28.  The pattern-forming method as claimed in claim  24,  further comprising:  (5) a process of rinsing the film with a rinsing liquid con› taining an organic solvent after the process ( 4).  29.  The pattern-forming method as claimed in claim  24,  wherein  the resin (A) further contains a repeating unit represented  by the following formula  (Al):  31.  The pattern-forming method as claimed in claim  24,  wherein the repeating unit having an alicyclic hydrocarbon  structure substituted with a hydroxyl group or a cyano group  is a repeating unit represented by any of the formula (Alla) to  (AIId):  30.  The pattern-forming method as claimed in claim  24,  which is a method for forming a fine circuit of a semiconduc› tor device.  wherein  wherein in formulae (Alla) to (AIId), R$_{1}$c represents a  hydrogen atom, a methyl group, a trifluoromethyl group  or a hydroxymethyl group;  each of R$_{2}$c to R$_{4}$ c independently represents a hydrogen  atom, a hydroxyl group or a cyano group, provided that  at least one ofR$_{2}$c to R$_{4}$ c represents a hydroxyl group or  a cyano group.  32.  The pattern-forming method as claimed in claim  24,  wherein the resin (A) contains a repeating unit having a  lactone structure.  33.  The pattern-forming method as claimed in claim  29,  wherein the content of the repeating unit represented by for› mula (1) in the resin is in the range of 1 to 40 mo!% based on  all the repeating units, and the content of the repeating unit  represented by formula (AI) in the resin is in the range of 20  to 70 mo! % based on all the repeating units, and the content  in the resin of the repeating unit having an alicyclic hydro› carbon structure substituted with a hydroxyl group or a cyano  group is 1 to 40 mo! %, based on all the repeating units.  * * * * *  group consisting ofbutyl acetate, pentyl acetate, isopen› tyl acetate, propylene glycol monomethyl ether acetate,  and anisole.  128  US 8,546,063 B2  127  (Al)  (Alla)  (Alld)  R3C  ~-Ell  CN  (Alie)  R3C  ~ $_{coo }$ R2C  RiC  R3C  (Allb)  ~ $_{coo }$ R2C  RiC  R3C  -continued  T represents a single bond or a divalent linking group; and  each of Rx  i, Rx $_{2 }$and Rx$_{3 }$independently represents an alky I  group or a cycloalkyl group, and Rx$_{2 }$ and Rx$_{3 }$ may be  bonded to each other to form a cyclic structure.  Xa$_{1 }$ represents a hydrogen atom or an alkyl group; 