c12)  United States Patent  Kawabata et al.  (IO)  Patent No.:  US 8,962,233 B2  (45)  Date of Patent:  Feb.24,2015  (54)  ACTINIC-RAY-OR RADIATION-SENSITIVE  RESIN COMPOSITION AND METHOD OF  FORMING PATTERN USING THE  COMPOSITION  (75)  Inventors:  Takeshi Kawabata,  Haibara-gun (JP);  Tomotaka Tsuchimura,  Haibara-gun  (JP);  Takayuki Ito,  Haibara-gun (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by 250 days.  (21)  Appl. No.:  13/015,874  (22)  Filed:  Jan.28,2011  (51)  Int. Cl.  (52)  U.S. Cl.  USPC ........  430/270.1;  430/311; 430/325; 430/326;  430/905; 430/910; 430/919; 430/921; 430/925;  430/942; 430/966; 562/30; 562/45; 562/74;  562/79; 562/82; 562/91; 562/100; 564/82;  564/96  ( 58)  Field of Classification Search  None  See application file for complete search history.  FOREIGN PATENT DOCUMENTS  OTHER PUBLICATIONS  (57)  ABSTRACT  21 Claims, No Drawings  (56)  References Cited  U.S. PATENT DOCUMENTS  (30)  Foreign Application Priority Data  (65)  Prior Publication Data  G03F  71004  G03F  71039  G03F  71038  G03F  7120  G03F  7130  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  6,548,221 B2  7,026,098 B2  7,541,131 B2  4/2003 Uetani et al.  4/2006 Komatsu et al.  6/2009 Kawanishi  2005/0008864 Al  2005/0233245 Al  2007 /0037091 Al  2008/0187860 Al *  2008/0248421 Al*  2010/0167207 Al  2011/0076615 Al*  1/2005 Ingen Schenau et al.  10/2005 Koitabashi et al.  2/2007 Koitabashi et al.  8/2008 Tsubaki et al. ............ 430/270.1  10/2008 Fukuhara et al. .......... 430/281.1  7/2010 Tanaka et al.  3/2011 Kawabata et al. ......... 430/270.1  EP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  1 480 078 Al  11-030856  A  2004-157158 A  2004-158287  A  2005-326833  A  2006-251551  A  2006-276760  A  2006-350212  A  2007-094356  A  2007-206639  A  2008-076559  A  2008-162101 A  2010-170094 A  11/2004  2/1999  6/2004  6/2004  11/2005  9/2006  10/2006  12/2006  4/2007  8/2007  4/2008  7/2008  8/2010  According to one embodiment, an actinic-ray- or radiation› sensitive resin composition includes an arylsulfonium salt  that when exposed to actinic rays or radiation, generates an  acid, the arylsulfonium salt containing at least one aryl ring  on which there are a total of one or more electron donating  groups, the acid generated upon exposure to actinic rays or  radiation having a volume of 240  A $^{3 }$or greater.  Primary Examiner  - Sin J. Lee  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  * cited by examiner  JPO English abstract for JPl 1-30856 (Feb. 1999).*  Machine-assisted English translation of JP 11-30856, provided by  JPO (Feb. 1999).*  Edited by Hirai,  Y., Fundamentals of nano imprint and its technology  development/application deployment-technology of nanoimprint  substrate and its latest technology deployment-Science and New  Technology in Nanoprint, Jun. 2006, Frontier Publishing.  Japanese Office Action dated Apr. 15, 2014 issued in application No.  2010-019284.  Japanese Office Action issued in application No.2010-019284 dated  Sep.17,2013.  US008962233B2  US 2011/0189609 Al  Aug. 4, 2011  Jan. 29, 2010  (JP) ................................. 2010-019284 