44  US 8,283,102 B2  43  selectively exposing the resist layer; and  developing the exposed resist layer:  11.  The method of claim  10,  wherein a light source for the  exposing is any light source selected from a KrF excimer  laser, an ArF excimer laser, an Extreme Ultra Violet (EUV)  light, an X-ray, and an electron-beam (e-beam).  12.  The method of claim  10,  wherein a light wavelength of  the light source for the exposing is about 180 nm to 250 nm.  13.  The copolymer of claim  12,  wherein the copolymer has  a weight average molecular weight (Mw) of about 500 to  100,000.  14.  The copolymer of claim  3,  wherein the copolymer for a  chemically amplified resist is represented as any copolymer  of Chemical formulas below, which are  wherein R$_{1 }$is a C$_{1 }$-C$_{5 }$ alkoxy group, R$_{2 }$ and R$_{3 }$ are respec› tively a linear or branched C$_{1 }$-C$_{20 }$alkyl group, an aryl  group, a linear or branched C$_{1 }$-C$_{20 }$perfluoroalkyl group,  a benzyl group, or a  CcC$_{20 }$ aryl group, and  A- is a  compound represented as  wherein X$_{1 }$ is a monocyclic or polycyclic C$_{3}$ -C$_{20 }$hydro› carbon group, a benzyl group, a  CcC$_{20 }$ aryl group, a  cl  -ClO alkyl group, a  cl  -ClO alkoxy group, a  cl  -ClO  hydroxy alkyl group, or a cyano group, at least one  hydrogen atom of the monocyclic or polycyclic C$_{3}$ -C$_{20 }$ hydrocarbon group is or is not substituted with an ether  group, an ester group, a carbonyl group, an acetal group,  a nitrile group, a cyano group, a hydroxy group, a car› boxyl group, or an aldehyde group, R is a C$_{1 }$-C$_{10 }$alkyl  group, a C$_{1 }$-C$_{10 }$alkoxy group, a nitrogen atom, a sulfur  atom, or an oxygen atom, and m is a positive integer of  0  to 2.  [Chemical formula 1]  [Chemical formula 2]  0  0  II  F2  H2  II  _o-s-c -c -O___JL__(R)m-X$_{1}$,  II  0 