Radio Frequency Ion Source for Reactive Ion Beam Etching
{'Code': '15030000', 'Directorate': {'Abbreviation': 'TIP', 'LongName': 'Dir for Tech, Innovation, & Partnerships'}, 'Division': {'Abbreviation': 'TI', 'LongName': 'Translational Impacts'}}
{'SignBlockName': 'Ritchie B. Coryell', 'PO_EMAI': None, 'PO_PHON': None}
A variety of dry etching processes have been developed for use in the           manufacture of high speed, high density, integrated semiconductor               circuits.  The recent requirements for submicron feature dimensions             have placed stressing demands on existing technologies such as reactive         ion etching and inert ion beam etching.  Reactive ion beam etching              (RIBE) has recently been demonstrated to offer advantages relative to           these technologies by facilitating rapid etching with highly precise,           submicron pattern definition.  However, available ion beam source               designs incorporate thermionic electron emitters which are easily               damaged by the gases used in RIBE processing.  This results in short            ion source lifetime, thereby greatly limiting the practical application         RIBE.  This proposal will attempt to overcome this problem by                   developing an inexpensive radio frequency ion source which is expected          to be insensitive to reactive gases and their products.  An                     experimental, 20-30 cm, magnetic-field-free, RF ion source system will          be constructed which incorporates a cold cathode discharge igniter.             Plasma generation experiments will be performed with oxygen and carbon          tetrachloride gases at RF frequencies up to 14 MHz.  Ion emission               uniformity will be measured and optimized at current density of                 approximtely 1 mA/cm .
{'FirstName': 'John', 'LastName': 'Bayless', 'PI_MID_INIT': 'R', 'PI_SUFX_NAME': None, 'PI_FULL_NAME': 'John R Bayless', 'EmailAddress': 'jb@firstpsi.com', 'PI_PHON': '8187071131', 'NSF_ID': '000444111', 'StartDate': '03/01/1987', 'EndDate': None, 'RoleCode': 'Principal Investigator'}
{'Name': 'Pulse Sciences Inc', 'CityName': 'Agoura', 'ZipCode': '913014500', 'PhoneNumber': '8187070095', 'StreetAddress': '5330 Derry Avenue, Suite J', 'StreetAddress2': None, 'CountryName': 'United States', 'StateName': 'California', 'StateCode': 'CA', 'CONGRESSDISTRICT': '33', 'CONGRESS_DISTRICT_ORG': 'CA33', 'ORG_UEI_NUM': None, 'ORG_LGL_BUS_NAME': None, 'ORG_PRNT_UEI_NUM': None}
{'Name': None, 'CityName': None, 'StateCode': None, 'ZipCode': None, 'StreetAddress': None, 'CountryCode': None, 'CountryName': None, 'StateName': None, 'CountryFlag': None, 'CONGRESSDISTRICT': None, 'CONGRESS_DISTRICT_PERF': '""'}
{'Code': '5371', 'Text': 'SBIR Phase I'}
{'url': 'https://www.nsf.gov/awardsearch/download?DownloadFileName=1986&All=true', 'xml': '8661129.xml'}