Observation of electron excitation into silicon conduction band by   slow-ion surface neutralization
  Bare reverse biased silicon photodiodes were exposed to 3eV He+, Ne+, Ar+, N2+, N+ and H2O+ ions. In all cases an increase of the reverse current through the diode was observed. This effect and its dependence on the ionization energy of the incident ions and on other factors are qualitatively explained in the framework of Auger-type surface neutralization theory. Amplification of the ion-induced charge was observed with an avalanche photodiode under high applied bias. The observed effect can be considered as ion-induced internal potential electron emission into the conduction band of silicon. To the best of our knowledge, no experimental evidence of such effect was previously reported. Possible applications are discussed. 
S. Shchemelinin and A. Breskin
cond-mat.mtrl-sci physics.ins-det