Datasets:

Taylor658
/

SiN-photonic-waveguide-loss-efficiency

Dataset card Data Studio Files Files and versions Community

Split (1)

train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
1.294	557.890015	Air	3.45	PECVD	ICP	2.89	No_Anneal	1,547.829956	TM	9.7	47.310001	165.839996	37.599998	6.614	1.562	77.360001	42.34	0.129	1.954	0.89	BATCH_48	Synthetic	ring_resonance	0.127
0.883	347.369995	Air	3.99	LPCVD	ICP	3.71	1000C_1hr	1,549.459961	TM	-5.89	32.880001	145.589996	16.41	3.732	1.438	76.160004	84.019997	0.347	1.741	0.91	BATCH_5	Synthetic	microring_Q	0.031
0.536	363.170013	Polymer	1.41	PECVD	Wet Etch	2.56	1000C_1hr	1,584.150024	TE	8.88	22.620001	79.910004	47.91	22.620001	4.474	63.369999	76.540001	0.299	1.664	0.773	BATCH_8	Measurement	ring_resonance	0.161
1.441	336.350006	SiO2	4.11	LPCVD	RIE	2.83	900C_3hr	1,583.810059	TE	2.3	24.67	118.809998	39.009998	21.198999	4.978	59.619999	41.080002	0.495	1.61	0.946	BATCH_31	Synthetic	microring_Q	0.17
1.086	541.77002	Air	1.23	Sputtering	RIE	4.44	1000C_1hr	1,590.199951	TE	-1.09	36.630001	105.160004	10.01	5.093	3.211	52.41	83.910004	0.068	1.882	0.898	BATCH_37	Synthetic	microring_Q	0.069
1.801	419.220001	Polymer	2.72	PECVD	Wet Etch	1.81	1000C_1hr	1,592.51001	TE	-2.48	40.77	96.599998	7	2.616	2.491	84.980003	42.419998	0.347	1.91	0.754	BATCH_45	Measurement	OTDR	0.084
0.648	224.509995	Air	2.04	Sputtering	Wet Etch	3.59	900C_3hr	1,539.930054	TE	6.41	27.370001	23.33	35.82	14.117	3.422	44.200001	53.549999	0.015	1.527	0.726	BATCH_18	Measurement	ring_resonance	0.128
1.732	542.049988	Air	1.28	Sputtering	Wet Etch	0.84	900C_3hr	1,583.030029	TM	3.84	27.700001	199.210007	40.209999	20.063999	4.709	89.480003	84.989998	0.465	1.818	0.773	BATCH_42	Measurement	cut-back	0.193
0.527	269.570007	SiO2	4.36	LPCVD	Wet Etch	2.29	900C_1hr	1,580.780029	TE	0.68	40.810001	54.57	7.05	3.205	3.387	41.43	79.940002	0.412	1.876	0.743	BATCH_14	Synthetic	cut-back	0.137
0.625	255.539993	Polymer	2.92	LPCVD	ICP	1.9	1000C_1hr	1,584.390015	TE	-8.99	51.18	144.610001	40.75	15.054	3.379	43.689999	56.27	0.29	1.746	0.796	BATCH_33	Synthetic	OTDR	0.024
0.639	322.459991	Polymer	2.45	LPCVD	Wet Etch	4.37	900C_1hr	1,555.319946	TM	-1.35	66.050003	155.270004	18.32	7.019	3.078	45.080002	60.23	0.468	1.518	0.835	BATCH_27	Synthetic	microring_Q	0.132
0.896	491.359985	Air	2.91	LPCVD	ICP	2.5	900C_3hr	1,558.98999	TM	0.06	48.639999	168.509995	35.130001	18.114	4.91	67.769997	46.419998	0.329	1.528	0.761	BATCH_33	Synthetic	cut-back	0.083
0.985	567.539978	Polymer	1.18	LPCVD	RIE	1.81	900C_1hr	1,574.790039	TE	-4.89	23.32	36.380001	49.66	5.041	0.629	51.16	57.049999	0.454	1.958	0.727	BATCH_46	Measurement	ring_resonance	0.122
