This process is called ashing, and resembles dry etching. Plasma ashing is a process that uses plasma cleaning solely to remove carbon. Two forms of plasma ashing are typically performed on wafers. Plasma ashing is always done with O gas. The term plasma ashing can be used instead. Dry ashing tends to break up phytoliths better than wet ashing. The bodies burned for five hours, without the ashing of bones. Ashing is also performed prior to chemical analysis by inductively coupled plasma emission spectrometry.