US 20190219920Al  c19)  United States  c12)  Patent Application Publication  NAGAMINE et al.  c10)  Pub. No.: US 2019/0219920 Al  (43)  Pub. Date:  Jul. 18, 2019  (54)  RESIST COMPOSITION, METHOD OF  FORMING RESIST PATTERN, POLYMERIC  COMPOUND, AND COPOLYMER  (71)  Applicant:  TOKYO OHKA KOGYO CO., LTD.,  Kawasaki-shi (JP)  (72)  Inventors:  Takashi NAGAMINE,  Kawasaki-shi  (JP);  Hideto NITO,  Kawasaki-shi (JP);  Masafumi FUJISAKI,  Kawasaki-shi  (JP);  Tatsuya FUJII,  Kawasaki-shi  (JP);  Yuki FUKUMURA,  Kawasaki-shi  (JP);  Takahiro KOJIMA,  Kawasaki-shi  (JP);  Issei SUZUKI,  Kawasaki-shi (JP);  Takuya IKEDA,  Kawasaki-shi (JP);  KhanhTin NGUYEN,  Kawasaki-shi  (JP)  (21)  Appl. No.:  16/334,302  (22)  PCT Filed:  Oct. 4, 2017  (86)  PCT No.:  PCT  I  JP2017 /036151  § 371 (c)(l),  (2) Date:  Mar. 18, 2019  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ............  G03F  71039  (2013.01);  G03F 7/2059  (2013.01);  C0SF  20126  (2013.01);  G03F  710045  (2013.01)  (57)  ABSTRACT  A resist composition which generates acid upon exposure  and exhibits changed solubility in a developing solution  under action of acid, and which includes a polymeric com› pound having a structural unit represented by general for› mula (a0-1) (wherein R represents a hydrogen atom, an alkyl  group of 1 to 5 carbon atoms or a halogenated alkyl group  of 1 to 5 carbon atoms; Va 0  represents a divalent hydrocar› bon group; nao represents an integer of Oto 2; Ra$^{00 }$repre› sents an acid dissociable group represented by general  formula (a0-rl-1); Ra$^{01 }$and Ra$^{02 }$represents a hydrocarbon  group; Ra 01  and Ra$^{02 }$may be mutually bonded to form a  ring; Ya 0  represents a quaternary carbon atom; Ra 031  Ra 032  033  ’  and Ra  each independently represents a hydrocarbon  group, provided that at least one ofRa 031 , Ra $^{032 }$and Ra033  is a hydrocarbon group having a polar group).  Oct. 5, 2016  Sep. 13, 2017  (JP) ................................. 2016-197492  (JP) ................................. 2017-176005  G03F  71039  G03F  71004  C0SF  20126  (2006.01)  (2006.01)  (2006.01)  (30)  Foreign Application Priority Data  Publication Classification  [Chemical Formula 1]  (a0-1)  (a0-rl-1) 