1.905	490.920013	SiO2	3.16	LPCVD	Wet Etch	1.62	1000C_1hr	1,583	TM	7.05	54.32	179.009995	18.780001	8.091	3.909	70.440002	81.830002	0.363	1.657	0.759	BATCH_37	Measurement	ring_resonance	0.025
0.64	429.559998	Polymer	4.64	PECVD	ICP	4.81	900C_3hr	1,590.099976	TM	-6.12	23.25	49.279999	15.62	2.049	0.309	61.849998	42.77	0.258	1.528	0.829	BATCH_38	Measurement	microring_Q	0.188
1.631	299.959991	Air	4.91	Sputtering	Wet Etch	0.91	900C_3hr	1,507.540039	TE	-1.1	27.91	73.360001	10.71	3.075	1.308	44.610001	73.18	0.359	1.611	0.71	BATCH_12	Measurement	cut-back	0.158
0.555	595.789978	SiO2	2.72	LPCVD	Wet Etch	4.91	1000C_1hr	1,559.920044	TE	4.08	68.900002	130.850006	27.120001	7.664	2.516	54.669998	58.52	0.148	1.662	0.887	BATCH_23	Measurement	ring_resonance	0.174
0.532	432.98999	Air	3.52	LPCVD	RIE	0.98	900C_1hr	1,566.609985	TM	0.71	48.400002	31.459999	37.119999	15.271	3.867	77	69.82	0.404	1.54	0.846	BATCH_45	Synthetic	cut-back	0.022
1.945	588.789978	Polymer	3.28	PECVD	ICP	1.15	No_Anneal	1,516.97998	TE	-1.95	59.740002	111.239998	14.62	8.756	4.953	60.59	75.43	0.347	1.526	0.862	BATCH_32	Synthetic	OTDR	0.131
1.435	336.579987	SiO2	1.49	LPCVD	ICP	2.31	900C_3hr	1,588.849976	TE	-7.8	45.34	105.470001	37.349998	19.257	4.809	71.970001	84.540001	0.152	1.927	0.77	BATCH_6	Synthetic	cut-back	0.116
0.955	421.730011	Air	1.76	PECVD	Wet Etch	1.4	No_Anneal	1,581.930054	TE	-5.82	38.959999	143.570007	40.119999	16.111	3.75	43.970001	61.540001	0.366	1.693	0.793	BATCH_49	Measurement	OTDR	0.119
1.798	565.75	SiO2	1.09	LPCVD	Wet Etch	1.03	900C_1hr	1,558.119995	TM	-6.19	31	27.32	2.44	2.067	4.937	78.669998	72.07	0.41	1.944	0.809	BATCH_29	Synthetic	cut-back	0.039
0.601	471.359985	Polymer	2.16	PECVD	RIE	4.6	900C_3hr	1,546.390015	TM	9.2	61.529999	154.059998	32.580002	8.209	1.993	84.209999	59.52	0.029	1.561	0.801	BATCH_32	Measurement	microring_Q	0.046
0.534	220.479996	Air	1.89	PECVD	Wet Etch	3.98	900C_1hr	1,595.349976	TE	-6.21	38.16	45.73	18.290001	9.344	4.353	55.599998	62.52	0.3	1.873	0.812	BATCH_8	Synthetic	ring_resonance	0.135
1.815	201.089996	Polymer	2.34	LPCVD	Wet Etch	1.97	No_Anneal	1,555.439941	TM	-4.16	60.630001	82.349998	9.19	4.499	2.917	53.009998	63.959999	0.159	1.926	0.904	BATCH_22	Measurement	ring_resonance	0.189
1.107	399.829987	Polymer	4.98	LPCVD	RIE	3.71	900C_1hr	1,594.660034	TM	-4.68	72.709999	95.879997	13.02	4.747	2.434	74.43	76.949997	0.096	1.699	0.946	BATCH_10	Measurement	ring_resonance	0.191
1.15	544.299988	SiO2	1.24	LPCVD	Wet Etch	1.9	900C_3hr	1,532.300049	TE	-4.02	61.419998	90.800003	15.4	5.955	3.11	61.810001	57.77	0.23	1.924	0.95	BATCH_29	Synthetic	OTDR	0.012
0.937	469.429993	Polymer	2.41	Sputtering	Wet Etch	1.85	900C_3hr	1,514.290039	TM	5.09	27.639999	128.979996	9.45	0.801	0.278	55.779999	55.57	0.402	1.811	0.861	BATCH_26	Measurement	cut-back	0.195
