(IO)  Patent No.:  US 7,217,493 B2  (45)  Date of Patent:  May 15, 2007  c12)  United States Patent  Yasunami et al.  (54)  POSITIVE RESIST COMPOSITION  (75)  Inventors:  Shoichiro Yasunami,  Shizuoka (JP);  Kazuyoshi Mizutani,  Shizuoka (JP)  (73)  Assignee:  Fujifilm Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 50 days.  (21)  Appl. No.:  10/840,624  (22)  Filed:  May 7, 2004  (65)  Prior Publication Data  US 2004/0229161 Al  Nov. 18, 2004  (30)  Foreign Application Priority Data  May 12, 2003  (JP)  .......................... P.2003-133194  (51)  Int. Cl.  G03F  71039  (2006.01)  G03F  71075  (2006.01)  (52)  U.S. Cl.  ....................  430/270.1;  430/905; 430/914  (58)  Field of Classification Search  ............. 430/270.1,  430/905, 914  See application file for complete search history.  (56)  References Cited  U.S. PATENT DOCUMENTS  5,882,844 A *  6,296,985 Bl *  6,420,084 Bl *  6,531,260 B2 *  6,589,705 Bl *  3/ 1999 Tsuchiya et al. ... ... ... 430/288.1  10/2001 Mizutani et al. ......... 430/270.1  7/2002 Angelopoulos et al. .. 430/270.1  3/2003 Iwasawa et  al .......... 430/270.1  7/2003 Sato et al. ............... 430/270.1  6,939,664 B2 *  2003/0170561 Al*  2005/0106494 Al*  9/2005 Huang et al. ............ 430/270.1  9/2003 Iwasawa et al. ......... 430/270.1  5/2005 Huang et al. ............ 430/270.1  FOREIGN PATENT DOCUMENTS  JP  JP  JP  JP  JP  JP  JP  JP  6-184311 A  8-160620  A  9-274319 A  2000-219743  A  2001-109150 A  2001-147538 A  2001-330957  A  2002-6494  A  7 /1994  6/1996  10/1997  8/2000  4/2001  5/2001  11/2001  1/2002  OTHER PUBLICATIONS  Keiji Watanabe et al., "Study of Bi-level Resist System with  Conductive Bottom Layer for EB lithography", Journal of  Photopolymer Science and Technology, vol. 19, No. 4 (1996), pp.  697-706.  * cited by examiner  Primary Examiner-Richard  L. Schilling  (74)  Attorney, Agent, or Firm-Sughrue  Mion, PLLC  (57)  ABSTRACT  A positive resist composition comprising (A) polysiloxane  or polysilsesquioxane that has a property of increasing  solubility in an alkali developing solution by the action of an  acid and contains a group capable of being decomposed with  an acid, (B) a compound that generates a sulfonic acid upon  irradiation of an actinic ray or radiation and (C) an organic  basic compound, wherein an amount of the compound that  generates a sulfonic acid upon irradiation of an actinic ray or  radiation is from 6 to 20% by weight based on the total solid  content of the positive resist composition.  8 Claims, No Drawings  US007217493B2 