US 20110008728Al  c19)  United States  c12)  Patent Application Publication  NAKAMURA et al.  c10) Pub. No.: US 2011/0008728 Al  (43) Pub. Date:  Jan. 13, 2011  (54)  RESIST COMPOSITION AND METHOD OF  FORMING RESIST PATTERN  (75)  Inventors:  Tsuyoshi NAKAMURA,  Kawasaki-shi (JP);  Masaru  TAKESHITA,  Kawasaki-shi (JP);  Jiro YOKOYA,  Kawasaki-shi (JP);  Hideo HADA,  Kawasaki-shi (JP);  Kensuke MATSUZAWA,  Kawasaki-shi (JP);  Kazushige  DOHTANI,  Kawasaki-shi (JP)  (51)  Int. Cl.  (73)  Assignee:  TOKYO OHKA KOGYO CO.,  LTD.,  Kawasaki-shi (JP)  (21)  Appl. No.:  12/788,160  (22)  Filed:  May 26, 2010  A resist composition including: a base component which  exhibits changed solubility in an alkali developing solution  under the action of acid; and an acid-generator component  containing an acid generator  (B 1) consisting of a compound  represented by general formula (bl); dissolved in an organic  solvent containing an alcohol-based organic solvent having a  boiling point of at least 150°  C., wherein R  7 " to R 9 " represents  an aryl &"oup or an alkyl group, provided that at least one of  R 7 "  to R "represents a substituted aryl group which has been  substituted with a group represented by the formula:  ---O-R$^{70 }$(R$^{70 }$represents an organic group), and two ofR 7 "  to R 9 "  may be mutually bonded to form a ring with the sulfur  atom; X represents a hydrocarbon group of 3 to 30 carbon  atoms; Q$^{1 }$represents a divalent linking group containing an  oxygen atom; and Y$^{1 }$represents an alkylene group of 1 to 4  carbon atoms or a fluorinated alkylene group of 1 to 4 carbon  atoms.  Correspondence Address:  KNOBBE MARTENS OLSON  &  BEAR LLP  2040  MAIN STREET, FOURTEENTH FLOOR  IRVINE, CA 92614 (US)  (52)  U.S. Cl.  ......................................  430/270.1;  430/326  May 29, 2009  (JP) ................................. 2009-130943  HORIZONTAL DIRECTION: FIRST POSITIVE RESIST COMPOSITION  VERTICAL DIRECTION: SECOND POSITIVE RESIST COMPOSITION  Publication Classification  (57)  ABSTRACT  (30)  Foreign Application Priority Data  [Chemical Formula 1]  (bl)  r.n  •x  m  >- 2  X - axis  2  1  1  G03F  7120  (2006.01)  G03F  71004  (2006.01) 