Characterization of ion/electron beam induced deposition of electrical   contacts at the sub-{\mu}m scale
  We investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-\mu m scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05-2 \mu m range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes exhibit weakly conductive halos at the sub-\mu m scale, and can thus be used to achieve resist-free electrical contacts for transport measurements at the sub-\mu m scale. Four-point transport measurements using \mu m-spaced EBID contacts are provided in the case of a multiwalled carbon nanotube. 
D. Brunel, D. Troadec, D. Hourlier, D. Deresmes, M Zdrojek and T.   M\'elin
cond-mat.mes-hall