Electrochemical integration of graphene with light absorbing   copper-based thin films
  We present an electrochemical route for the integration of graphene with light sensitive copper-based alloys used in optoelectronic applications. Graphene grown using chemical vapor deposition (CVD) transferred to glass is found to be a robust substrate on which photoconductive Cu_{x}S films of 1-2 um thickness can be deposited. The effect of growth parameters on the morphology and photoconductivity of Cu_{x}S films is presented. Current-voltage characterization and photoconductivity decay experiments are performed with graphene as one contact and silver epoxy as the other. 
Medini Padmanabhan, Kallol Roy, Gopalakrishnan Ramalingam, Srinivasan   Raghavan, and Arindam Ghosh
cond-mat.mtrl-sci