Hall Resistive Tearing Mode: A Variational Formulation
  A unified linear tearing-mode formulation is given incorporating both resistivity and Hall effects. A variational method is used that appears to be best suited to deal with the difficulties peculiar to the {\it triple-deck} structure associated with the Hall resistive tearing mode but also to lead to a convenient analytical dispersion relation for the Hall resisitive tearing mode.   This analytical dispersion relation -   * recovers the Furth-Killeen-Rosenbluth[15] result for the resistive branch;   * gives a growth rate for the Hall branch which appears to be consistent with the growth rate of the electron-inertia driven tearing mode given previously (Coppi [19]);   * recovers the scaling relation for the transition from the resisitive regime to the Hall regime numerically established by Fitzpatrick[20] in a driven Hall resistive reconnection situation. 
Bhimsen K. Shivamoggi