Quantum interferometric optical lithography:towards arbitrary   two-dimensional patterns
  As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology. 
Pieter Kok, Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, Samuel   L. Braunstein and Jonathan P. Dowling