Datasets:

Taylor658
/

SiN-photonic-waveguide-loss-efficiency

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train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
1.819	564.130005	Polymer	1.88	LPCVD	Wet Etch	2.59	900C_3hr	1,584.130005	TE	-0.3	58.549999	129.949997	15.06	6.36	3.149	84.639999	52.599998	0.279	1.829	0.805	BATCH_30	Synthetic	OTDR	0.056
0.892	571.820007	SiO2	4.13	Sputtering	Wet Etch	2.25	1000C_1hr	1,580.280029	TM	-8.09	31.040001	99.879997	36.700001	17.523001	4.238	77.849998	73.209999	0.165	1.674	0.863	BATCH_44	Synthetic	microring_Q	0.192
1.349	375.609985	Polymer	2.02	PECVD	RIE	2.02	900C_1hr	1,532.76001	TM	-2.08	79.889999	129.470001	35.23	7.361	1.625	45.040001	44.389999	0.256	1.726	0.833	BATCH_19	Synthetic	OTDR	0.035
0.589	444.420013	SiO2	2.44	PECVD	RIE	4.27	1000C_1hr	1,560.079956	TE	-6.09	40.029999	41.950001	14.26	8.195	4.999	68.260002	64.800003	0.351	1.732	0.832	BATCH_19	Measurement	microring_Q	0.087
0.978	366.23999	SiO2	4.2	Sputtering	ICP	3.58	900C_1hr	1,589.849976	TM	-7.04	21.73	48.529999	23.299999	3.08	0.514	49.169998	72.25	0.092	1.694	0.75	BATCH_3	Synthetic	microring_Q	0.198
1.168	579.030029	SiO2	1.15	Sputtering	RIE	3.17	900C_3hr	1,577.630005	TM	4.61	72.129997	145.440002	46.509998	18.562	3.665	71.779999	55.68	0.234	1.838	0.949	BATCH_44	Measurement	ring_resonance	0.116
0.811	573.190002	Polymer	2.11	PECVD	ICP	3.08	900C_3hr	1,553.449951	TE	-7.77	66.550003	91.529999	27.940001	6.077	1.742	67.010002	47.860001	0.057	1.503	0.869	BATCH_7	Synthetic	cut-back	0.099
1.461	340.709991	Air	3.07	Sputtering	RIE	4.36	1000C_1hr	1,512.920044	TM	2	33.939999	42.209999	26.91	7.206	2.489	59.380001	45.849998	0.069	1.744	0.837	BATCH_48	Synthetic	OTDR	0.039
1.567	239.389999	Polymer	4	Sputtering	RIE	0.94	No_Anneal	1,533.52002	TE	9.29	41.68	135.919998	6.88	4.65	4.778	71.379997	87.690002	0.117	1.721	0.938	BATCH_30	Measurement	ring_resonance	0.09
1.118	476.769989	Air	2.59	PECVD	Wet Etch	2.07	900C_1hr	1,523.02002	TM	5.06	22.01	96.660004	37.09	12.533	3.146	82.519997	66.309998	0.225	1.837	0.824	BATCH_10	Measurement	OTDR	0.068
1.566	570.890015	Polymer	3.72	PECVD	Wet Etch	0.85	900C_1hr	1,508.920044	TE	2.56	25.98	79.230003	20.35	11.716	4.848	77.019997	44.91	0.257	1.623	0.938	BATCH_50	Measurement	cut-back	0.075
0.979	423.720001	Polymer	3.05	Sputtering	Wet Etch	0.74	1000C_1hr	1,534.219971	TM	9.25	57.41	181.449997	9.62	2.333	0.653	69.959999	89.470001	0.451	1.522	0.908	BATCH_30	Measurement	OTDR	0.025
1.939	265.350006	Polymer	2.55	Sputtering	RIE	2.96	900C_1hr	1,555.400024	TE	6.98	22.709999	42.619999	13.39	6.585	4.536	41.52	75.889999	0.193	1.513	0.864	BATCH_14	Synthetic	cut-back	0.186
