c12)  United States Patent  Takahashi et al.  (10)  Patent No.:  US 9,052,590 B2  (45)  Date of Patent:  Jun.9,2015  (54)  ACTINIC-RAY- OR RADIATION-SENSITIVE  RESIN COMPOSITION AND METHOD OF  FORMING PATTERN USING THE  COMPOSITION  (75)  Inventors:  Hidenori Takahashi,  Shizuoka (JP);  Shuji Hirano,  Shizuoka (JP);  Takayuki  Ito,  Shizuoka (JP);  Hideaki Tsubaki,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  13/393,173  (22)  PCT Filed:  Aug. 31, 2010  (86)  PCT No.:  PCT  I  JP2010/065192  § 371 (c)(l),  (2), ( 4) Date:  Feb.28,2012  (87)  PCT Pub. No.:  WO2011/025070  (51)  Int. Cl.  G03F  71004  G03F  7100  (2006.01)  (2006.01)  (52)  U.S. Cl.  CPC ................  G03F  710045  (2013.01);  G03F  7120  (2013.01);  G03F  710046  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01)  (58)  Field of Classification Search  None  See application file for complete search history.  OTHER PUBLICATIONS  (Continued)  (57)  ABSTRACT  14 Claims, No Drawings  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  (65)  Prior Publication Data  (30)  Foreign Application Priority Data  PCT Pub. Date:  Mar. 3, 2011  US 2012/0156618Al  Jun. 21, 2012  Aug. 31, 2009  (JP) ................................. 2009-200912  (Continued)  (Continued)  (Continued)  US009052590B2  Wang, Mingxing, et al., "Sythesis and Properties of New Anionic  Photoacid Generators Bound Polymer Resists for e-beam and EUV  lithography", Proc. ofSPIE, pp. 692312-1-692312-7, vol. 6923.  Primary Examiner  - Cynthia H Kelly  Assistant Examiner  - Alyssa L Cepluch  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  According to one embodiment, an actinic-ray- or radiation› sensitive resin composition includes a resin (P) containing not  only at least one repeating unit (A) that when exposed to  actinic rays or radiation, is decomposed to thereby generate  an acid and is expressed by any of general formulae  (I)  to (III)  below but also a repeating unit (B) containing at least an  aromatic ring group provided that the repeating unit (B) does  not include any of those of general formulae  (I)  to (III). (The  characters used in general formulae  (I)  to (III) have the mean› ings mentioned in the description.)  (II)  (I)  R11  R13  I  I  --+C-C+- 1  I  R12 X11  I  L11  I  X12  I  Ar1  I  X13  I  L12  I  Z1  JP  JP  09-325497  A  10-221852  A  12/1997  8/1998  5,945,250 A  6,013,411 A  *  7,026,098 B2  8/ 1999 Aoai et al.  1/2000 Aoai et al. ................. 430/270.1  4/2006 Komatsu et al.  (III) 