Aug. 4, 2016  42  US 2016/0223905 Al  [0390]  Specific examples of the group represented by Gen› eral Formula (F3) include those exemplified in "0500" of  US2012/0251948Al.  [0391]  Specific examples of the group represented by Gen› eral Formula (F4) include ----C(CF$_{3}$ ) $_{2}$OH, -C(C$_{2}$F$_{5}$ ) $_{2}$OH,  -C(CF$_{3}$)(CH$_{3}$)OH, and -CH(CF$_{3}$)OH, with ----C(CF$_{3}$ )  $_{2}$OH being preferable.  [0392]  The partial structure having a fluorine atom may be  bonded directly to the main chain or may be bonded to the  main chain through a group selected from the group consist› ing of an alkylene group, a phenylene group, an ether bond, a  thioether bond, a carbonyl group, an ester bond, an amide  bond, a urethane bond, and a ureylene bond, or a group  formed by combination of two or more thereof.  [0393]  The hydrophobic resin may contain a silicon atom.  As a partial structure having a silicon atom, a resin having an  alkylsilyl structure (preferably a trialkylsilyl group), or a  cyclic siloxane structure is preferable.  [0394]  Examples of the alkylsilyl structure or the cyclic  siloxane structure include the partial structures described in  paragraphs "0304" to "0307" of JP2013-l 78370A.  [0395]  Examples of the repeating unit having a fluorine  atom or a silicon atom include those exemplified in "0519" of  US2012/0251948Al.  [0396]  Furthermore, it is also preferable that the hydropho› bic resin contains a CH$_{3 }$ partial structure in the side chain  portion as described above.  [0397]  Here, the CH$_{3 }$ partial structure contained in the side  chain portion in the hydrophobic resin includes a CH$_{3 }$ partial  structure contained in an ethyl group, a propyl group, and the  like.  [0398]  On the other hand, a methyl group bonded directly  to the main chain of the hydrophobic resin (for example, an  ao-methyl group in the repeating unit having a methacrylic  acid structure) makes only a small contribution of uneven  distribution to the surface of the hydrophobic resin due to the  effect of the main chain, and it is therefore not included in the  CH$_{3 }$ partial structure.  [0399]  More specifically, in the case where the hydropho› bic resin contains a repeating unit derived from a monomer  having a polymerizable moiety with a carbon-carbon double  bond, such as a repeating unit represented by the following  General Formula (M), and in addition, R$_{11 }$ to R$_{14 }$are CH$_{3 }$ "themselves", such CH$_{3 }$ is not included in the CH$_{3 }$ partial  structure contained in the side chain portion in the present  invention.  [0400]  On the other hand, a CH$_{3 }$ partial structure which is  present via a certain atom from a C----C main chain corre› sponds to the CH$_{3 }$ partial structure in the present invention.  For example, in a case where R$_{11 }$is an ethyl group (CH$_{2}$CH$_{3}$),  the structure has "one" CH$_{3 }$ partial structure in the present  invention.  (M)  R11  R13  I  I  --fC-Cr  I  I  R12 R14  [0401]  In General Formula (M),  [0402]  R$_{11 }$to R$_{14 }$each independently represent a side chain  portion.  [0403]  Examples of R$_{11 }$ to R$_{14 }$ at the side chain portion  include a hydrogen atom and a monovalent organic group.  [0404]  Examples of the monovalent organic group for R$_{11 }$ to R$_{14 }$ include an alkyl group, a cycloalkyl group, an aryl  group, an alkyloxycarbonyl group, a cycloalkyloxycarbonyl  group, an aryloxycarbonyl group, an alkylaminocarbonyl  group, a cycloalkylaminocarbonyl group, and an arylami› nocarbonyl group, each of which may further have a substitu› ent.  [0405]  The hydrophobic resin is preferably a resin includ› ing a repeating unit having the CH$_{3 }$partial structure in the side  chain portion thereof. Further, the hydrophobic resin prefer› ably has, as such a repeating unit, at least one repeating unit  (x) selected from a repeating unit represented by the follow› ing General Formula (II) and a repeating unit represented by  the following General Formula (III).  [0406]  Hereinafter, the repeating unit represented by Gen› eral Formula (II) will be described in detail.  (II)  [0407]  In General Formula (II), X$_{61 }$represents a hydrogen  atom, an alkyl group, a cyano group, or a halogen atom, and  R$_{2 }$ represents an organic group which has one or more CH$_{3 }$ partial structures and is stable against an acid. Here, more  specifically, the organic group which is stable against an acid  is preferably an organic group which does not have "the  acid-decomposable group" as mentioned with respect to the  resin (A).  [0408]  The alkyl group ofX$_{61 }$ is preferably an alkyl group  having 1 to 4 carbon atoms, and examples include a methyl  group, an ethyl group, a propyl group, a hydroxymethyl  group, and a trifluoromethyl group, with the methyl group  being preferable.  [0409]  X$_{61 }$ is preferably a hydrogen atom or a methyl  group.  [0410]  Examples ofR$_{2 }$include an alkyl group, a cycloalkyl  group, an alkenyl group, a cycloalkenyl group, an aryl group,  and an aralkyl group, each of which has one or more CH$_{3 }$ partial structures. Each of the cycloalkyl group, the alkenyl  group, the cycloalkenyl group, the aryl group and the aralkyl  group may further have an alkyl group as a substituent.  [0411]  R$_{2 }$ is preferably an alkyl group or an alkyl-substi› tuted cycloalkyl group, each of which has one or more CH$_{3 }$ partial structures.  [0412]  The number of the CH$_{3 }$ partial structures contained  in the organic group which has one or more CH$_{3 }$ partial  structures and is stable against an acid as R$_{2 }$ is preferably 2 to  10, and more preferably 2 to 8.  [0413]  Specific preferred examples of the repeating unit  represented by General Formula (II) are set forth below, but  the present invention is not limited thereto. 