US 20170059990Al  c19)  United States  c12)  Patent Application Publication  TSUCHIMURA  c10)  Pub. No.: US 2017 /0059990 Al  (43)  Pub. Date:  Mar. 2, 2017  (54)  RADIATION-SENSITIVE OR ACTINIC  RAY-SENSITIVE RESIN COMPOSITION,  RESIST FILM USING THE SAME, MASK  BLANK, RESIST PATTERN FORMING  METHOD, ELECTRONIC DEVICE  MANUFACTURING METHOD, AND  ELECTRONIC DEVICE  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventor:  Tomotaka TSUCHIMURA,  Shizuoka  (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  (21)  Appl. No.:  15/352,662  (22)  Filed:  Nov. 16, 2016  (63)  Continuation  of application  No.  PCT/JP2015/  065083, filed on May 26, 2015.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  710382  (2013.01);  G03F  71322  (2013.01);  G03F  712004  (2013.01);  G03F  712037  (2013.01);  C08F  212114  (2013.01);  G03F  71162  (2013.01);  G03F  1120  (2013.01);  G03F  1122  (2013.01)  G03F  71038  G03F  7120  G03F  1122  G03F  7116  G03F  1120  G03F  7132  C08F  212114  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (30)  Foreign Application Priority Data  Publication Classification  Related U.S. Application Data  (57)  ABSTRACT  A radiation-sensitive or actinic ray-sensitive resin composi› tion contains a polymer compound (A) including a structural  part (a) that is decomposed by irradiation with actinic rays  or radiation to generate an acid anion on a side chain and a  repeating unit (b) that is represented by the following  Formula (I), in the formula, R$_{3 }$ represents a hydrogen atom,  an organic group, or a halogen atom, A$_{1 }$ represents an  aromatic ring group or an alicyclic group.  R$_{1 }$ and  R$_{2 }$ each  independently represent an alkyl group, a cycloalkyl group,  or an aryl group, at least two of A$_{1}$ ,  R$_{1}$ ,  or  R$_{2 }$ may be bonded  to each other to form a ring. B$_{1 }$ and L$_{1 }$ each independently  represent a single bond or a divalent linking group,  X  represents a hydrogen atom or an organic group, n represents  an integer of 1 or greater.  Jun. 19, 2014  (JP) ................................. 2014-126652  (I) 