Metalorganic Chemical Vapor Deposition of High Temperature  Superconducting Films
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Metalorganic chemical vapor deposition of metallic oxides is an                 established technology in the electronics industry for production               of thin film insulators and transparent conductors with tailored                properties.  Applied to the new superconducting ceramic materials               this process could produce films in oxygen which do not require                 sintering, films which may grow epitaxially on single crystal                   substrates and films of exceptionally high purity with uniform                  composition and crystal phases.  The objective of Phase I is to                 demonstrate that metalorganic chemical vapor deposition of                      yttrium-barium-copper-oxide on zirconia, alumina, coated alumina                or strontium titanate yields a uniform superconducting film with                a smooth surface.
{'FirstName': 'Anton', 'LastName': 'Greenwald', 'PI_MID_INIT': 'C', 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'Anton C Greenwald', 'EmailAddress': 'agreenwald@agiltron.com', 'PI_PHON': '7819351200', 'NSF_ID': '000165506', 'StartDate': '01/01/1989', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
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{'Code': '5371', 'Text': 'SBIR Phase I'}
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