PEBtemp. Sensitivity Maximwn resolution  (" C.)  (mJ/cm 2 )  (nm)  Resist 1  90  15  18  Resist 2  85  16  18  Resist 3  85  17  17  Resist 4  85  17  17  Resist 5  85  15  16  Resist 6  90  15  17  Resist 7  90  15  17  Resist 8  90  15  17  Resist 9  90  15  17  Resist 10  90  15  17  Resist 11  90  15  17  Comparative Resist 1  90  15  20  Comparative Resist 2  90  15  18  LWR  (nm)  4.8  4.3  4.4  4.4  4.9  4.2  4.3  4.3  4.2  4.4  4.1  6.0  5.2  PEB temp. ( 0  C.)  Contamination thickness (nm)  ~~1  00  1.2  Comparative Resist 1  90  2.5  91  US 9,152,050 B2  92  Polymer  PAG  Quencher  Additive  Surfactant Solvent  (pbw)  (pbw)  (pbw)  (pbw)  (pbw)  (pbw)  Comparative Resist  Quencher  FC-4430  PGMEA(2,000)  Resist 1  Polymer 1  (1.123)  (0.001)  PGME(l,000)  (100)  CyH(3,000)  Comparative Resist  Quencher  Reference  FC-4430  PGMEA(2,000)  Resist 2  Polymer 1  (1.123)  Polymer 1 (0.001)  PGME(l,000)  (100)  (5.0)  CyH(3,000)  TABLE I-continued  TABLE2  TABLE3  Japanese Patent Application No. 2012-194753 is incorpo- rated herein by reference.  Although  some  preferred  embodiments  have  been  described, many modifications and variations may be made  thereto in light of the above teachings. It is therefore to be  understood that the invention may be practiced otherwise  than as specifically described without departing from the  scope of the appended claims.  The invention claimed is:  1.  A resist composition comprising:  2.  The resist composition of claim  1  which is a chemically  amplified positive resist composition.  3.  The resist composition of claim  1  wherein the polymer  comprising recurring units of at least one type selected from  wherein R $^{10 }$and R $^{12 }$are each independently hydrogen or  methyl, R $^{11 }$and R $^{13 }$each are an acid labile group, Y$^{1 }$is  a single bond, a C$_{1 }$-C$_{12 }$linking group having at least one  of ester, lactone ring, phenylene and napthylene, a phe› nylene group or a naphthylene group, Y $^{2 }$is a single bond,  ester group or amide group, subscripts al and a2 are  numbers in the range: 0sal>0.9, 0sa2s0.9, and 0<al+  a2<1.0, and  0.1 to 20 parts by weight of a polymer, as a polymeric  additive, comprising recurring units derived from a sty› rene  having  1,1,1,3,3,3-hexafluoro-2-propanol  and  recurring units ( q2) derived from a monomer selected  from a vinylnaphthalene, represented by the general for› mula (2):  wherein R 1  is hydrogen, hydroxyl, C$_{1}$-C$_{10 }$ straight,  branched or cyclic alkyl, alkoxy, acyloxy, cyano, nitro,  amino or halogen, m is 1 or 2, R 3  is hydrogen, C$_{1 }$-C$_{6 }$ straight, branched or cyclic alkyl, alkoxy, acyl, acyloxy,  alkoxycarbonyl, nitro, cyano, halogen, trifluoromethyl,  or carboxyl, w is an integer of 1 to 7, p and q2 are  numbers in the range: 0.3sp<l .0, 0<q2<1.0, and 0.5sp+  q2sl.0.  100 parts by weights of a polymer serving as a base resin  capable ofincreasing alkali solubility under the action of  acid and comprising recurring units of at least one type  selected from recurring units (al) and (a2) having a  carboxyl and/or phenolic hydroxyl group substituted  with an acid labile group, as represented by the general  formula (3), and recurring units having a phenolic  hydroxyl group and/or lactone ring as an adhesive group  and having a weight average molecular weight of 1,000  to 500,000,  PGMEA: propylene glycol monomethyl ether acetate  PGME: propylene glycol monomethyl ether  CyH: cyclohexanone  FC-4430: fluorochemical surfactant by 3M-Sumitomo Co., Ltd.  (3)  (2) 