Dec. 3, 2020  95  US 2020/0379345 Al  PAG-11  PAG-9  PAG-10  Y’p~  I  syYo0s"  ✓ l-,..,...  ~  V  CF3  0  Resist  Oniwn  compound Base resin Quencher Surfactant  Solvent 1  Solvent 2  composition  (pbw)  (pbw)  (pbw)  (pbw)  (pbw)  (pbw)  Example  1-1  R-01  PAG-1  PGMEA  DAA  (80)  (2,240)  (960)  1-2  R-02  PAG-2  PGMEA  DAA  (80)  (2,240)  (960)  1-3  R-03  PAG-3  PGMEA  DAA  (80)  (2,240)  (960)  1-4  R-04  PAG-4  PGMEA  DAA  (80)  (2,240)  (960)  1-5  R-05  PAG-5  PGMEA  DAA  (80)  (2,240)  (960)  1-6  R-06  PAG-6  PGMEA  DAA  (80)  (2,240)  (960)  1-7  R-07  PAG-7  PGMEA  DAA  (80)  (2,240)  (960)  1-8  R-08  PAG-8  PGMEA  DAA  (80)  (2,240)  (960)  1-9  R-09  PAG-9  PGMEA  DAA  (80)  (2,240)  (960)  1-10  R-10  PAG-10  PGMEA  DAA  (80)  (2,240)  (960)  1-11  R-11  PAG-11  PGMEA  DAA  (80)  (2,240)  (960)  1-12  R-12  PAG-1  Q-1  PGMEA  DAA  (40)  (40)  (2,240)  (960)  1-13  R-13  PAG-2  Q-2  SF-1  PGMEA  DAA  (80)  (4.5)  (0.1)  (2,240)  (960)  1-14  R-14  PAG-3  Q-1  SF-1  PGMEA  DAA  (40)  (40)  (0.1)  (2,240)  (960)  1-15  R-15  PAG-7  Q-2  PGMEA  DAA  (80)  (4.5)  (2,240)  (960)  [0205]  PAG-6 to PAG-11 were synthesized by well-known  synthesis methods using corresponding reactants.  [0206]  Resist compositions in solution form were pre› pared by dissolving a betaine type onium compound (PAG-1  to PAG-11) or comparative betaine type onium compound or  onium salt (PAG-A to PAG-F), base resin (P-1 or P-2),  quencher (Q-1 or Q-2), and alkali-soluble surfactant (SF-1)  in a solvent containing 0.01 wt  % of surfactant A in  accordance with the formulation shown in Tables 1 to 3, and  filtering through a Teflonfi filter with a pore size of 0.2 µm.  [2] Preparation of Resist Composition  Examples 1-1 to 1-19, Comparative Examples 1-1  to 1-7 and Reference Examples 1-1 to 1-2  -continued  -continued  TABLE 1 