1.877	553.359985	SiO2	2.79	PECVD	RIE	1.67	No_Anneal	1,587.050049	TE	-2.76	76.449997	181.009995	31.290001	2.065	0.214	74.730003	66.980003	0.031	1.783	0.786	BATCH_2	Synthetic	OTDR	0.115
1.809	583.159973	Polymer	2.45	PECVD	RIE	4.85	No_Anneal	1,595.48999	TE	-6.33	71.510002	174.289993	4.96	2.175	2.133	70.580002	80.309998	0.275	1.783	0.841	BATCH_49	Synthetic	OTDR	0.018
0.89	429.149994	SiO2	3.11	PECVD	Wet Etch	2.1	1000C_1hr	1,571.890015	TM	2.41	53.27	155.360001	37.349998	11.62	2.961	70.540001	73.019997	0.348	1.534	0.885	BATCH_41	Measurement	ring_resonance	0.056
1.442	390.589996	Air	2.29	LPCVD	ICP	4.62	900C_3hr	1,533.660034	TE	5.07	52.119999	37.02	25.66	5.925	1.678	72.970001	77.599998	0.459	1.843	0.838	BATCH_33	Measurement	OTDR	0.017
1.197	302.950012	Polymer	3.24	PECVD	RIE	2.59	900C_1hr	1,528.400024	TM	5.35	27.48	116.139999	45.41	18.584999	3.743	59.259998	53.599998	0.085	1.881	0.827	BATCH_41	Synthetic	cut-back	0.121
0.516	569.22998	SiO2	4.88	PECVD	ICP	2.3	1000C_1hr	1,503.72998	TE	-5.88	43.200001	173.160004	5.41	2.721	2.394	59.799999	58.48	0.255	1.69	0.82	BATCH_20	Synthetic	OTDR	0.12
1.263	507.160004	Polymer	3.47	PECVD	RIE	2.08	900C_3hr	1,526.920044	TM	-6.67	66.75	153.679993	35.349998	8.508	2.021	77.669998	76.209999	0.293	1.59	0.855	BATCH_16	Measurement	OTDR	0.095
1.655	532.039978	Polymer	1.78	LPCVD	Wet Etch	1.27	900C_1hr	1,574.880005	TE	-1.46	65.239998	51.450001	40.009998	17.167999	3.9	44.029999	81.519997	0.174	1.949	0.789	BATCH_41	Measurement	OTDR	0.043
0.774	496.209991	Air	3.02	PECVD	Wet Etch	4.74	900C_1hr	1,564.079956	TM	3.24	26.66	71.349998	22.32	8.363	3.522	81.120003	55.549999	0.025	1.66	0.73	BATCH_35	Synthetic	cut-back	0.16
0.998	473.079987	SiO2	4.18	LPCVD	RIE	1.47	No_Anneal	1,513.280029	TM	-5.72	78.040001	89.389999	9.05	4.376	3.46	57.029999	51.68	0.425	1.691	0.826	BATCH_49	Synthetic	cut-back	0.088
1.627	534.419983	Polymer	3.95	LPCVD	Wet Etch	3.57	No_Anneal	1,505.73999	TM	2.43	35.82	121.360001	9.29	2.688	1.6	61.84	41.779999	0.2	1.632	0.757	BATCH_22	Synthetic	ring_resonance	0.135
1.104	525.049988	Polymer	3.16	Sputtering	ICP	1.92	1000C_1hr	1,554.859985	TE	-3.47	56.939999	155.910004	20.190001	3.252	1.027	49.790001	47.950001	0.138	1.887	0.707	BATCH_24	Synthetic	microring_Q	0.052
1.879	322.630005	Air	4.4	PECVD	ICP	1.2	900C_3hr	1,536.27002	TM	-9.82	34.220001	83.18	36.610001	12.732	2.966	47.16	60.73	0.097	1.875	0.86	BATCH_1	Synthetic	ring_resonance	0.117
0.878	322.940002	Air	1.62	Sputtering	ICP	1.92	No_Anneal	1,562.199951	TE	-5.71	56.119999	25.49	17.5	10.475	4.883	49.43	77.300003	0.491	1.863	0.7	BATCH_39	Synthetic	OTDR	0.177
1.766	506.170013	Polymer	1.29	PECVD	Wet Etch	3.43	900C_3hr	1,536.26001	TE	-3.26	24.870001	112.239998	2.33	2.025	4.136	68.639999	43.75	0.256	1.673	0.834	BATCH_34	Measurement	OTDR	0.042
