160  US 8,962,233  B2  159  Ar$_{1 }$ represents an aromatic ring group, and alternatively,  R$_{03 }$andAr$_{1 }$may be simultaneously alkylene groups and  bonded to each other so as to form a 5-membered or  6-membered ring in cooperation with -C----C-;  each of n Y’s independently represents a hydrogen atom or  a group that is eliminated by the action of an acid,  provided that at least one of the Y’s is a group that is  eliminated by the action of an acid; and  n is an integer of 1 to 4.  6.  The actinic-ray- or radiation-sensitive resin composition  according to claim  5,  wherein in general formula (A), at least  one group ofY s that is eliminated by the action of an acid has  a structure represented by the following general formula (B):  15.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  1,  wherein in general formula (V), the  cycloaliphatic group represented by B is limited to a cyclo› hexyl group.  16.  The actinic-ray-or radiation-sensitive resin composi- tion according to claim  1,  wherein in general formula (I), Ar 1  is a phenyl group substituted at its m-position by at least one  -(OR 1 )  group.  17.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  1,  wherein in general formula (I), the  two members selected from among mAr$^{1}$s and n R$^{2}$s are not  bonded to each other.  in which  each of L$_{1 }$ and L$_{2 }$ independently represents a hydrogen  atom, an alkyl group, a cycloalkyl group, an aryl group  or an aralkyl group;  Q represents an alkyl group, a cycloalkyl group, an alicy- clic group, an aromatic ring group, an amino group, an  ammonium group, a mercapto group, a cyano group or  an aldehyde group, and the alicyclic group and the aro› matic ring group may contain a heteroatom; and  at least two ofQ, M andL$_{1 }$maybe bonded to each other to  thereby form a 5-membered or 6-membered ring.  M represents a single bond or a bivalent connecting group;  7.  The actinic-ray- or radiation-sensitive resin composition  according to claim  1,  further comprising a resin soluble in an  alkali developer and an acid crosslinking agent capable of  eras slinking with the resin soluble in an alkali developer  under the action of an acid.  8. A  resist film formed from the actinic-ray- or radiation› sensitive resin composition according to claim  1.  9. A  method of forming a pattern, comprising forming the  actinic-ray- or radiation-sensitive resin composition accord› ing to claim  1  into a film, exposing the film and developing the  exposed film.  10.  The method of forming a pattern according to claim  9,  wherein the exposure is performed using X-rays, an electron  beamorEUV.  11.  The actinic-ray- or radiation-sensitive resin composi- tion according to claim  1,  wherein p is 3 in general formula  (V).  12.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  11,  wherein B is a cycloaliphatic  group in general formula (V).  13.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  12,  wherein Bis a cyclohexyl group in  general formula (V).  14.  The actinic-ray- or radiation-sensitive resin composi- tion according to claim  1,  wherein the anion moiety of general  formula (II) has the following structure:  provided that when mis 1 and n is 2, two R $^{2}$s may be  bonded to each other to thereby form a tetrahy› drothiophene ring or a tetrahydrothiopyran ring in coop› eration with the sulfur atom appearing in the formula,  and provided that when mis 2 and n is 1, or when mis 3  and n is 0, two Ar$^{1}$s, or Ar$^{1 }$and R $^{2 }$may be bonded to each  other to thereby form a ring structure in cooperation with  the sulfur atom appearing in the formula, in which two  Ar$^{1}$s, or Ar 1  and R 2  are simultaneously phenyl groups  and the ring structure formed is a dibenzothiophene ring  or a dibenzothiopyran ring,  mis an integer of 1 to 3, and nan integer of0 to 2, provided  that m+n=3 is satisfied,  R2 represents an optionally substituted aryl group, an  optionally substituted alkyl group or an optionally sub› stituted cycloalkyl group,  Rl represents a linear or branched alkyl group or a  cycloalkyl group,  Ari represents an aromatic ring, in which a substituent  other than  -(ORI) groups may further be introduced,  in which  1 is an integer of 1 or greater,  19.  A compound of general formula (VI) that when  exposed to actinic rays or radiation, generates an acid having  a volume of 240 A3 or greater,  18.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  1,  wherein in general formula (I), mis  an integer of 3.  (VI)  (  (R$^{1}$0) 1  ~  \  +  ~S-+R $^{2}$)n  m  0  II  W-S-+X+-G-+L+-D  II  2  y  0  (B) 