US006767687Bl  (12)  United States Patent  Kim et al.  (10)  Patent No.:  US 6,767,687 Bl  (45)  Date of Patent:  Jul. 27, 2004  (54)  POLYMER FOR CHEMICALLY AMPLIFIED  RESIST AND A RESIST COMPOSITION  USING THE SAME  (75)  Inventors:  Deog-Bae Kim,  Hwaseong-kun  (KR);  Hyun-Jin Kim,  Hwaseong-kun  (KR);  Yong-Joon Choi,  Hwaseong-kun  (KR);  Yoon-Sik Chung,  Hwaseong-kun  (KR)  (73)  Assignee:  Dongjin Semichem Co., Ltd.,  Incheon  (KR)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 159 days.  (21)  Appl. No.:  10/070,477  (22)  PCT Filed:  Aug. 25, 2000  (86)  PCT No.:  PCT/KR00/00956  §  371 (c)(l),  (2), ( 4) Date:  Jul. 23, 2002  (87)  PCT Pub. No.:  WO0l/18603  PCT Pub. Date:  Mar. 15, 2001  (51)  Int. Cl.7  ................................................  G03F 7/004  (52)  U.S. Cl.  .......................  430/270.1;  430/914; 522/35  (58)  Field of Search  .............................. 430/270.1, 914;  522/35  (30)  Foreign Application Priority Data  Sep. 7, 1999  (KR) ............................................ 11-37772  (56)  References Cited  U.S. PATENT DOCUMENTS  4,491,628 A  1/1985 Ito et al.  5,310,619 A  5/1994 Crivello et al.  5,443,690 A  8/1995 Takechi et al.  5,492,793 A  2/1996 Breyta et al.  5,556,734 A  9/1996 Yamachika et al.  5,679,495 A  10/1997 Yamachika et al.  5,773,191 A  6/1998 Padmanaban et al.  5,976,759 A  *  11/1999  Urano et al. ............. 430/270.1  6,045,970 A  *  4/2000 Choi ....................... 430/270.1  6,083,659 A  *  7/2000 Choi ....................... 430/270.1  6,165,680 A  *  12/2000 Choi ....................... 430/270.1  6,395,450  Bl  *  5/2002 Park et al. ............... 430/270.1  2003/0181629 Al  *  9/2003 Kim et al. .................. 528/247  EP  EP  EP  EP  JP  JP  JP  JP  0404206 A2  0786701 Al  0793144 A2  0877294 Al  02227660  05113667  05232706  05249683  5/1983  7/1997  9/1997  11/1998  9/1990  5/1993  9/1993  9/1993  FOREIGN PATENT DOCUMENTS  OTHER PUBLICATIONS  MacDonald et al., "Airborne Chemical Contamination of a  Chemically Amplified Resist,"  SPIE,  vol. 1466 (1991).  Schlegel, 37th Japanese Applied Physics Society Announce› ment, 28p-ZE-4 (1990).  Ueno  et al.,  36th Japanese Applied Physics Society  Announcement, lp-k-7, (1989).  Ito et al., "Applications of Photoinitiators to the Design of  Resists for Seminconductor Manufacturing,"  Polymers in  Electronics,  American Chemical Society, pp. 11-23 (1984).  *  cited by examiner  Primary Examiner-Mark  F.  Huff  Assistant Examiner-Amanda  Walke  (74)  Attorney, Agent, or Firm-Baker  Botts LLP  The present invention relates to a polymer for a chemically  amplified resist and a resist composition using the same. The  present invention provides a polymer represented by the  Formula (1) and a chemically resist composition for extreme  ultraviolet light comprising the same. The chemically ampli› fied resist composition comprising the polymer represented  by the formula (1) of the present invention responds to mono  wavelength in a micro-lithography process and can embody  a micro-pattern of high resolution on a substrate.  (57)  ABSTRACT  5 Claims, No Drawings 