Observation of field emission from GeSn nanoparticles epitaxially grown   on silicon nanopillar arrays
  We apply molecular beam epitaxy to grow GeSn-nanoparticles on top of Si-nanopillars patterned onto p-type Si wafers. We use X-ray photoelectron spectroscopy to confirm a metallic behavior of the nanoparticle surface due to partial Sn segregation as well as the presence of a superficial Ge oxide. We report the observation of stable field emission current from the GeSn-nanoparticles. We prove that field emission can be enhanced by preventing GeSn nanoparticles oxidation or by breaking the oxide layer through electrical stress. Finally, we show that GeSn/p-Si junctions have a rectifying behavior. 
Antonio Di Bartolomeo, Maurizio Passacantando, Gang Niu, Viktoria   Schlykow, Grzegorz Lupina, Filippo Giubileo and Thomas S...
cond-mat.mes-hall