US 9,086,623 B2  91  92  (III)  Xa  ORx  (II)  Ro  ~ $_{X }$ I  (~)n  I  Ar  in which  Xa represents a hydrogen atom or a linear or branched alkyl  group, and  Rx represents a hydrogen atom or a group that when acted  on by an acid, is decomposed to thereby be cleaved.  6.  The method according to claim  1,  wherein the resin (A)  contains neither any aromatic group containing a phenolic  hydroxyl group nor any aromatic group containing a phenolic  hydroxyl group whose hydrogen atom is replaced by a group  that when acted on by an acid, is decomposed to thereby be  cleaved.  7.  The method according to claim  1,  wherein the developer  is a developer comprising at least one organic solvent selected  from among a ketone solvent, an ester solvent, an alcohol  solvent, an amide solvent and an ether solvent.  8.  An  actinic-ray- or radiation-sensitive resin composition  for use in the method according to claim  1.  9.  The actinic-ray- or radiation-sensitive resin composition  according to claim  8,  comprising a resin (A) comprising a  repeating unit containing a group that when acted on by an  acid, is decomposed to thereby produce a polar group and  comprising an aromatic group, which resin when acted on by  an acid, decreases its solubility in an organic solvent, a non› ionic compound (B) that when exposed to actinic rays or  radiation, generates an acid and a solvent (C).  10.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  8,  wherein the repeating unit contain› ing a group that when acted on by an acid, is decomposed to  thereby produce a polar group, contained in the resin (A) is  expressed by general formula  (I)  below,  (I)  (III)  Xa  ORx  in which  in which  Ra  represents a hydrogen atom or a linearor branched alkyl  group optionally substituted with a fluorine atom or a  hydroxyl group, and  each of R$_{1}$ ,  R$_{2 }$ and R$_{3 }$ independently represents an  optionally substituted linear or branched alkyl group  or an optionally substituted cycloalkyl group, pro› vided that any two ofR$_{1}$ ,  R$_{2 }$ andR$_{3 }$ maybe bonded to  each other to thereby form a monocyclic or polycyclic  structure.  11.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  8,  wherein a repeating unit containing  the aromatic group contained in the resin (A) is expressed by  general formula (II) below,  18.  The actinic-ray- or radiation-sensitive resin composi- tion according to claim  11,  wherein X represents a single  bond and/or n is an integer of 1 to 4.  * * * * *  17.  A semiconductor device manufactured by the process  of claim  16.  16.  A process for manufacturing a semiconductor device,  comprising the method according to claim  1.  15.  An  actinic-ray- or radiation-sensitive film formed from  the actinic-ray- or radiation-sensitive resin composition  according to claim  8.  14.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  8,  wherein the resin (A) contains  neither any aromatic group containing a phenolic hydroxyl  group nor any aromatic group containing a phenolic hydroxyl  group whose hydrogen atom is replaced by a group that when  acted on by an acid, is decomposed to thereby be cleaved.  in which  Xa represents a hydrogen atom or a linear or branched alkyl  group, and  Rx represents a hydrogen atom or a group that when acted  on by an acid, is decomposed to thereby be cleaved.  13.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  8,  wherein the content of any of  repeating units of general formula (III) below contained in the  resin (A) is up to 20 mo!% based on all the repeating units of  the resin (A),  12.  The actinic-ray- or radiation-sensitive resin composi› tion according to claim  11,  wherein in general formula (II), X  is  -COO- or  ----CONH-.  R$_{4 }$represents an optionally substituted alkylene group, and  n is an integer of  O to 4.  R$_{0 }$ represents a hydrogen atom or a linear or branched alkyl  group optionally substituted with a fluorine atom or a  hydroxyl group,  Ar represents an optionally substituted aromatic group,  provided that when a substituent is introduced in the  aromatic group, the substituent is any of an alkyl group  ( optionally substituted), a cycloalkyl group ( optionally  substituted), an aryl group, a halogen atom, a cyano  group, an amino group, a nitro group and a carboxyl  group,  X represents a single bond or a bivalent connecting group, 