c12)  United States Patent  Takizawa et al.  (54)  PATTERN FORMING METHOD, ACTINIC  RAY-SENSITIVE OR RADIATION-SENSITIVE  RESIN COMPOSITION, RESIST FILM,  MANUFACTURING METHOD OF  ELECTRONIC DEVICE USING THE SAME  AND ELECTRONIC DEVICE  (IO)  Patent No.:  US 9,557,643 B2  Jan.31,2017  (45)  Date of Patent:  (71)  Applicant:  FUJIFILM Corporation,  Minato-ku,  Tokyo (JP)  (72)  Inventors:  Hiroo Takizawa,  Shizuoka (JP);  Tomotaka Tsuchimura,  Shizuoka (JP);  Takeshi Kawabata,  Shizuoka (JP);  Takuya Tsuruta,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 160 days.  (21)  Appl. No.:  14/451,901  (22)  Filed:  Aug. 5, 2014  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ...........  G03F  710388  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  71038  (2013.01);  G03F  710397  (2013.01);  G03F  7120  (2013.01);  G03F  712002  (2013.01);  G03F  71325  (2013.01)  ( 58)  Field of Classification Search  CPC .... G03F 7/0045; G03F 7/0046; G03F 7/0397;  G03F 7/2002; G03F 7/038; G03F 7/0388;  G03F 7/20; G03F 7/325; G03F 7/0382  USPC .... 430/18, 270.1, 286.1, 296, 311, 319, 325  See application file for complete search history.  (63)  Continuation  of  application  No.  PCT/JP2013/052969, filed on Feb. 4, 2013.  US 2014/0349224 Al  Nov. 27, 2014  Feb. 6, 2012  (JP) ................................. 2012-023386  Search Report dated Mar. 5, 2013, issued by the International  Searching Authority in counterpart International Application No.  PCT/JP2013/052969.  Written Opinion dated Mar. 5, 2013, issued by the International  Searching Authority in counterpart International Application No.  PCT/JP2013/052969.  Office Action dated May 19, 2015, issued by the Japanese Patent  Office in counterpart Japanese Application No. 2012-023386.  Office Action issued on Apr. 26, 2016, by the Taiwanese Patent  Office in counterpart Taiwanese Application No. 102104643.  Office Action dated Mar. 7, 2016, issued by the Korean Intellectual  Property Office in corresponding Korean Application No. 10-2014- 7022075.  Office Action dated Aug. 15, 2016, issued by the Taiwanese Patent  Office in counterpart Taiwanese Application No. 102104643.  Office Action dated Aug. 23, 2016 issued by the Korean Intellectual  Property Office in corresponding Korean Application No. 10-2014- 7022075.  Office Action dated Oct. 17, 2016 issued by the Korean Intellectual  Property Office in counterpart Korean Patent Application No.  10-2014-7022075.  Primary Examiner  - John A McPherson  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  There is provided a pattern forming method comprising (1)  a step of forming a film by using an actinic ray-sensitive or  radiation-sensitive resin composition containing (A) a resin  containing an acid-decomposable repeating unit and being  capable of decreasing the solubility for an organic solvent› containing developer by the action of an acid, (B) a com› pound capable of generating an acid upon irradiation with an  actinic ray or radiation, (C) a compound capable of decom› posing by the action of an acid to generate an acid, and (D)  a solvent; (2) a step of exposing the film by using an actinic  ray or radiation, and (4) a step of developing the exposed  film by using an organic solvent-containing developer to  form a negative pattern.  (30)  Foreign Application Priority Data  Related U.S. Application Data  (65)  Prior Publication Data  (56)  References Cited  U.S. PATENT DOCUMENTS  (57)  ABSTRACT  14 Claims, No Drawings  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  G03F  71038  G03F  71004  G03F  71039  G03F  7132  G03F  7120  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  2002/0068236 Al  2002/0068237 Al  6/2002 Imai  6/2002 Imai  JP  JP  JP  JP  JP  JP  JP  JP  JP  KR  KR  WO  WO  2002-122987 A  2005-157247 A  2009-025707 A  2009-075428 A  2010-217884 A  2011-033729 A  2011-209520 A  2011-219742 A  2011-221509 A  10-2004-0004404 A  10-2011-0107294 A  2009/022681 Al  2011/162408 Al  4/2002  6/2005  2/2009  4/2009  9/2010  2/2011  10/2011  11/2011  11/2011  1/2004  9/2011  2/2009  12/2011  2011/0183258 Al  2011/0236831 Al  2011/0300485 Al  2013/0011785 Al  2013/0122427 Al  7/2011  Takahashi et al.  9/2011  Hasegawa et al.  12/2011 Tsubaki et al.  1/2013 Kato et al.  5/2013 Kataoka et al. 