(19)  United States  (12)  Patent Application Publication  Berger et al.  (10)  Pub. No.: US 2005/0100814 Al  ( 43)  Pub. Date:  May 12, 2005  (54)  BASES AND SURFACTANTS AND THEIR  USE IN PHOTORESIST COMPOSITIONS  FOR MICROLITHOGRAPHY  (76)  Inventors:  Larry  L.  Berger,  Chadds Ford, PA  (US);  Michael Karl Crawford,  Glens  Mills, PA (US);  Frank  L.  Schadt  III,  Wilmington,  DE  (US);  Frederick Claus  Zumsteg Jr,  Wilmington,  DE  (US)  (21)  Appl. No.:  10/399,375  (22)  PCT Filed:  Nov. 26, 2001  (86)  PCT No.:  PCT/US0l/44294  (60)  Provisional application No. 60/253,820, filed on Nov.  29, 2000.  (51)  Int. Cl.7  .....  G03F 7/00;  G03F 7/20; G03F 7/004;  G03F 7/30  (52)  U.S. Cl.  ...................  430/270.1;  430/311; 430/281.1;  430/326; 526/72; 526/242;  526/250; 525/328.8  Related U.S. Application Data  Publication Classification  (57)  ABSTRACT  Correspondence Address:  Jessica M Sinnott  EI du Pont de Nemours  &  Company  Legal Patents  Wilmington, DE 19898 (US)  A  photoresist composition having:  (A)  a polymer selected  from the group consisting of: ( a) a fluorine-containing  copolymer having a repeat unit derived from at least one  ethylenically unsaturated compound characterized in that at  least one ethylenically unsaturated compound is polycyclic;  (b) a branched polymer containing protected acid groups,  said polymer comprising one or more branch segment(s)  chemically linked along a linear backbone segment; (c)  fluoropolymers having at least one fluoroalcohol group  having the structure:  -C(Ri)(R/)OH,  wherein  Rf  and  R/  are  the same or different fluoroalkyl groups of from 1 to about  10 carbon atoms or taken together are (CF$_{2}$)n wherein n is 2  to 10; (d) amorphous vinyl homopolymers of perfluoro(2,  2-dimethyl-1,3-dioxole) or  CX$_{2}$=CY$_{2 }$ where  X=F  or  CF$_{3 }$ and  Y=-H  or amorphous vinyl copolymers of perfluoro(2,  2-dimethyl-1,3-dioxole) and  CX$_{2}$=CY  2 ;  and ( e) nitrile/  fluoroalcohol-containing polymers prepared from substi› tuted or unsubstituted vinyl ethers;  (B)  at least one  photoactive component; and  (C) a functional compound  selected from the group consisting of a base and a surfactant.  The polymer may have an absorption coefficient of less than  about 5.om?-l at a wavelength of about 157 nm. These  photoresist compositions have improved imaging properties.  US 20050100814Al 