Improved Surfaces for Electron Devices (Materials Research)
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{'SignBlockName': 'Ritchie B. Coryell', 'PO_EMAI': None, 'PO_PHON': None}
This proposal employs ion implantation and ion beam mixing as a                 means of alloying low work function elements into surface regions               of substrates.  Such surfaces should exhibit high secondary                     electron yields.  Proposed research will explore the introduction               of selected elements (e.g., barium and cesium) into the emitting                surfaces.  Potential applications include photomultipliers,                     electron multipliers, and channeltron-type devices.
{'FirstName': 'James', 'LastName': 'Hirvonen', 'PI_MID_INIT': 'K', 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'James K Hirvonen', 'EmailAddress': None, 'PI_PHON': None, 'NSF_ID': '000155482', 'StartDate': '02/01/1988', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
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{'Code': '5371', 'Text': 'SBIR Phase I'}
{'url': 'https://www.nsf.gov/awardsearch/download?DownloadFileName=1987&All=true', 'xml': '8760769.xml'}