Random Sequential Adsorption: From Continuum to Lattice and   Pre-Patterned Substrates
  The random sequential adsorption (RSA) model has served as a paradigm for diverse phenomena in physical chemistry, as well as in other areas such as biology, ecology, and sociology. In the present work, we survey aspects of the RSA model with emphasis on the approach to and properties of jammed states obtained for large times in continuum deposition versus that on lattice substrates, and on pre-patterned surfaces. The latter model has been of recent interest in the context of efforts to use pre-patterning as a tool to improve selfassembly in micro- and nanoscale surface structure engineering. 
A. Cadilhe, N. A. M. Araujo, Vladimir Privman