Scanning Tunneling Lithography-A New Approach to High-Speed,Submicron Pattern Generation
{'Code': '07010000', 'Directorate': {'Abbreviation': 'ENG', 'LongName': 'Directorate For Engineering'}, 'Division': {'Abbreviation': 'ECCS', 'LongName': 'Div Of Electrical, Commun & Cyber Sys'}}
{'SignBlockName': 'Arthur R. Bergen', 'PO_EMAI': None, 'PO_PHON': None}
The possibility of using a scanning tunneling microscope configuration          as a high-speed, ultra-microscopic, pattern generator exists because of         (i) the unusual physics involved in forming the beam, (ii) recent               advances in novel resist materials and processes, and (iii) the                 possibility of engineering an array of beams.  The advantages of such a         system are that the normal limits imposed by space-charge and lens              aberrations are absent and that proximity effects are eliminated. Some          very preliminary experiments have already resulted in some primitive            patterns with sub-0.1 um lines. The proposed research is to                     investigate:
{'FirstName': 'R. Fabian', 'LastName': 'Pease', 'PI_MID_INIT': 'W', 'PI_SUFX_NAME': 'Dr.', 'PI_FULL_NAME': 'R. Fabian W Pease', 'EmailAddress': 'Pease@cis.stanford.edu', 'NSF_ID': '000446644', 'StartDate': '09/15/1986', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
{'Name': 'Stanford University', 'CityName': 'STANFORD', 'ZipCode': '943052004', 'PhoneNumber': '6507232300', 'StreetAddress': '450 JANE STANFORD WAY', 'StreetAddress2': None, 'CountryName': 'United States', 'StateName': 'California', 'StateCode': 'CA', 'CONGRESSDISTRICT': '16', 'CONGRESS_DISTRICT_ORG': 'CA16', 'ORG_UEI_NUM': 'HJD6G4D6TJY5', 'ORG_LGL_BUS_NAME': 'THE LELAND STANFORD JUNIOR UNIVERSITY', 'ORG_PRNT_UEI_NUM': None}
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