Graphene field-effect transistors based on boron nitride gate   dielectrics
  Graphene field-effect transistors are fabricated utilizing single-crystal hexagonal boron nitride (h-BN), an insulating isomorph of graphene, as the gate dielectric. The devices exhibit mobility values exceeding 10,000 cm2/V-sec and current saturation down to 500 nm channel lengths with intrinsic transconductance values above 400 mS/mm. The work demonstrates the favorable properties of using h-BN as a gate dielectric for graphene FETs. 
I. Meric, C. R. Dean, A. F. Young, J. Hone, P. Kim, K. L. Shepard
cond-mat.mes-hall