US009612535B2  c12)  United States Patent  Hirano et al.  (IO)  Patent No.:  US 9,612,535 B2  Apr. 4, 2017  (45)  Date of Patent:  (54)  PATTERN FORMING METHOD, ELECTRON  BEAM- OR EXTREME  ULTRAVIOLET-SENSITIVE RESIN  COMPOSITION, RESIST FILM USING THE  SAME, METHOD OF MANUFACTURING  ELECTRONIC DEVICE, AND ELECTRONIC  DEVICE  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Shuji Hirano,  Shizuoka (JP);  Hiroo  Takizawa,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  14/838,326  Aug. 27, 2015  (22)  Filed:  (63)  Continuation  of  application  No.  PCT/JP2014/051019, filed on Jan. 20, 2014.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  712059  (2013.01);  C08F  12124  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  71038  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  710758  (2013.01);  G03F  7111  (2013.01);  G03F  712004  (2013.01);  G03F  712041  (2013.01);  G03F  71325  (2013.01);  C08F 20/30  (2013.01);  C08F 20/58  (2013.01)  ( 58)  Field of Classification Search  None  See application file for complete search history.  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (56)  References Cited  U.S. PATENT DOCUMENTS  (57)  ABSTRACT  14 Claims, No Drawings  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  US 2015/0370170 Al  Dec. 24, 2015  Feb. 28, 2013  (JP) ................................. 2013-039705  "International Search Report of PCT/JP2014/051019 (Form PCT/  ISA/210)", mailed on Apr. 15, 2014, with English translation  thereof, pp. 1-5.  "International Preliminary Report on Patentability; this report con› tains the following items :Form PCT/IB/373, PCT/ISA237(cover  sheet), PCT/ISA237(Box No. I),PCT/ISA237(Box No. V),", mailed  on Sep. 1, 2015, which is English translation of "Written Opinion  of the International Searching Authority", p. 1-p. 7.  "Office Action of Japanese Counterpart Application," issued on Sep.  1, 2015, with English translation thereof, p. 1-p. 10.  "Office Action of Japan Counterpart Application," issued on Mar.  29, 2016, with Machine translation thereof, p. 1-p. 7.  "Office Action of Japan Counterpart Application" with machine  English translation, issued on Sep. 27, 2016, p. 1-p. 5.  "Office Action of Korea Counterpart Application" with English  translation thereof, issued on Dec. 1, 2016, p. 1-p. 14, in which the  listed reference was cited.  "Office Action of Taiwan Counterpart Application" with English  translation thereof, issued on Dec. 21, 2016, p. 1-p. 10, in which the  listed reference was cited.  * cited by examiner  Primary Examiner  - Sin Lee  (74)  Attorney, Agent, or Firm  - Jianq Chyun IP Office  According to one aspect of the present invention, there is  provided a pattern forming method comprising, in this order:  (1) forming a film by using an electron beam- or extreme  ultraviolet-sensitive resin composition containing, in a  specific amount, a resin (Aa) having a specific atom or  substituent;  (2) exposing the film by using an electron beam or  extreme ultraviolet ray; and  (3) forming a negative pattern by performing develop› ment using a developer including an organic solvent  after the exposure.  G03F  7120  G03F  7132  G03F  71039  G03F  71038  G03F  71004  G03F  71075  G03F  7111  C08F  12124  C08F 20/30  C08F 20/58  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  2011/0294069 Al  2012/0276481 Al  2012/0315581 Al  2013/0040096 Al  2014/0087310 Al  12/2011 Bae et al.  11/2012 Shimizu et al.  12/2012 Hatakeyama et al.  2/2013 Iwato et al.  3/2014 Kato et al.  JP  JP  JP  JP  JP  JP  JP  JP  KR  TW  WO  2011221513  2011-248019  2012-032782  2012181289  2012208431  2012-230328  2013-011855  2013-020238  20110107299  201303495  2012/165604  11/2011  12/2011  2/2012  9/2012  10/2012  11/2012  1/2013  1/2013  9/2011  1/2013  12/2012  2009/0269696 Al* 10/2009 Ohsawa ................ C08F 220/18  430/270.1  2011/0236826 Al  9/2011 Hatakeyama et al. 