259  US 9,291,896 B2  260  the resolution is excellent, the PEB temperature dependency  is low, the pattern profile is rectangular and the sensitivity and  etching resistance are high, a resist film using the same, a  pattern forming method, a manufacturing method of an elec› tronic device, and an electronic device can be provided.  This application is based on a Japanese patent application  filed on Jul. 27, 2012 (Japanese Patent Application No. 2012- 167816), and Japanese patent application filed on Mar. 15,  2013 (Japanese Patent Application No. 2013-054403), and  the contents thereof are incorporated herein by reference.  The invention claimed is:  1.  An actinic ray-sensitive or radiation-sensitive resin com› position comprising:  a solvent:  R$_{2 }$ represents an alkyl group or a cycloalkyl group, and  R$_{3 }$ represents a hydrogen atom or an alkyl group;  R$_{22 }$may combine withAr $_{2 }$to form a ring and in this case,  R$_{22 }$represents a single bond or an alkylene group,  L$_{2 }$ represents a single bond or an alkylene group,  n represents an integer of 1 to 4.  2.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  3.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  wherein in formula (1 ), R$_{3 }$ is a hydrogen atom.  4.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  5.  The actinic ray-sensitive or radiation-sensitive resin  composition as claimed in claim  1,  a compound capable of generating an acid upon irradiation  with an actinic ray or radiation,  a resin (P) containing a repeating unit represented by the  following formula (1) and a repeating unit represented  by the following formula (A), and  wherein each of R’ and Li independently represents a  hydrogen atom, an alkyl group, a cycloalkyl group, a  halogen atom, a cyano group or an alkoxycarbonyl  group, Li may combine with L to form a ring and in this  case, Li represents a single bond, an alkylene group or a  carbonyl group,  L represents a single bond or a divalent linking group, and  in the case of forming a ring together with Li, L repre› sents a trivalent linking group,  each of Ria, Ri$_{6 }$and Ric independently represents an alkyl  group, a cycloalkyl group, an aryl group, an aralkyl  group or a heterocyclic group,  at least two of Ria, Ri$_{6 }$ and Ric may combine with each  other to form a ring, or at least one of Ria, Ri$_{6 }$ and Ric  may combine with R$_{2 }$ to form a ring,  wherein each ofR$_{21}$, R$_{22 }$and R$_{23 }$independently represents 65  a hydrogen atom, an alkyl group, a halogen atom, a  cyano group or an alkoxycarbonyl group, provided that  X$_{2 }$ represents a single bond, -COO- or ----CONR$_{30}$ -,  wherein R$_{30 }$ represents a hydrogen atom or an alkyl  group,  Ar$_{2 }$ represents an (n+l)-valent aromatic ring group and in  the case of combining with R$_{22 }$ to form a ring, Ar$_{2 }$ represents an (n+2)-valent aromatic ring group, and  wherein in formula (1), each of Ria, Ri$_{6 }$ and Ric is inde› pendently an alkyl group or a cycloalkyl group.  wherein in formula (1), L is a single bond, a divalent  aromatic group, a divalent group having a norbornylene  group, or a divalent group having an adamantylene  group.  wherein the repeating unit represented by formula (1) is a  repeating unit represented by any one of the following  formulae (1-1) to (1-4):  (1)  (A)  R21  R23  I  I  ---t- c-c-,- 1  I  R22 X2  I  L2  I  Ar2  I  (OH)n  (1-1)  (1-2)  R3  Oto......_  R1c  Ria R1b  (1-3)  R2 