287  US 9,323,153 B2  288  The numerical value of"% by mass" shown in Table 6 is a  value based on the entire solid content excluding the surfac› tant of the composition. Incidentally, the content of the sur› factant is 0.01 % by mass with respect with the entire solid  content excluding the surfactant of the composition.  A pattern formation was carried out in the same manner as  for the alkali development/positive pattern except that the  development was carried out by means of an organic devel› oper instead of the alkali developer using an exposing mask  that inverted the pattern of the exposed mask, the develop- ment was carried out for 30 seconds instead of 60 seconds,  and an organic rinsing liquid was used instead of pure water  as the rinsing liquid.  For each of the obtained positive-tone pattern and the nega› tive-tone pattern, the sensitivity, the pattern shape, the reso› lution, and DOF were evaluated by the evaluation methods  described below.  Firstly the cross-sectional shape of a line and space pattern  which has been obtained was observed by using a scanning  electron microscope (S-4800 manufactured by Hitachi Ltd.).  Then, the minimum irradiation energy when resolving a line  with a line width of 50 nm was obtained and the value was set  as "the sensitivity (mJ/cm 2 )".  The cross-sectional shape of the 100 nm line pattern (line:  space= 1: 1) at the irradiation dose giving the sensitivity above  was observed by using a scanning electron microscope  (S-4800, manufactured by Hitachi, Ltd.). Then, the shape  thereof was evaluated in two stages of "rectangular" and  "taper".  In the sensitivity obtained above, a minimum nm at which  resolution could be made with line:space=l: 1 was observed  by using a scanning electron microscope.  For a 50 nm line pattern (line:space=l: 1), a 50 nm isolated  line (line:space=l: 10), and a 50 nm isolated trench pattern, an  acceptable range of focus variation was determined and a  common focus variation width  (µm) acceptable in all was  determined.  The evaluation results were shown in Table 5 and Table 6.  TABLES  [Sensitivity]  [Defocus Latitude (DOF)]  [Resolution]  [Pattern Shape]  (EUV Exposure/Alkali Development/Positive-tone)  Resist com osition  Resin  Photo-acid  Surfactant  Evaluation result  (Ab)(%  Solvent  generator  Basic compound  (0.01% by Sensitivity  Pattern  Resolution  DOF  Resin (Aa) by mass) (mass ratio)  (35% by mass)  (2% by mass)  mass)  (mJ/cm 2 )  shape  (nm)  (µm)  Example 1  Ab-17  S-4/S-3  B-110  AM-49/N-5  W-3  14  rectangular  28.0  0.25  (80/20)  (80/20)  * $^{4}$Example 2  Ab-178  S-2  B-122  AM-32  W-3  19  rectangular  32.0  0.25  * $^{4}$Example 3  Ab-178  S-2  B-122  AM-34  W-3  23  rectangular  34.0  0.20  * $^{4}$Example 4  Ab-178  S-2  B-122  AM-40  W-3  26  rectangular  36.0  0.15  * $^{3}$Example 5  Aa-16  Ab-240  S-2/S-3  AM-4  W-4  22  rectangular  34.0  0.25  (80/20)  * $^{3}$Example 6  Aa-16  Ab-240  S-2/S-3  AM-5  W-4  21  rectangular  34.0  0.25  (80/20)  * $^{3}$Example 7  Aa-16  Ab-240  S-2/S-3  AM-6  W-4  22  rectangular  34.0  0.25  (80/20)  * $^{3}$Example 8  Aa-16  Ab-240  S-2/S-3  AM-7  W-4  23  rectangular  34.0  0.25  (80/20)  * $^{3}$Example 9  Aa-16  Ab-240  S-2/S-3  AM-8  W-4  23  rectangular  34.0  0.25  (80/20)  * $^{3}$Example 10  Aa-16  Ab-240  S-2/S-3  AM-3  W-4  27  rectangular  36.0  0.20  (80/20)  * $^{3}$Example 11  Aa-16  Ab-240  S-2/S-3  AM-1  W-4  30  rectangular  38.0  0.15  (80/20)  * $^{3}$Example 12  Aa-16  Ab-240  S-2/S-3  AM-53  W-4  30  rectangular  40.0  0.10  (80/20)  * $^{1}$Example 13  Aa-29  Ab-173  S-1/S-2  B-123  AM-23  W-4  8  rectangular  24.0  0.30  (70/30)  * $^{1}$Example 14  Aa-29  Ab-173  S-1/S-2  B-123  AM-26  W-4  12  rectangular  26.0  0.25  (70/30)  Example 15  Ab-14  S-1/S-2  B-119  AM-24  W-4  9  rectangular  26.0  0.30  (80/20)  Example 16  Ab-14  S-1/S-2  B-119  AM-30  W-4  14  rectangular  28.0  0.25  (80/20)  Example 17  Ab-14  S-1/S-2  B-119  AM-38  W-4  18  rectangular  30.0  0.20  (80/20)  * $^{2}$Example 18  Ab-232  S-2/S-4  AM-42  W-2  20  rectangular  32.0  0.15  (70/30)  * $^{2}$Example 19  Ab-233  S-2/S-4  AM-42  W-2  16  rectangular  30.0  0.20  (70/30)  * $^{2}$Example 20  Ab-234  S-2/S-4  AM-42  W-2  13  rectangular  28.0  0.25  (70/30)  * $^{2}$Example 21  Ab-245  S-2/S-1  AM-43  W-1  14  rectangular  28.0  0.30  (90/10)  * $^{2}$Example 22  Ab-245  S-2/S-1  AM-48  W-1  18  rectangular  30.0  0.25  (90/10)  * $^{2}$Example 23  Ab-245  S-2/S-1  AM-50  W-1  22  rectangular  34.0  0.20  (90/10)  * $^{2}$Example 24  Ab-245  S-2/S-1  AM-28  W-1  26  rectangular  36.0  0.15  (90/10) 