In Situ Direct Patterning of MBE Films Using Ion Assisted   Etching
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Considerable effort is being made to grow controlled thin layers of a           variety of semiconductors and other type of materials.  These have              been of increasing importance in the fabrication of both electronic             devices and optoelectronic devices and will see increasing importance           in the future.                                                                                                                                                  Along with the ability to fabricate the layers it would be                      advantageous to be able to write patterns in situ, that is while the            layers are being grown.  This proposal addresses problems associated            with such patterning.
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