Research Initiation:  Mapping Process Chemistry for Silicon PECVD
{'Code': '07020000', 'Directorate': {'Abbreviation': 'ENG', 'LongName': 'Directorate For Engineering'}, 'Division': {'Abbreviation': 'CBET', 'LongName': 'Div Of Chem, Bioeng, Env, & Transp Sys'}}
{'SignBlockName': 'MILTON J LINEVSKY', 'PO_EMAI': None, 'PO_PHON': None}
Species concentrations are mapped within a parallel-plate,                      plasma-enhanced chemical vapor deposition (PECVD) reactor during                the deposition of silicon from a helium/silicon hydride plasma.                 Film properties will also be measured.  The purposes are to                     examine the relationship among process variables, gas                           concentrations, and the amorphous/crystalline transition, and                   also to determine kinetics that could permit reactor modeling.                                                                                                  PECVD is an important emerging technology for creating thin films               for microelectronics manufacturing, but is limited to empirical                 settings for product quality, reproducibility, and new-film                     development.  Gas-phase (plasma-phase) chemistry dominates, and                 if the kinetics were quantitatively predictable for PECVD                       processes, then existing and new PECVD processes could be                       improved.  Spatially resolved data such as described above are                  critical prerequisites for achieving such a goal.
{'FirstName': 'Phillip', 'LastName': 'Westmoreland', 'PI_MID_INIT': 'R', 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'Phillip R Westmoreland', 'EmailAddress': 'phil.westmoreland@ncsu.edu', 'NSF_ID': '000252030', 'StartDate': '07/01/1988', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
{'Name': 'University of Massachusetts Amherst', 'CityName': 'AMHERST', 'ZipCode': '010039252', 'PhoneNumber': '4135450698', 'StreetAddress': '101 COMMONWEALTH AVE', 'StreetAddress2': None, 'CountryName': 'United States', 'StateName': 'Massachusetts', 'StateCode': 'MA', 'CONGRESSDISTRICT': '02', 'CONGRESS_DISTRICT_ORG': 'MA02', 'ORG_UEI_NUM': 'VGJHK59NMPK9', 'ORG_LGL_BUS_NAME': 'UNIVERSITY OF MASSACHUSETTS', 'ORG_PRNT_UEI_NUM': 'VGJHK59NMPK9'}
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{'Code': '1407', 'Text': 'CFS-Combustion & Fire Systems'}
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