US 2012/0003590 Al  98  Jan. 5, 2012  pounds synthesized in Examples of JP-A-2002-363146 and  the compounds described in paragraph 0108 of JP-A-2007- 298569.  [0437]  A photosensitive basic compound may be also used  as the basic compound. Examples of the photosensitive basic  compound which can be used include the compounds  described in JP-T-2003-524799 (the term "JP-T" as used  herein means a "published Japanese translation of a PCT  patent application") and  J.  Photopolym. Sci.  &  Tech.,  Vol. 8,  pp. 543-553 (1995).  [0438]  The molecular weight of the basic compound is  usually from 100 to 1,500, preferably from 150 to 1,300, more  preferably from 200 to 1,000.  [0439]  One of these basic compounds may be used alone, or  two or more kinds thereof may be used in combination.  [0440]  In the case where the composition of the present  invention contains a basic compound, the content thereof is  preferably from 0.01 to 8.0 mass%, more preferably from 0.1  to 5.0 mass%, still more preferably from 0.2 to 4.0 mass%,  based on the entire solid content of the composition.  [0441]  The molar ratio of the basic compound to the photo› acid generator is preferably from 0.01 to 10, more preferably  from 0.05 to 5, still more preferably from 0.1 to 3.  [0442]  If  this molar ratio is excessively large, there is a case  that sensitivity and/or resolution may be reduced.  If  this  molar ratio is excessively small, thinning of the pattern may  occur between exposure and heating (post-baking). The  molar ratio is more preferably from 0.05 to 5, still more  preferably from 0.1 to 3. The photo-acid generator in the  molar ratio above is based on the total amount of the repeating  unit (B) in the resin and the photo-acid generator which may  be further contained in the resin.  [0450]  Preferred examples of the dye include an oil dye and  a basic dye. Specific examples thereof include Oil Yellow  #101, Oil Yellow #103, Oil Pink #312, Oil Green BG, Oil  Blue BOS, Oil Blue #603, Oil Black BY, Oil Black BS, Oil  Black T-505 (all produced by Orient Chemical Industries,  Ltd.), Crystal Violet (C142555), Methyl Violet (C142535),  RhodamineB (C145170B), MalachiteGreen(C142000), and  Methylene Blue (C152015).  [0451]  The composition of the present invention may fur› ther contain a photo-base generator. When a photo-base gen› erator is contained, a more excellent pattern can be formed.  [0452]  Examples of the photo-base generator include the  compounds described in JP-A-4-151156, JP-A-4-162040,  JP-A-5-197148,  JP-A-5-5995,  JP-A-6-194834,  JP-A-8- 146608, JP-A-10-83079 and European Patent No. 622682.  Specific preferred examples of the photo-base generator  include 2-nitrobenzyl carbamate, 2,5-dinitrobenzylcyclo› hexy I carbamate, N-cyclohexy 1-4-methy lpheny !sulfonamide  and 1, 1-dimethy 1-2-pheny lethy 1-N-isopropy I carbamate.  (Photo-Base Generator)  [0453]  The composition of the present invention may fur› ther contain an antioxidant. When an antioxidant is contained,  the organic material can be prevented from oxidation in the  presence of oxygen.  [0454]  Examples of the antioxidant include a phenol-based  antioxidant, an antioxidant composed of an organic acid  derivative, a sulfur-containing antioxidant, a phosphorus› based antioxidant, an amine-based antioxidant, an antioxi› dant composed of an amine-aldehyde condensate, and an  antioxidant composed of an amine-ketone condensate. Out of  these antioxidants, a phenol-based antioxidant or an antioxi› dant composed of an organic acid derivative is preferably  used. When such an antioxidant is used, the function as an  antioxidant can be brought out without deteriorating the per› formance of the composition,  [0443]  The composition of the present invention may fur› ther contain a surfactant. The surfactant is preferably a fluo› rine-containing and/or silicon-containing surfactant.  [0444]  Examples of the fluorine-containing and/or silicon› containing surfactant include Megaface Fl 76 and Megaface  ROS produced by Dainippon Ink & Chemicals, Inc.; PF656  and PF6320 produced by OMNOVA; Troysol S-366 pro› duced by Troy Chemical; Florad FC430 produced by Sumi› tomo 3M Inc.; and Polysiloxane Polymer KP-341 produced  by Shin-Etsu Chemical Co., Ltd.  [0445]  A surfactant other than the fluorine-containing and/  or silicon-containing surfactant may be also used. Examples  of this surfactant include a nonionic surfactant such as poly› oxyethylene alkyl ethers and polyoxyethylene alkylaryl  ethers.  [0446]  In addition, known surfactants may be appropriately  used. Examples of the surfactant which can be used include  the surfactants described in paragraph [0273] et seq. of U.S.  Patent Application Publication No. 2008/0248425Al.  [0447]  One kind of a surfactant may be used alone, or two  or more kinds of surfactants may be used in combination.  [0448]  In the case where the composition of the present  invention further contains a surfactant, the amount used  thereof is preferably from 0.0001 to 2 mass %, more prefer› ably from 0.001 to 1 mass%, based on the entire solid content  of the composition.  [0449]  The composition of the present invention may fur› ther contain a dye.  (Surfactant)  (Dye)  (Antioxidant)  [0455]  Examples of the phenol-based antioxidant which  can be used include substituted phenols, and bis-, tris- and  poly-phenols.  [0456]  Examples of the substituted phenols include l-oxy- 3-methyl-4-isopropylbenzene, 2,6-di-tert-butylphenol, 2,6- di-tert-butyl-4-ethylphenol,  2,6-di-tert-butyl-4-methylphe› nol,  4-hydroxymethy 1-2, 6-di-tert-buty !phenol,  buty lhydroxyanisole,  2-( 1-methy lcyclohexyl )-4, 6-dimeth› y lphenol, 2,4-dimethyl-6-tert-butylphenol, 2-methyl-4,6-di› nonylphenol,  2,6-di-tert-butyl-a-dimethylamino-p-cresol,  6-( 4-hydroxy-3,5-di-tert-butylanilino )-2,4-bis-octyl-thio-l,  3,5-triazine,  n-octadecyl-3-( 4’-hydroxy-3’,5’-di-tert-butyl› phenyl)propionate, octylated phenol, aralkyl-substituted  phenols, alkylated p-cresol, and hindered phenol.  [0457]  Examples of the bis-, tris- and poly-phenols include  4,4 ’-dihydroxydipheny I,  methy lenebis( dimethy 1-4, 6-phe› nol ), 2,2’-methylene-bis-( 4-methyl-6-tert-butylphenol), 2,2’› methylene-bis-( 4-methyl-6-cyclohexyl-phenol), 2,2’-meth› y lene-bis-( 4-ethyl-6-tert-buty !phenol),  4,4 ’-methylene-bis- (2,6-di-tert-butylphenol ),  2,2’-methylene-bis-(6- alphamethyl-benzyl-p-cresol),  methylene-crosslinked  polyhydric alkylphenol, 4,4’-butylidenebis-(3-methyl-6-tert› butylphenol), 1, 1-bis-( 4-hydroxyphenye-cyclohexane, 2,2’› dihydroxy-3,3’-di-a-methylcyclohexyl)-5,5’-dimethyldiphe› nylmethane, alkylated bisphenol, hindered bisphenol, 1,3,5-