Evidence for a capacitor network near the metal insulator transition in   VO2 thin films probed by in-plane impedance spectroscopy
  Impedance spectroscopy measurements were performed in high quality Vanadium dioxide (VO2) thin films. This technique allows us investigate the resistive and capacitive contribution to the dielectric response near the metal-insulator transition (MIT). A non ideal RC behavior was found in our films from room temperature up to 334 K. A decrease of the total capacitance was found in this region, possibly due to interface effects. Above the MIT, the system behaves like a metal as expected, and a modified equivalent circuit is necessary to describe the impedance data adequately. Around the MIT, an increase of the total capacitance is observed. 
J. -G. Ram\'irez, Edgar J. Pati\~no, Rainer Schmidt, Amos Sharoni, M.   E. G\'omez and Ivan K. Schuller
cond-mat.mtrl-sci cond-mat.str-el