US 2020/0319555 Al  22  Oct. 8, 2020  (8)  (3)  18.  The photoresist composition of claim,  4,  wherein solid  component b ), said photoacid generator, is a trihalomethyl  derivative of an oxazole or substituted oxazone having  structure (  4)  wherein R$_{3 }$ is a substituted or unsubstituted  alkenyl or substituted or unsubstituted aryl group, and X is  Cl or Br;  23.  The photoresist composition of claim  4,  wherein solid  component b ), said photoacid generator, is a trihalomethyl  derivative having structure (9), wherein X is Cl or Br, and  further wherein, R6 is hydrogen or a Cl to C3 alkyl,  (4)  (9)  19.  The photoresist composition of claim  4,  wherein solid  component b ), said photoacid generator, is a trihalomethyl  derivative of a substituted triazine containing  1  or 2 triha› lomethyl moieties.  20.  The photoresist composition of claim  4,  wherein solid  component b), said photoacid generator, is a trihalo methyl  derivative having structure (5), wherein Xis Br or Cl and R$_{4 }$ is a unsubstituted or substituted alkenyl, an unsubstituted  aryl or substituted aryl moiety, or a substituted or unsubsti› tuted fused aromatic ring moiety containing 2 to  4  rings;  (5)  24.  The photoresist composition of claim  1,  wherein solid  component c ), said crosslinking agent, comprises etherified  melamines selected from ones having structure  (11),  oli› gomers formed by  (11)  or mixtures of these; wherein R7 is  a Cl to C4 alkyl, Hor represents a moiety of structure (lla),  wherein =  represents the attachment point of moiety  (lla) to structure  (11),  wherein R$_{1}$ a  is a Cl to C alkyl, Hor  represents another moiety of structure (lla),  (11)  21.  The photoresist composition of claim  4,  wherein solid  component b ), said photoacid generator, is trihalomethyl  derivative having structure (7), wherein, o is  1  or 2, X is Cl  or Br, and further wherein R$_{5 }$ is a C4 or  CS  cyclic aliphatic  ether moiety containing one or two olefin bounds which is  substituted by hydrogen or a Cl to C2 alkyl,  (7)  22.  The photoresist composition of claim  4,  wherein solid  component b ), said photoacid generator, is a trihalomethyl  derivative having structure (8), wherein, o is  1  or 2, X is Cl  or Br and R$_{6 }$ is hydrogen or a Cl to C3 alkyl,  R,;  R3~0H:X  II  x.  N  #  X  .__N 