Electrically Reconfigurable Dual Metal-Gate Planar Field-Effect   Transistor for Dopant-free CMOS
  In this paper, we demonstrate by simulation the feasibility of electrostatically doped and therefore reconfigurable planar field-effect-transistor (FET) structure which is based on our already fabricated and published Si-nanowire (SiNW) devices. The technological cornerstones for this dual-gated general purpose FET contain Schottky S/D junctions on a silicon-on-insulator (SOI) substrate. The transistor type, i.e. n-type or p-type FET, is electrically selectable on the fly by applying an appropriate control-gate voltage which significantly increases the versatility and flexibility in the design of digital integrated circuits. 
Tillmann Krauss, Frank Wessely and Udo Schwalke
cond-mat.mes-hall cond-mat.mtrl-sci