US 20200050106Al  c19)  United States  c12)  Patent Application Publication  SHIRAKAWA et al.  c10)  Pub. No.: US 2020/0050106 Al  (43)  Pub. Date:  Feb. 13, 2020  (54)  PHOTOSENSITIVE COMPOSITION FOR  EUV LIGHT, PATTERN FORMING METHOD,  AND METHOD FOR MANUFACTURING  ELECTRONIC DEVICE  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Michihiro SHIRAKAWA,  Haibara-gun  (JP);  Hajime FURUTANI,  Haibara-gun  (JP);  Mitsuhiro FUJITA,  Haibara-gun  (JP);  Tomotaka TSUCHIMURA,  Haibara-gun (JP);  Takashi  KAWASHIMA,  Haibara-gun (JP);  Michihiro OGAWA,  Haibara-gun (JP);  Akihiro KANEKO,  Haibara-gun (JP);  Hironori OKA,  Haibara-gun (JP);  Yasuharu SHIRAISHI,  Haibara-gun  (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  (21)  Appl. No.:  16/655,447  (22)  Filed:  Oct. 17, 2019  (63)  Continuation  of application  No.  PCT/JP2018/  015332, filed on Apr. 12, 2018.  Condition 2: The concentration of the solid content in the  photosensitive composition for EUV light is 2.5% by  mass or less.  2,  Condition  1:  The A value determined by Formula (1) is  0.14 or more,  A~([H]x0.04+[C]x 1.0+[N]x2.1 +[O]x3. 6+[F]x5. 6+  [S]x 1.5+[I]x39 .5)/([H]x 1 +[C]x 12+[N]x 14+[O]x  16+[F]x19+[S]x32+[I]x127)  Formula (1):  (52)  U.S. Cl.  CPC ............  G03F  71039  (2013.01);  G03F  712004  (2013.01);  G03F  710045  (2013.01)  (51)  Int. Cl.  (30)  Foreign Application Priority Data  Publication Classification  (57)  ABSTRACT  Related U.S. Application Data  A photosensitive composition for  EUV  light includes a  predetermined resin and a photoacid generator, or includes  a predetermined resin having a repeating unit having a  photoacid generating group, and satisfies Conditions 1 and  G03F  71039  G03F  71004  G03F  7120  (2006.01)  (2006.01)  (2006.01)  Apr. 21, 2017  May 25, 2017  Mar. 29, 2018  (JP) ................................. 2017-084466  (JP) ................................. 2017-103304  (JP) ................................. 2018-064289 