Thulium and ytterbium-doped titanium oxide thin films deposited by   ultrasonic spray pyrolysis
  Thin films of thulium and ytterbium-doped titanium oxide were grown by metal-organic spray pyrolysis deposition from titanium(IV)oxide bis(acetylacetonate), thulium(III) tris(2,2,6,6-tetramethyl-3,5-heptanedionate) and ytterbium(III) tris(acetylacetonate). Deposition temperatures have been investigated from 300{\deg}C to 600{\deg}C. Films have been studied regarding their crystallity and doping quality. Structural and composition characterisations of TiO2:Tm,Yb were performed by electron microprobe, X-ray diffraction and Fourier transform infrared spectroscopy. The deposition rate can reach 0.8 \mum/h. The anatase phase of TiO2 was obtained after synthesis at 400{\deg}C or higher. Organic contamination at low deposition temperature is eliminated by annealing treatments. 
S. Forissier, H. Roussel, P. Chaudouet, A. Pereira, J.-L. Deschanvres,   B. Moine
cond-mat.mtrl-sci