In addition, two or more of these high molecular com› pounds can be used in a combination.  The additive amount of the high molecular compound (A)  used in the present invention is preferably 30 to 100% by  mass, more preferably 50 to 99.7% by mass, and particularly  preferably 70 to 99.5% by mass, based on total solid content  of the composition.  [2] (B) A Compound Generating an Acid Upon Irradiation  with Actinic Rays or Radiation.  The chemical amplification type resist composition of the  present invention further contain, as an essential component,  (B) a compound generating an acid upon irradiation with  actinic rays or radiation (hereinafter, these compounds are  sometimes referred to as an "acid generator"). In the present  invention, (B) a compound generating an acid upon irradia› tion with actinic rays or radiation may be a low molecular acid  generator generating an acid upon irradiation with an actinic  ray or radiation (in particular, an electron beam or extreme  ultraviolet rays) or may be a high molecular compound gen- erating an acid. In addition, as described above, the com› pound (B) may be a constituent in the high molecular com› pound (A).  The preferable forms of the acid generator can include  onium compounds. The examples of such onium compounds  include sulfonium salts, iodonium salts and phosphonium  salts, and the like.  In addition, another preferable forms of the acid generator  can include, upon irradiation with the actinic rays or radia› tion, a compound generating sulfonic acids, imide acids or  methide acids. The examples of the acid generator in this form  can include sulfonium salts, iodonium salts, phosphonium  salts, oxime sulfonates and imidosulfonates, and the like.  OD  (J  OD  (J  ~s~  V  OH  OMe  OH  54  US 8,614,033 B2  53  -continued  -continued 