Discharge-produced plasma extreme ultraviolet (EUV) source and ultra   high vacuum chamber for studying EUV-induced processes
  An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed. 
A Dolgov, O Yakushev, A Abrikosov, E Snegirev, V M Krivtsun, C J Lee   and F Bijkerk
physics.plasm-ph physics.ins-det