US009423690B2  c12)  United States Patent  Takizawa et al.  (IO)  Patent No.:  US 9,423,690 B2  (45)  Date of Patent:  Aug. 23, 2016  (54)  PATTERN FORMING METHOD, ELECTRON  BEAM-SENSITIVE OR EXTREME  ULTRAVIOLET RAY-SENSITIVE RESIN  COMPOSITION, RESIST FILM, AND  METHOD FOR MANUFACTURING  ELECTRONIC DEVICE, AND ELECTRONIC  DEVICE USING THE SAME  (71)  Applicant:  FUJIFILM Corporation,  Tokyo (JP)  (72)  Inventors:  Hiroo Takizawa,  Shizuoka (JP);  Shuji  Hirano,  Shizuoka (JP);  Natsumi  Yokokawa,  Shizuoka (JP);  Wataru  Nihashi,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM Corporation,  Tokyo (JP)  ( *)  Notice:  Subject to any disclaimer, the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by 0 days.  (21)  Appl. No.:  14/625,897  (22)  Filed:  Feb. 19, 2015  (63)  Continuation  of  application  No.  PCT/JP2013/072485, filed on Aug. 16, 2013.  (51)  Int. Cl.  (52)  U.S. Cl.  CPC ...........  G03F 710388  (2013.01);  C08F 141185  (2013.01);  C08F 16110  (2013.01);  C08F 24100  (2013.01);  C08F 220118  (2013.01);  C08F  220120  (2013.01);  C08F 220126  (2013.01);  G03F  710045  (2013.01);  G03F  710046  (2013.01);  G03F  710392  (2013.01);  G03F  710397  (2013.01);  G03F  712002  (2013.01);  G03F  712037  (2013.01);  G03F  71325  (2013.01);  (58)  Field of Classification Search  CPC .... G03F 7/038; G03F 7/0388; G03F 7/0392;  G03F 7/32; G03F 7/40; C08F 220/18;  C08F 220/12; C08F 220/20; C08F 220/26;  H0lL 21/0271; H01L 21/0273; H0lL  21/0274  USPC ............ 430/270.1, 322, 325, 329, 434, 435,  430/913, 914; 526/320, 326  See application file for complete search history.  (Continued)  (Continued)  14 Claims, No Drawings  (1-2)  (1-0)  (65)  Prior Publication Data  Related U.S. Application Data  (30)  Foreign Application Priority Data  (57)  ABSTRACT  OTHER PUBLICATIONS  FOREIGN PATENT DOCUMENTS  U.S. PATENT DOCUMENTS  (56)  References Cited  US 2015/0168834 Al  Jun. 18, 2015  There is provided a pattern forming method, including: (a)  forming a film by using an electron beam-sensitive or  extreme ultraviolet ray-sensitive resin composition contain› ing a resin (A) having a repeating unit represented by  Formula (1-0) and a repeating unit represented by Formula  (1-2); (b) exposing the film by using an electron beam or  extreme ultraviolet ray; and ( c) developing the exposed film  by using a developer containing an organic solvent to form  a negative pattern, wherein a content of the repeating unit  represented by Formula (1-0) is 45 mo!% or more based on  a whole repeating units in the resin (A).  (Continued)  Search Report dated Nov. 12, 2013, issued by the International  Searching Authority in counterpart International Application No.  PCT/JP2013/072485.  Primary Examiner  - Amanda C Walke  (74)  Attorney, Agent, or Firm  - Sughrue Mion, PLLC  (Continued)  (Continued)  8,252,504 B2  *  8/2012 Harada et al. ............. 430/270.1  8,426,115 B2  4/2013 Hatakeyama et al. ........ 430/312  JP  JP  2001-201854 A  2005-091712 A  7/2001  4/2005  Aug. 20, 2012  Mar. 15, 2013  (JP) ................................. 2012-181892  (JP) ................................. 2013-054401  G03F 71004  G03F 71038  C08F 220118  (2006.01)  (2006.01)  (2006.01) 