359  US 9,411,230 B2  360  using 4-methyl-2-pentanol as a rinsing solution, spun at a  rotational speed of 4,000 rpm for 30 seconds and baked at 90°  C. for 60 seconds to obtain a resist pattern composed of a 1: 1  line-and-space pattern having a line width of 50 nm.  Preparation of an electron beam-sensitive or extreme ultra› violet-sensitive resin composition and pattern formation were  performed in the same manner as in Example 1 except for  changing the formulation as shown in the Table below, per› forming the development with an aqueous alkali solution  (TMAH, an aqueous 2.38 mass  % tetramethylammonium 15  hydroxide solution) in pace of the organic developer, and  using water as the rinsing solution.  The obtained resist pattern was evaluated for sensitivity,  resolution and LWR by means of a scanning electron micro- scope (S-9220, manufacture by Hitachi Ltd.) by the following  methods. The results obtained are shown in the Table below.  (3) Evaluation of Resist Pattern  (3-1) Sensitivity  The irradiation energy below which a 1: 1 line-and-space  pattern having a line width of 50 nm cannot be resolved was  taken as the sensitivity (Eop ). A smaller value indicates  higher performance. In Comparative Examples 3 to 5, the 1: 1  line-and-space pattern with a line width of 50 nm could not be  resolved and therefore, the irradiation energy below which a  1: 1 line-and-space pattern with a line width of 100 nm is not  resolved was taken as the sensitivity (Eop).  (3-2) Resolution  The minimum line width below which the line-and-space  (1: 1) pattern at the Eop above cannot be separated was taken  as the resolution. A smaller value indicates higher perfor- mance.  (3-3) Line Width Roughness (LWR)  With respect to the line width roughness, at arbitrary 50  points in the longitudinal 0.5 µm  region of a line-and-space  space pattern having a line width of 50 nm (in Comparative  Examples 3 to 5, a 1:1 line-and-space pattern having a line  width of 100 nm), the line width at the Eop above was mea› sured and after determining the standard deviation thereof, 3  a  was computed. A smaller value indicates higher performance.  TABLE4  Comparative Examples 3 to 6  Electron Beam (EB) Exposure  EB  exposure  Solvent  (mass ratio)  Basic  Surfactant  Sensitivity  Resolution  LWR  Resin (A)  (40 g)  Compound  (5mg)  (µC/cm 2 )  (nm)  (nm)  Remarks  Example 1  A-1  SL-1/SL-6  N-6  W-2  14.0  32.5  4.2  (0.988 g)  (70/30)  (7mg)  Example 2  A-2  SL-1/SL-5  N-6  W-1  13.0  32.0  3.9  (0.990 g)  (80/20)  (5mg)  Example 3  A-3  SL-1/SL-4  N-5  W-1  12.9  32.0  4.0  (0.990 g)  (75/25)  (5mg)  Example4  A-4  SL-1/SL-3  N-5  W-1  12.2  30.5  3.8  (0.992 g)  (70/30)  (3mg)  Example 5  A-5  SL-1  N-7  W-3  11.3  31.5  3.7  (0.991 g)  (4mg)  Example 6  A-6  SL-1/SL-5  N-5  W-1  11.2  30.0  3.5  (0.991 g)  (80/20)  (4mg)  Example 7  A-7  SL-1/SL-5  N-8  12.1  30.5  3.8  (0.995 g)  (75/25)  (5mg)  Example 8  A-8  SL-2/SL-6  N-3  W-4  11.4  30.0  3.6  (0.991 g)  (80/20)  (4mg)  Example 9  A-9  SL-6/SL-1  N-5  W-1  12.4  30.5  3.9  (0.991 g)  (70/30)  (4mg)  Example 10  A-10  SL-2/SL-5  N-4  W-1  11.9  30.5  3.8  (0.990 g)  (80/20)  (5mg)  Example 11  A-11  SL-2/SL-4  N-2  W-2  12.0  30.0  3.8  (0.991 g)  (75/25)  (4mg)  Example 12  A-12  SL-1  N-1  W-5  11.4  31.0  3.6  (0.992 g)  (3mg)  Example 13  A-13  SL-6  N-7  W-6  11.2  31.5  3.6  (0.987 g)  (8mg)  Example 14  A-14  SL-1/SL-5  N-4  W-2  11.9  32.0  3.7  (0.993 g)  (60/40)  (2mg)  Example 15  A-15  SL-1/SL-5  N-7  W-1  11.8  31.0  3.8  (0.991 g)  (80/20)  (4mg)  Solvent  Acid  (mass ratio)  Basic  Surfactant Sensitivity Resolution LWR  Resin (A)  Generator  (40 g)  Compound  (5mg)  (µC/cm 2 )  (nm)  (nm)  Remarks  Example 16  A-16  SL-1/SL-6  N-8  W-3  12.1  31.5  3.8  (0.985 g)  (90/10)  (10mg)  Example 17  A-17  SL-1/SL-4  N-6  W-1  11.6  31.5  3.8  (0.989 g)  (80/20)  (6mg)  Example 18  A-18  SL-1/SL-4  N-5  W-4  11.9  32.5  3.7  (0.980 g)  (80/20)  (15mg)  Example 19  A-19  SL-1/SL-4  N-8  W-5  11.7  32.5  3.7  (0.985 g)  (90/10)  (10mg)  Example 20  A-20  SL-1  N-7  W-6  11.6  32.5  3.6  (0.986 g)  (9mg) 