Undulatory Variation of Antiferromagnetic Strength with Magnetic Field   Based on Hubbard Model Hamiltonian
  Using the Hubbard model Hamiltonian in a mean field level, we examine the variation of antiferromagnetic strength with applied magnetic field. It is demonstrated that minima in the antiferromagnetic strength exist at the the even integer denominator values of rational number for magnetic flux per plaquette. The undulatory behavior of antiferromagnetic strength with the external magnetic field is found. It is seen to be related to the undulatory net statistical phase owing to the influence of the applied magnetic field. 
Hyeonjin Doh and Sung-Ho Suck Salk (Pohang University of Science and   Technology)