US 20200133122Al  c19)  United States  c12)  Patent Application Publication  Fukushima  c10)  Pub. No.: US 2020/0133122 Al  (43)  Pub. Date:  Apr. 30, 2020  (54)  NOVEL ONIUM SALT, CHEMICALLY  AMPLIFIED RESIST COMPOSITION, AND  PATTERNING PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventor:  Masahiro Fukushima,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/660,081  (22)  Filed:  Oct. 22, 2019  (52)  U.S. Cl.  CPC ..........  G03F 710045  (2013.01);  G03F 710382  (2013.01);  G03F 71322  (2013.01);  C08L 33/14  (2013.01);  C07C 381112  (2013.01)  (51)  Int. Cl.  Publication Classification  (57)  ABSTRACT  (30)  Foreign Application Priority Data  A novel onium salt and a resist composition comprising the  same as a PAG are provided. When processed by photoli› thography using KrF or ArF excimer laser, EB or EUV, the  resist composition is reduced in acid diffusion and improved  in exposure latitude, MEF, and  LWR.  Oct. 24, 2018  (JP) ................................. 2018-199659  G03F  71004  G03F  71038  C07C 381112  C08L 33/14  G03F 7132  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  r,..  I’-- a>  ci  ..,,  t--- I’--- m  c;I  q  Q  t--- a)  .,..  u:i  ;8<D  0  r-- LO <’>1:00,n  0  (’)  ’°  0  ~  - ""~~co  <?  C\I~  U:>  9  0  .  ’¢"  d~  0  --r-,00"’  .r  f  -1/  ;1, 0  ,,,,. 