Jan. 10, 2019  40  US 2019/0010119 Al  [0144]  As the amount of the repeating unit BN2, the lower  limit is preferably 5 mo! %, more preferably 10 mo! % based  on the whole repeating units constituting the component (B).  The upper limit is preferably 70 mo! %, more preferably 60  mo!%.  [0145]  When the inventive resist composition is a chemi› cally amplified negative resist composition, the component  (B) preferably contains the repeating unit BN2, additionally  at least one kind of a repeating unit selected from the  repeating units B3 to B5 in addition to the repeating unit Bl  in view of coexisting high etching durability and resolution.  In this case, these repeating units are contained in an amount  of 60 mo! % or more, more preferably 70 mo! % or more,  and still more preferably 80 mo! % or more in the whole  repeating units. This securely gives properties demanded for  the inventive negative resist composition.  [0146]  When the inventive resist composition is a chemi› cally amplified negative resist composition, the component  (B) may contain a lactone structure, a (meth)acrylate ester  unit having an adhesive group such as a hydroxy group other  than the phenolic hydroxy group, and other repeating units  in order to fine-tune the properties of a resist film. Illustra› tive examples of the (meth)acrylate ester unit having an  adhesive group include the units shown by the following  general formulae (bl) to (b3). These units can be used  supplementary as a unit to control the unit to give adhesive› ness to a substrate and the solubility without showing  acidity.  (b2)  (bl)  -continued  MeO  HO  -continued  0  1Q  0 