May 12, 2005  22  US 2005/0100814 Al  34.  The photoresist composition of claim 1, wherein the  polymer is derived from at least one ethylenically unsatur› ated compound containing a fluoroalcohol functional group  having the structure:  wherein  Rf  and  Rf’  are the same or different fluoroalkyl  groups of from 1 to about 10 carbon atoms or taken  together are (CF$_{2}$ )n wherein n is 2 to about 10.  *  *  *  *  *  -C(R,,)(R,,’)OH 