68  US 7,851,130 B2  67  (F2)  carbon-based acid-decomposable resin, in particular the fol› lowing performances, becomes possible, that is,  The examples of such monomers include compounds hav› ing one addition polymerizable unsaturated bond selected  from acrylic esters, methacrylic esters, acrylamides, meth› acryl-amides, ally! compounds, vinyl ethers, vinyl esters, etc.  In addition to the aforementioned compounds, addition  polymerizable unsaturated compounds copolymerizable with  the monomers corresponding to the above various repeating  structural units may be used for copolymerization.  In the alicyclic hydrocarbon-based acid-decomposable  resin, the molar ratio of the content of each repeating struc› tural unit is arbitrarily set to adjust  dry  etching resistance,  aptitude for standard developing solutions of a resist, adhe- sion to a substrate, and resist profile, in addition, general  requisite performances of a resist, e.g., resolution, heat resis› tance and sensitivity.  As preferred embodiments of the alicyclic hydrocarbon› based acid-decomposable resin in the invention, the follow- ing resins are exemplified.  (1) Resin containing a repeating unit having a partial structure  containing the alicyclic hydrocarbon represented by any of  formulae (pl) to (pV) (a side chain type), preferably resin  containing a repeating unit by (meth)acrylate having the  structure of any of formulae (pl) to (p V),  (2) Resin containing a repeating unit represented by formula  (II-AB) (a main chain type); however, the following is further  exemplified as embodiment (2),  (3) Resin containing a repeating unit represented by formula  (II-AB), a maleic anhydride derivative structure and a (meth)  acrylate structure (a hybrid type).  In the alicyclic hydrocarbon-based acid-decomposable  resin, the content of a repeating unit having an acid-decom- posable group is preferably from 10 to 60 mo! % in all the  repeating structural units, more preferably from 20 to 50 mo!  %, and still more preferably from 25 to 40 mo! %.  In the alicyclic hydrocarbon-based acid-decomposable  resin, the content of a repeating unit having a partial structure  containing the alicyclic hydrocarbon represented by any of  formulae (pl) to (p V) is preferably from 25 to 70 mo! % in all  the repeating structural units, more preferably from 35 to 65  mo! %, and still more preferably from 40 to 60 mo! %.  In the alicyclic hydrocarbon-based acid-decomposable  resin, the content of a repeating unit represented by formula  (II-AB) is preferably from 10 to 60 mo!% in the total repeat› ing structural units, more preferably from 15 to 55 mo!%, and  still more preferably from 20 to 50 mo!%.  The content of the repeating unit having a lactone group is  preferably from 10 to 70 mo! % in all the repeating structural  units, more preferably from 20 to 60 mo! %, and still more  preferably from 25 to 60 mo! %.  The content of the repeating unit having the alicyclic  hydrocarbon structure substituted with a polar group is pref- erably from 1 to 40 mo!% in all the repeating structural units,  more preferably from 5 to 30 mo!%, and still more preferably  from 5 to 20 mo! %.  The alicyclic hydrocarbon-based acid-decomposable resin  in the invention can contain various kinds of repeating struc› tural units, besides the above repeating structural units, for the  purpose of the adjustments of dry etching resistance, aptitude  for standard developing solutions, adhesion to a substrate,  resist profile, and further, general requisite performances of  resists, e.g., resolution, heat resistance and sensitivity.  As these repeating structural units, the repeating structural  units corresponding to the monomers shown below can be  exemplified, but the invention is not restricted thereto.  By containing such various repeating structural units, fine  adjustment of performances required of the alicyclic hydro- In formula (F2), Rx represents a hydrogen atom, a halogen  atom, or an alkyl group having from 1 to 4 carbon atoms. As  preferred substituents that the alkyl group represented by Rx  may have, a hydroxyl group and a halogen atom are exempli› fied.  Fa represents a single bond or a straight chain or branched  alkylene group, and preferably a single bond.  Fb represents a monocyclic or polycyclic hydrocarbon  group.  Fe represents a single bond or a straight chain or branched  alkylene group, and preferably a single bond or a methylene  group.  F $_{1 }$ represents a group represented by formula (F 1).  P$_{1 }$ represents from 1 to 3.  As the cyclic hydrocarbon group represented by Fb, a  cyclopentyl group, a cyclohexyl group, or a norbomyl group  is preferred.  The specific examples of the repeating units having the  structure represented by formula (Fl) are shown below.  (1) Solubility in a coating solvent,  (2) A film-forming property (a glass transition point),  (3) Alkali developability,  (4) Decrease of layer thickness (hydrophobic/hydrophilic  properties, selection of an alkali-soluble group),  (5) Adhesion of an unexposed area to a substrate, and  (6) Dry etching resistance.  ~-+-OH  H  I  ---fCH2-Cr- l  o=c  CH3  I  ---f CH2 - C-,-- 1  o=c  CF3  OH  CF3  6~  CF3  OH  CF3 