1.409	448.140015	Air	3.42	LPCVD	ICP	2.18	900C_3hr	1,506.119995	TE	8.38	50	117.940002	45.200001	24.333	4.965	88.720001	69.400002	0.237	1.739	0.795	BATCH_49	Measurement	cut-back	0.069
0.537	339.51001	SiO2	1.93	Sputtering	Wet Etch	3.78	900C_3hr	1,596.680054	TM	-8.89	40.5	193.729996	32.970001	4.109	1.033	89.370003	78.669998	0.432	1.966	0.842	BATCH_50	Measurement	ring_resonance	0.046
1.559	247.339996	Polymer	3.73	PECVD	ICP	0.85	900C_3hr	1,522.780029	TM	-1.25	30.09	107.480003	49.25	13.629	2.392	46.040001	55.380001	0.49	1.97	0.908	BATCH_29	Measurement	cut-back	0.023
0.945	356.320007	Air	4.38	LPCVD	Wet Etch	4.73	900C_1hr	1,540.819946	TE	1.23	79.18	181.460007	48.810001	5.882	0.918	79.019997	55.939999	0.201	1.559	0.947	BATCH_4	Measurement	OTDR	0.016
0.554	304.660004	Air	3.63	Sputtering	RIE	1.68	900C_1hr	1,592.949951	TM	2.79	74.610001	124.309998	23.540001	13.077	4.89	60.75	74.230003	0.316	1.97	0.736	BATCH_49	Synthetic	OTDR	0.061
1.961	471.690002	Air	3.2	Sputtering	Wet Etch	4.85	900C_3hr	1,530.810059	TM	-4.92	74.620003	100.050003	14.62	3.791	1.335	73.660004	57.189999	0.243	1.709	0.87	BATCH_34	Synthetic	ring_resonance	0.176
1.615	357.98999	Air	4.67	LPCVD	RIE	1.56	No_Anneal	1,569.060059	TM	2.74	32.610001	62.110001	19.809999	5.028	2.224	75.519997	76.879997	0.074	1.752	0.778	BATCH_10	Synthetic	OTDR	0.18
1.204	522.609985	SiO2	2.07	LPCVD	Wet Etch	2.11	1000C_1hr	1,564.040039	TM	1.06	64.169998	106.900002	8.46	2.248	1.517	88.610001	70.949997	0.117	1.867	0.895	BATCH_26	Synthetic	cut-back	0.173
0.924	233.770004	SiO2	2.25	Sputtering	ICP	1.97	900C_1hr	1,574.75	TM	7.75	23.32	103.93	46.459999	21.554001	4.254	86.57	70.650002	0.477	1.992	0.853	BATCH_17	Synthetic	cut-back	0.091
1.409	392.339996	SiO2	2.91	LPCVD	RIE	0.66	900C_3hr	1,523.369995	TE	-0.32	49.700001	166.929993	45.900002	13.143	2.518	40.439999	49.259998	0.278	1.716	0.731	BATCH_10	Synthetic	microring_Q	0.133
0.805	481.459991	Air	4.2	PECVD	Wet Etch	1.62	900C_3hr	1,570.609985	TE	-2.73	56.759998	60.529999	34.529999	6.443	1.565	72.769997	65.239998	0.296	1.687	0.798	BATCH_14	Synthetic	microring_Q	0.056
1.131	566.27002	Polymer	1.65	Sputtering	Wet Etch	2.13	No_Anneal	1,508.890015	TE	3.3	73.099998	77.330002	13.66	7.874	4.323	78.540001	67.629997	0.386	1.578	0.85	BATCH_16	Synthetic	cut-back	0.043
1.32	237.970001	Polymer	1.91	LPCVD	Wet Etch	2.01	900C_3hr	1,590.72998	TE	9.07	30.26	54.169998	6.1	2.792	2.711	63.52	50.939999	0.192	1.855	0.896	BATCH_39	Measurement	cut-back	0.187
1.434	363.429993	SiO2	2.44	LPCVD	RIE	1.71	900C_3hr	1,547.47998	TE	3.64	35	118.559998	18.469999	2.801	0.845	82.230003	52.189999	0.14	1.994	0.846	BATCH_22	Measurement	microring_Q	0.124
