(IO)  Patent No.:  US 7,858,289 B2  Dec. 28, 2010  (45)  Date of Patent:  c12)  United States Patent  Yamashita  (54)  POSITIVE RESIST COMPOSITION FOR  ELECTRON BEAM, X-RAY OR EUV AND  PATTERN FORMING METHOD USING THE  SAME  (75)  Inventor:  Katsuhiro Yamashita,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term ofthis  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  12/259,056  Oct. 27, 2008  (22)  Filed:  (51)  Int. Cl.  (52)  U.S. Cl.  ......................  430/270.1;  430/913; 568/19;  568/28  (58)  Field of Classification Search  ....................... None  See application file for complete search history.  13 Claims, No Drawings  (57)  ABSTRACT  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  (65)  Prior Publication Data  (30)  Foreign Application Priority Data  A positive resist composition for electron beam, X-ray or  EUV includes a compound having a proton acceptor func› tional group and capable of producing an acid radical upon  irradiation with an actinic ray or radiation to reduce or lose the  acceptor property or to change the proton acceptor functional  group to be acidic, wherein the positive resist composition has  a solid content concentration of from 2.5 to 4.5 mass%.  Primary Examiner-Amanda  C. Walke  (74)  Attorney, Agent, or Firm-Sughrue  Mion, PLLC  * cited by examiner  US007858289B2  US 2009/0111047 Al  Apr. 30, 2009  Oct. 26, 2007  (JP)  ............................. 2007-279579  G03F  7100  (2006.01)  G03F  71004  (2006.01)  G03F  71029  (2006.01)  C07C 381/00  (2006.01)  EP  1500977 Al *  1/2005  EP  1703322 A2 *  9/2006  JP  6-242606  A  9/1994  JP  2001-107707 A  4/2001  JP  2001-166474 A  6/2001  JP  2001-166478 A  6/2001  JP  2001-194792 A  7/2001  JP  2003-107708  A  4/2003  JP  2005-234434  A  9/2005  JP  2006-208781  A  8/2006  JP  2007-210904  A  8/2007  6,033,826 A *  3/2000 Urano et al .............. 430/270.1  6,210,859 Bl*  4/2001 Jeon et al ................. 430/270.1  6,384,169 Bl*  5/2002 Watanabe et al. ........... 526/346  7,449,573 B2 * 11/2008 Kodama et al. ............. 540/482  2006/0210922 Al*  9/2006 Nishiyama ............... 430/270.1  2008/0102407 Al*  5/2008 Ohsawa et al. ........... 430/286.1  2009/0075202 Al*  3/2009 Kodama et al. .......... 430/285.1 