1111111111111111 IIIIII IIIII 1111111111 11111 1111111111 1111111111 1111111111 1111111111 11111111  US 20200401045Al  c19)  United States  c12)  Patent Application Publication  ASAKAWA et al.  c10)  Pub. No.: US 2020/0401045 Al  (43)  Pub.  Date:  Dec. 24, 2020  (54)  ACTIVE-RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, RESIST FILM, PATTERN  FORMATION METHOD, AND METHOD FOR  MANUFACTURING ELECTRONIC DEVICE  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Daisuke ASAKAWA,  Haibara-gun (JP);  Hironori OKA,  Haibara-gun (JP);  Kyohei SAKITA,  Haibara-gun (JP);  Michihiro SHIRAKAWA,  Haibara-gun  (JP);  Akiyoshi GOTO,  Haibara-gun  (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  (21)  Appl. No.:  17/001,805  (22)  Filed:  Aug. 25, 2020  (63)  Continuation  of application  No.  PCT/JP2019/  006235, filed on Feb. 20, 2019.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  71039  (2013.01);  G03F  710045  (2013.01);  C08F  2201283  (2020.02);  C08F  220/1808  (2020.02);  C08F 220/1804  (2020.02);  G03F 71038  (2013.01)  C08F 220118  C08F  220128  (2006.01)  (2006.01)  G03F 71039  G03F 71004  G03F 71038  (2006.01)  (2006.01)  (2006.01)  Feb. 28, 2018  (JP) ................................. 2018-035948  (30)  Foreign Application Priority Data  Related U.S. Application Data  (57)  ABSTRACT  An object of the present invention is to provide an actinic  ray-sensitive or radiation-sensitive resin composition which  is capable of forming a pattern having an excellent pattern  line width roughness  (LWR). In addition, another object of  the present invention is to provide:  The actinic ray-sensitive or radiation-sensitive resin com› position of the present invention includes a resin including  a repeating unit derived from a monomer having a salt  structure and a repeating unit having a group whose polarity  increases through decomposition by the action of an acid,  a resist film, a pattern forming method, and a method for  manufacturing an electronic device, each of which uses  the actinic ray-sensitive or radiation-sensitive resin  composition.  the salt structure consists of an anionic structure moiety  and an actinic ray-sensitive decomposable or radiation› sensitive decomposable cationic structure moiety, and  a pKa of a monomer obtained by substituting the cationic  structure moiety in the salt structure with a hydrogen  atom is -0.80 or more.  Publication Classification 