Oct. 21, 2010  57  US 2010/0266955 Al  [0574]  The method of forming a resist pattern according to  the present invention is also applicable to a double exposure  method or a double patterning method.  [0575]  As follows is a description of examples of the  present invention, although the scope of the present invention  is by no way limited by these examples.  [0576]  In the following examples, a unit represented by a  chemical formula  (1)  is designated as "compound  (1)",  and  the same applies for compounds represented by other formu› las.  [0577]  <Synthesis of Base Component (A)>  [0578]  Each of the polymeric compounds  1  to 6 used as the  base component (A) in the present examples were synthe› sized by a conventional polymerization method, using com› pounds  (1)  to (7) as monomers for deriving the corresponding  structural units of the polymeric compound with a predeter› mined molar ratio and charge ratio.  [Chemical Formula 64]  Compound (1)  Compound (2)  Compound (3)  -continued  Compound (4)  Compound (5)  Compound (6)  Compound (7)  [0579]  For example, with respect to the polymeric com› pound 2, the weight average molecular weight (Mw) and the  dispersity (Mw/Mn) were determined by the polystyrene  equivalent value as measured by gel permeation chromatog› raphy (GPC). As a result, it was found that the weight average  molecular weight was 7,900, and the dispersity was 1.80.  Further, as a result of an analysis by carbon 13 nuclear mag› netic resonance spectroscopy (600 MHz,  $^{13}$C-NMR), it was  found that the composition of the copolymer (ratio (molar  EXAMPLES  Polymer Synthesis Examples  1  to 6  Synthesis of Polymeric Compounds  1  to 6 