(51)  Int. Cl.  (56)  References Cited  U.S. PATENT DOCUMENTS  OTHER PUBLICATIONS  C0SF  12122  (2006.01)  C0SF  12130  (2006.01)  C0SF  12132  (2006.01)  G03F  71039  (2006.01)  C09D  125118  (2006.01)  JP  2009-211051 A  9/2009  JP  2010-77404 A  4/2010  WO  WO 2006121096 Al * 11/2006  Wang, et al. New Anionic Photoacid Generator Bound Polymer  Resists for EUV Lithography, Oct. 18, 2007, ACS Macromolecules  2007, 40, 8220-8224.*  Lee et al. "Photosensitivity and line-edge roughness of novel poly› mer-bound PAG photoresist" Feb. 25, 2007. Proc. of Spie. vol. 6519,  p. 65191E-l.*  Machine translation JP 10-221852. Aug. 21, 1998.*  Wang, Mingxing et al., "Synthesis and Properties of New Anionic  Photoacid Generators Bound Polymer Resists for e-beam and EUV  lithography", Proc. of SPIE vol. 6923, 692312, 2008, 7 pages.  Written Opinion (PCT/ISA/237) dated Oct. 6, 2009, in PCT/JP2009/  065286.  International Search Report (PCT/ISA/210) dated Oct. 6, 2009, in  PCT/JP2009/065286.  Extended European Search Report dated Oct. 12, 2012 in European  Application No. 09811498.6.  Wang, Mingxing et al, "Novel Anionic Photoacid Generator (PAGs)  and Photoresist for sub-50 nm Patterning by EUVL and EBL", Proc.  ofSPIE, vol. 6519, Jan. 1, 2007, pp. 65191F-l to 65191F-6.  Office Action dated Feb. 5, 2013 in Japanese Application No. 2009- 145677.  Office Action dated Sep. 3, 2013, issued by the Japanese Patent Office  in corresponding JP Application No. 2009-145677.  Office Action dated Apr. 22, 2014, issued by the Japanese Patent  Office in counterpart Japanese Application No. 2009-145677.  Office Action dated Nov. 11, 2014 issued by the Japanese Patent  Office in counterpart Japanese Patent Application No. 2009-145677.  * cited by examiner  FOREIGN PATENT DOCUMENTS  EP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  2 112 554 A2  2-302758  A  4-230645  A  9-325497  A  10-221852  A  2006-178317 A  2006-259509  A  2008-133448  A  2009-145714 A  2009-155304  A  2009-169406  A  2009-211050  A  10/2009  12/1990  8/1992  12/1997  8/1998  7/2006  9/2006  6/2008  7/2009  7/2009  7/2009  9/2009  2003/0134225  Al*  7/2003 Fujimori et al. ........... 430/270.1  2005/0221224  Al*  10/2005 Mizutani .................... 430/270.1  2007/0117043  Al*  5/2007 Gonsalves ................. 430/270.1  2007/0149702  Al*  6/2007 Ando et al.  524/556  2008/0102407  Al*  5/2008 Ohsawaet al. ............ 430/286.1  2009/0069521 Al*  3/2009 Nagai et al.  526/243  2009/0202940 Al  8/2009 Hatakeyama et al.  2009/0202947 Al  8/2009 Hatakeyama et al.  2010/0055608 Al  3/2010 Ohashi et al.  US 9,217,919 B2  Page 2 