Micro-Raman and field emission studies of silicon nanowires prepared by   metal assisted chemical etching
  Micro-Raman scattering and electron field emission characteristics of silicon nanowires (SiNWs) synthesized by metal assisted chemical etching (MACE) are investigated. Scanning electron microscopy images reveal the growth of well aligned vertical SiNWs. Raman shift and size relation from bond-polarizability model has been used to calculate exact confinement sizes in SiNWs. The Si optical phonon peak for SiNWs showed a downshift and an asymmetric broadening with decreasing diameter of the SiNWs due to quantum confinement of optical phonons. The field emission characteristics of these SiNWs are studied based by carrying out current-voltage measurements followed by a theoretical analysis using Fowler-Nordheim equation. The electron field emission increased with decreasing diameter of SiNWs. Field emission from these SiNWs exhibits significant enhancement in turn-on field and total emission current with decreasing nanowire size. The reported results in the current study indicate that MACE is a simple technique to prepare well-aligned SiNWs with potentials for applications in field emission devices. 
Vivek Kumar, Shailendra K. Saxena, Vishakha Kaushik, Kapil Saxena,   Rajesh Kumar, A.K. Shukla
cond-mat.mes-hall