Eigenanalysis of morphological diversity in silicon random   nanostructures formed via resist collapse
  This paper demonstrates eigenanalysis to quantitatively reveal the diversity and capacity of identities offered by the morphological diversity in silicon nanostructures formed via random collapse of resist. The analysis suggests that approximately 10^115 possible identities are provided per 0.18-um^2 area of nanostructures, indicating that nanoscale morphological signatures will be extremely useful for future information security applications where securing identities is critical. The eigenanalysis provides an intuitive physical picture and quantitative characterization of the diversity of structural fluctuations while unifying measurement stability concerns, which will be widely applicable to other materials, devices, and system architectures. 
Makoto Naruse, Morihisa Hoga, Yasuyuki Ohyagi, Shumpei Nishio, Naoya   Tate, Naoki Yoshida, and Tsutomu Matsumoto
physics.data-an physics.optics