225  US 9,958,775 B2  226  Y $_{1 }$ and Y $_{2 }$ each independently represents a hydrogen  atom, an alkyl group, a cycloalkyl group, an alkenyl  group, an alkynyl group, an aryl group, or an acyl  group;  wherein the actinic ray-sensitive or radiation-sensitive  resin composition further comprises a compound (Bl)  having a phenolic hydroxyl group and a compound  (B2) having a group which is capable of decomposing  by the action of an acid,  wherein, in the formula (M),  Z represents a hydrogen atom or a substituent; and  * represents a linking site with the aromatic ring.  17.  A compound represented by the following general  formula (I):  wherein, in the formula (I),  M + represents a sulfonium cation;  X represents an alkyl group, a cycloalkyl group, an aryl  group, a halogen atom, a hydroxyl group, an alkoxy  group, or an acyl group;  Z represents a hydrogen atom, an alkyl group, a  cycloalkyl group, an aryl group or an acyl group;  n represents an integer of 1 to 3;  o represents an integer of 1 to 5;  p represents an integer of O to 4; and  o+ps5 is satisfied.  18.  An actinic ray-sensitive or radiation-sensitive resin  composition comprising:  a compound (A) which generates an acid by irradiation  with actinic rays or radiation,  wherein the acid includes an aromatic heterocyclic struc› ture, and the aromatic heterocyclic structure is linked  with at least one group represented by the following 35  general formula (M),  Y $_{1 }$ and Y $_{2 }$ each independently represents a hydrogen  atom, an alkyl group, a cycloalkyl group, an alkenyl  group, an alkynyl group, an aryl group, or an acyl  group;  Z represents a hydrogen atom or a substituent; and  * represents a linking site with a residue of the aromatic  heterocyclic structure.  19.  A negative-tone pattern forming method comprising:  forming a film using an actinic ray-sensitive or radiation› sensitive resin composition comprising a compound  (A) which generates an acid by irradiation with actinic  rays or radiation, wherein the acid includes a structure  represented by the following general formula (9);  exposing the film;  wherein, in the formula (M),  and developing the exposed film with a developer con› taining an organic solvent,  the compound (Bl) having a phenolic hydroxyl group  includes a polymer compound having at least one kind  of repeating unit represented by the following general  formula (1 ),  Y $_{1 }$ and Y $_{2 }$ each independently represents a hydrogen  atom, an alkyl group, a cycloalkyl group, an alkenyl  group, an alkynyl group, an aryl group, or an acyl  group;  wherein, in the formula (9),  A represents a divalent linking group;  B represents an aromatic ring;  Z represents a hydrogen atom or a substituent; and  o represents an integer of 1 to 5, and  wherein, in the general formula (1 ),  R$_{11 }$ represents a hydrogen atom, a methyl group which  may have a substituent, or a halogen atom;  B$_{1 }$ represents a single bond or a divalent linking group;  Ar represents an aromatic ring; and  ml represents an integer of 1 or more.  20.  The negative-tone pattern forming method according  to claim  19,  wherein the following group in the general  formula (9) is a hydroxymethyl group or an alkoxymethyl  group  *  *  *  *  *  TI-ffi-TI  --c)k-o-z  t  W  -o-S  S-0  \\  ;)  II  II  \\  ’}1---..(X)  0  F  O  P  n  (I)  (9)  (1)  (M)  R11  ~ $_{B1 }$ I  Ar  I  (OH)m1 