High-Mobility Few-Layer Graphene Field Effect Transistors Fabricated on   Epitaxial Ferroelectric Gate Oxides (Supplementary Information)
  Supplementary Information to arXiv:0810.4466: 1. Characterizations of Pb(Zr_0.2Ti_0.8)O_3 (PZT) films. 2. Substrate preparation before the exfoliation of graphene. 3. The band structure of FLG. 4. Dielectric constant measurements of PZT. 5. rho(V_g) and R_H(V_g) fitting inside the band overlap regime. 6. The deformation potential of longitudinal acoustic (LA) phonons in graphene. 7. Resistivity and Hall measurements of a SiO_2-gated FLG. 
X. Hong, A. Posadas, K. Zou, C. H. Ahn and J. Zhu