0.576	237.649994	SiO2	4.64	Sputtering	Wet Etch	2.89	No_Anneal	1,589.109985	TE	1.15	66.839996	161.970001	28.66	5.72	1.37	73.260002	83.879997	0.213	1.659	0.728	BATCH_7	Measurement	microring_Q	0.024
1.969	548.809998	SiO2	1.8	Sputtering	RIE	3.4	900C_1hr	1,526.22998	TE	2.84	43.369999	85.790001	32.630001	4.529	0.981	73.989998	86.620003	0.178	1.881	0.804	BATCH_17	Synthetic	microring_Q	0.104
0.848	400.390015	Air	1.39	LPCVD	RIE	4.41	1000C_1hr	1,518.579956	TE	9.51	32.990002	146.970001	23.35	13.056	4.753	71.900002	40.299999	0.256	1.936	0.76	BATCH_5	Measurement	ring_resonance	0.162
0.809	555.630005	SiO2	2.18	Sputtering	ICP	1.8	No_Anneal	1,578.300049	TE	-0.83	78.489998	194.690002	13.1	5.237	3.142	43.099998	43.810001	0.032	1.731	0.844	BATCH_28	Synthetic	microring_Q	0.087
1.596	389.279999	SiO2	1.21	LPCVD	Wet Etch	1.64	No_Anneal	1,563.670044	TE	2.11	71.389999	48.830002	15.92	2.698	0.69	47.830002	44.450001	0.43	1.885	0.869	BATCH_18	Synthetic	ring_resonance	0.05
1.09	507.920013	SiO2	2.12	LPCVD	ICP	1.29	No_Anneal	1,555.02002	TM	7.41	55.490002	197.470001	6.35	2.422	2.171	77.720001	82.449997	0.186	1.631	0.932	BATCH_20	Measurement	OTDR	0.016
1.102	458.420013	SiO2	1.7	LPCVD	ICP	4.69	900C_1hr	1,526.530029	TE	8.46	58.369999	131.610001	3.12	0.985	0.272	86.540001	48.709999	0.387	1.633	0.765	BATCH_38	Measurement	microring_Q	0.1
1.195	358.959991	SiO2	1.78	Sputtering	Wet Etch	3.11	1000C_1hr	1,525.51001	TE	-9.18	51.849998	120.010002	48.689999	5.861	1.053	66.199997	86.389999	0.079	1.807	0.75	BATCH_35	Measurement	OTDR	0.032
1.202	261.910004	Air	4.24	PECVD	Wet Etch	1.6	900C_1hr	1,575.51001	TM	5.3	71.510002	155.809998	5.32	4.041	4.01	47.639999	71.709999	0.169	1.68	0.881	BATCH_40	Measurement	cut-back	0.131
1.376	543.76001	Air	2.58	LPCVD	Wet Etch	1.14	1000C_1hr	1,561.5	TE	-3.23	79.669998	159.949997	2.11	2.007	4.927	41.060001	70.75	0.35	1.593	0.783	BATCH_6	Synthetic	cut-back	0.04
0.96	480.160004	SiO2	3.74	Sputtering	Wet Etch	2.59	1000C_1hr	1,534.459961	TE	2.37	29.870001	85.470001	31.700001	13.266	3.893	88.059998	54.880001	0.128	1.734	0.753	BATCH_47	Synthetic	cut-back	0.179
1.095	383.929993	SiO2	1.99	Sputtering	RIE	2.79	900C_3hr	1,537.23999	TM	8.34	55	44.080002	39.779999	18.972	4.63	47.720001	65.559998	0.128	1.693	0.947	BATCH_1	Measurement	ring_resonance	0.056
1.908	331	Polymer	3.2	Sputtering	Wet Etch	2.8	No_Anneal	1,598	TE	0.23	31.09	93.949997	22.219999	4.276	1.393	50.049999	61.459999	0.144	1.681	0.78	BATCH_24	Measurement	OTDR	0.114
1.806	486.670013	Polymer	3.82	PECVD	RIE	3.73	1000C_1hr	1,554.109985	TM	8.62	21.299999	151.139999	32.490002	15.683	4.35	71.580002	68.669998	0.097	1.765	0.853	BATCH_48	Measurement	microring_Q	0.083
0.717	302.850006	SiO2	2.16	LPCVD	ICP	4.66	900C_1hr	1,574.699951	TM	6.14	54.529999	191.899994	32.07	13.954	4.012	45.299999	63.759998	0.028	1.927	0.873	BATCH_22	Measurement	OTDR	0.095