1.739	222.119995	Air	1.24	Sputtering	ICP	1.11	900C_1hr	1,504.47998	TE	5.89	43.830002	155.880005	11.09	7.301	4.792	76.419998	88.510002	0.071	1.993	0.877	BATCH_20	Measurement	OTDR	0.179
0.959	581.719971	SiO2	1.53	LPCVD	RIE	2.44	1000C_1hr	1,565.949951	TM	5.4	61.59	136.25	43.040001	7.63	1.518	79.169998	74.650002	0.445	1.8	0.877	BATCH_43	Measurement	microring_Q	0.039
1.615	281.25	SiO2	4.68	PECVD	ICP	4.65	1000C_1hr	1,529.719971	TM	-0.19	58.91	53.740002	17	1.67	0.338	49.459999	46.130001	0.098	1.813	0.788	BATCH_40	Measurement	microring_Q	0.077
0.759	381.670013	Polymer	4.11	Sputtering	ICP	4.3	1000C_1hr	1,589.380005	TE	9.78	43.799999	192.880005	29.219999	2.827	0.593	76.529999	65.870003	0.069	1.74	0.72	BATCH_41	Measurement	microring_Q	0.023
0.982	448.540009	SiO2	3.58	Sputtering	Wet Etch	0.57	1000C_1hr	1,521.449951	TE	-5.05	29.030001	137.949997	17.68	6.254	2.407	87.470001	70.300003	0.081	1.769	0.721	BATCH_5	Measurement	ring_resonance	0.134
0.916	490.410004	SiO2	1.08	PECVD	ICP	2.56	1000C_1hr	1,567.589966	TE	8.87	39.900002	132.589996	40.73	19.108999	4.333	49.900002	86.980003	0.202	1.577	0.811	BATCH_7	Measurement	ring_resonance	0.027
1.919	291.179993	Air	2.03	PECVD	ICP	4.2	No_Anneal	1,555.930054	TE	3.86	21.48	142.679993	34.169998	9.259	2.298	81.620003	46.41	0.296	1.592	0.774	BATCH_42	Measurement	OTDR	0.142
1.015	281.929993	Air	3.61	PECVD	ICP	3.96	900C_1hr	1,581.52002	TE	-4.59	62.07	142.619995	2.26	1.127	2.351	61.080002	65.419998	0.292	1.957	0.904	BATCH_41	Synthetic	microring_Q	0.033
1.489	219.710007	SiO2	1.77	LPCVD	Wet Etch	1.12	900C_1hr	1,593.390015	TM	9.04	78.980003	158.919998	33.91	11.478	2.936	59.669998	42.290001	0.359	1.996	0.861	BATCH_42	Synthetic	cut-back	0.059
0.757	528.330017	Polymer	1.37	LPCVD	RIE	3.64	900C_3hr	1,563.619995	TM	-3.74	74.010002	164.639999	34.810001	2.793	0.248	43.200001	47.360001	0.155	1.988	0.896	BATCH_49	Synthetic	microring_Q	0.098
0.835	527.830017	Polymer	4.47	Sputtering	RIE	1.3	1000C_1hr	1,549.400024	TM	-8.39	24.51	31.58	4.71	3.538	4.324	49.220001	40.779999	0.082	1.592	0.865	BATCH_23	Measurement	microring_Q	0.134
0.545	321.720001	Air	1.49	PECVD	ICP	1.67	900C_1hr	1,573.430054	TE	2.96	67.699997	127.699997	44.310001	13.55	2.677	44.09	69.739998	0.044	1.548	0.852	BATCH_28	Synthetic	cut-back	0.161
1.919	233.479996	Polymer	1.21	LPCVD	RIE	4.18	No_Anneal	1,524.609985	TE	-9.28	49.369999	130.929993	43.939999	20.636	4.242	78.639999	85.190002	0.086	1.804	0.787	BATCH_42	Synthetic	microring_Q	0.084
0.83	241.160004	Air	4.92	Sputtering	RIE	0.6	No_Anneal	1,505.97998	TM	-8.63	51.84	141.089996	12.33	6.715	4.939	51.099998	61.700001	0.45	1.579	0.712	BATCH_5	Measurement	microring_Q	0.051
