1111111111111111 IIIIII IIIII 1111111111 11111 11111 lllll 111111111111111 111111111111111 11111111  US 20210033969Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama  c10)  Pub. No.: US 2021/0033969 Al  (43)  Pub. Date:  Feb. 4, 2021  (54)  CHEMICALLY AMPLIFIED RESIST  COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventor:  Jun Hatakeyama,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/919,366  (22)  Filed:  Jul. 2, 2020  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..........  G03F  710045  (2013.01);  G03F  712004  (2013.01);  G03F  710392  (2013.01);  G03F  710382  (2013.01)  Publication Classification  (57)  ABSTRACT  (30)  Foreign Application Priority Data  Aug. 2, 2019  (JP) ................................. 2019-142875  A chemically amplified resist composition comprising a  quencher containing an ammonium salt of a carboxylic acid  having an iodized or brominated hydrocarbyl group exclu› sive of an iodized or brominated aromatic ring and an acid  generator exerts a sensitizing effect and an acid diffusion  suppressing effect and forms a pattern having satisfactory  resolution, LWR and CDU.  G03F  71004  G03F  71038  G03F  71039  G03F  7120  (2006.01)  (2006.01)  (2006.01)  (2006.01) 