0.614	206.949997	SiO2	2.9	LPCVD	Wet Etch	2.56	1000C_1hr	1,503.670044	TE	0.56	46.700001	42.720001	5.38	3.362	3.885	47.869999	49.549999	0.436	1.637	0.802	BATCH_30	Measurement	OTDR	0.145
0.997	367.25	Air	1.66	Sputtering	RIE	2.54	No_Anneal	1,513.130005	TM	8.54	62.349998	196.009995	40.02	3.884	0.72	47.009998	68.949997	0.488	1.959	0.844	BATCH_23	Synthetic	OTDR	0.131
1.803	595.460022	Air	1.32	PECVD	RIE	4.17	900C_1hr	1,554.949951	TE	-8.65	77.57	199.960007	13.09	4.727	2.792	73.510002	49.779999	0.245	1.548	0.861	BATCH_16	Measurement	ring_resonance	0.168
1.808	365.920013	Polymer	4.24	PECVD	RIE	2.56	900C_1hr	1,559.400024	TM	7.72	69.330002	168.149994	32.439999	13.834	3.799	64.769997	67.5	0.481	1.867	0.765	BATCH_39	Measurement	microring_Q	0.184
0.666	478.079987	Air	2.45	Sputtering	ICP	2.69	No_Anneal	1,522.219971	TM	-2.28	24.379999	195.539993	48.919998	7.392	1.207	79.730003	60.389999	0.135	1.935	0.867	BATCH_3	Synthetic	microring_Q	0.179
1.825	290.420013	SiO2	2.71	Sputtering	ICP	3.27	900C_3hr	1,556.790039	TE	-1.16	70.980003	114.260002	8.77	2.397	1.499	67.290001	60.73	0.142	1.523	0.733	BATCH_36	Synthetic	ring_resonance	0.012
0.807	448.029999	Air	4.53	PECVD	Wet Etch	2.9	900C_1hr	1,579.150024	TE	5.42	50.34	111.300003	19.299999	5.114	1.684	72.610001	43.040001	0.025	1.51	0.821	BATCH_18	Measurement	ring_resonance	0.076
0.818	371.690002	Air	3.89	PECVD	RIE	0.8	900C_3hr	1,544.48999	TE	-2.21	75.620003	162.160004	44.32	13.285	2.786	79.309998	48.869999	0.364	1.548	0.808	BATCH_30	Measurement	OTDR	0.086
0.545	543.73999	Polymer	2.71	LPCVD	RIE	1.53	1000C_1hr	1,512.349976	TM	1.53	27.200001	78.5	15.45	8.207	4.476	43.299999	62.490002	0.438	1.616	0.917	BATCH_39	Measurement	OTDR	0.055
1.99	217.020004	Air	1.2	PECVD	Wet Etch	4.84	No_Anneal	1,556.430054	TM	7.17	29.76	23.139999	6.74	2.044	1.528	78.349998	52.389999	0.463	1.951	0.833	BATCH_9	Synthetic	OTDR	0.099
1.407	260.01001	Polymer	4.28	PECVD	RIE	0.61	No_Anneal	1,559.069946	TM	-2.17	76.610001	136.429993	21.879999	6.656	2.439	57.59	42.59	0.311	1.64	0.947	BATCH_23	Measurement	microring_Q	0.052
1.066	488.519989	Air	3.06	PECVD	ICP	2.66	No_Anneal	1,579.579956	TE	1.05	70.419998	125	42.18	22.24	4.834	79.089996	43.529999	0.085	1.854	0.717	BATCH_22	Synthetic	cut-back	0.15
0.584	522.289978	Polymer	1.46	PECVD	ICP	1.25	No_Anneal	1,518.189941	TE	-9.6	40.25	130.279999	22.139999	7.662	2.882	49.470001	45.529999	0.047	1.534	0.898	BATCH_35	Synthetic	microring_Q	0.127
0.587	436.130005	Air	1.08	LPCVD	ICP	4.57	900C_1hr	1,554.01001	TM	6.65	21.549999	101.510002	27.940001	6.975	2.047	69.580002	43.529999	0.016	1.814	0.76	BATCH_19	Synthetic	OTDR	0.062
1.732	304.980011	Air	2.13	Sputtering	Wet Etch	0.83	No_Anneal	1,535.319946	TM	-2.05	39.389999	59.34	3.23	2.229	2.505	52.880001	85.029999	0.032	1.711	0.899	BATCH_48	Synthetic	OTDR	0.1
