1111111111111111 IIIIII IIIII 1111111111 11111 11111 111111111111111 lllll 111111111111111 11111111  US 20210048748Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama et al.  c10)  Pub. No.: US 2021/0048748 Al  (43)  Pub. Date:  Feb. 18, 2021  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu-shi (JP);  Takayuki Fujiwara,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/934,259  (22)  Filed:  Jul. 21, 2020  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..........  G03F  710045  (2013.01);  G03F 7/2006  (2013.01);  G03F  710382  (2013.01);  G03F  710392  (2013.01)  G03F  71004  G03F  71039  G03F  71038  (2006.01)  (2006.01)  (2006.01)  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Aug. 14, 2019  (JP) ................................. 2019-148848  A resist composition comprising a base polymer and a  quencher in the form of an ammonium salt consisting of an  ammonium cation having an iodized aromatic ring bonded  to the nitrogen atom via a  C$_{1 }$-C$_{20 }$ hydrocarbylene group and  an anion derived from an iodized or brominated phenol  offers a high sensitivity and minimal LWR or improved  CDU, independent of whether it is of positive or negative  tone.  Publication Classification 