Large array of sub-10 nm single-grain Au nanodots for use in   nanotechnology
  A uniform array of single-grain Au nanodots, as small as 5-8 nm, can be formed on silicon using e-beam lithography. The as-fabricated nanodots are amorphous, and thermal annealing converts them to pure Au single crystals covered with a thin SiO2 layer. These findings are based on physical measurements, such as atomic force microscopy (AFM), atomic resolution scanning transmission electron microscopy, and chemical techniques using energy dispersive x-ray spectroscopy. A self-assembled organic monolayer is grafted on the nanodots and characterized chemically with nanometric lateral resolution. We use the extended uniform array of nanodots as a new test-bed for molecular electronics devices. 
N. Clement, G. Patriarche, K. Smaali, F. Vaurette, K. Nishiguchi, D.   Troadec, A. Fujiwara and D. Vuillaume
cond-mat.mes-hall cond-mat.mtrl-sci