I 1111111111111111 1111111111 11111 111111111111111 IIIII  IIIII  IIIIII IIII IIII IIII  US010093834B2  (IO)  Patent No.:  US 10,093,834 B2  (45)  Date of Patent:  Oct. 9, 2018  c12)  United States Patent  Ishida  (54)  POLISHING COMPOSITION AND  POLISHING METHOD  (71)  Applicant:  FUJIMI INCORPORATED,  Kiyosu-shi, Aichi (JP)  (72)  Inventor:  Yasuto Ishida,  Miaoli County (CN)  (73)  Assignee:  FUJIMI INCORPORATED,  Kiyosu-Shi (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 0 days.  (21)  Appl. No.:  15/514,130  (22)  PCT Filed:  Aug. 28, 2015  (86)  PCT No.:  PCT  I  JP2015/004378  (87)  PCT Pub. No.:  WO2016/051659  (65)  Prior Publication Data  (30)  Foreign Application Priority Data  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ..............  C09G 1102  (2013.01);  B24B 371044  (2013.01);  C09K 3/1436  (2013.01);  H0JL  21/31053  (2013.01);  H0JL 2113212  (2013.01)  ( 58)  Field of Classification Search  CPC ...... C09G 1/02; C09K 3/1436; B24B 37/044;  H0lL 21/3212  There are provided a polishing composition and a method  for polishing capable of, when a substrate including poly› silicon is polished, limiting the polishing rate of the poly› silicon, and selectively polishing a silicon compound other  than the polysilicon, such as silicon nitride. The polishing  composition used includes abrasives, an organic acid and a  conjugate base of the organic acid.  See application file for complete search history.  § 371 (c)(l),  (2) Date:  Mar. 24, 2017  PCT Pub. Date:  Apr. 7, 2016  US 2017/0298253 Al  Oct. 19, 2017  Sep. 29, 2014  (JP) ................................. 2014-197860  C09G 1102  B24B 37104  C09K 3/14  H0JL 211321  H0JL 2113105  (2006.01)  (2012.01)  (2006.01)  (2006.01)  (2006.01)  (57)  ABSTRACT  17 Claims, No Drawings  Primary Examiner  - Nadine G Norton  Assistant Examiner  - Mahmoud Dahimene  (74)  Attorney, Agent, or Firm  - Foley & Lardner LLP  * cited by examiner  FOREIGN PATENT DOCUMENTS  (56)  References Cited  U.S. PATENT DOCUMENTS  9,206,336 B2 *  12/2015 Takahashi .  C09K 3/1463  2002/0128327 Al  9/2002 Ishitobi et al.  2004/0229552  Al*  11/2004 Cherian ................ B24B 37/044  2008/0104893 Al  5/2008 Oh  2013/0146804 Al  6/2013 Mizuno et al.  451/41  H04-214022 A  1788061  Al  101177603 A  102358824  A  103180101 A  2001-131535 A  2002-020732  A  2005-014204  A  2005-023313  A  2005-034986  A  2007-103457  A  2007-168034  A  2009-227893  A  2009-289886  A  8/1992  6/2006  5/2008  2/2012  6/2013  5/2001  1/2002  1/2005  1/2005  2/2005  4/2007  7/2007  10/2009  12/2009  CN  CN  CN  CN  CN  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  JP  TW  TW  WO  WO  WO  WO  2013108777  2015-137297  A  200516122  A  200525016  A  WO-2004/101695 Al  WO-2004/111145 Al  WO-2005/000984 Al  *  7/2013  7/2015  5/2005  8/2005  ............... C09K 3/14  11/2004  12/2004  1/2005 