(IO)  Patent No.:  US 7,129,023 B2  (45)  Date of Patent:  Oct. 31, 2006  c12)  United States Patent  Son  (54)  PHOTORESIST POLYMER AND  PHOTORESIST COMPOSITION  CONTAINING THE SAME  (75)  Inventor:  Min Seok Son,  Seoul (KR)  (73)  Assignee:  Hynix Semiconductor Inc.,  Icheon  (KR)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  11/124,937  (22)  Filed:  May 9, 2005  (51)  Int. Cl.  G03F  71038  (2006.01)  C0SG  77100  (2006.01)  C0SF 20110  (2006.01)  (52)  U.S. Cl.  ...............................  430/281.1;  430/285.1;  525/29; 526/318; 528/10; 528/41  ( 58)  Field of Classification Search  ... ... ... ... . 430/281.1,  430/285.1; 525/29; 526/318; 528/10, 41  See application file for complete search history.  (56)  References Cited  U.S. PATENT DOCUMENTS  (65)  Prior Publication Data  (57)  ABSTRACT  US 2005/0244748 Al  Nov. 3, 2005  (30)  Foreign Application Priority Data  Jul. 30, 2004  (KR)  ...................... 10-2004-0060267  5,976,759 A  *  11/1999 Urano et al. ............. 430/270.1  6,444,408 Bl *  9/2002 Brock et al ................. 430/322  6,818,378 Bl* 11/2004 Endo ....................... 430/270.1  6,844,134 Bl*  1/2005 Choi et al. ............... 430/270.1  7,049,044 Bl*  5/2006 Gonsalves et al ........ 430/270.1  * cited by examiner  Primary Examiner-Hoa  Van Le  (74)  Attorney, Agent, or  Firm-Marshall, Gerstein & Borun  LLP  Photoresist polymers and photoresist compositions are dis› closed. A photoresist polymer comprising a polymerization  repeating unit represented by Formula 1 is less sensitive to  change in the amount of energy due to its higher active  energy than that of a conventional photoresist polymer. As a  result, a phenomenon that a pattern of an outer field region  that receives a relatively large amount of light becomes too  thin is alleviated without additional dummy patterns when  pattern is formed, and pattern collapse caused by a high  aspect ratio due to high etching resistance is prevented.  Formula 1  wherein  R$_{1 }$-Rw  a, b, c and d are as defined in the description.  20 Claims, 2 Drawing Sheets  $^{0 }$\ $_{R11 }$ Formula 1  US007129023B2 