US 20200192222Al  c19)  United States  c12)  Patent Application Publication  Hatakeyama et al.  c10)  Pub. No.: US 2020/0192222 Al  (43)  Pub. Date:  Jun. 18, 2020  (54)  RESIST COMPOSITION AND PATTERNING  PROCESS  (71)  Applicant:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (72)  Inventors:  Jun Hatakeyama,  Joetsu-shi (JP);  Masaki Ohashi,  Joetsu-shi (JP);  Masahiro Fukushima,  Joetsu-shi (JP);  Takayuki Fujiwara,  Joetsu-shi (JP);  Kazuhiro Katayama,  Joetsu-shi (JP)  (73)  Assignee:  Shin-Etsu Chemical Co., Ltd.,  Tokyo  (JP)  (21)  Appl. No.:  16/717,292  (22)  Filed:  Dec. 17, 2019  (52)  U.S. Cl.  CPC ..........  G03F 710382  (2013.01);  G03F 710045  (2013.01);  C08L 33/14  (2013.01);  C08G  2261/3222  (2013.01);  C08L 25106  (2013.01);  C08G 61102  (2013.01);  C08L 33/08  (2013.01);  G03F  712004  (2013.01)  (51)  Int. Cl.  G03F  71038  G03F  71004  C08L 33/14  G03F 7120  C08L 25106  C08G 61102  C08L 33/08  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  (2006.01)  Dec. 18, 2018  (JP) ................................. 2018-236571  A resist composition comprising an iodized base polymer  and an iodized benzene ring-containing quencher has a high  sensitivity and improved LWR and CDU.  (30)  Foreign Application Priority Data  (57)  ABSTRACT  Publication Classification 