44  US 7,232,640 Bl  43  CA’J Cl)  -continued  Examples of such phenolic compounds include those  recited below, but the compounds usable in the invention  should not be construed as being limited to these examples.  Of these compounds, 1,8-diazabicyclo[5.4.0]undeca-7- ene and 1,5-diazabicyclo[4.3.0]nona-5-ene are preferred  over the others.  As the nitrogen-containing basic compounds having at  least two nitrogen atoms per molecule in different chemical  environments, compounds containing in each molecule both  a substituted or unsubstituted amino group and a nitrogen› containing cyclic structure and compounds having alky› lamino groups are especially preferred. Examples of such  especially preferred compounds include guanidine, 1, 1-me› thylguanidine,  1,1,3,3-tetraguanidine,  2-aminopyridine,  3-aminopyridine, 4-aminopyridine, 2-dimethylaminopyri› dine,  4-dimethylaminopyridine,  2-diethylaminopyridine,  2-(aminomethyl)pyridine,  2-amino-3-methylpyridine,  2-amino-4-methylpyridine,  2-amino-5-methylpyridine,  2-amino-6-methylpyridine, 3-aminoethylpyridine, 4-amino› ethylpyridine, 3-aminopyrrolidine, piperazine, N-(2-amino› ethyl)piperazine, N-(2-aminoethyl)piperidine, 4-amino-2,2,  6,6-tetramethylpiperidine,  4-piperidinopiperidine,  2-iminopiperidine, 1-(2-aminoethyl)pyrrolidine, pyrazole,  3-amino-5-methylpyrazole,  5-amino-3-methyl-1-p› tolylpyrazole,  pyrazine,  2-(aminomethyl)-5-methylpyra› zine, pyrimidine, 2,4-diaminopyrimidine, 4,6-dihydroxypy› rimidine, 2-pyrazoline, 3-pyrazoline, N-aminomorpholine,  N-(2-aminoethyl)morpholine,  trimethylimidazole,  triph› enylimidazole, and methyldiphenylimidazole. However,  these examples should not be construed as limiting the scope  of the basic compounds usable in the invention.  These basic compounds are used alone or as combinations  of two or more thereof. The proportion of the basic com› pounds used to the total solids in the resist composition is  generally from 0.001 to 10% by weight, preferably from  0.01 to 5% by weight.  The addition of basic compounds in a proportion lower  than 0.001 % by weight carmot produce the intended effect,  while the addition in proportions higher than 10% by weight  tends to lower the sensitivity and cause deterioration of  developability in unexposed areas.  Compounds usable in the invention for promoting disso› lution into a developer are low-molecular-weight com› pounds containing at least two phenolic OH groups or at  least one carboxyl group per molecule and having molecular  weight of 1,000 or below. When the compounds have  carboxyl groups, it is preferable that they are alicyclic or  aliphatic compounds for the same reasons as mentioned  above.  The suitable proportion of these dissolution-promoting  compounds is from 2 to 50% by weight, preferably from 5  to 30% by weight, based on the polymers used in the  invention. Those compounds added in a proportion greater  than 50% by weight give rise to aggravation of development  residue and a new defect that patterns are deformed at the  time of development.  It is easy for persons skilled in the art to synthesize the  foregoing phenolic compounds having molecular weight of  1,000 or below by reference to the methods as described in  JP-A-4-122938, JP-A-2-28531, U.S. Pat. No. 4,916,210 and  European Patent 2,192,294.  