0.727	411.23999	SiO2	3.74	LPCVD	RIE	3.38	No_Anneal	1,551.349976	TM	5.06	26.83	155.330002	29.610001	7.379	1.874	74.120003	64.629997	0.059	1.988	0.823	BATCH_44	Synthetic	OTDR	0.029
1.689	368.630005	SiO2	4.33	PECVD	Wet Etch	0.8	No_Anneal	1,571.930054	TE	-3.31	42.200001	182.440002	32.650002	9.04	2.564	72.669998	67.32	0.153	1.67	0.898	BATCH_37	Measurement	cut-back	0.027
0.529	419.929993	Air	2.99	Sputtering	Wet Etch	1.12	1000C_1hr	1,587.969971	TE	-3.56	56.93	52.970001	34.799999	7.853	1.884	63.779999	70.489998	0.456	1.53	0.825	BATCH_6	Synthetic	ring_resonance	0.103
0.502	565.469971	Air	4.79	LPCVD	Wet Etch	3.57	1000C_1hr	1,521.300049	TM	-6.83	23.120001	189.429993	38.82	16.825001	4.199	42.689999	87.510002	0.456	1.814	0.722	BATCH_31	Measurement	ring_resonance	0.068
0.806	553.419983	Air	1.17	PECVD	RIE	0.57	No_Anneal	1,574.060059	TE	0.08	55.73	114.970001	14.54	4.192	1.508	79.019997	70.870003	0.169	1.75	0.911	BATCH_46	Measurement	ring_resonance	0.066
1.859	474.140015	Air	4	Sputtering	ICP	4.18	900C_1hr	1,592.339966	TM	8.92	62.860001	151.630005	5.59	2.681	1.966	61.18	89.300003	0.237	1.728	0.727	BATCH_34	Synthetic	microring_Q	0.014
1.745	270.940002	Air	4.88	Sputtering	Wet Etch	1.16	900C_3hr	1,502.819946	TM	8.27	78.830002	139.360001	22.08	6.249	2.453	59.880001	89.660004	0.346	1.767	0.944	BATCH_3	Measurement	microring_Q	0.081
0.848	519.580017	Polymer	2.09	Sputtering	RIE	4.85	No_Anneal	1,503.380005	TE	0.86	50.400002	134.979996	28.700001	13.204	4.225	57.91	55.830002	0.442	1.808	0.785	BATCH_43	Measurement	microring_Q	0.165
0.755	426.320007	Polymer	1.12	Sputtering	ICP	1.66	1000C_1hr	1,564.689941	TM	-1.93	34.529999	107.459999	10.62	4.198	2.184	40.240002	62.439999	0.424	1.954	0.768	BATCH_29	Synthetic	cut-back	0.071
0.578	294.149994	Polymer	1.16	LPCVD	Wet Etch	3.53	900C_3hr	1,512.98999	TE	-5.79	79.599998	37.619999	24.040001	5.075	1.407	65.209999	86.989998	0.125	1.944	0.835	BATCH_10	Measurement	microring_Q	0.077
0.537	397.309998	SiO2	1.52	PECVD	Wet Etch	4.46	900C_3hr	1,582.180054	TE	-2.46	71.110001	130.809998	33.080002	5.66	1.174	81.800003	85.300003	0.422	1.701	0.873	BATCH_7	Synthetic	cut-back	0.062
1.656	349.390015	Polymer	3.54	PECVD	ICP	3.88	900C_1hr	1,552.890015	TE	5.67	31.219999	113.169998	37.43	6.651	1.463	60.23	85	0.272	1.705	0.929	BATCH_11	Measurement	cut-back	0.137
0.971	251	SiO2	2.39	PECVD	RIE	2.76	No_Anneal	1,543.310059	TM	-2.46	64.410004	64.269997	27.440001	12.256	3.904	59.470001	54.619999	0.243	1.822	0.855	BATCH_15	Synthetic	cut-back	0.126
1.252	269.5	Polymer	4.4	LPCVD	Wet Etch	0.96	No_Anneal	1,594.089966	TM	-5.98	56.439999	64.160004	26.780001	13.884	4.503	51.32	80.379997	0.176	1.514	0.931	BATCH_22	Measurement	microring_Q	0.068
