(IO)  Patent No.:  US 8,187,792 B2  May 29, 2012  (45)  Date of Patent:  c12)  United States Patent  Levanon et al.  (54)  PROCESSING OF POSITIVE-WORKING  LITHOGRAPHIC PRINTING PLATE  PRECURSOR  (75)  Inventors:  Moshe Levanon,  Ness-Ziona (IL);  Moshe Nakash,  Ramat Hashron (IL);  Tanya Kurtser,  Petach Tikva (IL)  (73)  Assignee:  Eastman Kodak Company,  Rochester,  NY(US)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by 951 days.  (21)  Appl. No.:  12/195,468  Aug. 21, 2008  (22)  Filed:  (51)  Int. Cl.  G03F  7130  (2006.01)  B41N 1/10  (2006.01)  (52)  U.S. Cl.  ......................  430/302;  430/326; 101/463.1  (58)  Field of Classification Search  ........................ None  See application file for complete search history.  OTHER PUBLICATIONS  (57)  ABSTRACT  (65)  Prior Publication Data  (56)  References Cited  U.S. PATENT DOCUMENTS  FOREIGN PATENT DOCUMENTS  19 Claims, No Drawings  EP  EP  1096315 Al  5/2001  1 868 036  12/2007  4,808,513 A  *  2/1989 Lazarus et al. ................ 430/331  4,828,965 A  *  5/1989 West et al. .................... 430/309  6,410,203 Bl  6/2002 Nakamura  6,541,181 Bl  4/2003 Levanon et al.  7,544,462 B2 *  6/2009 Levanon et al. ........... 430/270.1  2005/0287468 Al*  12/2005 Goodin ......................... 430/192  2006/0154187 Al*  7/2006 Wilson et al. ................. 430/331  JP  WO  WO  2006 018203 A  WO  O  1/09682 A2  2004/081662  1/2006  2/2001  9/2004  US 2010/0047723 Al  Feb. 25, 2010  English translation ofJP 2006-018203, A (2006) from machine trans› lation from AIPN Japan Patent Office National Center for Industrial  Property Information and Training, generated Jun. 22, 2011, 63 + 12  pages.*  U.S. Appl. No. 11/677,599, filed Feb. 22, 2007, titled Radiation› Sensitive Compositions and Elements With Basic Development  Enhancers, by M. Levanon et al.  U.S. Appl. No. 11/769,766, filed Jun. 28, 2007, titled Radiation› Sensitive Compositions and Elements With Solvent Resistant  Poly(Vinyl Acetal)s, by M. Levanon et al.  U.S. Appl. No. 11/959,492, filed Dec. 19, 2007, titled Radiation› Sensitive Elements With Developability-Enhancing Compounds, by  M. Levanon et al.  U.S. Appl. No. 12/025,089, filed Feb. 4, 2008, titled Method of  Imaging and Developing Positive-Working Imageable Elements, by  M. Levanon et al.  U.S. Appl. No. 12/125,084, filed May 22, 2008, titled Method of  Imaging and Developing Positive-Working Imageable Elements, by  M. Levanon et al.  * cited by examiner  Primary Examiner  - Cynthia Hamilton  (74)  Attorney, Agent, or Firm  - J. Lanny Tucker  Positive-working imageable elements can be imaged and pro› cessed using a processing solution that comprises at least 0.03  N of an organic amine or a mixture thereof, whose conjugated  acids have a pKa greater than 9 and a boiling point greater  than 150°  C. The imageable element is a single-layer, infrared  radiation-sensitive  positive-working  imageable  element  comprising a substrate and an infrared radiation absorbing  compound. It also has an imageable layer that comprises a  developability-enhancing compound and a poly(vinyl acetal)  in which at least 25 mo!  % of its recurring units comprise  pendant phenol, naphtha!, or anthracenol groups that are sub› stituted with one or more electron-withdrawing groups.  US008187792B2 