1.569	474.130005	Air	2.42	Sputtering	RIE	3.03	No_Anneal	1,583.339966	TE	-2.2	41.889999	138.839996	32.560001	8.362	2.064	68.309998	72.760002	0.261	1.67	0.892	BATCH_17	Synthetic	ring_resonance	0.02
1.405	462.869995	SiO2	3.11	PECVD	Wet Etch	3.39	No_Anneal	1,557.439941	TM	-7.6	69.599998	97.900002	8.24	4.594	3.949	47.66	85.980003	0.331	1.619	0.872	BATCH_50	Measurement	microring_Q	0.185
0.677	370.709991	Polymer	1.51	Sputtering	ICP	1.94	900C_3hr	1,532.780029	TE	0.98	23.440001	51.400002	48.470001	16.565001	3.223	62.049999	62.849998	0.149	1.832	0.718	BATCH_23	Measurement	ring_resonance	0.015
1.939	302.640015	Polymer	4.05	PECVD	RIE	3.31	1000C_1hr	1,537.459961	TE	2.53	48.970001	118.919998	4.87	2.576	3.835	47.400002	89.239998	0.154	1.503	0.877	BATCH_5	Measurement	microring_Q	0.12
1.095	265.329987	Polymer	4.98	Sputtering	ICP	3.83	900C_3hr	1,568.420044	TM	-6.01	62.759998	159.380005	2.58	2.639	2.964	53.799999	83.57	0.231	1.633	0.76	BATCH_45	Measurement	OTDR	0.086
0.785	595.929993	SiO2	4.29	PECVD	Wet Etch	4.18	900C_1hr	1,525.119995	TM	-6.6	28.16	105.110001	38.52	16.408001	4.078	52.59	76.18	0.469	1.587	0.708	BATCH_49	Measurement	ring_resonance	0.031
1.821	418.540009	SiO2	1.87	LPCVD	Wet Etch	1.72	1000C_1hr	1,524.469971	TM	-7.39	78.940002	63.540001	4.59	1.385	0.709	61.830002	77.900002	0.265	1.988	0.876	BATCH_12	Synthetic	OTDR	0.181
1.641	515.969971	Polymer	3.36	Sputtering	ICP	4.36	1000C_1hr	1,521.619995	TE	4.65	32.93	126.989998	6.5	3.786	3.535	50.830002	84.75	0.17	1.69	0.882	BATCH_10	Synthetic	microring_Q	0.185
1.281	554.25	SiO2	3.46	PECVD	ICP	2.83	No_Anneal	1,534.439941	TM	0.89	74.400002	145.649994	7.83	4.452	3.576	77.860001	57.18	0.355	1.835	0.771	BATCH_40	Synthetic	ring_resonance	0.153
1.739	247.360001	Air	4.35	PECVD	ICP	2.51	1000C_1hr	1,531.050049	TE	-4.76	76.82	42.66	36.23	14.382	3.46	52.41	56.169998	0.424	1.843	0.879	BATCH_27	Synthetic	cut-back	0.092
0.912	557.210022	SiO2	3.2	Sputtering	ICP	4.18	1000C_1hr	1,547.27002	TE	1.99	41.369999	83.110001	48.400002	15.317	2.938	57.610001	51.66	0.037	1.757	0.737	BATCH_32	Synthetic	microring_Q	0.125
1.044	323.679993	Air	4.61	PECVD	Wet Etch	4.82	1000C_1hr	1,533.939941	TE	-7.09	31.389999	176.479996	42.790001	4.71	0.888	45.549999	59.919998	0.198	1.515	0.894	BATCH_46	Measurement	microring_Q	0.165
1.563	219.619995	Polymer	2.45	Sputtering	RIE	1.05	900C_1hr	1,558.359985	TE	-3.74	54.709999	120.099998	16.709999	5.693	3.085	78.269997	68.839996	0.476	1.942	0.82	BATCH_22	Synthetic	ring_resonance	0.054
1.934	399.01001	SiO2	1.07	Sputtering	Wet Etch	3.85	900C_3hr	1,521.589966	TE	-6.28	68.540001	124.370003	12.75	2.333	0.827	41.630001	66.870003	0.204	1.883	0.823	BATCH_4	Measurement	OTDR	0.184
1.433	297.390015	Air	3.37	PECVD	ICP	1.85	900C_1hr	1,519.560059	TM	4.38	76.580002	117.889999	16.889999	8.68	4.734	88.349998	70.709999	0.28	1.734	0.869	BATCH_27	Measurement	microring_Q	0.134
