r  0  0  --b  OH  Mw~ 8,600  Mw/Mn~ 1.73  r- 0:.30  o  o  I  ~  --b  #  OH  r  0  0  F2  0  C  Y’s03- 0  CF3  Qs  Mw~ 8,900  Mw/Mn~ 1.89  Polymer 1  r  0  0  0  Polymer 2  Polymer 3  0  OH  -continued  or  0  0  0  Mw~7,600  Mw/Mn~ 1.73  OH  Mw~ 6,900  Mw/Mn~ 1.62  Polymer4  Examples 1 to 33 and Comparative Examples 1 to  8  [0191]  Preparation and Evaluation of Resist Compositions  (1) Preparation of Resist Compositions  [0192]  Resist compositions were prepared, under LED  illumination with UV of wavelength 400 nm and shorter cut  off, by dissolving the polymer and selected components in a  solvent in accordance with the recipe shown in Tables 1 to  3, and filtering through a filter having a pore size of 0.2 µm.  The solvent contained 100 ppm of surfactant Polyfox  PF-636 (Onmova Solutions). The resist compositions of  Examples 1 to 21, Examples 23 to 33, and Comparative  Examples 1 to 6 and 8 were of positive tone, while the resist  compositions ofto Example 22 and Comparative Example 7  were of negative tone.  [0193]  The components in Tables 1 to 3 are as identified  below.  Organic Solvents:  [0194]  PGMEA (propylene glycol monomethyl ether  acetate)  [0195]  CyH (cyclohexanone)  103  Feb. 13, 2020  US 2020/0050105 Al 