110  US 9,423,690 B2  109  -continued  In Formula (c2), R$_{3 }$ represents a hydrogen atom or an  alkyl group. The alkyl group as R$_{3 }$ is preferably the same as  Formula (cl).  Here, with respect to the extreme ultraviolet (EUV light)  exposure, the light leakage (out-of-band light) occurred in  the ultraviolet region having a wavelength of 100 to 400 nm  worsens the surface roughness, and as a result, the perfor› mance of the resolution and the space width roughness tends  to be degraded due to the bridge between patterns or pattern  disconnection.  However, the aromatic ring in the repeating unit ( c)  functions as an internal filter capable of absorbing the  out-of-band light. Accordingly, it is preferred that the resin  (A) contains the repeating unit (c) from the viewpoint of  high resolution and low space width roughness.  Here, it is preferred that the repeating unit ( c) does not  have a phenolic hydroxyl group (a hydroxyl group directly  bound on the aromatic ring) from the viewpoint of obtaining  high resolution.  Specific examples of the repeating unit ( c) are shown  below, but are not limited thereto.  CH3  I  --fCH2-CH t- --fCH2-C+-- OAO  OAO  ¢  uo  ~  #  #  --fCH2-CHt- OAO  --+CH2-CH t- OAO  --fCH2-CH-,-- CH3  OAO  I  --fCH2-Ct- OAO  u~  I  0  ~  ~  CH3  I  --fCH2-CHt- OAO  --fCH2-Ct- OAO  ~  ~ 