Jul. 30, 2020  101  US 2020/0241417 Al  Acid  Organic  PEB  Polymer  generator  Quencher  solvent  temp.  (pbw)  (pbw)  (pbw)  (pbw)  (" C.)  2 Polymer 1  PAG2  Comparative  PGMEA (400)  100  (100)  (30)  Quencher 2  CyH (2,000)  (1.20)  PGME (100)  3 Polymer 1  PAG2  Comparative  PGMEA (400)  100  (100)  (30)  Quencher 3  CyH (2,000)  (3.20)  PGME (100)  4 Polymer 1  PAG2  Comparative  PGMEA (400)  100  (100)  (30)  Quencher 4  CyH (2,000)  (3.20)  PGME (100)  5 Polymer 1  PAG2  Comparative  PGMEA (400)  100  (100)  (30)  Quencher 5  CyH (2,000)  (3.20)  PGME (100)  6 Polymer 1  PAG2  Comparative  PGMEA (400)  100  (100)  (30)  Quencher 6  CyH (2,000)  (3.20)  PGME (100)  7 Polymer 4  PAG2  Comparative  PGMEA (400)  120  (100)  (30)  Quencher 7  CyH (2,000)  (3.65)  PGME (100)  Sensitivity CDU  (mJ/cm 2 )  (nm)  28  30  28  38  30  30  3.2  2.9  2.8  3.0  3.0  4.9  [0175]  It  is demonstrated in Tables  1  to 3 that resist  compositions comprising amine compounds containing an  iodized aromatic ring and a tertiary ester structure form  patterns having a high sensitivity and a reduced value of  CDU.  [0176]  Japanese Patent Application No. 2019-010892 is  incorporated herein by reference.  [0177]  Although some preferred embodiments have been  described, many modifications and variations may be made  thereto in light of the above teachings.  It  is therefore to be  understood that the invention may be practiced otherwise  than as specifically described without departing from the  scope of the appended claims.  1.  A resist composition comprising a base polymer and a  quencher, the quencher containing at least one compound  selected from amine compounds having the formula (A-1)  and amine compounds having the formula (A-2):  C 1  -C 4  alkylsulfonyloxy group, fluorine, chlorine,  bromine, amino, nitro, cyano, -NR 1 A---C(=O)› R1B, or -NR 1 A-C(=O)-O-R 1 B, R 1 A is hydro› gen or a  C 1 -C$_{6 }$ alkyl group, R 1 B is a  C 1  -C$_{6 }$ alkyl  group or C 2 -C 5  alkenyl group,  2.  The resist composition of claim  1,  further comprising  an acid generator capable of generating a sulfonic acid,  imide acid or methide acid.  3.  The resist composition of claim  1,  further comprising  an organic solvent.  4.  The resist composition of claim  1  wherein the base  polymer comprises recurring units having the formula (al)  or recurring units having the formula (a2):  wherein X is a single bond or a C 1  -C$_{20 }$ divalent linking  group which may contain an ether bond, carbonyl  moiety, ester bond, amide bond, sultone ring, lactam  ring, carbonate bond, halogen, hydroxyl moiety or  carboxyl moiety,  R 1  is hydrogen, hydroxyl, an optionally halo-substi› tuted C 1  -C$_{6 }$ alkyl group, optionally halo-substituted  C 1  -C$_{6 }$ alkoxy group, optionally halo-substituted  C 2 -C$_{6 }$ acyloxy group, optionally halo-substituted  R 2  and R 3  are each independently a C 1  -C$_{6 }$ alkyl group,  R 2  and R $^{3 }$may bond together to form a ring with the  carbon atom to which they are attached,  R 4  and R 6  are each independently hydrogen, a C 1 -C 4  straight or branched alkyl group, C 2 -C 12  straight or  branched alkoxycarbonyl group,  CcC 15  aryloxycar› bonyl group, or  CcC 14  aralkyloxycarbonyl group,  R 5  is a  C 1  -C$_{6 }$ alkyl group,  C 2 -C$_{6 }$ alkenyl group,  C 2 -C$_{6 }$ alkynyl group, or  CcC$_{12 }$ aryl group,  R is a C 2 -C$_{10 }$ alicyclic group to form a ring with the  nitrogen atom,  m is an integer of  1  to 5, n is an integer of Oto  4,  and  lsm+ns5, and pis  1  or 2.  (al)  (A-1)  (A-2)  TABLE 3-continued 