Grain-boundary grooving and agglomeration of alloy thin films with a   slow-diffusing species
  We present a general phase-field model for grain-boundary grooving and agglomeration of polycrystalline alloy thin films. In particular, we study the effects of slow-diffusing species on grooving rate. As the groove grows, the slow species becomes concentrated near the groove tip so that further grooving is limited by the rate at which it diffuses away from the tip. At early times the dominant diffusion path is along the boundary, while at late times it is parallel to the substrate. This change in path strongly affects the time-dependence of grain boundary grooving and increases the time to agglomeration. The present model provides a tool for agglomeration-resistant thin film alloy design. keywords: phase-field, thermal grooving, diffusion, kinetics, metal silicides 
Mathieu Bouville, Dongzhi Chi, and David J. Srolovitz