Parallel Core-Shell Metal-Dielectric-Semiconductor Germanium Nanowires   for High Current Surround Gate Field Effect Transistors
  Core-shell germanium nanowire (GeNW) is formed with a single-crystalline Ge core and concentric shells of nitride and silicon passivation layer by chemical vapor deposition (CVD), an Al2O3 gate dielectric layer by atomic layer deposition (ALD) and an Al metal surround-gate (SG) shell by isotropic magnetron sputter deposition. Surround gate nanowire field effect transistors (FETs) are then constructed using a novel self-aligned fabrication approach. Individual SG GeNW FETs show improved switching over GeNW FETs with planar gate stacks owing to improved electrostatics. FET devices comprised of multiple quasi-aligned SG GeNWs in parallel are also constructed. Collectively, tens of SG GeNWs afford on-currents exceeding 0.1mA at low source-drain bias voltages. The self-aligned surround gate scheme can be generalized to various semiconductor nanowire materials. 
Li Zhang, Ryan Tu and Hongjie Dai