US 10,802,400 B2  173  174  -continued  -continued  T  0  0  Mw ~9,900  Mw/Mn~ 1.88  QD’ Br  ~I  6  Mw ~9,800  Mw/Mn~ 1.69  Examples and Comparative Examples  Preparation of Resist Composition  Comparative Synthesis Example 1  Synthesis of Comparative Polymer 1  Organic Solvents:  PGMEA (propylene glycol monomethyl ether acetate)  CyH (cyclohexanone)  PGME (propylene glycol monomethyl ether)  DAA ( diacetone alcohol)  50  Acid generators: PAG 1 to PAG 3 of the following structural  formulae  Resist compositions were prepared by dissolving the  components in a solvent in accordance with the recipe  shown in Table 1, and filtering through a filter having a pore  size of 0.2 µm. The solvent contained 100 ppm of surfactant  FC-4430 (3M). The components in Table 1 are as identified  below.  Comparative Polymer 1 was synthesized as white solid by  the same procedure as in Synthesis Example 1 aside from  using 7.6 g of Comparative PAG Monomer 1 instead of PAG  Monomer 1. The polymer was analyzed for composition by  $^{13}$C- and $^{1}$H-NMR and for Mw and Mw/Mn by GPC.  Comparative Polymer 1  PAGl 