Microwave properties of superconducting atomic-layer deposited TiN films
  We have grown superconducting TiN films by atomic layer deposition with thicknesses ranging from 6 to 89 nm. This deposition method allows us to tune the resistivity and critical temperature by controlling the film thickness. The microwave properties are measured, using a coplanar-waveguide resonator, and we find internal quality factors above a million, high sheet inductances (5.2-620 pH), and pulse response times up to 100 \mu s. The high normal state resistivity of the films (> 100 \mu\Omega cm) affects the superconducting state and thereby the electrodynamic response. The microwave response is modeled using a quasiparticle density of states modified with an effective pair-breaker,consistently describing the measured temperature dependence of the quality factor and the resonant frequency. 
P. C. J. J. Coumou, M. R. Zuiddam, E. F. C. Driessen, P. J. de Visser,   J. J. A. Baselmans, and T. M. Klapwijk
cond-mat.supr-con