Oct. 8, 2020  77  US 2020/0319551 Al  [0713]  From the results shown in the table, it was con› firmed that in a case where the value of n in the repeating  unit A was 2 or greater, the pattern collapse during pattern  formation could be further suppressed (Comparison of  Examples 1, 5, 11, and 12 vs. others Examples).  [0714]  It  was confirmed that in a case where  J  in the  repeating unit A was an alicyclic group, the pattern collapse  during pattern formation could be further suppressed ( com› parison of Examples 2, 7, 8, and 13 vs. Examples 3, 4, 6, 9,  10, 14, and 15 (comparison between Examples in which the  value of n in the repeating unit A was 2 or greater).  Comparison of Example 5 vs. Examples 1, 11, and 12  ( comparison between Examples in which the value of n in  repeating unit A was 1).  [0715]  It  was confirmed that in a case where the resin X  has a repeating unit represented by General Formula (II-1)  or (II-2), the sensitivity of the resist film was more excellent  (comparison of Examples 2, 6,  11, and 13 vs. other  Examples).  [0716]  It  was confirmed that in a case where the total  content of the repeating units A to C in the resin X with  respect to the total mass of the resin X was more than 90%  by mass, the sensitivity of the resist film was more excellent  (comparison of Examples 3 to 5, 14, and 15 vs. other  Examples).  [0717]  It  was confirmed that in a case where the dispersity  of the resin X was 1.0 to 1.5, pattern collapse during pattern  formation could be further suppressed ( comparison of  Examples 1, 11, and 12 vs. other Examples).  [0718]  It  was confirmed that in a case where the com› pound Y generates an acid with a pka of 1.00 to 4.50 upon  irradiation with actinic rays or radiation, the LER perfor› mance of the obtained pattern was more excellent (compari› son of Examples 2 to 12, and 14 vs. other Examples).  [0719]  It  was confirmed that in a case where the difference  between the pka of an acid generated by the compound Y  and the pka of an acid generated by the photoacid generator  Z  was 3 .00 or greater, the LER performance of a pattern thus  obtained was more excellent ( comparison of Examples 4 to  6 and 8 to 12 vs. other Examples).  [0720]  It  was confirmed that in a case where the content of  the photoacid generator Z whose volume of generated acid  was 240  A $^{3 }$or more was 60% to 100% by mass with respect  to the total mass of the photoacid generator Z in the actinic  ray-sensitive or radiation-sensitive resin composition, it was  confirmed that the LER performance of a pattern thus  obtained was more excellent ( comparison of Example 2 vs.  Examples 3 to 12 and 14 (comparison between Examples in  which a pka difference between the acid generated from the  compound Y and the acid generated from the photoacid  generator was 3.00 or greater)).  [0721]  In a case where the resist composition includes two  or more kinds of the photoacid generators Z, it was con› firmed that the obtained pattern had better LER performance  (the results of Examples 5 and 8; comparison of Example 7  vs. Examples 2, 3, and 14 (comparison between Examples in  which the pka of the acid generated from the compound Y  was 1 or more, and a pka difference between the acid  generated from the compound Y and the acid generated from  the photoacid generator was less than 3.00)).  What is claimed is:  1.  An actinic ray-sensitive or radiation-sensitive resm  composition comprising:  2.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  1,  3.  The actinic ray-sensitive or radiation-sensitive resin  composition according to claim  1,  a resinX having a repeating unitArepresented by General  Formula (I), a repeating unit B having an acid-decom› posable group, and a repeating unit C selected from the  group consisting of a repeating unit cl represented by  General Formula (II), a repeating unit c2 represented by  General Formula (III), a repeating unit c3 having a  carbonate ring group, and a repeating unit c4 having an  anhydride ring group;  a compound Y which is a basic compound or ammonium  salt compound whose basicity is reduced upon irradia› tion with actinic rays or radiation; and  a photoacid generator Z which is a compound other than  the compound  Y,  in General Formula (I), RI represents a hydrogen atom or  a monovalent organic group,  in General Formula (II), RII represents a hydrogen atom  or a monovalent organic group,  wherein  J  represents an (n+l)-valent group having an  alicyclic group.  n represents an integer of 1 or greater, and  J  represents a (n+l)-valent linking group,  Q represents a divalent linking group, and  T represents a monovalent organic group, and  in General Formula (III), RIII’s each independently rep› resent a hydrogen atom or a substituent, and  lac represents a lactone ring group.  wherein n represents an integer of 2 or greater.  (I)  (II)  ~ $_{Q }$ T  0  (III) 