(IO)  Patent No.:  US 8,574,814 B2  (45)  Date of Patent:  Nov. 5, 2013  c12)  United States Patent  Inasaki et al.  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, AND ACTINIC  RAY-SENSITIVE OR RADIATION-SENSITIVE  FILM AND PATTERN FORMING METHOD  USING THE COMPOSITION  (75)  Inventors:  Takeshi Inasaki,  Haibara-gun (JP);  Tomotaka Tsuchimura,  Haibara-gun  (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  13/528,477  (22)  Filed:  Jun.20,2012  (51)  Int. Cl.  (52)  U.S. Cl.  USPC ............  430/270.1;  430/5; 430/913; 430/942;  430/945; 430/966  ( 58)  Field of Classification Search  USPC ................... 430/270.1, 5, 945, 942, 966, 913  See application file for complete search history.  (56)  References Cited  U.S. PATENT DOCUMENTS  (30)  Foreign Application Priority Data  (65)  Prior Publication Data  FOREIGN PATENT DOCUMENTS  (57)  ABSTRACT  17 Claims, No Drawings  G03F  7100  G03F  71004  G03F  71028  G03F  7126  G03F  7120  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  5,882,835 A  6,042,997 A  3/ 1999 Park et al.  3/2000 Barclay et al.  2004/0091817 Al  5/2004 Komatsu et al.  2012/0171617 Al*  7/2012 Bae et al. ................... 430/285.1  2012/0202153 Al*  8/2012 Hatakeyama .............. 430/283.1  2012/0288794 Al* 11/2012 Bae et al. ................... 430/270.1  JP  JP  JP  JP  JP  JP  JP  03282550  A  10115928  A  2000241975  A  2004-158287  A  2005-157401 A  2005232396  A  2008-162101 A  12/1991  5/1998  9/2000  6/2004  6/2005  9/2005  7/2008  US008574814B2  * cited by examiner  Primary Examiner  - Amanda C. Walke  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  An object of the present invention is to provide an actinic  ray-sensitive or radiation-sensitive resin composition that can  form independent line patterns with high resolution and  excellent shapes and shows excellent resist performances  including roughness characteristics, and to provide an actinic  ray-sensitive or radiation-sensitive film and a pattern forming  method using the composition.  The actinic ray-sensitive or radiation-sensitive resin compo› sition contains a compound (P) that contains at least one  phenolic hydroxyl group and at least one group in which a  hydrogen atom of a phenolic hydroxyl group is substituted  with a group represented by the following General Formula  (1) (the respective symbols in the formula represent the same  definitions as in the claims and the specification).  Jun.29,2011  (JP) ................................. 2011-144458  US 2013/0004888 Al  Jan. 3, 2013  [Chem.!]  (1)  H 