(IO)  Patent No.:  US 8,546,063 B2  Oct. 1, 2013  (45)  Date of Patent:  c12)  United States Patent  Tsubaki et al.  (54)  ORGANIC SOLVENT DEVELOPMENT OR  MULTIPLE DEVELOPMENT  PATTERN-FORMING METHOD USING  ELECTRON BEAMS OR EUV RAYS  (75)  Inventors:  Hideaki Tsubaki,  Shizuoka (JP);  Koji  Shirakawa,  Shizuoka (JP);  Toru  Tsuchihashi,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 67 days.  (21)  Appl. No.:  13/202,389  (22)  PCT Filed:  Feb.19,2010  (86)  PCT No.:  PCT  I  JP2010/053014  § 371 (c)(l),  (2), ( 4) Date:  Aug. 19, 2011  (87)  PCT Pub. No.:  WO2010/095763  (51)  Int. Cl.  G03C 5100  (2006.01)  (52)  U.S. Cl.  USPC ...........  430/296;  430/325; 430/326; 430/331;  430/942  (58)  Field of Classification Search  USPC .......................... 430/296, 325,326, 331, 942  See application file for complete search history.  FOREIGN PATENT DOCUMENTS  (57)  ABSTRACT  OTHER PUBLICATIONS  33 Claims, No Drawings  U.S. PATENT DOCUMENTS  (56)  References Cited  (30)  Foreign Application Priority Data  (65)  Prior Publication Data  8,071,272 B2  8,088,557 B2  8,227,183 B2  *  8,241,840 B2  12/2011 Tsubaki  1/2012 Tsubaki  7/2012 Tsubaki et al. ............... 430/434  8/2012 Tsubaki et al.  2006/0147836 Al  2006/0189138 Al  2007 /0087288 Al  2008/0187860 Al  2008/0261150 Al  2011/0045413 Al  2011/0229832 Al  2011/0250543 Al  2011/0300485 Al  2011/0305992 Al  2012/0088194 Al  2012/0135355 Al  7/2006 Hatakeyama et al.  8/2006 Nishimura et al.  4/2007 Nishiyama et al.  8/2008 Tsubaki et al.  10/2008 Tsubaki et al.  2/2011 Tsubaki  9/2011 Kamimura et al.  10/2011 Tsubaki  12/2011 Tsubaki et al.  12/2011 Tarutani et al.  4/2012 Tsubaki  5/2012 Tsubaki  EP  EP  JP  JP  JP  JP  JP  JP  JP  1338921 A2  1939691 A2  62-175739  A  7-261392  A  3277114 B2  2002-148806  A  2006-227174  A  2008-268935  A  2008-292975  A  8/2003  7/2008  8/1987  10/1995  2/2002  5/2002  8/2006  11/2008  12/2008  5,665,527 A  7,985,534 B2  7,998,655 B2  8,017,298 B2  8,017,304 B2  8,034,547 B2  9/1997 Allen et al.  7/2011 Tsubaki  8/2011 Tsubaki  9/2011 Tsubaki  9/2011 Tarutani et al.  10/2011 Tsubaki et al.  PCT Pub. Date:  Aug. 26, 2010  US 2011/0300485 Al  Dec. 8, 2011  Feb. 20, 2009  (JP) ................................. 2009-038666  US008546063B2  International Search Report [PCT/ISA/210] issued in corresponding  International application No.PCT/JP2010/053014 on Mar. 23, 2010.  Written Opinion of the International Searching Authority [PCT/ISA/  237] issued in corresponding International application No. PCT/  JP2010/053014 on Mar. 23, 2010.  Extended European Search Report dated Jun. 12, 2012 issued by the  European Patent Office in counterpart European Application No.  10743883.0.  Office Action dated Jan. 9, 2013 in U.S. Appl. No. 13/588,762.  * cited by examiner  Primary Examiner  - Christopher Young  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  Provided is a pattern-forming method including, in the fol› lowing order: (1) a process of forming a film with an actinic  ray-sensitive or radiation-sensitive resin composition com› prising a resin which contains an acid-decomposable repeat› ing unit and is capable of decreasing the solubility in an  organic solvent by the action of an acid; (2) a process of  exposing the film with an electron beam or an EUV ray; and  (4) a process of developing the film with a developer contain› ing an organic solvent. 