1.292	217.089996	SiO2	1.76	PECVD	RIE	4.58	1000C_1hr	1,509.329956	TM	4.66	70.099998	117.260002	35.669998	10.972	2.816	58.720001	64.860001	0.227	1.896	0.912	BATCH_6	Measurement	microring_Q	0.035
0.811	356	Air	3.03	LPCVD	ICP	3.44	1000C_1hr	1,585.349976	TM	-7.96	70.730003	62.549999	9.79	2.129	1.296	77.690002	40.790001	0.321	1.8	0.704	BATCH_24	Measurement	microring_Q	0.107
1.467	554.200012	Polymer	2.36	PECVD	ICP	3.8	900C_3hr	1,520.670044	TM	-1.15	78.239998	89.639999	1.81	1.244	2.255	40.060001	49.419998	0.03	1.914	0.92	BATCH_19	Synthetic	ring_resonance	0.082
1.576	569.23999	Polymer	2.05	LPCVD	RIE	4.88	900C_1hr	1,508.609985	TE	7.15	25.1	142.589996	25.24	7.852	2.551	84.709999	40.919998	0.485	1.601	0.705	BATCH_48	Measurement	microring_Q	0.136
0.663	373.679993	Polymer	3.02	PECVD	RIE	4.34	1000C_1hr	1,504.02002	TM	9.13	38.869999	103.639999	30.51	10.124	2.942	69.459999	56.240002	0.344	1.744	0.823	BATCH_34	Measurement	OTDR	0.076
1.277	456.070007	Air	1.42	Sputtering	ICP	3.01	No_Anneal	1,569.969971	TM	7.08	22.48	72.43	22.68	3.68	1.119	63.419998	41.169998	0.238	1.845	0.818	BATCH_10	Synthetic	ring_resonance	0.15
1.747	382.399994	SiO2	2.38	LPCVD	RIE	2.52	No_Anneal	1,500.689941	TM	-9.41	35.27	154.179993	43.540001	22.535999	4.824	44.91	56.599998	0.489	1.997	0.815	BATCH_17	Synthetic	cut-back	0.051
1.215	593.659973	Air	1.17	Sputtering	Wet Etch	1.67	900C_1hr	1,565.170044	TE	-1.34	20.27	35.93	2.81	0.811	0.3	71.349998	73.139999	0.406	1.601	0.912	BATCH_8	Measurement	microring_Q	0.122
0.622	501.910004	SiO2	2.69	Sputtering	ICP	1.63	900C_1hr	1,530.849976	TE	-6.06	76.400002	73.889999	6.5	3.537	4.157	71.110001	83.790001	0.186	1.966	0.878	BATCH_6	Measurement	ring_resonance	0.175
0.633	397.209991	Air	4.11	LPCVD	RIE	0.74	No_Anneal	1,599.47998	TM	-5.68	29.84	74.709999	26.969999	8.96	2.734	80.610001	49.970001	0.042	1.568	0.754	BATCH_27	Measurement	microring_Q	0.04
0.584	540.429993	Air	3.41	PECVD	ICP	0.57	No_Anneal	1,529.449951	TE	-4.26	58.580002	33.84	29.969999	12.995	3.693	54.049999	51.220001	0.319	1.948	0.814	BATCH_31	Measurement	microring_Q	0.195
0.959	442.149994	Air	1.54	PECVD	Wet Etch	3.46	1000C_1hr	1,583.569946	TM	-5.03	24.73	90.150002	35.599998	7.203	1.773	82.209999	45.639999	0.302	1.812	0.782	BATCH_30	Measurement	OTDR	0.065
1.649	304.670013	SiO2	1.41	Sputtering	ICP	0.64	1000C_1hr	1,540.969971	TE	-5.03	60.669998	177.089996	26.559999	13.423	4.814	78.019997	68.860001	0.474	1.565	0.733	BATCH_37	Synthetic	OTDR	0.188
0.836	257.470001	SiO2	1.75	LPCVD	Wet Etch	1.4	1000C_1hr	1,514.969971	TM	-3.63	60.91	180.639999	21.110001	8.901	3.447	61.169998	74.639999	0.493	1.616	0.742	BATCH_38	Synthetic	cut-back	0.155
