Deposition Order Dependent Magnetization Reversal in Pressure Graded   Co/Pd films
  Magnetization reversal mechanisms and depth-dependent magnetic profile have been investigated in Co/Pd thin films magnetron-sputtered under continuously varying pressure with opposite deposition orders. For samples grown under increasing pressure, magnetization reversal is dominated by domain nucleation, propagation and annihilation; an anisotropy gradient is effectively established, along with a pronounced depth-dependent magnetization profile. However, in films grown under decreasing pressure, disorders propagate vertically from the bottom high-pressure region into the top low-pressure region, impeding domain wall motion and forcing magnetization reversal via rotation; depth-dependent magnetization varies in an inverted order, but the spread is much suppressed. 
Peter K. Greene, B. J. Kirby, J. W. Lau, J. A. Borchers, M. R.   Fitzsimmons, and Kai Liu
cond-mat.mtrl-sci