High field transport in strained Si/GeSi double heterostructure: a   Fokker-Planck approach
  We report calculations of high electric field transport for the case of a strained Si/GeSi double heterostructure (DHS) considering transport along the Si channel and by applying the analytical Fokker-Planck approach (FPA), where the process is modeled as drift-diffusion in energy space. We limit ourselves to electronic transport in the conduction band of the strained Si, where an energy shift between the otherwise degenerate six energy valleys characterizes the band alingment in the DHS. Intervalley phonon scatterings are considered while intravalley acoustic phonon scattering is ignored, leading to results valid for high enough temperatures. Our results are compared to previous theoretical works where Monte Carlo simulations were applied. A reasonable agreement between the two approaches is obtained in the high electric field regime. 
F. Comas and Nelson Studart