1.564	540.280029	SiO2	3.73	Sputtering	RIE	2.5	No_Anneal	1,582.869995	TE	-3.8	78.110001	178.589996	28.73	11.558	3.589	80.470001	47.810001	0.316	1.946	0.914	BATCH_18	Synthetic	microring_Q	0.108
1.149	227.229996	Air	4.38	PECVD	RIE	2.76	1000C_1hr	1,517.97998	TE	-0.11	67.25	119.389999	21.610001	12.646	4.935	61.470001	50.169998	0.144	1.512	0.816	BATCH_8	Synthetic	OTDR	0.182
1.865	596.150024	Polymer	4.04	Sputtering	RIE	2.1	No_Anneal	1,578.780029	TM	7.68	49.509998	72.830002	46.919998	4.717	0.876	40.34	82.010002	0.273	1.53	0.839	BATCH_2	Measurement	ring_resonance	0.035
1.31	452.480011	Polymer	1.21	PECVD	ICP	4.57	900C_3hr	1,597.430054	TM	8.21	26.469999	151.460007	36.900002	15.68	3.872	71.309998	72.120003	0.216	1.95	0.809	BATCH_37	Measurement	OTDR	0.056
1.615	362.829987	SiO2	3.92	LPCVD	Wet Etch	1.86	No_Anneal	1,574.890015	TM	4.68	31.389999	99.470001	44.150002	17.115999	3.437	84.449997	85.019997	0.403	1.808	0.942	BATCH_27	Synthetic	ring_resonance	0.05
0.947	347.23999	SiO2	3.99	LPCVD	Wet Etch	4.81	No_Anneal	1,514.069946	TM	3.39	51.360001	128.119995	38.139999	18.113001	4.331	76.400002	71.410004	0.055	1.85	0.78	BATCH_26	Synthetic	microring_Q	0.143
1.409	243.369995	SiO2	3.41	PECVD	ICP	4.55	No_Anneal	1,552.26001	TE	0.34	54.919998	193.759995	48.189999	15.617	3.066	77.190002	72.610001	0.443	1.77	0.889	BATCH_21	Measurement	cut-back	0.132
1.644	477.700012	Polymer	3.27	Sputtering	RIE	4.02	900C_3hr	1,586.26001	TE	4.53	51.939999	91.300003	33.900002	15.99	4.416	60.869999	45.720001	0.285	1.99	0.847	BATCH_31	Synthetic	OTDR	0.115
1.972	598.549988	Polymer	4.56	Sputtering	ICP	2.36	900C_3hr	1,597.660034	TE	-8.19	42.209999	46.369999	29.73	11.949	3.378	82.760002	87.32	0.261	1.578	0.948	BATCH_25	Synthetic	cut-back	0.122
1.997	502.019989	SiO2	1.64	PECVD	Wet Etch	1.6	900C_1hr	1,565.939941	TE	-1.58	21.959999	93.379997	24.610001	2.585	0.419	74.959999	60.91	0.398	1.997	0.874	BATCH_36	Measurement	OTDR	0.084
1.46	320.769989	Polymer	2.47	LPCVD	RIE	3.22	900C_3hr	1,598.170044	TM	5.45	41.18	23.09	43.549999	15.035	3.256	44.110001	82.809998	0.135	1.77	0.901	BATCH_24	Measurement	OTDR	0.104
1.836	386.609985	Polymer	2.42	LPCVD	Wet Etch	4.53	900C_3hr	1,500.5	TE	4.75	71.050003	84.879997	13.68	1.267	0.209	72.059998	81.410004	0.462	1.704	0.736	BATCH_29	Synthetic	ring_resonance	0.02
0.681	538.320007	SiO2	3.98	PECVD	Wet Etch	3.05	900C_1hr	1,569.930054	TE	-4.39	44.580002	111.790001	32.599998	16.549	4.816	88.610001	56.41	0.483	1.881	0.835	BATCH_46	Synthetic	cut-back	0.123
1.884	443.899994	Polymer	2.55	PECVD	Wet Etch	0.55	900C_1hr	1,546.780029	TE	-7.65	79.690002	20.74	14	4.838	2.539	64.059998	48.07	0.166	1.674	0.897	BATCH_4	Synthetic	OTDR	0.115
1.789	217.979996	SiO2	4.26	PECVD	ICP	4	No_Anneal	1,587.719971	TE	0.11	43.029999	197.919998	21.27	10.449	4.359	45.490002	54.700001	0.036	1.905	0.791	BATCH_41	Synthetic	cut-back	0.09
