US 20160342090Al  c19)  United States  c12)  Patent Application Publication  TSUCHIMURA  c10)  Pub. No.: US 2016/0342090 Al  (43)  Pub. Date:  Nov. 24, 2016  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, RESIST FILM,  RESIST-COATED MASK BLANK, RESIST  PATTERN FORMING METHOD, AND  PHOTO MASK  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventor:  Tomotaka TSUCHIMURA,  Yoshida-cha (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  (21)  Appl. No.:  15/229,896  (22)  Filed:  Aug. 5, 2016  (63)  Continuation  of application  No.  PCT/JP2015/  051293, filed on Jan. 20, 2015.  (52)  U.S. Cl.  CPC ...............  G03F  71322  (2013.01);  G03F  71039  (2013.01);  G03F  1150  (2013.01);  G03F  712063  (2013.01);  G03F  712004  (2013.01);  G03F  1176  (2013.01)  (51)  Int. Cl.  Publication Classification  (57)  ABSTRACT  Related U.S. Application Data  (30)  Foreign Application Priority Data  An actinic ray-sensitive or radiation-sensitive resin compo› sition includes (A) a polymer compound having a structure  in which a hydrogen atom of a phenolic hydroxyl group is  substituted by a group represented by specific General  Formula  (I), and (B) a compound capable of generating an  acid upon irradiation with actinic rays or radiation.  Feb. 21, 2014  (JP) ................................. 2014-031433  G03F  7132  (2006.01)  G03F  1176  (2006.01)  G03F  7120  (2006.01)  G03F  71039  (2006.01)  G03F  1150  (2006.01) 