Namely, examples of phenolic compounds usable in the  invention include resorcinol, phloroglucine, 2,3,4-trihy› droxybenzophenone,  2,3,4,4’-tetrahydroxybenzophenone,  2,3,4,3’,4’,5’-hexahydroxybenzophenone,  acetone-pyro› gallol condensation resin, phloroglucoside, 2,4,2’,4’-biphe- nyltetraol, 4,4’-thiobis(l,3-dihydroxy)benzene, 2,2’,4,4’-tet› rahydroxydiphenyl  ether,  2,2’,4,4’-tetrahydroxydiphenyl  sulfoxide, 2,2’,4,4’-tetrahydroxydiphenyl sulfone, tris(4-hy- droxyphenyl)methane, 1, 1-bis( 4-hydroxyphenyl)cyclohex› ane,  4,4-a-methylbenzylidene )bisphenol, a,a’,a""-tris(  4- hydroxypheny I )-1,3, 5-triisopropy !benzene,  a,a’  ,a "-tris( 4- hydroxypheny I )-1-ethy 1-4-isopropy !benzene,  1,2,2-tris  (hydroxyphenyl)propane,  1,l,2-tris(3,5-dimethyl-4- hydroxyphenyl)propane, 2,2,5,5-tetrakis( 4-hydroxyphenyl)  hexane,  1,2-tetrakis( 4-hydroxyphenyl)ethane,  1,1,3-tris  (hydroxyphenyl)butane,  and  para  [a,a’,a"-tetrakis(4- hydroxypheny I) ]xylene.  As dyes used in the invention, fat dyes and basic dyes are  suitable. Examples of such dyes include Oil Yellow #101,  Oil Yellow #103, Oil Pink #312, Oil Green BG, Oil Blue  BOS, Oil Blue #603, Oil Black BY, Oil Black BS, Oil Black  T-505 (all of which are products of Orient Chemical Indus› tries,  Ltd.),  Crystal Violet  (CI42555),  Methyl Violet  (CI42535), Rhodamine B (CI45170B), Malachite Green  (CI42000) and Methylene Blue (CI52015).  For the purpose of enhancing the rate of acid generation  by exposure to light, photo-sensitizers as recited below can  be added. Examples of photo-sensitizers suitable for such a  purpose include benzophenone, p,  p’-tetramethyldiami› nobenzophenone,  p,p’-tetraethylethylaminobenzophenone,  2-chlorothioxanthone,  anthrone,  9-ethoxyanthracene,  anthracene, pyrene, perylene, phenothiazine, benzil, Acri› dine Orange, benzoflavin, Cetoflavin-T, 9,10-diphenylan› thracene, 9-fluorenone, acetophenone, phenanthrene, 2-ni› trofluorene, 5-nitroacenaphthene, benzoquinone, 2-chloro- 4-nitroaniline,  N-acetyl-p-nitroaniline,  p-nitroaniline,  N-acetyl-4-nitro- l-naphthylamine,  picramide,  anthraquinone,  2-ethylanthraquinone,  2-tert-butylan- thraquinone, 1,2-benzanthraquinone, 3-methyl-1,3-diaza-l,  9-benzanthrone, dibenzalacetone, 1,2-naphthoquinone, 3,3’- carbonyl-bis(5, 7-dimethoxycarbonylcoumarin)  and  coronene, but photo-sensitizers usable in the invention  should not be construed as being limited to these com - pounds.  Those photo-sensitizers can act also as absorbents of far  ultraviolet rays of a light source used. In this case, the light  absorbents can reduce reflected light from a substrate and  lessen the influence of multiple reflections within the resist  film, thereby producing an effect of standing-wave improve› ment.  To the present compositions, surfactants other than the  foregoing fluorine- and/or silicon-containing surfactants can  also be added. Examples of such surfactants include non› ionic surfactants, such as polyoxyethylene alkyl ethers (e.g.,  polyoxyethylene lauryl ether, polyoxyethylene stearyl ether,  polyoxyethylene cetyl ether, polyoxyethylene oleyl ether),  polyoxyethylene alkyl aryl ethers ( e.g., polyoxyethylene  octyl phenol ether, polyoxyethylene nonyl phenol ether),  polyoxyethylene-polyoxypropylene block copolymers, sor› bitan fatty acid esters ( e.g., sorbitan monolaurate, sorbitan  monopalmitate, sorbitan monostearate, sorbitan monooleate,  sorbitan trioleate, sorbitan tristearate ), and polyoxyethylene› sorbitan fatty acid esters (e.g., polyoxyethylene sorbitan  monolaurate,  polyoxyethylene  sorbitan monopalmitate, 