1.939	529.450012	Polymer	3.69	LPCVD	Wet Etch	2	No_Anneal	1,586.959961	TM	6.99	36.169998	33.5	5.07	3.229	4.785	52.220001	78.080002	0.364	1.636	0.819	BATCH_44	Measurement	cut-back	0.178
0.942	247.350006	Air	4.78	PECVD	ICP	3.39	900C_3hr	1,519.900024	TE	1.87	56.360001	25.23	25.139999	4.165	0.903	82.589996	49.52	0.101	1.759	0.818	BATCH_15	Measurement	cut-back	0.144
0.709	440.720001	Polymer	4.09	LPCVD	ICP	4.29	900C_1hr	1,515.23999	TM	7.8	77.019997	86.730003	21.049999	3.912	1.271	54.310001	82.43	0.061	1.721	0.892	BATCH_25	Synthetic	microring_Q	0.188
1.385	276.559998	SiO2	4.85	Sputtering	Wet Etch	4.14	1000C_1hr	1,530.47998	TE	-7.98	75.010002	186.740005	24.309999	5.838	1.946	76.080002	73.800003	0.21	1.861	0.898	BATCH_43	Measurement	cut-back	0.192
1.146	258.519989	SiO2	1.75	PECVD	RIE	2.02	900C_3hr	1,514.109985	TE	3.23	66.32	152.449997	24.43	4.203	1.299	45.389999	82.150002	0.323	1.599	0.744	BATCH_43	Synthetic	microring_Q	0.039
0.953	563.75	Polymer	1.64	LPCVD	Wet Etch	1.16	900C_3hr	1,542.319946	TE	1.21	74.459999	63.220001	10.35	2.011	0.731	44.599998	75.620003	0.177	1.829	0.719	BATCH_50	Measurement	ring_resonance	0.049
0.822	378.929993	Polymer	1.37	LPCVD	ICP	3.68	1000C_1hr	1,587.780029	TM	0.81	36.490002	108.660004	40.130001	19.517	4.442	46.529999	74.300003	0.207	1.689	0.751	BATCH_28	Synthetic	microring_Q	0.134
1.19	428.059998	Polymer	4.25	LPCVD	Wet Etch	1.99	1000C_1hr	1,530.930054	TM	-1.62	43.470001	161.179993	21.08	8.946	3.602	72.68	82.269997	0.281	1.775	0.911	BATCH_48	Synthetic	microring_Q	0.167
0.888	206.850006	Air	3.34	PECVD	ICP	4.83	No_Anneal	1,523.859985	TM	5.29	23.379999	122.849998	13.67	4.234	2.041	59.759998	81.360001	0.02	1.526	0.86	BATCH_16	Measurement	cut-back	0.123
0.654	500.940002	Polymer	2.55	PECVD	ICP	1.12	900C_1hr	1,591.079956	TE	-8.8	74.800003	191.139999	34.450001	1.778	0.294	53.07	84.519997	0.457	1.874	0.904	BATCH_14	Measurement	ring_resonance	0.031
1.208	325	SiO2	2.52	PECVD	RIE	4.66	900C_1hr	1,589.569946	TE	-5.37	23.77	187.350006	44.84	21.426001	4.487	40.009998	84.5	0.389	1.78	0.769	BATCH_35	Synthetic	microring_Q	0.015
1.076	486.26001	SiO2	2.3	Sputtering	ICP	0.68	900C_1hr	1,551.319946	TE	-2.68	42.389999	30.68	2.96	1.066	1.533	76.760002	46.240002	0.092	1.641	0.872	BATCH_29	Synthetic	ring_resonance	0.128
1.144	299.450012	SiO2	1.7	PECVD	RIE	0.9	900C_1hr	1,569.609985	TM	-7.61	23.610001	47.970001	38.919998	8.591	1.919	74.599998	57.099998	0.058	1.505	0.745	BATCH_16	Measurement	microring_Q	0.014
1.483	368.720001	Air	3.34	Sputtering	RIE	2.01	900C_1hr	1,521.069946	TM	-8.25	42.650002	132.25	44.189999	2.612	0.166	54.290001	67.900002	0.452	1.58	0.827	BATCH_19	Synthetic	cut-back	0.168

Subsets and Splits