US 2020/0209747 Al  103  Jul. 2, 2020  EXAMPLES  Synthesis Example  1-1  Synthesis Example 1-3  Synthesis Example  1-4  Synthesis Example 1-2  X  ~  0  Monomer 3  Monomer4  Monomer 1  Monomer 2  P AG Monomer 1  ing is not essential. If rinsing is omitted, the amount of  solvent used may be reduced.  [0184]  A hole or trench pattern after development may be  shrunk by the thermal flow, RELACSfi or DSA process. A  hole pattern is shrunk by coating a shrink agent thereto, and  baking such that the shrink agent may undergo crosslinking  at the resist surface as a result of the acid catalyst diffusing  from the resist layer during bake, and the shrink agent may  attach to the sidewall of the hole pattern. The bake is  preferably at a temperature of 70 to 180°  C., more preferably  80 to 170°  C., for a time of  10  to 300 seconds. The extra  shrink agent is stripped and the hole pattern is shrunk.  [0185]  Examples of the invention are given below by way  of illustration and not by way of limitation. All parts are by  weight (pbw). Mw and Mw/Mn are determined by GPC  versus polystyrene standards using THF solvent.  [1]  Synthesis of Monomers  [0186]  Synthesis of Monomer  1  [0187]  Monomer  1  of the following formula was prepared  by esterification reaction of 5-iodoanthranilic acid with  2-hydroxyethyl methacrylate in triethylamine containing  carbodiimide hydrochloride as a condensing agent and  4,4- dimethyiaminopyridine (DMAP) as a catalyst and purifying  by silica gel colunm chromatography.  [0188]  Synthesis of Monomer 2  [0189]  Monomer 2 of the following formula was obtained  by the same procedure as in Synthesis Example  1-1  aside  from using 3,5-diiodoanthranilic acid instead of 5-iodoan› thranilic acid.  [0190]  Synthesis of Monomer 3  [0191]  Monomer 3 of the following formula was obtained  by the same procedure as in Synthesis Example  1-1  aside  from using iodopanoic acid instead of 5-iodoanthranilic  acid.  [0192]  Synthesis of Monomer  4  [0193]  Monomer  4  of the following formula was obtained  by the same procedure as in Synthesis Example  1-1  aside  from using diatrizoic acid instead of 5-iodoanthranilic acid.  [2] Synthesis of Polymers  [0194]  PAG Monomers  1  to 3 and ALG Monomers (i.e.,  acid labile group-containing monomers)  1  to 3 identified  below were used in the synthesis of polymers. 