Tailoring Nanostructures Using Copolymer Nanoimprint Lithography
  Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work, we report on a novel technique to direct self-assembled structures of block copolymers by NanoImprint Lithography. Surface energy of a reusable mold and nanorheology are used to organize the copolymers in defect-free structures over tens of micrometers in size. Versatile and controlled in-plane orientations of about 25 nm half-period lamellar nanostructures are achieved and, in particular, include applications to circular tracks of magnetic reading heads. 
Pascal Thebault, Stefan Niedermayer, Stefan Landis, Nicolas Chaix,   Patrick Guenoun, Jean Daillant, Xingkun Man, David Ande...
cond-mat.soft cond-mat.mes-hall cond-mat.mtrl-sci physics.chem-ph