Jan. 30,  2014  US 2014/0030643 Al  63  of0.1 to 20 mass%. The pH value of the alkali developer is  generally in the range of 10.0 to 15.0.  edited by Yoshihiko Hirai, published by Frontier Publishing  (issued in June, 2006), Japanese Patent No. 4109085, JP-A- 2008-162101, etc.  [0351]  <Method of Forming Pattern>  [0352]  The composition of the present invention is typi› cally used in the following manner. In particular, the compo› sition of the present invention is typically applied onto a  support, such as a substrate, thereby forming a film. The  thickness of the film is preferably in the range of0.02 to 10.0  µm.  The method of application onto a substrate is preferably  spin coating. The spin coating is performed at a rotating speed  of preferably 1000 to 3000 rpm.  [0353]  For example, the composition is applied onto, for  example, any of substrates ( e.g., silicon/silicon dioxide coat› ing, silicon nitride and chromium-vapor-deposited quartz  substrate, etc.) for use in the production of precision inte› grated circuit devices, etc. by appropriate application means,  such as a spinner or a coater. The thus applied composition is  dried, thereby forming an actinic-ray- or radiation-sensitive  film (hereinafter also referred to as a photosensitive film). The  application of the composition to the substrate can be pre› ceded by the application of a heretofore known antireflection  film.  [0354]  The resultant photosensitive film is exposed to  actJmc rays or radiation, preferably baked (heated), and  developed. A pattern of enhanced quality can be obtained by  baking. From the viewpoint of sensitivity and stability, the  baking temperature is preferably in the range of80 to 150°  C.,  more preferably 90 to 130°  C.  [0355]  As the actinic rays or radiation, there can be men› tioned, for example, infrared light, visible light, ultraviolet  light, far-ultraviolet light, X-rays or electron beams. It is  preferred for the actinic rays or radiation to have, for example,  a wavelength of 250 mn or shorter, especially 220 mn or  shorter. As such actinic rays or radiation, there can be men› tioned, for example, a KrF excimer laser (248 mn), an ArF  excimer laser (193 mn), anF$_{2 }$excimer laser (157 mn), X-rays  or electron beams. As preferred actinic rays or radiation, there  can be mentioned EUV-rays or electron beams. EUV-rays are  especially appropriate.  [0356]  The exposure in the condition that the interstice  between the photosensitive film and a lens is filled with a  liquid (for example, pure water) whose refractive index is  higher than that of air, namely, liquid-immersion exposure  may be carried out in the stage of the exposure to actinic rays  or radiation. This liquid-immersion exposure can enhance the  resolution.  [0357]  In the development step, an alkali developer is gen› erally used. As the alkali developer for the composition of the  present invention, use can be made of any of alkaline aqueous  solutions containing, for example, an inorganic alkali com› pound such as sodium hydroxide, potassium hydroxide,  sodium carbonate, sodium silicate, sodium metasilicate or  aqueous annnonia; a primary amine such as ethylamine or  n-propylamine; a secondary amine such as diethylamine or  di-n-butylamine; a tertiary amine such as triethylamine or  methyldiethylamine; an alcoholamine such as dimethyletha› nolamine or triethanolamine; a quaternary ammonium salt  such as tetramethylammonium hydroxide or tetraethylam› monium hydroxide; or a cycloamine such as pyrrole or pip› eridine.  [0358]  Appropriate amounts of an alcohol and a surfactant  may be added to the alkali developer before use. The alkali  concentration of the alkali developer is generally in the range  EXAMPLE  [0359]  The present invention will be described in greater  detail below by way of its examples. However, the gist of the  present invention is in no way limited to these examples.  [0360]  <Acid-Decomposable Resin>  [0361]  The following resins (A-1) to (A-5) were provided  as the resin (P).  (A-1)  OH  (A-2)  (A-3)  OH 