1111111111111111 IIIIII IIIII 111111111111111 lllll lllll 111111111111111 111111111111111 11111111  US 20190243238Al  A photosensitive compound which can be suitably used for  a resist composition having superior sensitivity with respect  to light of short wavelength such as KrF and the like,  especially to extreme ultraviolet or electron beam, superior  resolution and depth of focus in lithography, and can sup› press LER (line edge roughness) in fine pattern, a resist  composition using the photosensitive compound, and a  manufacturing method of a device is provided. A photosen› sitive compound including a divalent Te atom is provided.  c19)  United States  c12)  Patent Application Publication  NAITO et al.  c10)  Pub. No.: US 2019/0243238 Al  (43)  Pub. Date:  Aug. 8, 2019  (54)  PHOTOSENSITIVE COMPOUND,  PHOTOACID GENERATOR AND RESIST  COMPOSITION CONTAINING THE  PHOTOSENSITIVE COMPOUND, AND  METHOD FOR MANUFACTURING DEVICE  USING THE RESIST COMPOSITION  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Publication Classification  (51)  Int. Cl.  (86)  PCT No.:  PCT/JP2017/045771  (72)  Inventors:  Michiya NAITO,  Chiba (JP);  Masamichi HAYAKAWA,  Chiba (JP);  Yoshiyuki UTSUMI,  Chiba (JP)  (71)  Applicant:  TOYO GOSEI CO., LTD.,  Chiba (JP)  (73)  Assignee:  TOYO GOSEI CO., LTD.,  Chiba (JP)  (21)  Appl. No.:  16/339,014  (22)  PCT Filed:  Dec. 20, 2017  (52)  U.S. Cl.  CPC ............  G03F 710045  (2013.01);  G03F 71039  (2013.01);  G03F 7/0048  (2013.01);  G03F  712004  (2013.01);  C07C 395/00  (2013.01);  G03F 712059  (2013.01)  G03F  71004  G03F  71039  G03F  7120  C07C 395/00  (2006.01)  (2006.01)  (2006.01)  (2006.01)  Dec. 21, 2016  (JP) ................................. 2016-248109  § 371 (c)(l),  (2) Date:  Apr. 3, 2019 