Metallic Pattern Fabrication in Organic Mott Insulating Crystal by Local   X-Ray Irradiation
  We have fabricated a metallic structure in an organic Mott insulator $\kappa$-(BEDT-TTF)$_2$Cu[N(CN)$_2$]Cl. The periodic metallic domains of approximately 90$\times$90 $\mu$m$^2$ obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices. 
Naoki Yoneyama, Takahiko Sasaki, Norio Kobayashi, Yuka Ikemoto, Taro   Moriwaki, Hiroaki Kimura