the following chemical formulae were used in  combination in a predetermined molar ratio and copolymer› ized through a known radical polymerization method.  EXAMPLES  US 9,235,123 B2  115  116  (21)  (11)  (01)  ~o  HN  (02)  (03) 