US 20190113844Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama et al.  c10)  Pub. No.: US 2019/0113844 Al  (43)  Pub. Date:  Apr. 18, 2019  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu-shi (JP);  Masaki Ohashi,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/142,918  (22)  Filed:  Sep. 26, 2018  (52)  U.S. Cl.  CPC ..........  G03F  710045  (2013.01);  G03F  710392  (2013.01);  G03F  710382  (2013.01);  G03F  71162  (2013.01);  G03F  712004  (2013.01);  G03F  7138  (2013.01);  G03F  71322  (2013.01);  G03F  712006  (2013.01);  G03F  712037  (2013.01);  G03F  71168  (2013.01)  (51)  Int. Cl.  Publication Classification  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Oct. 13, 2017  (JP) ................................. 2017-199418  A resist composition comprising a base polymer and a  sulfonium salt of thiophenecarboxylic acid offers a  high  sensitivity, minimal LWR and improved CDU independent  of whether it is of positive or negative tone.  G03F  71004  G03F  71039  G03F  71038  G03F  7116  G03F  7138  G03F  7132  G03F  7120  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01) 