Influencia del potencial de polarizaci\'on en la deposici\'on de   pel\'iculas delgadas de NiO
  Nickel oxide (NiO) is a binary compound with a lot of applications in the present technology. NiO thin films were deposited by reactive sputtering magnetron under several voltage biases applied in the glass substrates (0, 50, 100, 200, 300, 400 and 500 V). Films were characterized by profilometry, X-ray diffraction, elemental composition and electrical resistivity at room temperature and at low temperatures. The present work showed that despite the insulating behavior of substrate the residual stress was reduced at high biases and the (111) texture was promoted. Electrical resistivity was reduced at high bias and at low temperatures thermal activation of p-type conduction was detected. 
Javier Garc\'ia Molleja, Bruna Regalado, Julien Keraudy, Graciela   Salum, Pierre-Yves Jouan
cond-mat.mtrl-sci