US 9,829,796 B2  290  289  wherein the bond between X$_{4 }$ and L$_{4 }$ in General Formula  (I) is a single bond.  wherein the content of the repeating unit represented by  General Formula (I) is 10 mo!  %  to 40 mo!  %  with  respect to the entirety of repeating units in the resin (A).  includes a compound (B) that generates an acid by active  light or radiation.  wherein the compound (B) that generates an acid by  active light or radiation is a compound that generates an  acid having a volume of 240 Angstroms 3  or greater.  wherein an electron beam or extreme ultraviolet rays are  used as the active light or the radiation.  (1) forming a film using an active light-sensitive or  radiation-sensitive resin composition;  wherein the active light-sensitive or radiation-sensitive  resin composition contains a resin (A) having a repeat› ing unit represented by General Formula  (I), a repeating  unit represented by General Formula (II’), and a repeat› ing unit represented by General Formula (V),  (3) developing the exposed film using a developer includ› ing an organic solvent,  11.  The pattern formation method according to claim  1,  12.  The pattern formation method according to claim  1,  13.  The pattern formation method according to claim  1,  14.  The pattern formation method according to claim  13,  15.  The pattern formation method according to claim  1,  16.  A production method for an electronic device, com- prising:  17.  A pattern formation method, comprising:  the pattern formation method according to claim  1.  (2) exposing the film to active light or radiation; and  wherein, in Formula (II’), each of R$_{6}$ i, $^{R}$62, and R 63  independently represents a hydrogen atom, an alkyl  group, a cycloalkyl group, a halogen atom, a cyano  group, or an alkoxycarbonyl group; here, R$_{62 }$ may be  bonded to Ar  6  to form a ring, and R$_{62 }$ in this case  represents a single bond or an alkylene group; X$_{6 }$ represents a single bond, -COO-, or ----CONR$_{64}$-;  R$_{64 }$represents a hydrogen atom or an alkyl group; L$_{6 }$ represents a single bond or an alkylene group; Ar$_{6 }$ represents a divalent aromatic ring group, and, in the  case of being bonded to R$_{62 }$to form a ring, represents  a trivalent aromatic ring group; R$_{3 }$ represents a hydro› gen atom, an alkyl group, a cycloalkyl group, an aryl  group, an aralkyl group, an alkoxy group, an acyl  group, or a heterocyclic group; M$_{3 }$ represents a single  bond or a divalent connecting group; Q$_{3 }$ represents an  alkyl group, a cycloalkyl group, an aryl group, or a  heterocyclic group; and at least two of Q$_{3}$ , M$_{3}$, and R$_{3 }$ may be bonded to each other to form a ring; and  wherein, in Formula (V), each of Rg$_{1}$ ,  Rg$_{2}$ ,  and Rg$_{3 }$ independently represents a hydrogen atom, an alkyl  group, a cycloalkyl group, a halogen atom, a cyano  group, or an alkoxycarbonyl group; here, Rg$_{2 }$ may be  bonded to Lg to form a ring, and Rg$_{2 }$ in this case  represents a single bond or an alkylene group; Xg  represents a single bond or a divalent connecting group;  Lg represents a single bond or an (s+l) valent connect› ing group, and in the case of being bonded to Rg$_{2 }$ to  form a ring, represents an (s+2) valent connecting  group; s represents an integer of 1 to 5; here, in a case  where Lg is a single bond, s is 1; and Bg represents a  group containing a cross-linking group.  wherein a cross-linking group included in Bg in General  Formula  (V) is a hydroxymethyl group, an alkoxym› ethyl group, an oxirane ring, or an oxetane ring.  wherein Bg in General Formula (V) is a group which has  a phenol structure, a urea structure, or a melamine  structure, having a hydroxymethyl group  or an  alkoxymethyl group.  19.  The pattern formation method according to claim  17,  18.  The pattern formation method according to claim  17,  wherein, in General Formula (I), each ofR$_{41}$, R 42 , and R 43  independently represents a hydrogen atom, an alkyl  group, a halogen atom, a cyano group, or an alkoxy- carbonyl group;  here, R$_{42 }$may be bonded to Ar$_{4 }$ to form a ring, and R$_{42 }$in  this case represents a single bond or an alkylene group;  X$_{4 }$ represents  a  single  bond,  --COO-,  or  ----CONR$_{44}$ -,  and, in the case of forming a ring with  R$_{42}$, represents a trivalent connecting group; R$_{44 }$rep› resents a hydrogen atom or an alkyl group; L$_{4 }$ repre› sents a single bond or an alkylene group; Ar$_{4 }$ represents  an (n+l) valent aromatic ring group, and, in the case of  being bonded to R$_{42 }$to form a ring, represents an (n+2) 65  valent aromatic ring group; and n represents an integer  of 1 to 4,  (I) (V)  Rs1  Rs3  I  I  +c-c+  I  I  Rs2 Xs  I  Ls  I  (Bs),  (II’) 