Jul. 4, 2019  57  US 2019/0204738 Al  (ca-5-3)  -continued  (dl-1)  (Mm(–))l/m  Rd 2 -so;=’  (dl-2)  (dl-3)  [0510]  Among these, as the group as Rd1, an aromatic  hydrocarbon group which may have a substituent, an ali› phatic cyclic group which may have a substituent and a  chain-like alkyl group which may have a substituent are  preferable. Examples of the substituent for these groups  include a hydroxyl group, an oxo group, an alkyl group, an  [0509]  In Formula (dl-1), Rd 1  represents a cyclic group  which may have a substituent, a chain-like alkyl group  which may have a substituent or a chain-like alkenyl group  which may have a substituent, and examples thereof are the  same as those described above as R$^{101 }$in Formula (b-1).  [0508]  Anion Moiety  [0507]  {  Component ( dl-1)}  [0506]  [In the formulae, Rd 1  to Rd 4  represent a cyclic  group which may have a substituent, a chain-like alkyl group  which may have a substituent or a chain-like alkenyl group  which may have a substituent, provided that, the carbon  atom adjacent to the sulfur atom in the Rd 2  in Formula  (dl-2) has no fluorine atom bonded thereto; Yd 1  represents  a single bond or a divalent linking group; m represents an  integer of 1 or greater; and each  Mm+  independently repre› sents an m-valent organic cation.]  [0504]  The component (Dl) is not particularly limited as  long as decomposition is made upon exposure so that the  acid diffusion controllability is lost, and one or more com› pounds selected from the group consisting of a compound  represented by Formula (dl-1) (hereinafter, referred to as a  "component (dl-1)"), a compound represented by Formula  [0503]  In a case where a resist composition containing the  component (Dl) is obtained, the contrast between exposed  portions and unexposed portions of the resist film can be  improved at the time of formation of a resist pattern.  [0502]  In Regard to Component (Dl)  [0501]  The component (D) may be a photodecomposable  base (Dl) (hereinafter, referred to as "component (Dl)")  which is decomposed upon exposure and then loses the acid  diffusion controllability or a nitrogen-containing organic  compound (D2) (hereinafter, referred to as "component  (D2)") which does not correspond to the component (Dl).  [0500]  The resist composition of the present embodiment  may further contain an acid diffusion control agent compo› nent (hereinafter, referred to as a "component (D)") in  addition to the component (A) or the component (A) and the  component (B). The component (D) acts as a quencher (an  acid diffusion control agent) which traps the acid generated  in the resist composition upon exposure.  [0499]  <<Acid Diffusion Control Agent Component  (D)»  [0498]  In a case where the content of the component (B)  is in the above-described range, pattern formation can be  satisfactorily performed. Further, it is preferable that the  content thereof is in the above-described range because a  uniform solution is easily obtained at the time of dissolving  each component of the resist composition in an organic  solvent, and the storage stability of the resist composition  becomes excellent.  [0497]  In a case where the resist composition contains the  component (B), the content of the component (B) is pref› erably in a range of 5 to 50 parts by mass, more preferably  in a range of 10 to 40 parts by mass, and still more preferably  in a range of 10 to 30 parts by mass with respect to 100 parts  by mass of the component (A).  [0496]  In the component (B), the above-described acid  generator may be used alone or in combination of two or  more kinds thereof.  [0495]  Among the examples, as the cation moiety [(Mm+)  $_{11}$ml, a cation represented by Formula (ca-1) is preferable,  and a cation represented by any of Formulae (ca-1-1) to  (ca-1-72) is more preferable.  (dl-2) (hereinafter, referred to as "component (dl-2)"), and  a compound represented by Formula (dl-3) (hereinafter,  referred to as "component (dl-3)") are preferable.  [0505]  At exposed portions of the resist film, the compo› nents (dl-1) to (dl-3) are decomposed and then lose the acid  diffusion controllability (basicity), and therefore the com› ponents (dl-1) to (dl-3) cannot act as a quencher, whereas  at unexposed portions, the components (dl-1) to (dl-3) acts  as a quencher. 