(IO)  Patent No.:  US 8,637,222 B2  (45)  Date of Patent:  Jan.28,2014  c12)  United States Patent  Tsuchihashi et al.  (54)  NEGATIVE RESIST PATTERN FORMING  METHOD, DEVELOPER AND NEGATIVE  CHEMICAL-AMPLIFICATION RESIST  COMPOSITION USED THEREFOR, AND  RESIST PATTERN  (75)  Inventors:  Toru Tsuchihashi,  Shizuoka (JP);  Tadateru Yatsuo,  Shizuoka (JP);  Koji  Shirakawa,  Shizuoka (JP);  Hideaki  Tsubaki,  Shizuoka (JP);  Akira Asano,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 35 days.  (21)  Appl. No.:  13/146,976  (22)  PCT Filed:  Jan.29,2010  (86)  PCT No.:  PCT  I  JP2010/051652  § 371 (c)(l),  (2), ( 4) Date:  Aug. 11, 2011  (87)  PCT Pub. No.:  WO2010/087516  (60)  Provisional application No. 61/148,517, filed on Jan.  30, 2009.  (51)  Int. Cl.  G03C 5100  (2006.01)  (52)  U.S. Cl.  USPC ........  430/296;  430/270.1; 430/311; 430/325;  430/330; 430/331; 430/942  ( 58)  Field of Classification Search  USPC .............. 430/270.1, 296,311,325,330,331,  430/942  See application file for complete search history.  16 Claims, No Drawings  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  (30)  Foreign Application Priority Data  (56)  References Cited  U.S. PATENT DOCUMENTS  Related U.S. Application Data  (65)  Prior Publication Data  2004/0039153 Al  2006/0079658 Al  2008/0131820 Al  2008/0182087 Al  2/2004 Eke et al.  4/2006 Kato et al.  6/2008 Van Steenwinckel et al.  7 /2008 Kato et al.  EP  EP  EP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  1 117 002 Al  1 186 624 Al  1 953 183 A2  62-175739  A  4-134350 A  6-112119 A  7-140674 A  7-199467 A  7-226358  A  7-261392  A  2000-321789  A  2000-321791 A  3277114 B2  2002-148806  A  2002-174908  A  2006-133757  A  2008-522206  A  2006-227174  A  2008-26667  A  2008-184571 A  2008-268935  A  2008-286877  A  2009-115835  A  7/2001  3/2002  8/2008  8/1987  5/1992  4/1994  6/1995  8/1995  8/1995  10/1995  11/2000  11/2000  2/2002  5/2002  6/2002  5/2006  6/2006  8/2006  2/2008  8/2008  11/2008  11/2008  5/2009  Jan.30,2009  Feb.20,2009  Mar. 31, 2009  (JP) ................................. 2009-020887  (JP) ................................. 2009-038665  (JP) ................................. 2009-088556  5,665,527 A  9/1997 Allen et al.  7,485,405 B2  *  2/2009 Kato et al. ................. 430/270.1  US00863 7222B2  PCT Pub. Date:  Aug. 5, 2010  US 2011/0287234 Al  Nov. 24, 2011  A resist pattern forming method including in the following  order, (1) a step of forming a film by using a negative chemi› cal-amplification resist composition capable of undergoing  negative conversion by a crosslinking reaction, (2) a step of  exposing the film, and (4) a step of developing the exposed  film by using a developer containing an organic solvent; a  developer and a negative chemical-amplification resist com› position used therefor; and a resist pattern formed by the  pattern forming method.  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  Primary Examiner  - Christopher Young  * cited by examiner  Office Action dated Nov. 26, 2013, issued by the Japanese Patent  Office, in counterpart Japanese Application No. 2010-017489.  Extended European Search Report dated Oct. 29, 2012 in European  Application No. 10735970.5.  Search Report from the International Searching Authority, dated Mar.  2, 2010, issued in Application No. PCT/JP2010/051652, English.  Written Opinion from the International Searching Authority, dated  Mar. 2, 2010, issued in Application No. PCT/JP2010/051652,  English. 