US 2020/0050104 Al  126  Feb. 13, 2020  [0165]  Resist compositions were prepared by dissolving  components in a solvent in accordance with the recipe  shown in Tables 1 to 3, and filtering through a filter having  a pore size of 0.2  µm. The solvent contained 100 ppm of  surfactant FC-4430 (3M). The components in Tables 1 to 3  are as identified below.  Base polymers: Polymers 1 to 3 of the above structural  formulae  Organic Solvents:  [0166]  PGMEA (propylene glycol monomethyl ether  acetate)  [0167]  CyH (cyclohexanone)  [0168]  PGME (propylene glycol monomethyl ether)  Acid generators: PAG 1 to PAG 4 of the following structural  formulae  Examples 1 to 27 and Comparative Examples 1 to  7  Preparation of Resist Compositions  OH  -continued  Polymer 3  -continued  PAG3  ~I  -t-0-s -0-o)-cc,  -03S-CF2  Mw ~S,100  Mw/Mn~ 1.65  PAG4  Comparative Quenchers 1 to 5:  [0169]  Comparative Quencher 1  I\  0  N  ~  \__J  \_o  Comparative Quencher 2  Comparative Quencher 4  Comparative Quencher 3  &Sq-<  OH  PAG2  PAGl 