Artificially Structured Multilayers Produced by Atomic      Layer Epitaxy
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{'SignBlockName': 'Darryl G. Gorman', 'PO_EMAI': None, 'PO_PHON': None}
Multilayer coatings vastly improve the performance of most x-ray                optical elements and allow operation at angles and wavelengths                  otherwise inaccessible.  They have been used successfully in                    analytical instruments, astronomical telescopes on satellites,                  and in plasma diagnostic instruments, and will likely be an                     important component of x-ray microlithography exposure systems in               the semiconductor industry.  Multilayers made by conventional                   techniques are not as reflective as theory predicts.  They do not               reflect the short wavelength x-rays of interest in medicine and                 nondestructive testing.  To solve these problems, we propose the                fabrication of multilayers by using atomic layer epitaxy to                     produce thinner layers with smoother, more abrupt interfaces than               can be made by traditional methods.
{'FirstName': 'Raymond', 'LastName': 'Perkins', 'PI_MID_INIT': 'T', 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'Raymond T Perkins', 'EmailAddress': None, 'PI_PHON': None, 'NSF_ID': '000444679', 'StartDate': '01/01/1989', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
{'Name': 'Multilayer Optics and X-ray Technology Inc', 'CityName': 'Provo', 'ZipCode': '84602', 'PhoneNumber': '8013783972', 'StreetAddress': '7070 University Station', 'StreetAddress2': None, 'CountryName': 'United States', 'StateName': 'Utah', 'StateCode': 'UT', 'CONGRESSDISTRICT': '03', 'CONGRESS_DISTRICT_ORG': 'UT03', 'ORG_UEI_NUM': None, 'ORG_LGL_BUS_NAME': None, 'ORG_PRNT_UEI_NUM': None}
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{'Code': '5371', 'Text': 'SBIR Phase I'}
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