US 9,829,796 B2  292  291  20.  The pattern formation method according to claim  19,  21.  The pattern formation method according to claim  17,  22.  The pattern formation method according to claim  17,  23.  The pattern formation method according to claim  22,  24.  The pattern formation method according to claim  17,  25.  The pattern formation method according to claim  17,  26.  The pattern formation method according to claim  17,  27.  The pattern formation method according to claim  26,  28.  The pattern formation method according to claim  17,  29.  A production method for an electronic device, com› prising:  30.  An active light-sensitive or radiation-sensitive resin  composition comprising a resin (A) having a repeating unit  represented by General Formula (I), a repeating unit repre- sented by any one of General Formulas (II) to (IV), and a  repeating unit represented by General Formula (V),  the pattern formation method according to claim  17.  wherein an electron beam or extreme ultraviolet rays are  used as the active light or the radiation.  wherein the compound (B) that generates an acid by  active light or radiation is a compound that generates an  acid having a volume of 240 Angstroms 3  or greater.  wherein the active light-sensitive or radiation-sensitive  resin composition further includes a compound (B) that  generates an acid by active light or radiation.  wherein the content of the repeating unit represented by  General Formula (I) is 10 mo!  %  to 40 mo!  %  with  respect to the entirety of repeating units in the resin (A).  wherein the bond between X$_{4 }$ and L$_{4 }$ in General Formula  (I) is a single bond.  wherein, in General Formula (II-2), each ofR$_{8}$ $^{i, R}$82, and  Rg$_{83 }$ independently represents an alkyl group, an alk› enyl group, a cycloalkyl group, or an aryl group; n81  represents  O  or 1; and at least two of R$_{81 }$ to R$_{83 }$may be  connected to each other to form a ring.  wherein, in General Formula (I), each ofR$_{41}$, R 42 , and R 43  independently represents a hydrogen atom, an alkyl  group, a halogen atom, a cyano group, or an alkoxy› carbonyl group; here, R$_{42 }$may be bonded to Ar$_{4 }$ to form  a ring, and R$_{42 }$in this case represents a single bond or  an alkylene group; X$_{4 }$ represents a single bond,  --COO-, or -CONR$_{44}$-, and, in the case of form› ing a ring with R$_{42}$ , represents a trivalent connecting  group; R$_{44 }$ represents a hydrogen atom or an alkyl  group; L$_{4 }$ represents a single bond or an alkylene  group; Ar$_{4 }$ represents an (n+l) valent aromatic ring  group, and, in the case of being bonded to R$_{42 }$to form  a ring, represents an (n+2) valent aromatic ring group;  and n represents an integer of 1 to 4,  wherein B$_{8 }$ in General Formula (V) is a group which has  a phenol structure having a hydroxymethyl group or an  alkoxymethyl group (here, the hydroxymethyl group is  not directly bonded to a nitrogen atom, and the  alkoxymethyl group is not directly bonded to a nitrogen  atom).  wherein the content of the repeating unit represented by  General Formula (V) is 1 mo!  %  to 20 mo!  %  with  respect to the entirety of repeating units in the resin (A).  wherein R$_{3 }$ in General Formula (II’) is a group having 2 15  or more carbon atoms.  wherein R$_{3 }$ in General Formula (II’) is a group represented  by the following General Formula (II-2), and  (I)  ~I ~3  I  I  -t-C -C-t- I  I  ~2  Xi  I  L4  I  Ar4  I  (OH)n  (11-2)  (II)  (III)  (IV)  wherein, in Formula (II), each of R$_{61}$, R 62 , and R 63  independently represents a hydrogen atom, an alkyl  group, a cycloalkyl group, a halogen atom, a cyano  group, or an alkoxycarbonyl group; here, R$_{62 }$ may be  bonded to Ar  6  to form a ring, and R$_{62 }$ in this case  represents a single bond or an alkylene group; X$_{6 }$ represents a single bond, -COO-, or ----CONR$_{64}$-;  R$_{64 }$represents a hydrogen atom or an alkyl group; L$_{6 }$ represents a single bond or an alkylene group; Ar$_{6 }$