3  US 9,958,775 B2  4  radiation as a result of extensive studies. The present inven› tion has been conducted based on these findings.  In other words, the present invention is as follows in one  embodiment.  [1]  An  actinic ray-sensitive or radiation-sensitive resin  composition (A) including; a compound which generates an  acid by irradiation with actinic rays or radiation, wherein the  acid is linked with a group represented by the following  general formula (M) through covalent bonding.  [Chem.!]  (M)  In the formula,  Y $_{1 }$ and  Y $_{2 }$ each independently represent a hydrogen atom,  an alkyl group, a cycloalkyl group, an alkenyl group, an  alkynyl group, an aryl group, or an acyl group;  Z represents a hydrogen atom or a substituent; and  * represents a linking site with a residue of the compound  (A).  [2] The actinic ray-sensitive or radiation-sensitive resin  composition according to [1], wherein the compound (A)  has two or more groups represented by the general formula  (M).  [3] The actinic ray-sensitive or radiation-sensitive resin  composition according to [1] or [2], wherein the group  represented by the general formula (M) is a hydroxymethyl  group or an alkoxymethyl group.  [4] The actinic ray-sensitive or radiation-sensitive resin  composition according to any one of [ 1] to [3] which is used  for the formation of a negative-tone pattern further includ› ing; (Bl) a compound having a phenolic hydroxyl group.  [5] The actinic ray-sensitive or radiation-sensitive resin  composition according to [4], wherein the compound (Bl)  having the phenolic hydroxyl group is a polymer compound  having a repeating unit represented by the following general  formula (1).  [Chem. 2]  In the formula,  Ar represents an aromatic ring; and  ml represents an integer of 1 or more.  [6] The actinic ray-sensitive or radiation-sensitive resin 65  composition according to any one of [1] to [5], further  including; (C) a cross-linking agent.  R$_{11 }$ represents a hydrogen atom, a methyl group which  may have a substituent, or a halogen atom;  B$_{1 }$ represents a single bond or a divalent linking group;  [7] The actinic ray-sensitive or radiation-sensitive resin  composition according to any one of [1] to [6], further  including; (D) a compound that generates an acid which  dose not include a cross-linking group in a molecule by  irradiation with actinic rays or radiation.  [8] The actinic ray-sensitive or radiation-sensitive resin  composition according to [6] or [7], including; a compound  having two or more groups represented by the general  formula (M) in a molecule as the cross-linking agent  (C).  [9] The actinic ray-sensitive or radiation-sensitive resin  composition according to [6] or [7], including; a compound  having two or more alkoxymethyl groups in a molecule as  the cross-linking agent  (C).  [10] The actinic ray-sensitive or radiation-sensitive resin  composition according to any one of [1] to [3], further  including; (B2) a compound having a group which is  capable of decomposing by the action of an acid.  [11] A negative-tone pattern forming method including;  forming a film using the actinic ray-sensitive or radiation- sensitive resin composition according to [10], exposing the  film and developing the exposed film with a developer  containing an organic solvent.  [12]  An  actinic ray-sensitive or radiation-sensitive film  which is formed from the actinic ray-sensitive or radiation- sensitive resin composition according to any one of [1] to  [10].  [13] Mask blanks including; the actinic ray-sensitive or  radiation-sensitive film according to [12].  [14] A pattern forming method including; exposing the  actinic ray-sensitive or radiation-sensitive film according to  [12], and developing the exposed film.  [15] A pattern forming method including; exposing the  actinic ray-sensitive or radiation-sensitive film of the mask  blanks according to [ 13], and developing the exposed actinic  ray-sensitive or radiation-sensitive film.  [16] The pattern forming method according to [14] or  [15], wherein the exposing is performed using an electron  beam or extreme ultraviolet rays.  [17] A photomask which is manufactured by a method  including; exposing the actinic ray-sensitive or radiation› sensitive film of the mask blanks according to [13], devel› oping the exposed actinic ray-sensitive or radiation-sensitive  film to form a pattern and etching mask blanks using the  pattern.  [18] A compound represented by the following general  formula (I):  [Chem. 3]  (In the formula, M+ represents a sulfonium cation. X  represents an alkyl group, a cycloalkyl group, an aryl group,  a halogen atom, a hydroxyl group, an alkoxy group, or an  acyl group. Z represents a hydrogen atom, an alkyl group, a  cycloalkyl group, an aryl group or an acyl group. n repre› sents an integer of 1 to 3. o represents an integer of 1 to 5,  p represents an integer of Oto 4, and o+ps5 is satisfied.)  According to the present invention, an actinic ray-sensi› tive or radiation-sensitive resin composition that can form a  pattern which satisfies high sensitivity, high resolution (for  R11  ~ $_{B1 }$ I  Ar  I  (OH)m1  (I)  (1) 