Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer.
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering. Sputtering is ejecting material from a "target," that is source such as a silicon wafer. Source then deposits onto a "substrate,".