(IO)  Patent No.:  US 10,802,400 B2  Oct. 13, 2020  (45)  Date of Patent:  Hatakeyama et al.  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  USO 10802400B2  (58)  Field of Classification Search  CPC .... G03F 7/0392; G03F 7/0397; G03F 7/0382;  G03F 7/2002; G03F 7/2004; G03F  7/2006; G03F 7/039; G03F 7/038; C08F  212/14; C08F 212/21  USPC ....................................................... 430/270.1  See application file for complete search history.  8,057,985 B2  11/2011 Ohashi et al.  2008/0102407 Al*  5/2008 Ohsawa ................ G03F 7/0382  430/286.1  2010/0063232 Al*  3/2010 Nagai ................... G03F 7/0392  526/287  2011/0177453 Al*  7/2011 Masubuchi ........... G03F 7/0382  430/270.1  JP  JP  4425776 B2  3/2010  5201363 B2  6/2013  G03F  71039  G03F  71038  G03F  7116  G03F  7138  G03F  7120  C08F  220116  C08F  212114  G03F  7132  G03F  71004  C08F 12/24  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  12 Claims, No Drawings  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  (30)  Foreign Application Priority Data  (65)  Prior Publication Data  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu (JP);  Masaki  Ohashi,  Joetsu (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  ( * )  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by 298 days.  (21)  Appl. No.:  16/006,063  (22)  Filed:  Jun. 12, 2018  US 2018/0373150 Al  Dec. 27, 2018  Jun. 21, 2017  (JP) ................................. 2017-121568  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..........  G03F  710382  (2013.01);  C08F  212114  (2013.01);  C08F  220116  (2013.01);  G03F  710045  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  71162  (2013.01);  G03F  71168  (2013.01);  G03F  712004  (2013.01);  G03F  712006  (2013.01);  G03F  712037  (2013.01);  G03F  71322  (2013.01);  G03F  7138  (2013.01);  C08F 12/24  (2013.01);  C08F 2800/20  (2013.01)  Yamamoto et al., "Polymer-Structure Dependence of Acid Genera› tion in Chemically Amplified Extreme Ultraviolet Resists", Japa› nese Journal of Applied Physics, 2007, vol. 46, No. 7, pp. Ll42- Ll44 (3 pages).  * cited by examiner  Primary Examiner  - John A McPherson  (74)  Attorney, Agent, or Firm  - Westerman, Hattori,  Daniels & Adrian, LLP  A resist compos1t10n compnsmg a polymer-bound acid  generator, i.e., a polymer comprising recurring units derived  from a sulfonium or iodonium salt having a brominated  linker between a polymerizable unsaturated bond and a  fluorosulfonic acid offers a high sensitivity and reduced  LWR or improved CDU independent of whether it is of  positive or negative tone.  c12)  United States Patent 