232  US 8,852,845 B2  231  A smaller variation  of  film thickness indicates better per- formance in terms  of  outgassing.  Concentration of each component indicates the concentration (mass%) based on the entire solid content concentration.  Structures of materials ( other resin, conventional acid gen- erator, basic compound) used in Examples and Comparative  Examples are shown below.  TABLE3  Evaluation Results in EB Exposure  Resin of  Other  Conventional  Basic  Invention  Concentrations Resin  Concentrations Acid Generator  Concentrations Compound  Example 1  P-1  99.95  none  none  none  Example 2  P-2  99.95  none  none  none  Example 3  P-3  99.95  none  none  none  Example4  P-4  99.95  none  none  none  Example 5  P-5  99.95  none  none  none  Example 6  P-6  99.95  none  none  none  Example 7  P-7  99.95  none  none  none  Example 8  P-2  84.95  P-10  15  none  none  Example 9  P-2  99.65  none  none  TPI  Example 10  P-2  98.65  none  PAG-1  TPI  Example 11  P-3  97.45  none  PAG-1  2  TBAH  Example 12  P-8  99.95  none  none  none  Example 13  P-8  99.75  none  none  TPI  Example 14  P-9  99.95  none  none  none  Example 15  P-9  99.75  none  none  DIA  Example 16  P-1  49.75  none  none  TBAH  P-3  50.00  Example 17  P-5  49.75  none  none  DIA  P-8  50.00  Comparative none  P-10  91.95  PAG-1  8  none  Example 1  Comparative none  P-10  90.45  PAG-1  8  TPI  Example 2  Comparative none  P-10  90.45  PAG-2  8  TPI  Example 3  Comparative none  P-10  50  none  none  Example4  P-11  49.95  Comparative none  P-12  99.95  none  none  Example 5  Comparative none  P-13  99.95  none  none  Example 6  Organic  Entire Solid  Solvent  Ratio  Content  Sensitivity Resolution Pattern  LER  (D)  by Mass  Surfactant  Concentration  (µC/cm 2 )  (nm)  Profile  (nm)  Example 1  Sl/S2  40/60  W-1  4.0  19.6  60  rectangular  4.1  Example 2  Sl/S2  40/60  W-1  4.0  17.5  55  rectangular  4.2  Example 3  Sl/S2  40/60  W-2  4.0  21.3  60  rectangular  4.6  Example4  Sl/S2  40/60  W-3  4.0  20.0  60  rectangular  4.5  Example 5  Sl/S2  40/60  W-1  4.0  23.8  60  rectangular  4.9  Example 6  Sl/S2  40/60  W-1  4.0  16.9  55  rectangular  3.9  Example 7  Sl/S2  40/60  W-1  4.0  18.2  55  rectangular  4.1  Example 8  Sl/S2  40/60  W-1  4.0  25.0  70  rectangular  5.7  Example 9  Sl/S2  40/60  W-3  4.0  34.5  60  rectangular  4.1  Example 10  Sl/S2  40/60  W-2  4.0  29.6  65  rectangular  5.2  Example 11  Sl/S2  40/60  W-1  4.0  13.8  55  rectangular  4.7  Example 12  Sl/S2/S3  35/60/5  none  4.0  23.9  65  rectangular  5.3  Example 13  Sl/S2  40/60  W-1  4.0  30.5  60  rectangular  4.9  Example 14  Sl/S2  40/60  W-2  4.0  22.1  60  rectangular  4.8  Example 15  Sl/S2/S3  30/60/10  W-1  4.0  29.8  55  rectangular  4.4  Example 16  Sl/S2  40/60  W-3  4.0  25.6  55  rectangular  4.5  Example 17  Sl/S3  70/30  W-1  4.0  27.4  55  rectangular  4.6  Comparative Sl/S2  40/60  W-1  4.0  A 100-nm LIS pattern could not be formed.  Example 1  Comparative Sl/S2  40/60  W-1  4.0  22.8  90  tapered  12.6  Example 2  Comparative Sl/S2  40/60  W-1  4.0  23.5  75  tapered  8.5  Example 3  Comparative Sl/S2  40/60  W-1  4.0  27.6  85  tapered  10.2  Example4  Comparative Sl/S2  40/60  W-1  4.0  A 100-nm LIS pattern could not be formed.  Example 5  Comparative Sl/S2  40/60  W-1  4.0  25.0  75  tapered  Example 6  6.8  Concentrations  0.3  0.3  0.5  0.2  0.2  0.2  0.2  1.5  1.5  Outgassing  (%)  1.5  1.6  2.5  2.6  2.3  1.6  2.7  1.4  1.6  2.2  3.1  2.4  2.5  2.3  2.4  1.9  2.3  8.8  9.1  2.8  15.1  9.8  10.3 