38  US 8,283,102 B2  37  about 1 part by weight oftetramethylammonium hydroxide  was used as the basic additive.  A chemically amplified resist composition was manufac› tured in the same manner as in the Example 3, except that  about 1 part by weight oftetramethylammonium hydroxide  was used as the basic additive.  A chemically amplified resist composition was manufac› tured in the same manner as in the Example 4, except that  about 1 part by weight oftetramethylammonium hydroxide  was used as the basic additive.  A chemically amplified resist composition was manufac› tured in the same manner as in the Example 2, except that  about 1.25 parts by weight oftetramethylammonium hydrox› ide was used as the basic additive.  A chemically amplified resist composition was manufac› tured in the same manner as in the Example 3, except that  about 1.25 parts by weight oftetramethylammonium hydrox› ide was used as the basic additive.  A chemically amplified resist composition was manufac› tured in the same manner as in the Example 4, except that  about 1.25 parts by weight oftetramethylammonium hydrox› ide was used as the basic additive.  A chemically amplified resist composition was manufac› tured in the same manner as in the Example 1, except that  about 100 parts by weight of a methacrylate copolymer rep› resented as Chemical formula 22 below was used instead of  using about 100 parts by weight of the copolymer obtained in  the synthesis example 15.  Referring to Table 1, the resolutions in the Examples and  Comparative Examples were similar, however, the sensitivity  and characteristics of line edge roughness were relatively  excellent in the Examples than in the Comparative Examples.  Particularly, the sensitivity was significantly excellent in  Examples 1, 8, and 9, and the characteristics of line edge  roughness was significantly excellent in Examples 1, 4, 7, and  10.  As described above, according to the exemplary embodi- ments, the PAG is connected with a main chain of the copoly› mer, whereby the PAG may be equally dispersed within the  resist layer. As a result, characteristics ofline edge roughness  A chemically amplified resist composition was manufac› tured in the same manner as in the Comparative Example 1,  The chemically amplified resist compositions respectively  manufactured through Examples 1 to 10, and the Compara- tive Examples 1 to 3 were coated on a substrate using a  spinner, and dried for about 90 seconds at about 110°  C. to  form a resist layer having a thickness of about 0.2 µm. Next,  the formed resist layer was exposed using an ArF excimer  laser stepper (lens numerical aperture: about 0.75), and sub- jected to a heat treatment at about 120°  C. for about 90  seconds. Next, the resist layer was developed for about 40  seconds using about 2.38 wt  % of a tetramethylammonium  hydroxide aqueous solution, and then washed and dried to  form a resist pattern. In this regard, sensitivity, resolution, and  characteristics ofline edge roughness were measured, and the  results are shown in Table 1 below. Here, the sensitivity may  denote an optimal exposure amount enabling a Line and  Space (LIS) pattern ofabout 0 .12 µm  formed after developing  to be formed to have a line width of 1: 1. Also, the resolution  may denote a minimal pattern numerical value formed in the  sensitivity. Also, the line edge roughness was measured using  a critical-dimension-measurement scanning electron micro› scope (CD-SEM), and a degree of the line edge roughness  was classified into five levels, which were 1 (significantly  bad), 2 (bad), 3 (moderate), 4 (good), and 5 (significantly  good).  2. Estimating Characteristics of Chemically Amplified  Resist Composition  A chemically amplified resist composition was manufac› tured in the same manner as in the Comparative Example 1,  except that about 1.25 parts by weight oftetramethylammo› nium hydroxide was used as the basic additive.  except that about 1 parts by weight oftetramethylammonium  hydroxide was used as the basic additive.  Comparative Example 3  Example 6  Example 7  Example 8  Example 9  Example 10  Comparative Example 1  Comparative Example 2  Sensitivity  Resolution  Line edge  (mJ/cm 2 )  (nm)  roughness  Example 1  Example 2  Example 3  Example4  Example 5  Example 6  Example 7  Example 8  10  15  14  16  11  11  13  10  100  5  90  4  100  3  100  5  110  4  100  4  120  5  110  3  Example 9  10  120  4  Example 10  11  120  5  Comparative  16  90  3  Example 1  Comparative  15  100  4  Example 2  Comparative  17  100  2  Example 3  TABLE 1  [Chemical formula 22] 50 