154  US 8,900,791 B2  153  It  is apparent from the results  of  Table 2 that the photosen› sitive composition  of  the present invention exhibits excellent  performance as a positive resist composition employed in  KrF excimer laser exposure.  Examples ID to 15D and Comparative Examples ID  and2D  <Preparation of Resist>  Referring to Table 4 below, with respect to each of the  resists, the individual components were dissolved in the sol- vent and passed through a polytetrafluoroethylene filter of0.1  µm  pore size, thereby obtaining a negative resist solution of  14 mass % solid content. The thus obtained negative resist  solutions were evaluated in the same manner as in the  Example C (KrF positive exposure). The results are given in  Table 4.  The resins (R-2), (R-8), (R-14), (R-17), (R-lO(H)), (R-10  (L)),  (R-18(H)), (R-18(L)), (R-19), (R-20) and (R-21)  appearing in Table 2 are resins shown hereinbefore by way of  example. With respect to each of these resins, the molar ratio  of individual repeating units and the weight average molecu› lar weight are given in Table 3.  Example D  TABLE3  TABLE4  KrF  ne ative ex osure  (Al)  Acid  generator  (0.3 g)  Ex. 1D  Al-1  Ex. 2D  Al-2  Ex. 3D  Al-3  Ex. 4D  Al-4  Ex.  SD  Al-5  Ex. 6D  Al-6  Ex. 7D  Al-7  Ex. SD  Al-8  Ex. 9D  Al-9  Ex. !OD  Al-1  Ex. llD  Al-1  Ex. 12D  Al-1  Ex. 13D  Al-1  Ex. 14D  Al-1  Ex. 15D  Al-1  Ex. 16D  Al-10  Ex. 17D  Al-11  Ex. 18D  Al-12  Ex. 19D  Al-13  Ex. 20D  Al-14  (A2)  Acid  generator  (0.1 g)  Z2  (C)  Resin  (10 g)  P-3  P-3  P-3  P-3  P-3  P-3  P-3  P-3  P-3  P-2  P-1  P-1  P-2  P-3  P-3  P-3  P-3  P-3  P-3  P-3  (D)  Cross› linking  agent  (3.0 g)  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-3  CL-2  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  CL-1  (F)  Basic  compound  (0.02 g)  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-1  C-2  C-1  C-1  C-1  C-1  C-1  C-1  (G)  (H)  Surfactant Solvent  (0.1  (mass  mass%)*  ratio)  W-1  W-2  W-3  W-1  W-3  W-2  W-4  W-2  W-1  W-1  W-1  W-1  W-1  W-1  W-1  W-1  W-1  W-1  W-1  W-1  Al/Bl  (6/4)  A2/B2  (6/4)  A3/Bl  (6/4)  A4/Bl  (6/4)  Al/B2  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Al/Bl  (6/4)  Sensitivity Resolving Roughness Pattern  (mJ/cm 2 )  power  y  (nm)  profile  21.0  21.0  18.0  21.0  21.0  21.0  21.0  21.0  19.0  22.0  22.0  21.0  21.0  21.0  20.0  21.0  22.0  22.0  21.0  22.0  6.3  6.0  6.5  5.5  5.5  5.5  6.3  6.3  6.3  6.3  6.3  6.3  6.3  6.3  6.3  6.2  5.5  5.2  5.2  6.2  10.2  Rectangle  14.0  Rectangle  10.0  Rectangle  10.2  Rectangle  13.0  Rectangle  10.2  Rectangle  9.5  Rectangle  10.2  Rectangle  10.2  Rectangle  10.2  Rectangle  10.2  Rectangle  10.2  Rectangle  10.2  Rectangle  10.2  Rectangle  10.2  Rectangle  10.0  Rectangle  15.0  Rectangle  15.0  Rectangle  14.0  Rectangle  10.0  Rectangle  Resin  R-2  R-8  R-14  R-17  R-10 (H)  R-10 (L)  R-18 (H)  R-18 (L)  R-19  R-20  R-21  Molar ratio of  repeating units  ( corresponding to  individual repeating  units in order  from the left)  60/20/20  60/20/20  60/15/25  80/20  60/40  60/40  60/40  60/40  60/20/20  60/40  60/20/20  Weight-average  Molecular  Weight(Mw)  12000  12000  12000  15000  10000  4000  10000  4000  12000  12000  12000 