US 10,005,868 B2  81  82  -continued  (3)  wherein X 6  and X 7  represent a single bond,  ----C(=O)- O-R 15 -, or  ----C(=O)-NH-;  X 8  and X 9  represent  -C(=0)---0-R 15 -, where  R $^{15 }$represents a single bond  or a linear, branched or cyclic alkylene group having 1 to 10  carbon atoms; R$^{14 }$represents a cyano group, a nitro group,  a halogen atom, or a linear, branched, or cyclic alkyl group,  alkoxy group, acyl group, acyloxy group, or alkoxycarbonyl  group having 1 to 5 carbon atoms; R$^{13 }$may be the same or  different and represents a hydrogen atom or a methyl group;  Y$^{1 }$and Y$^{2 }$represent a methylene group or an ethylene group;  Z$^{1 }$represents a methylene group, an oxygen atom, or a sulfur  atom; "p" represents 1 or 2; "q" represents an integer ofO to  4; and bl to b8 satisfy Osbl <1.0, Osb2<1.0, Osb3<1.0,  Osb4<1.0, Osb5<1.0, Osb6<1.0, Osb7<1.0, Osb8<1.0, and  O<bl +b2+b3+b4+b5+b6+b7 +b8<1.0.  5.  The resist composition according to claim  2,  wherein  the polymer compound is further copolymerized with one or  more repeating units selected from repeating units cl to c5  shown by the following general formulae ( 4 ),  wherein R$^{16 }$to R$^{20 }$each represent a hydrogen atom, an alkyl  group having 1 to 30 carbon atoms, an alkyl group partially  or wholly substituted with a halogen atom, an alkoxy group,  an alkanoyl group, an alkoxycarbonyl group, an aryl group  having 6 to 10 carbon atoms, a halogen atom, or a 1,1,1,3,  3,3-hexafluoro-2-propanol group; Z $^{2 }$represents a methylene  group, an oxygen atom, or a sulfur atom; and cl to c5 satisfy  Osei <1.0, Osc2<1.0, Osc3<1.0, Osc4<1.0, Osc5<1.0, and  O<cl +c2+c3+c4+c5<1.0.  7.  The resist composition according to claim  1,  wherein  the polymer compound is further copolymerized with one or  more repeating units selected from repeating units dl to d3  each having a sulfonium salt, shown by the following  general formulae (5),  wherein R$^{16 }$to R$^{20 }$each represent a hydrogen atom, an alkyl  group having 1 to 30 carbon atoms, an alkyl group partially  or wholly substituted with a halogen atom, an alkoxy group,  an alkanoyl group, an alkoxycarbonyl group, an aryl group  having 6 to 10 carbon atoms, a halogen atom, or a 1,1,1,3,  3,3-hexafluoro-2-propanol group; Z $^{2 }$represents a methylene  group, an oxygen atom, or a sulfur atom; and cl to c5 satisfy  Osei <1.0, Osc2<1.0, Osc3<1.0, Osc4<1.0, Osc5<1.0, and  O<cl +c2+c3+c4+c5<1.0.  6. The resist composition according to claim  1,  wherein  the polymer compound is further copolymerized with one or  more repeating units selected from repeating units cl to c5  shown by the following general formulae ( 4),  0  ~  0  (4)  (4)  0  (5)  ~  R22  I  R23_ 8 +_R24  M-