US 20120003590Al  c10)  Pub. No.: US 2012/0003590 Al  (43)  Pub.  Date:  Jan. 5, 2012  c19)  United States  c12)  Patent Application Publication  HIRANO et al.  (54)  ACTINIC RAY-SENSITIVE OR  RADIATION-SENSITIVE RESIN  COMPOSITION, AND RESIST FILM AND  PATTERN FORMING METHOD USING THE  SAME  (75)  Inventors:  Shuji HIRANO,  Shizuoka (JP);  Hidenori TAKAHASHI,  Shizuoka  (JP);  Tomotaka TSUCHIMURA,  Shizuoka (JP);  Takeshi  KAWABATA,  Shizuoka (JP);  Hideaki TSUBAKI,  Shizuoka (JP)  (73)  Assignee:  FUJIFILM CORPORATION,  Tokyo (JP)  (21)  Appl. No.:  13/033,079  (22)  Filed:  Feb.23,2011  (30)  Foreign Application Priority Data  Publication Classification  (57)  ABSTRACT  (51)  Int. Cl.  G03F  7120  COSF 214118  (2006.01)  (2006.01)  (52)  U.S. Cl.  .........................................  430/325;  526/243  Jul. 1, 2010  Feb. 8, 2011  (JP) ................................. 2010-151500  (JP) ................................. 2011-025505  An actinic ray-sensitive or radiation-sensitive resin composi› tion containing a resin having (A) a repeating unit represented  by a specific formula  (I)  and (B) a repeating unit capable of  generating an acid upon irradiation with an actinic ray or  radiation. 