US009513547B2  c12)  United States Patent  Kamimura et al.  (54)  PATTERN FORMING METHOD, ACTINIC  RAY-SENSITIVE OR RADIATION-SENSITIVE  RESIN COMPOSITION, RESIST FILM,  METHOD FOR MANUFACTURING  ELECTRONIC DEVICE, AND ELECTRONIC  DEVICE  (IO)  Patent No.:  US 9,513,547 B2  (45)  Date of Patent:  Dec. 6, 2016  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Sou Kamimura,  Haibara-gun (JP);  Hidenori Takahashi,  Haibara-gun (JP);  Keita Kato,  Haibara-gun (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  14/607,146  (22)  Filed:  Jan. 28, 2015  (63)  Continuation  of  application  No.  PCT/JP2013/076178, filed on Sep. 19, 2013.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ...........  G03F  710388  (2013.01);  C08F  212114  (2013.01);  C08F  220104  (2013.01);  C08F  220118  (2013.01);  C08F  220126  (2013.01);  C08F  220128  (2013.01);  C08F  220158  (2013.01);  G03F  71038  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  7120  (2013.01);  G03F  712002  (2013.01);  G03F  712037  (2013.01);  G03F  7130  (2013.01);  G03F  71325  (2013.01);  G03F  7140  (2013.01);  C08F 212/32  (2013.01)  ( 58)  Field of Classification Search  None  See application file for complete search history.  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  4/1998 Nakano et al.  7/2001 Lung et al.  5,738,975 A  6,255,032 Bl  2004/0033437 Al *  2/2004 Uenishi ................. G03F 7/0397  430/270.1  2007/0207406 Al  9/2007 Guerrero et al.  2008/0044772 Al  2/2008 Guerrero et al.  2008/0187860 Al *  8/2008 Tsubaki ................ G03F 7/2024  430/270.1  2011/0212390 Al *  9/2011 Masunaga ............. G03F 7/0382  430/5  2011/0311913 Al  12/2011 Suzuki et al.  2012/0058431 Al  3/2012 Takahashi et al.  2012/0077125 Al  3/2012 Shiono et al.  2012/0202158 Al  8/2012 Hatakeyama et al.  2012/0251950 Al  10/2012 Horiguchi et al.  2012/0315449 Al  12/2012 Tsubaki et al.  2012/0321855 Al  12/2012 Iwato et al.  2013/0065183 Al  3/2013 Kobayashi et al.  2013/0071787 Al  3/2013 Takita  2013/0078426 Al*  3/2013 Koshijima ............ G03F 7/0397  2013/0130183 Al  5/2013 Kobayashi et al.  2013/0157196 Al  6/2013 Nakasugi et al.  2013/0266777 Al  10/2013 Kato et al.  428/156  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  7-49569  A  7-199467 A  2715881 B2  2002-363222  A  2003-345023  A  2004-286968  A  2008058710  A  2008-292975  A  2009-98616  A  2009-235132  A  2/1995  8/1995  2/1998  12/2002  12/2003  10/2004  3/2008  12/2008  5/2009  10/2009  G03F  71039  G03F  7140  G03F  7130  G03F  71038  C08F  212114  C08F  220104  C08F  220118  C08F  220126  C08F  220128  C08F  220158  G03F  7132  G03F  7120  C08F 212/32  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  22 Claims, No Drawings  The pattern forming method of the present invention  includes (i) forming a film using an actinic ray-sensitive or  radiation-sensitive resin composition which contains a resin  (A) which has a repeating unit including a group capable of  generating a polar group by being decomposed due to an  action of an acid and a repeating unit including a carboxyl  group, a compound (B) which generates an acid according  to irradiation with actinic rays or radiation, and a solvent  (C); (ii) exposing the film using a KrF excimer laser,  extreme ultraviolet rays, or an electron beam; and (iii)  forming a negative tone pattern by developing the exposed  film using a developer which includes an organic solvent.  Primary Examiner  - Martin Angebranndt  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  (Continued)  Machine translation of JP 2010-164958 (2010).*  (Continued)  Sep. 28, 2012  (JP) ................................. 2012-217564  US 2015/0147699 Al  May 28, 2015 