Simulation of Arsenic Diffusion During Rapid Thermal Annealing of   Silicon Layers Doped with Low-Energy High-Dose Ion Implantation
  The model of transient enhanced diffusion of ion-implanted As is formulated and the finite-difference method for numerical solution of the system of equations obtained is developed. The nonuniform distribution of point defects near the interface and more accurate description of arsenic clustering are simultaneously taking into account. Simulation of As diffusion during rapid annealing gives a reasonable agreement with the experimental data.   Keywords: diffusion; clusters; ion implantation; arsenic; silicon   PACS: 66.30.Jt 
O.I. Velichko, A.M. Mironov, V.A. Tsurko, G.M. Zayats