US 9,034,557 B2  48  47  TABLES  TABLE6  Lithographic Examples 1, 6, 27 and 34 are comparative examples.  27 and 34 are comparative examples.  Target feature for Lithographic Examples Ll-L9, L19-L24 and L31 is LIS (1: 1); Lithographic  Examples L27-L29, L32-L35 is Trenches 1: 1.  SB/PEBT: soft bake temperature/post exposure bake temperature Lithographic Examples 1, 6,  Lithogra12hic exarn12les  Litho  Photospeed  Example  El:1,  RES  EL  DOF  #  Formulation  mJ/cm 2  (nm)  (%)  (µm) Comments on profile  L1  Fl  17  190  11.8  0.4 severe standing waves  L2  F2  12  190  16.7  0.5  smooth profiles  L3  F3  21  190  9.5  0.6  standing waves  L4  F4  18  standing waves  L5  F5  10  severe standing waves  L6  F6  13  190  7.7  0.4 severe standing waves  L7  F7  11.5  190  10.9  0.5  small standing waves  LS  F8  11  180  11.4  0.7  small standing waves  L9  F9  10.5  180  11.9  0.7  smooth profile  L19  F18  13  190  27.3  small standing waves  L20  F19  13  210  26.3  1.2  smooth profile  L21  F20  12  220  23.5  1.1  smooth profile  L22  F21  13  220  28.2  1.2  smooth profile  L24  F24  36  vertical, smooth profile  Hopping  L27  F26  32  80  9.4  0.6  Slightly rounded profile,  footing  L28  F27  27  80  14.8  0.6  More vertical profile,  footing  L29  F28  25  75  16  0.6  More vertical profile,  footing  L30  F29  27  75  14.8  0.7  Vertical and smooth  profile, footing  L31  F30  33  110  vertical and smooth  lines, slightly rounded  L32  F31  40  110  22.5  0.5  smooth lines, slightly  rounded  L33  F32  39  110  18.2  0.5  vertical, smooth profiles  L34  F33  34.82  L35  F34  36.28  Litho  a hie exam les  Litho  Example  #  Formulation  Substrate  L1  Fl  Primed  Si  L2  F2  Primed  Si  L3  F3  Primed  Si  L4  F4  Primed  Si  L5  F5  Primed  Si  L6  F6  Primed  Si  L7  F7  Primed  Si  LS  F8  Primed  Si  L9  F9  Primed  Si  L19  F18  Primed  Si  L20  F19  Primed  Si  L21  F20  Primed  Si  L22  F21  Primed  Si  L24  F24  DUV44(60 nm)  L27  F26  193UL-F12(160 nm)  128  F27  193UL-F12(160 nm)  L29  F28  193UL-F12(160 nm)  L30  F29  193UL-F12(160 nm)  L31  F30  TIS 193UL52-50  L32  F31  193UL-F12  L33  F32  193UL-F12  L34  F33  193TCU-F12  L35  F34  193TCU-F12  Thickness  SB("  C. )/  ofresist  PEBT( 0  C.)  (nm)  Time (s)  Illumination  190  130/130, 90  Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  190  130/130, 90 Conv.  720  130/130, 60 Conv.  720  130/130, 60 Conv.  720  130/130, 60 Conv.  720  130/130, 60 Conv.  1180  130/130, 60 Conv.  110  135/100, 90 Quadrapole  110  135/100, 90 Quadrapole  110  135/100, 90 Quadrapole  110  135/100, 90 Quadrapole  110  120/100, 60 Annular  235  135/125, 90 Annular  235  135/125, 90 Annular  235  135/125/90 Annular  235  135/125/90 Annular  Target  SIGMA  CD(nm)  0.6  200  0.6  200  0.6  200  0.6  200  0.6  200  0.6  200  0.6  200  0.6  200  0.6  200  0.5  300  0.5  300  0.5  300  0.5  300  0.7  300  0.92/0.72  400  0.92/0.72  300  0.92/0.72  120  0.92/0.72  130  0.8/0.6  80  0.8/0.45  80  0.8/0.45  80  0.8/0.45  120  0.8/0.45  120 