283  US 9,411,230 B2  284  to 300, more preferably from 5 .0 to 200, still more preferably  from 7.0 to 150. If this molar ratio is excessively small, the  sensitivity and/or resolution may be reduced, whereas if the  molar ratio above is excessively large, thickening of the pat› tern may be caused between exposure and heating (post bak- ing).  rine atom-containing aryl group include the groups repre› sented by the following formulae (F2) to (F 4 ), but the present  invention is not limited thereto:  The composition of the present invention may further con› tain a hydrophobic resin. When a hydrophobic resin is con- tained, the hydrophobic resin is unevenly distributed to the  surface layer of the composition film and in the case of using  water as the immersion medium, the receding contact angle of  the film for the immersion liquid can be increased. In turn, the  followability of the immersion liquid to the film can be  enhanced.  The receding contact angle of the film after baking and  before exposure is preferably from 60 to 90°,  more preferably  65°  or more, still more preferably 70°  or more, yet still more  preferably 75°  or more, at a temperature of 23–3°  C. and a  humidity of 45–5%.  The hydrophobic resin is, as described above, unevenly  distributed to the interface but unlike a surfactant, need not  have necessarily a hydrophilic group in the molecule and may  not contribute to uniform mixing of polar/nonpolar sub› stances.  In the immersion exposure step, the immersion liquid must  move on a wafer following the movement of an exposure head  that is scanning the wafer at a high speed and forming an  exposure pattern. Therefore, the contact angle of the immer› sion liquid with the resist film in a dynamic state is important,  and the electron beam-sensitive or extreme ultraviolet-sensi- tive resin composition is required to have a performance of  allowing a liquid droplet to follow the high-speed scanning of  an exposure head with no remaining.  The hydrophobic resin (HR) is preferably a resin having at  least either a fluorine atom or a silicon atom. The fluorine  atom or silicon atom in the hydrophobic resin (HR) may be  present in the main chain of the resin or may be substituted on  the side chain. By virtue of the hydrophobic resin containing  at least either a fluorine atom or a silicon atom, hydrophobic- ity (water followability) on the film surface is increased and  the development residue (scum) is decreased.  The hydrophobic resin (HR) is preferably a resin having, as  the fluorine atom-containing partial structure, a fluorine  atom-containing alkyl group, a fluorine atom-containing  cycloalkyl group or a fluorine atom-containing aryl group.  The fluorine atom-containing alkyl group (preferably hav› ing a carbon number of 1 to 10, more preferably from 1 to 4)  is a linear or branched alkyl group with at least one hydrogen  atom being substituted for by a fluorine atom and may further  have other substituents.  The fluorine atom-containing cycloalkyl group is a mono› cyclic or polycyclic cycloalkyl group with at least one hydro› gen atom being substituted for by a fluorine atom and may  further have other substituents.  The fluorine atom-containing aryl group includes an aryl  group (e.g., phenyl group, naphthyl group) with at least one  hydrogen atom being substituted for by a fluorine atom and  may further have other substituents.  Preferred examples of the fluorine atom-containing alkyl  group, fluorine atom-containing cycloalkyl group and fluo- In formulae (F2) to (F4), each ofR$_{57 }$to R$_{68 }$independently  represents a hydrogen atom, a fluorine atom or an alky 1 group,  provided that at least one ofR$_{57 }$to R$_{6}$ i, at least one ofR$_{62 }$to  R$_{64 }$and at least one of R$_{65 }$ to R$_{68 }$ are a fluorine atom or an  alkyl group (preferably having a carbon number of 1 to 4)  with at least one hydrogen atom being substituted for by a  fluorine atom. It is preferred that all of R$_{57 }$to R$_{61 }$ and all of  R$_{65 }$ to R$_{67 }$ are a fluorine atom. Each of R$_{62}$, R$_{63 }$and R$_{68 }$is  preferably an alkyl group (preferably having a carbon number  of 1 to 4) with at least one hydrogen atom being substituted  for by a fluorine atom, more preferably a perfluoroalkyl group  having a carbon number of 1 to 4. R$_{62 }$and R$_{63 }$may combine  with each other to form a ring.  Specific examples of the group represented by formula  (F2) include p-fluorophenyl group, pentafluorophenyl group  and 3,5-di(trifluoromethyl)phenyl group.  Specific examples of the group represented by formula  (F3) include trifluoromethyl group, pentafluoropropyl group,  pentafluoroethyl group, heptafluorobutyl group, hexafluor› oisopropyl group, heptafluoroisopropyl group, hexafluoro(2- methyl)isopropyl group, nonafluorobutyl group, octafluor› oisobutyl group, nonafluorohexyl group, nonafluoro-tert› butyl group, perfluoroisopentyl group, perfluorooctyl group,  perfluoro( trimethy 1 )hexyl group, 2,2,3 ,3-tetrafluorocyclo bu› tyl group and perfluorocyclohexyl group. Among these,  hexafluoroisopropyl  group,  heptafluoroisopropyl  group,  hexafluoro(2-methyl)isopropyl  group,  octafluoroisobutyl  group, nonafluoro-tert-butyl group and perfluoroisopentyl  group are preferred, and hexafluoroisopropyl group and hep- tafluoroisopropyl group are more preferred.  Specific examples of the group represented by formula  (F4) include ----C(CF$_{3}$ ) $_{2}$OH, ----C(C$_{2}$F$_{5}$ ) $_{2}$OH, -C(CF$_{3}$ )  ( CH$_{3}$)O H and-CH( CF $_{3}$)0 H, with ----C( CF $_{3}$ ) $_{2}$0 H being pre- ferred.  Suitable repeating units having a fluorine atom include the  followings.  (F2)  (F3)  (F4)  [E] Hydrophobic Resin 