Though not particularly limited, the number of carbon  atoms that the aryl group represented by R has is generally  from 6 to 20, and preferably from 6 to 10. Specific examples  of the aryl group include a phenyl group, a naphthyl group, 10  and the like.  Though not particularly limited, the number of carbon  atoms that the cycloalkyl group represented by R has is gen- erally from 3 to 20 and preferably from 5 to 15.  Though not particularly limited, the number of carbon  atoms that the alkyl group represented by R has is generally  from 1 to 20 and preferably from 1 to 12.  Though not particularly limited, the number of carbon  atoms that the aralkyl group represented by R has is generally  from 7 to 20 and preferably from 7 to 11. Specific examples of  the aralkyl group include a benzyl group and the like.  In the alkyl group, the cycloalkyl group, the aryl group, and  the aralkyl group represented by R, a hydrogen atom may be  substituted with a substituent. Examples of the substituent  include an alkyl group, a cycloalkyl group, an aryl group, an  aralkyl group, a hydroxyl group, a carboxyl group, an alkoxy  group, an aryloxy group, an alkylcarbonyloxy group, an alky› loxycarbonyl group, and the like.  In the compound represented by General Formula (BS-1 ),  at least two of Rs are preferably organic groups.  Specific examples of the compound represented by Gen› eral Formula (BS-1) include tri-n-butylamine, tri-n-penty› lamine, tri-n-octylamine, tri-n-decylamine, triisodecylamine,  dicyclohexylmethylamine,  tetradecylamine,  pentadecy› lamine, hexadecy !amine, octadecy !amine, didecy !amine,  methyl octadecylamine, dimethylundecyl amine, N,N-dim› ethyldodecylamine, methyldioctadecylamine, N,N-dibutyla› niline, N,N-dihexylaniline, 2,6-diisopropylaniline, and2,4,6- tri(t-butyl)aniline.  Examples of preferable basic compounds represented by  General Formula (BS-1) include a compound in which at least  one R is an alkyl group substituted with a hydroxyl group.  Specific examples thereof include triethanolamine and N-di› hydroxyethylaniline.  The alkyl group represented by R may have an oxygen  atom in an alkyl chain. That is, an oxyalkylene chain may be  formed. The oxyalkylene chain is preferably ----CH$_{2}$CH$_{2}$0-.  Specific examples thereof include tris(methoxyethoxyethyl)  amine and compounds exemplified from Line 60 of Column  3 in U.S. Pat. No. 6,040,112A.  (2) Compound Having Nitrogen-Containing Heterocyclic  Structure  The nitrogen-containing heterocycle may or may not be  aromatic, and may have a plurality of nitrogen atoms. This  heterocycle may also contain hetero atoms other than nitro› gen. Specific examples thereof include compounds having an  imidazole structure (2-phenylbenzimidazole, 2,4,5-triph› enylimidazole, and the like), compounds having a piperidine  structure (N-hydroxyethylpiperidine, bis(l ,2,2,6,6-pentam› ethyl-4-piperidyl)sebacate, and the like), compounds having  a pyridine structure ( 4-dimethylaminopyridine and the like),  and compounds having an antipyrine structure (antipyrine,  hydroxyantipyrine, and the like).  In addition, compounds having two or more ring structures  are preferably used, and specific examples thereof include  1,5-diazabicyclo[4.3.0]nona-5-ene  and  1,8-diazabicyclo  [5.4.0]-undeca-7-ene.  (3) Amine Compound Having Phenoxy Group  An  amine compound having a phenoxy group is a com› pound that has a phenoxy group at an end positioned opposite  to an N atom of an alkyl group contained in an amine com- pound. The phenoxy group may have a substituent such as an  alkyl group, an alkoxy group, a halogen atom, a cyano group,  a nitro group, a carboxyl group, a carboxylic acid ester group,  a sulfonic acid ester group, an aryl group, an aralkyl group, an  acyloxy group, and an aryloxy group.  This compound more preferably has at least one oxyalky› lene chain between a phenoxy group and a nitrogen atom. The  number of the oxyalkylene chain in a single molecule is  preferably from 3 to 9, and more preferably from 4 to 6.  Among the oxyalkylene chains, -CH$_{2}$CH$_{2}$0- is particu› larly preferable.  Specific examples of the compound include 2-[2-{2-(2,2- dimethoxy-phenoxyethoxy )ethy I }-bis-(2-methoxyethy I)]› amine and compounds (Cl-1) to (C3-3) exemplified in Para› graph [0066] ofUS2007/0224539Al.  ( 4) Ammonium Salt  An  ammonium salt can also be appropriately used. This  ammonium salt is preferably a hydroxide or a carboxylate.  More specifically, the anmionium salt is preferably a tet› raalkylammonium hydroxide such as tetrabutyl anmionium  hydroxide.  In addition, examples of compounds usable for the com› position of the present invention include compounds synthe› sized in examples of JP2002-363146A, compounds disclosed  in Paragraph [0108] of JP2007-298569A, and the like.  As the basic compound, a photosensitive basic compound  may also be used. As the photosensitive basic compound,  compounds disclosed in, for example, JP2003-524799A and  J. Photopolym. Sci & Tech. Vol. 8, pp. 543-553 (1995) can be  used.  The molecular weight of the basic compound is preferably  from 250 to 2000 and more preferably from 400 to 1000.  These basic compounds may be used alone, or two or more  kinds thereof may be used in combination.  When the composition according to the present invention  further contains the basic compound, the content of the basic  compound is generally from 0.001 % by mass to 10% by mass,  and preferably from 0.01 % by mass to 5% by mass, based on  the total solid contents of the composition.  The molar ratio of the photoacid generator described later  to the basic compound is preferably from 1.5 to 300. That is,  from the viewpoint of improving sensitivity and resolution,  the molar ratio is preferably 1.5 or higher, and from the  viewpoint of inhibiting resolution deterioration caused by  pattern thickening that occurs before a post exposure bake,  the molar ratio is preferably 300 or lower. The molar ratio is  more preferably from 2.0 to 200, and even more preferably  from 2.5 to 150.  When the compound (P) contains the repeating unit repre› sented by the General Formula (4) described above, the pho› toacid generator in the above molar ratio is based on the total  amount of the repeating unit and the photoacid generator  described later.  [3] Acid Degradable Resin  The composition according to the present invention may  further contain a resin of which a dissolution rate in an alka› line developer is increased due to the degradation of the resin  caused by the action of an acid, that is, an acid-degradable  resin, in addition to the compound (P).  The acid-degradable resin typically has a group (hereinbe› low, also referred to as an acid-degradable group) that is  degraded by the action of an acid and generates an alkali› soluble group. This resin may have the acid-degradable group  on one of or both the main chain and side chain. It is prefer› able that the resin have the acid-degradable group on the side  chain.  As disclosed in EP254853B, JP1990-25850A (JP-H02- 25850A),  JP1991-223860A  (JP-H03-223860A),  and  JP1992-251259A (JP-H04-251259A), the acid-degradable  144  US 8,574,814 B2  143 