Competitive and synergistic effects between excimer VUV radiation and O   radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces   treated by atmospheric He-O$_2$ post-discharge
  Among various surface modification techniques, plasma can be used as a source for tailoring the surface properties of diverse materials. HDPE and fluoropolymer surfaces have been treated by the post-discharge of an atmospheric RF-plasma torch supplied with helium and oxygen gases. The plasma-treated surfaces were characterized by measurements of mass losses, water contact angles, x-ray photoelectron spectroscopy and atomic force microscopy. This experimental approach correlated with an optical characterization of the plasma phase allowed us to propose etching mechanisms occurring at the post-discharge/polymer interface. We discuss how competitive and synergistic effects can result from the oxidation and/or the roughening of the surface but also from the excimer VUV radiation, the He metastable species and the O radicals reaching the plasma-polymer interface. 
Thierry Dufour, Julie Hubert, Nicolas Vandencasteele, Pascal Viville,   Roberto Lazzaroni and Fran\c{c}ois Reniers
physics.chem-ph