US009551933B2  c12)  United States Patent  Takizawa et al.  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, RESIST FILM, USING THE  SAME, PATTERN FORMING METHOD,  MANUFACTURING METHOD OF  ELECTRONIC DEVICE, AND ELECTRONIC  DEVICE  (IO)  Patent No.:  US 9,551,933 B2  (45)  Date of Patent:  *Jan. 24, 2017  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Hiroo Takizawa,  Shizuoka (JP);  Shuji  Hirano,  Shizuoka (JP);  Natsumi  Yokokawa,  Shizuoka (JP);  Wataru  Nihashi,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  This patent is subject to a terminal dis› claimer.  (21)  Appl. No.:  14/605,631  Jan. 26, 2015  (22)  Filed:  (63)  Continuation  of  application  PCT/JP2013/070833, filed on Jul. 25, 2013.  No.  (30)  Foreign Application Priority Data  (51)  Int. Cl.  (52)  U.S. Cl.  CPC .............  G03F  710388  (2013.01);  C08F  12120  (2013.01);  C08F  12122  (2013.01);  C08F  12124  (2013.01);  C08F  12130  (2013.01);  C08F  12132  (2013.01);  C08F  212114  (2013.01);  C08F  220128  (2013.01);  C09D  125118  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  7111  (2013.01);  G03F  712002  (58)  Field of Classification Search  None  See application file for complete search history.  (2013.01);  G03F  712037  (2013.01);  G03F  712041  (2013.01);  G03F  7130  (2013.01);  G03F  71325  (2013.01);  C08F 2220/281  (2013.01)  (56)  References Cited  U.S. PATENT DOCUMENTS  FOREIGN PATENT DOCUMENTS  (65)  Prior Publication Data  Related U.S. Application Data  OTHER PUBLICATIONS  (57)  ABSTRACT  Jul. 27, 2012  Mar. 15, 2013  (JP) ................................. 2012-167814  (JP) ................................. 2013-054400  G03F  71039  G03F  7132  C08F  12122  C08F  12124  G03F  71038  C08F  212114  C08F  220128  G03F  7120  G03F  7130  C08F  12120  C08F  12130  C08F  12132  C09D  125118  G03F  7111  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  JP  JP  08101507 A  200029215 A  4/1996  1/2000  24 Claims, No Drawings  There is provided an actJmc ray-sens1t1ve or radiation› sensitive resin composition comprising: (A) a resin contain› ing a repeating unit represented by the first specific formula  and a repeating unit represented by the second specific  formula, wherein the content of the repeating unit repre› sented by the first specific formula is 35 mo! % or more  based on all repeating units in the resin (A), a resist film  formed using the actinic ray-sensitive or radiation-sensitive  resin composition.  Primary Examiner  - Martin Angebranndt  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  (Continued)  Machine translation of JP 2007-086284 (Apr. 2007).*  Machine translation of JP 2010-217-884 (2010).*  Dewent abstract for JP 2001337452 (2001).*  Conununication from the Japanese Patent Office dated May 19,  2015 in counterpart Japanese Application No. 2013-054400.  (Continued)  (Continued)  6,090,526 A  7/2000 Kumar  6,824,948 Bl *  11/2004 Aoai ....................... G03F 7/038  430/170  9,291,896 B2 *  3/2016 Hirano ...................... G03F7/30  9,291,897 B2 *  3/2016 Hirano .................. G03F 7/0388  9,291,898 B2 *  3/2016 Yokokawa ............ G03F 7/0002  2004/0023153 Al *  2/2004 Takeda .................. G03F 7/0392  430/270.1  2006/0134549 Al*  6/2006 Moon . .................. G03F 7/0392  430/270.1  2007/0160927 Al*  7/2007 Murakami ........ H0lL 21/32139  430/270.1  2011/0300485 Al  12/2011 Tsubaki et al.  2012/0076997 Al  3/2012 Hirano et al.  2012/0082939 Al  4/2012 Kawabata et al.  2015/0132687 Al *  5/2015 Hirano .................. G03F 7/0388  430/18  2015/0132688 Al *  5/2015 Yokokawa ............ G03F 7/0002  430/18  US 2015/0140484 Al  May 21, 2015 