US 10,394,127 B2  81  82  -continued  Examples of the aryl group included in the aryl sulfonate  include a phenyl group, a naphthyl group, and an anthryl  group. These aryl groups may have a substituent. As the  substituent, for example, a linear or branched alkyl group  having 1 to 6 carbon atoms or a cycloalkyl group having 3  to 6 carbon atoms is preferable. Specifically, for example, a  methyl group, an ethyl group, an n-propyl group, an isopro› pyl group, an n-butyl group, an i-butyl group, a t-butyl  group, an n-hexyl group, or a cyclohexyl group is preferable.  Examples of other substituents include an alkoxy group  having 1 to 6 carbon atoms, a halogen atom, a cyano group,  a nitro group, an acyl group, and an acyloxy group.  The carboxylate may be an aliphatic carboxylate or an  aromatic carboxylate, and examples thereof include acetate,  lactate, pyruvate, trifluoroacetate, adamantane carboxylate,  hydroxyadamantane carboxylate,  benzoate, naphthoate,  salicylate, phthalate, and phenolate, and, in particular, ben› zoate, naphthoate, or phenolate is preferable, and benzoate  is the most preferable.  In this case, the anmionium salt is preferably tetra(n› butyl)ammonium benzoate, tetra(n-butyl)anmionium phe› nolate, or the like.  In a case where the ammonium salt is hydroxide, the  ammonium salt is particularly preferably tetraalkylammo- nium hydroxide (tetraalkylammonium hydroxide such as  tetramethylanmionium  hydroxide,  tetraethylammonium  hydroxide, and tetra-n-butyl)ammonium hydroxide) having  1 to 8 carbon atoms.  (Q5) Low Molecular Compound Having Nitrogen Atom  and Group Capable of Leaving by Action of Acid  The actinic ray-sensitive or radiation-sensitive resin com› position used in the present invention can include a low  molecular compound having a nitrogen atom and a group  capable of leaving by the action of an acid. The compound  preferably has basicity after the group capable ofleaving by  the action of an acid leaves.  With regard to the compound, reference can be made to  the description in paragraphs [0324] to [0337] of JP2012- 133331A, the contents of which are incorporated herein.  In the present invention, the compound may be used  singly or as a mixture of two or more kinds thereof.  Other examples of the basic compound which can be used  in the actinic ray-sensitive or radiation-sensitive resin com› position include the compounds synthesized in Examples of  JP2002-363146A and the compounds described in para› graph 0108 of JP2007-298569A.  A photosensitive basic compound may also be used as the  basic compound (C’). As the photosensitive basic com› pound, for example, the compounds described in JP2003- 524799A, J. Photopolym. Sci. & Tech., Vol. 8, P. 543 to 553  (1995), or the like can be used.  Preferred specific examples of the basic compound (C’)  include the following compounds, but are not limited  thereto.  C-1  The molecular weight of the basic compound (C’) is  typically 100 to 1,500, preferably 150 to 1,300, and more  preferably 200 to 1,000.  These basic compounds  (C’) may be used singly or in  combination of thereof.  The actinic ray-sensitive or radiation-sensitive resin com- position used in the present invention may or may not  include the basic compound  (C’). However, in a case where  the basic compound  (C’) is included in the composition, the  C-2  C-3  C-4  C-5  C-6  HO~  N  ~  O ~  o~  $^{~ }$o’l  0  ~ $_{OH }$