0.542	399.519989	Polymer	2.48	LPCVD	RIE	4.42	900C_1hr	1,582.73999	TE	6.49	56	130.880005	16.01	1.975	0.751	77.339996	68.610001	0.377	1.874	0.722	BATCH_39	Measurement	cut-back	0.163
1.81	454.640015	SiO2	2.72	PECVD	RIE	3.47	No_Anneal	1,573.420044	TM	-8.22	64.339996	164.419998	10.44	3.348	1.31	61.419998	77.82	0.021	1.551	0.802	BATCH_42	Measurement	OTDR	0.035
1.427	449.200012	SiO2	1.52	PECVD	RIE	4.94	No_Anneal	1,583.670044	TE	3.6	20.02	151.910004	5.82	2.876	3.511	88.279999	81.559998	0.155	1.535	0.886	BATCH_26	Measurement	ring_resonance	0.061
1.018	272.019989	Air	1.88	LPCVD	RIE	1.33	1000C_1hr	1,584.359985	TM	-9.11	66.080002	42.470001	18.98	8.752	4.313	77.629997	40.099998	0.427	1.777	0.78	BATCH_35	Measurement	OTDR	0.013
0.606	310.309998	SiO2	4.38	PECVD	Wet Etch	2.47	No_Anneal	1,582.140015	TM	7.39	40.049999	31.940001	16.889999	8.712	4.609	40.869999	49.360001	0.245	1.703	0.887	BATCH_33	Synthetic	microring_Q	0.191
1.556	278.480011	Polymer	2.78	PECVD	Wet Etch	4.04	900C_1hr	1,535.869995	TM	-2.39	28.73	104.650002	26.07	7.991	2.787	88.379997	85.849998	0.499	1.606	0.795	BATCH_15	Measurement	OTDR	0.032
1.784	512.75	Air	3.99	LPCVD	RIE	3.32	1000C_1hr	1,551.459961	TE	-1.34	68.199997	142.259995	31.709999	15.667	4.383	66.540001	71.400002	0.133	1.528	0.853	BATCH_47	Synthetic	microring_Q	0.027
1.803	446.619995	Polymer	3.46	PECVD	Wet Etch	1.12	No_Anneal	1,544.199951	TM	-0.38	20.610001	139.580002	48.509998	17.558001	3.214	52.509998	87.839996	0.209	1.663	0.769	BATCH_27	Synthetic	cut-back	0.183
0.67	464.609985	SiO2	3.88	Sputtering	ICP	2.12	1000C_1hr	1,542.76001	TE	-0.75	56.529999	88.019997	6.69	3.163	2.583	62.290001	40.990002	0.244	1.715	0.72	BATCH_22	Synthetic	ring_resonance	0.049
0.629	539.909973	Polymer	1.99	PECVD	RIE	4.01	900C_3hr	1,540.73999	TM	2.77	70.010002	193.089996	45.25	21.497999	4.616	58.810001	85.239998	0.185	1.611	0.83	BATCH_11	Synthetic	microring_Q	0.182
1.409	422.559998	SiO2	2.11	PECVD	ICP	2.81	1000C_1hr	1,525.849976	TM	-5.03	42.509998	35.599998	19.08	7.557	3.097	45.630001	85.019997	0.495	1.749	0.926	BATCH_38	Measurement	OTDR	0.185
1.446	566.23999	SiO2	2.37	LPCVD	Wet Etch	4.12	900C_1hr	1,530.839966	TE	2.32	65.800003	175.309998	37.099998	11.913	2.693	72.080002	67.610001	0.451	1.556	0.926	BATCH_24	Measurement	microring_Q	0.087
0.502	517.200012	SiO2	3.78	Sputtering	RIE	2.72	900C_3hr	1,533.5	TM	5.89	68.970001	148.110001	5.88	1.145	0.396	75.230003	79.68	0.067	1.755	0.907	BATCH_46	Measurement	cut-back	0.172
1.157	352.820007	SiO2	2.81	Sputtering	RIE	0.91	900C_1hr	1,502.359985	TE	0.56	71.940002	148.649994	26.67	5.033	1.334	73.059998	83.449997	0.33	1.677	0.915	BATCH_4	Synthetic	ring_resonance	0.089

Subsets and Splits