6  US 9,323,150 B2  5  -continued  in general formulae (aal-2-3) and (aal-3-3),  Ra$_{1 }$ represents a hydrogen atom or a methyl group, and  each of Rf$_{1 }$ and Rf$_{2 }$ independently represents an organic  group containing a fluorine atom.  [5] The composition according to any of items [1] to [4],  wherein in general formula (aa2-1) above, Rb represents a  hydrogen atom; S  la  represents an optionally substituted alkyl 25  group, an organic group containing a silicon atom, or a halo› gen atom; and pis an integer of 1 to 5.  [ 6] The composition according to any of items [ 1] to [ 5],  wherein in general formula (aa2-1) above, S$_{1}$ a  represents an  alkyl group, an alkyl group substituted with a halogen atom or 30  an organic group containing a silicon atom.  [7] The composition according to any of items [ 1] to [ 6],  wherein in general formula (aa2-1) above, S$_{1}$ a  represents an  alkyl group or any of groups of general formula (aal-2-1)  below,  in which  each ofR$_{11}$, R$_{21 }$and R$_{31 }$independently represents an alkyl  group, and  L$_{1 }$represents a single bond or a bivalent connecting group.  [8] The composition according to any of items [ 1] to [7],  further comprising a compound that when exposed to actinic  rays or radiation, generates an acid.  [9] The composition according to any of items [ 1] to [8],  wherein the resin (Ab) comprises a repeating unit (B) con› taining a structural moiety that when exposed to actinic rays  or radiation, generates an acid.  [1 OJ The composition according to any of items [1] to [9], 55  wherein the resin (Ab) comprises at least one of repeating  units (A) of general formula (A) below,  in which  n is an integer of 1 to 5, and m is an integer of O to 4  satisfying the relationship lsm+ns5, and  S$_{1 }$ represents a substituent, provided that when mis 2 or  greater, two or more S’s may be identical to or different from  each other.  [11] The composition according to item [10], wherein the  resin (Ab) comprises at least a repeating unit of formula  below as the at least one of repeating units (A) of general  formula (A) above.  [12] The composition according to any ofitems [1] to [11],  wherein the resin (Aa) is contained in an amount of0.01 to 20  mass% based on total solids of the composition.  [13] The composition according to item [12], wherein the  resin (Aa) is contained in an amount of0.01 to 10 mass%  based on total solids of the composition.  [14] The composition according to item [13], wherein the  resin ( Aa) is contained in an amount ofO .01 to 5 mass % based  on total solids of the composition.  [15] The composition according to any ofitems [1] to [14],  wherein the resin (Ab) comprises at least one of repeating  units of general formulae (Al) and (A2) below,  in general formula (Al)  n is an integer of 1 to 5, and m is an integer of O to 4  satisfying the relationship lsm+ns5,  S$_{1 }$ represents a substituent, provided that when mis 2 or  greater, two or more S$_{1 }$s may be identical to or different from  each other, and  A$_{1 }$ represents a hydrogen atom or a group that when acted  on by an acid, is cleaved, provided that at least oneA$_{1 }$ repre› sents a group that when acted on by an acid, is cleaved, and  that when n is 2 or greater, two or more A$_{1 }$s may be identical  to or different from each other, and  in general formula (A2)  X represents a hydrogen atom, an alkyl group, a hydroxyl  group, an alkoxy group, a halogen atom, a cyano group, a  nitro group, an acyl group, an acyloxy group, a cycloalkyl  group, a cycloalkyloxy group, an aryl group, a carboxyl  group, an alkyloxycarbonyl group, an alkylcarbonyloxy  group or an aralkyl group, and  (aa-1-3-3)  (S-1)  (A) (Al)  (A2) 