156  US 8,900,791 B2  155  TABLE 4-continued  KrF ne ative ex osure  (D)  (Al)  (A2)  Cross- (F)  (G)  (H)  Acid  Acid  (C)  linking  Basic  Surfactant  Solvent  generator  generator  Resin  agent  compound  (0.1  (mass  Sensitivity Resolving  Roughness Pattern  (0.3 g)  (0.1 g)  (10 g)  (3.0 g)  (0.02 g)  mass%)*  Ex. 21D  Al-15  P-3  CL-1  C-1  W-1  Ex. 22D  Al-16  P-3  CL-1  C-1  W-1  Ex. 23D  Al-17  P-3  CL-1  C-1  W-1  Ex. 24D  Al-18  P-3  CL-1  C-1  W-1  Ex. 25D  Al-19  P-3  CL-1  C-1  W-1  Comp. lD Comp.  P-1  CL-1  C-1  W-1  compound 1  Comp. 2D Comp.  P-1  CL-1  C-1  W-1  compound 2  Comp. 3D Comp.  P-3  CL-1  C-1  W-1  compound 3  Comp. 4D Comp.  P-3  CL-1  C-1  W-1  compound 4  ratio)  (mJ/cm 2 )  powery  (nm)  Al/Bl  21.0  6.2  10.2  (6/4)  Al/Bl  21.0  6.0  10.2  (6/4)  Al/Bl  21.0  6.2  10.0  (6/4)  Al/Bl  22.0  6.2  10.0  (6/4)  Al/Bl  22.0  6.2  11.0  (6/4)  Al/Bl  24.0  4.0  16.3  (6/4)  Al/Bl  24.0  4.2  16.3  (6/4)  Al/Bl  24.0  4.8  16.0  (6/4)  Al/Bl  24.0  4.8  16.1  (6/4)  profile  Rectangle  Rectangle  Rectangle  Rectangle  Rectangle  Taper  Taper  Taper  Taper  *based on the total solid content of the resist composition  The structure, molecular weight and molecular weight dis› tribution of each of the alkali-soluble resins (C) as well as the  crosslinking agents appearing in Table  4  will be shown below.  -continued  VP-5000 (produced by Nippon Soda Co., Ltd.)  OH  HO  OH  CL-1  CH2OMe  CH2OMe  I  I  /NYNYN’  MeOH2C  1  ’-"::::  CH2OMe  NIN  /N’-.  MeOH2C  CH2OMe  CL-2  CH2OMe  I  M~X~o  MeO  \  CH2OMe  CL-3  Mw  HO  Mw/Mn  OH  Mw  Mw/Mn  P-1  16000  2.30  OH  P-2  °’  12000  1.2  OH  P-3  6000  1.2  OH 