Studies of Optical Microlithographic Processes
{'Code': '07010000', 'Directorate': {'Abbreviation': 'ENG', 'LongName': 'Directorate For Engineering'}, 'Division': {'Abbreviation': 'ECCS', 'LongName': 'Div Of Electrical, Commun & Cyber Sys'}}
{'SignBlockName': 'Kristen M. Biggar, N-BioS', 'PO_EMAI': None, 'PO_PHON': None}
This proposal seeks support for the PIs studies on microlithographic            processes.  A new set of exposure bleaching model equations, applicable         when standing wave effects are present and non-negligible are being             developed.  The ray-tracing model for resist dissolution will be                formulated in terms of path integrals and exact differentials to yield          the developed line contours in closed forms.  Analytical solutions              derived earlier for the image reversal and CEL processes will be                convoluted with the exact formulation of the dissolution process.               Multi-level resist processes will be explored by explicitly considering         thickness non-uniformities and various interface reflectivities.  Deep          UV induced image stabilization and hardening in positive resists will           be studied by relating measured optical density changes and cross link          gradients in the resist film.  Finally, the extended exposure-bleaching         models of Ag-doped Ge Se resists will be studied and the resolution             capability of these inorganic resists investigated.
[{'FirstName': 'Eytan', 'LastName': 'Barouch', 'PI_MID_INIT': None, 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'Eytan Barouch', 'EmailAddress': 'eytan@omega.bu.edu', 'NSF_ID': '000176134', 'StartDate': '11/15/1986', 'EndDate': None, 'RoleCode': 'Co-Principal Investigator'}, {'FirstName': 'S.', 'LastName': 'Babu', 'PI_MID_INIT': 'V', 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'S. V Babu', 'EmailAddress': 'babu@clarkson.edu', 'NSF_ID': '000233391', 'StartDate': '11/15/1986', 'EndDate': None, 'RoleCode': 'Principal Investigator'}]
{'Name': 'Clarkson University', 'CityName': 'POTSDAM', 'ZipCode': '136761401', 'PhoneNumber': '3152686475', 'StreetAddress': '8 CLARKSON AVE', 'StreetAddress2': None, 'CountryName': 'United States', 'StateName': 'New York', 'StateCode': 'NY', 'CONGRESSDISTRICT': '21', 'CONGRESS_DISTRICT_ORG': 'NY21', 'ORG_UEI_NUM': 'SL2PF6R7MRN1', 'ORG_LGL_BUS_NAME': 'CLARKSON UNIVERSITY', 'ORG_PRNT_UEI_NUM': 'SL2PF6R7MRN1'}
{'Name': None, 'CityName': None, 'StateCode': None, 'ZipCode': None, 'StreetAddress': None, 'CountryCode': None, 'CountryName': None, 'StateName': None, 'CountryFlag': None, 'CONGRESSDISTRICT': None, 'CONGRESS_DISTRICT_PERF': '""'}
[{'Code': '1456', 'Text': 'SOLID-STATE&MICROSTRUCTURE RES'}, {'Code': '6004', 'Text': None}]
{'url': 'https://www.nsf.gov/awardsearch/download?DownloadFileName=1986&All=true', 'xml': '8611298.xml'}