Polar catastrophe in ultra-thin limit: A case of rare-earth perovskite   LaNiO3
  We address the fundamental issue of growth of perovskite ultra-thin films under the condition of a strong polar mismatch at the heterointerface exemplified by the growth of a correlated metal LaNiO$_3$ on the band insulator SrTiO$_3$ along the pseudo cubic [111] direction. While in general the metallic LaNiO$_3$ film can effectively screen this polarity mismatch, we establish that in the ultra-thin limit, films are insulating in nature and require additional chemical and structural reconstruction to compensate for such mismatch. A combination of in-situ reflection high-energy electron diffraction recorded during the growth, X-ray diffraction, and synchrotron based resonant X-ray spectroscopy reveal the formation of a chemical phase La$_2$Ni$_2$O$_5$ (Ni$^{2+}$) for a few unit-cell thick films. First-principles layer-resolved calculations of the potential energy across the nominal LaNiO$_3$/SrTiO$_3$ interface confirm that the oxygen vacancies can efficiently reduce the electric field at the interface. 
S. Middey, P. Rivero, D. Meyers, M. Kareev, X. Liu, Y. Cao, J. W.   Freeland, S. Barraza-Lopez, and J. Chakhalian
cond-mat.str-el cond-mat.mtrl-sci