Synchrotron Radiation in X-Ray Lithography:  Exposure       Process Characterization and Development
{'Code': '07010000', 'Directorate': {'Abbreviation': 'ENG', 'LongName': 'Directorate For Engineering'}, 'Division': {'Abbreviation': 'ECCS', 'LongName': 'Div Of Electrical, Commun & Cyber Sys'}}
{'SignBlockName': 'Arthur R. Bergen', 'PO_EMAI': None, 'PO_PHON': None}
X-ray lithography will play a significant role in the production of the         next generation of high-density electronic devices, in particular, in           the production of computer memories.  Mask technology has progressed            considerably, but the problem of a source still remains.  A clear trend         has emerged worldwide in favor of the application of Electron Storage           Rings as dedicated XRL sources, because of the sheer X-ray power of             these machines.  Much work still needs to be done before a successful           Synchrotron XRL exposure process is developed.  These include:  the             behavior of masks in the high-power X-ray beam; detailed studies of the         local distortions; multi-level alignment with a successful test                 vehicle; the influences of external factors on the process; and a               complete model describing the exposure tool, from the Synchrotron               source to the development.  The proposed research addresses the points          where this work may make a unique contribution; this is in the area of          exposure process characterization, real-time mask distortion studies,           multi-level alignment techniques and process modelling.  All of this            will be applied to the unifying goal of demonstrating a multi-level             test vehicle at linewidths of 0.25 um.
{'FirstName': 'Franco', 'LastName': 'Cerrina', 'PI_MID_INIT': None, 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'Franco Cerrina', 'EmailAddress': 'fcerrina@wisc.edu', 'NSF_ID': '000411441', 'StartDate': '09/15/1986', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
{'Name': 'University of Wisconsin-Madison', 'CityName': 'MADISON', 'ZipCode': '537151218', 'PhoneNumber': '6082623822', 'StreetAddress': '21 North Park Street', 'StreetAddress2': 'Suite 6301', 'CountryName': 'United States', 'StateName': 'Wisconsin', 'StateCode': 'WI', 'CONGRESSDISTRICT': '02', 'CONGRESS_DISTRICT_ORG': 'WI02', 'ORG_DUNS_NUM': '161202122', 'ORG_LGL_BUS_NAME': 'UNIVERSITY OF WISCONSIN SYSTEM', 'ORG_PRNT_DUNS_NUM': '041188822'}
{'Name': None, 'CityName': None, 'StateCode': None, 'ZipCode': None, 'StreetAddress': None, 'CountryCode': None, 'CountryName': None, 'StateName': None, 'CountryFlag': None, 'CONGRESSDISTRICT': None, 'CONGRESS_DISTRICT_PERF': '""'}
{'Code': '1456', 'Text': 'SOLID-STATE&MICROSTRUCTURE RES'}
{'url': 'https://www.nsf.gov/awardsearch/download?DownloadFileName=1986&All=true', 'xml': '8610788.xml'}