It is certified that error appears in the above-identified patent and that said Letters Patent is  hereby corrected as shown below:  Column 13,  Lines 66-67, the sentence  "An  ultramicro negative pattern of 0.20 jm L/S was  obtained." should read -- An  ultramicro negative pattern of 0.20 µm  L/S was  obtained. -- Column 17,  Lines 7-9, the claim "A negative photoresist comprosition according to claim 5 further  comprising (iii) a photoacid generator and (iv) an organic solvent." should read -- A  negative photoresist composition according to claim 5 further comprising (iii) a  photoacid generator and (iv) an organic solvent. -- Column 20,  Lines 8-9, the phrase "a, band c individually represent the relative amounts of each  comonomer, with band c being greater then  O." should read -- a, band c individually  represent the relative amounts of each comonomer, with band c being greater than 0. -› Lines 60-66, please replace Chemical Formula 6 with the following Chemical  Formula 6: __  UNITED STATES PATENT AND TRADEMARK OFFICE  CERTIFICATE OF CORRECTION  Page 4 of 5  PATENT NO.  : 6,482,565 Bl  DATED  : November 19, 2002  INVENTOR(S)  : Jae Chang et al. 